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1.
It is difficult to exactly control the film thickness of optical disk multilayer in the actual coating process. The thickness error becomes a main factor affecting the optical characters of the film system. The thickness error′s sensitivity factor of dielectric optical multilayer is derived from the optical matrix in this paper. The effect of the thickness error on the reflectivity or reflectivity contrast of the optical disk multilayer is analyzed with a numerical calculation. The sensitivities to thickness error for different layers or in different film-thickness ranges are compared and discussed. A sketchy method defining allowable thickness error is given. Some experimental results verify the applicability of our theoretical analysis. 相似文献
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为了使光盘获得优良的记录/读出性能并能够长期稳定地使用,必须优化设计相变光盘的多层膜结构。采用自行设计的模拟分析相变光盘读出过程设计软件,从光学角度出发模拟计算了蓝光(405nm)相变光盘的膜层结构,研究了多层膜系的反射率和反射率对比度等光学参量与各层膜厚度和槽深的关系。研究得出的最佳多层膜结构为:下介电层/记录层/上介电层/反射层的厚度对于台记录为100nm/10nm/25nm,/60nm,而对于槽记录则为140nm/15nm/30nm,/60nm,槽深为50nm。模拟计算结果对于将来高密度蓝光相变光盘的制备具有一定的指导意义。 相似文献
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粒子群优化算法是一种新的演化计算技术,与遗传算法相比,粒子群优化算法具有易于实现,控制参量少等优点,且在大多数的情况下,可快速收敛于最优解.为了获得更优的膜系结构,本文提出了一种利用粒子群优化算法进行膜系设计的方法,并以增透膜、高反膜及分光膜为优化设计实例验证该方法的可行性.在这些实例中,以理论反射率和实际反射率的误差平方和为评价函数.结果表明,将粒子群优化算法用于膜系设计是有效的,在相同设计条件下,应用粒子群优化算法可以得到比遗传算法更优的膜系结构. 相似文献
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软X射线Mo/Si多层膜反射率拟合分析 总被引:7,自引:5,他引:7
由于多层膜的表界面粗糙度和材料之间的相互扩散等因素,导致多层膜的实际反射率小于理论计算的反射率,因此,多层膜结构参量的确定对镀膜工艺参量的标定具有重要意义。由于描述单个非理想粗糙界面散射的Stearns法适用于软X射线短波段区域,采用它的数学模型来描述软X射线多层膜的粗糙度,利用最小二乘法曲线拟合法对同步辐射测得的Mo/Si多层膜的反射率曲线进行拟合,得到了非常好的拟合结果,从而确定了多层膜结构参量,同时分析了多层膜周期厚度,厚度比率,界面宽度以及仪器光谱分辨率对多层膜反射特性的影响,这些工作都为镀膜工艺改进提供了一定的理论依据。 相似文献
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波长30.4 nm的He-II谱线是极紫外天文观测中最重要的谱线之一,空间极紫外太阳观测光学系统需要采用多层膜作为反射元件。为此研究了SiC/Mg、B4C/Mg、C/Mg、C/Al、Mo/Si、B4C/Si、SiC/Si、C/Si、Sc/Si等材料组合的多层膜在该波长处的反射性能。基于反射率最大与多层膜带宽最小的设计优化原则,选取了SiC/Mg作为膜系材料。采用直流磁控溅射技术制备了SiC/Mg多层膜,用X射线衍射仪测量了多层膜的周期厚度,用国家同步辐射计量站的反射率计测量了多层膜的反射率,在入射角12°时,实测30.4 nm处的反射率为38.0%。 相似文献
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LIU Huiyong JIANG Fusong MEN Liqiu FAN Zhengxiu GAN Fuxi 《Chinese Journal of Lasers》1998,7(2):158-163
HighReflectionGe0.45Te0.55RecordingFilmsLIUHuiyongJIANGFusongMENLiqiuFANZhengxiuGANFuxi(ShanghaiInstituteofOptics&FineMechani... 相似文献
8.
