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1.
The Ag-In-Sb-Te phase-change films were deposited on K9 glass substrates by RF magnetron sputtering technology with an Ag-In-Sb-Te alloy target. The spectral properties and short-wavelength optical storage properties of Ag8In13Sb55Te23 films were studied. X-ray diffraction results have indicated that the crystallization compounds include mainly AgSbTe2 with small amounts of Sb and AgInTe2. A comparatively large absorption has been observed in the visible wavelength range. The optical storage characteristics of Ag8In13Sb55Te23 thin films indicated that larger reflectivity contrast can be obtained at lower writing power and shorter writing pulse width.  相似文献   

2.
方铭  李青会  干福熹 《光子学报》2004,33(8):978-981
利用直流磁控溅射制备了单层Ge2Sb2Te5薄膜,研究了薄膜在400~800 nm区域的反射、透过光谱,计算了它的吸收系数,发现薄膜在400~800 nm波长范围内具有较强的吸收.随着薄膜厚度的增加,相应的禁带宽度Eg也随之增加.对Ge2Sb2Te5薄膜光存储记录特性的研究发现,在514.5 nm波长激光辐照样品时,薄膜具有良好的写入对比度,擦除前后的反射率对比度在6%~18%范围内.对实验结果进行了分析.  相似文献   

3.
研究了单层GeSb2Te4真空射频溅射薄膜在400nm~830nm区域的吸收、反射光谱和光学常数(n,k),发现GeSb2Te4薄膜在400nm~600nm波长范围内具有较强的吸收。在短波长静态测试仪上测试了GeSb2Te4薄膜的光存储记录特性,发现在514.5nm波长用较低功率的激光辐照样品时薄膜在写入前后的反射率变化较大,擦除前后的反射率对比度较低,可通过膜层设计来提高  相似文献   

4.
研究了磁控溅射制备的Ag5In5Te47Sb33相变薄膜的光谱及短波长静态记录性能。研究结果表明,晶态薄膜反射率较高,并在600~900nm波长范围内,晶态与非晶态的反射率和折射率相差很大。在CD-E系统的工作波长780nm处,晶态反射率高达50%,光学常数为5.34-1.0i;非晶态反射率为23%,光学常数为2.5-1.03i。从这一角度讲,Ag5In5Te47Sb33相变薄膜适于做CD-E系统的记录介质。另外,采用波长为514.4nm的短波长光学静态记录测试仪对Ag5In5Te47Sb33薄膜的记录性能进行了测试,结果表明,这种薄膜短波长记录性能较好,它在较低功率和短脉宽的激光束作用下就可得到较高的反射率对比度。  相似文献   

5.
To improve the optical storage performance, Sn was doped into Ge2Sb2Te5 phase change thin films. The optical and thermal properties of Sn-doped Ge2Sb2Te5 film were investigated. The crystal structures of the as-sputtered and the annealed films were identified by the X-ray diffraction (XRD) method. The differential scanning calorimeter (DSC) method is used to get the crystallization temperature and crystallization energy (Ea). It was found that proper Sn-doping could highly improve storage performance of the Ge2Sb2Te5 media.  相似文献   

6.
One important application area of chalcogenide materials is rewritable optical data storage. This technology is based on a reversible phase transition between the crystalline and the amorphous state and vice versa. Currently dominant materials for rewritable optical recording are Ge–Sb–Te and Ag–In–Sb–Te alloys. Material research still continues due to the need for increasing storage capacity and data rates. Polycrystalline bulks of AgSbS2 were prepared by melt-quench technique. Composition and homogeneity of these bulks were checked by scanning electron microscopy with energy dispersive X-ray analysis (SEM-EDX), crystallinity was studied by X-ray diffraction (XRD). Targets for RF magnetron sputtering were prepared from pulverized bulks by hot-pressing technique. Targets were characterized the same way as bulks. Thin Ag–Sb–S films were prepared by RF magnetron sputtering as potential candidates for rewritable optical data storage films. Composition and homogeneity of prepared thin films were characterized by SEM-EDX, Rutherford Back Scattering (RBS) and Elastic Recoil Detection Analysis (ERDA); character (amorphous/crystalline) was traced by XRD. Optical properties (spectral dependence of refractive index) were evaluated on the basis of UV–Vis–NIR spectroscopy and variable angle spectral ellipsometry (VASE). Crystallization abilities were studied by the measurement of thermal dependence of the prepared thin films optical transmission.  相似文献   

7.
刘波  阮昊  干福熹 《光学学报》2002,22(10):1266-1270
研究了结晶度对Ag11In12 Te2 6Sb51相变薄膜光学常数的影响。用初始化仪使相变薄膜晶化 ,改变晶化参量得到不同的结晶度 ,当转速固定时 ,随激光功率的增加 ,折射率基本随之减小 ,消光系数先是增大 ,而后减小 ;当激光功率固定时 ,随转速的增大 ,折射率也随之增大 ,消光系数也是先增大后减小。非晶态与晶态间的变换、薄膜微结构的变化 (包括晶型的转变和原子间键合状态的变化 )以及薄膜内残余应力是影响Ag11In12 Te2 6Sb51相变薄