X. Wang 《Solid State Communications》2011,151(23):1721-1724
We excited surface-plasmon polariton waves (SPPW) on Cu(111) by coupling a monochromatic optical beam with a xenon multilayer thickness grating on the metal. The SPPW excitation was detected with an angle-resolved oblique-incidence reflectivity difference technique (OI-RD). The amplitude of the resonance OI-RD signal was a quadratic function of the grating modulation depth. By monitoring the decay of the resonance OI-RD signal as a function of time and temperature, we were able to study the mass transport of xenon that plays a key role in the annealing of a “rough” Xe multilayer crystalline film. 相似文献
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超分辨薄膜是一种能够实现突破光学衍射极限的功能薄膜,它在超分辨近场光存储技术中起到至关重要的作用。采用磁控溅射共溅的方式制备了Ag掺杂一定量Si的超分辨复合薄膜,测试了其作为掩膜层的超分辨光盘读出性能,并获得了最佳的薄膜制备条件,即当Ag溅射功率为55 W,Si为95 W,溅射时间为80s,薄膜厚度为39nm时,超分辨光盘的读出信号载噪比(CNR)最高为28dB。用X射线光电子能谱测量了上述薄膜的组成,用扫描电子显微镜观察了薄膜微区形貌,并用椭圆偏振光谱仪测量了薄膜的光学常数和厚度。超分辨复合薄膜的读出机理可以用Ag的散射型机理解释。光盘在持续读出10万次以后读出信号基本没有下降。 相似文献
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离子束溅射沉积不同厚度铜膜的光学常数研究 总被引:1,自引:0,他引:1
利用Lambda-900分光光度计对离子束溅射沉积不同厚度Cu膜测定的反射率和透射率,运用哈德雷方程,并考虑基片后表面的影响,对离子束溅射沉积的Cu膜光学常数进行了计算。结果表明,在同一波长情况下,膜厚小于100 nm的纳米Cu膜光学常数随膜厚变化明显;膜厚大于100 nm后,Cu膜的光学常数趋于一定值。Cu膜不连续时的光学常数与连续膜时的光学常数随波长变化规律不同;不同厚度的连续膜的光学常数随波长变化规律相同,但大小随膜厚变化而变化。 相似文献
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本文阐述了n≈k的超薄金属膜与介质膜组成周期对称膜系的光学特性,并结合Ag、Al等膜层的高反特性提出了可见光区诱导窄带高反膜系结构,推导出膜系的反射率、反射峰值、反射半波带宽等光谱反射特性的近似公式,实验证实了理论设计和分析.同时也提出了设计红外和紫外窄带高反滤光片的方法. 相似文献
12.
运用遗传算法优化设计了Mo/B4C多层膜结构。入射光入射角度取10°时,设计的理想多层膜膜对数为150,周期为3.59 nm,Gamma值(Mo膜厚与周期的比值)为0.41,峰值反射率为33.29%。采用恒功率模式直流磁控溅射方法制作Mo/B4C多层膜。通过在Mo/B4C多层膜与基底之间增加15 nm厚的Cr粘附层,提高多层膜与基底的粘附力。另外,还采用调整多层膜Gamma值的方法减小其内应力,调整后多层膜结构周期为3.59 nm, Mo膜厚1.97 nm, B4C膜厚1.62 nm,峰值反射率26.34%。制备了膜对数为150的Mo/B4C膜并测量了其反射率,在波长7.03 nm处,Mo/B4C多层膜的近正入射反射率为21.0%。最后对测量结果进行了拟合,拟合得到Mo/B4C多层膜的周期为3.60 nm,Gamma值0.60,界面粗糙度为0.30 nm。 相似文献
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X-ray reflectivity (XRR) is a non-destructive, accurate and fast technique for evaluating film density. Indeed, sample-goniometer alignment is a critical experimental factor and the overriding error source in XRR density determination. With commercial single-wavelength X-ray reflectometers, alignment is difficult to control and strongly depends on the operator. In the present work, the contribution of misalignment on density evaluation error is discussed, and a novel procedure (named XRR-density evaluation or XRR-DE method) to minimize the problem will be presented. The method allows to overcome the alignment step through the extrapolation of the correct density value from appropriate non-specular XRR data sets. This procedure is operator independent and suitable for commercial single-wavelength X-ray reflectometers. To test the XRR-DE method, single crystals of TiO2 and SrTiO3 were used. In both cases the determined densities differed from the nominal ones less than 5.5%. Thus, the XRR-DE method can be successfully applied to evaluate the density of thin films for which only optical reflectivity is today used. The advantage is that this method can be considered thickness independent. 相似文献
14.
DONG Xuying GAN Fuxi GU Donghong YIN Jinlong 《Chinese Journal of Lasers》2000,9(4):349-355
1 Introduction High densityinformationstorageisanimportanttechnologicalobjective.Toincreasetherecordingdensityisoneoftheimportantsubjectsinthecurrentandfuturedevelopmentofopticalstoragetechnology .Thedigitalversatiledisc recordable (DVD R)formathasbeenpr… 相似文献
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月基极紫外相机多层膜反射镜 总被引:1,自引:0,他引:1
月基极紫外相机用于月球表面对地球等离子体层辐射出的30.4 nm谱线进行成像观测,多层膜反射镜是月基极紫外相机的重要光学元件。根据月基极紫外相机技术参数,选择了B4C/Mg,B4C/Mg2Si,B4C/Al,B4C/Si,Mo/Si等材料,对其周期厚度、材料比例、周期数等参数进行优化。计算了以上材料组合在30.4 nm的反射率曲线。考虑到月球环境的特殊性和材料的物理化学性质,从中选择出Mo/Si和B4C/Si两种组合,利用磁控溅射进行镀制。Mo/Si和B4C/Si多层膜在30.4 nm反射率分别达到15.3%和22.8%。 相似文献
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A generalized design method for an optical filter consisting of a dielectric multilayer structure is proposed to get an arbitrary profile of the wavelength dispersion of reflectivity or transmittance. The basic concept of the method lies in the fact that the wavelength dispersion of the reflectivity is approximately determined by taking the inverse Fourier transformation of the refractive index profile of the multilayer structure. Construction of a filter with only three different values of refractive index is described. 相似文献
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GaN紫外光电阴极是近年发展起来的一种高性能真空紫外探测器件,其中透射式结构作为光电阴极实际应用的工作模式,其多层结构参数及光学特性对阴极的最终光电发射性能有着重要的影响.测试了透射式GaN阴极材料的紫外透射光谱,通过建立透射式GaN阴极样品的透射模型,得到了GaN阴极样品的薄膜厚度、光学吸收系数与透射谱之间的函数关系.计算得到的GaN外延材料的厚度与实际值误差小,吸收系数与已发表数据一致,表明紫外透射光谱法能够准确地实现透射式GaN阴极材料结构及光学特性的评估. 相似文献
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Donyau Chiang Shih-Feng Tseng Wen-Tse Hsiao Chien-Nan Hsiao 《Applied Physics A: Materials Science & Processing》2013,110(3):571-578
Two programs are developed to calculate the temperature profile, as well as the reflectance, transmittance and absorption of a given multilayer film structure, in order to better understand the laser energy distribution between the reflectance, transmittance and absorption in each film layer. An inorganic Blu-ray recordable disc (BD-R) structure is used as a practical demonstration of the multilayer structure. The reflectance and absorption of the BD-R structure exhibit opposite trends and oscillate repeatedly with varying lower or upper dielectric layer thickness while the rest of the film thickness remains unchanged. The energy absorption in an absorbed layer depends on the thickness of the dielectric layers, its relative position in the structure and the extinction coefficient of its optical constant. The total absorption ratio of its maximum to minimum can be over 3 when changing the lower dielectric layer thickness of the studied structure. The layer thickness acts as an energy valve to control the energy flow into the multilayer structure. The thermal profile of the multilayer film structure irradiated by a pulsed laser is calculated at different positions in the film layers with time. The calculated temperatures in the recording alloy layer exhibit linear relationship with the applied power level. The effect of the laser duration time on the temperature increase in the recording layer is significant in the first few nanoseconds and becomes saturated if the heat balance is established in the structure. The calculated temperature is consistent with the experimental recording result when the structure is recorded at 4-time BD-R recording speed. 相似文献
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介绍了13.9 nm马赫贞德干涉仪用软X射线分束镜的设计、制备与性能检测。基于分束镜反射率和透过率乘积最大的评价标准,设计了13.9 nm软X射线激光干涉实验用多层膜分束镜。采用磁控溅射方法在有效面积为10 mm×10 mm、厚度为100 nm的Si3N4基底上镀制了Mo/Si多层膜,制成了多层膜分束镜。利用X射线掠入射衍射的方法测量了Mo/Si多层膜的周期。用扩束He-Ne激光束进行的投影成像方法定性分析了分束镜的面形精度,利用光学轮廓仪完成了分束镜面形精确测量。利用北京同步辐射装置测量了分束镜反射率和透射率,在13.9 nm处,分束镜反射率和透过率乘积达4%。使用多层膜分束镜构建了软X射线马赫贞德干涉仪,并应用于13.9 nm软X射线激光干涉实验中,获得了清晰的含有C8H8等离子体电子密度信息的动态干涉条纹。 相似文献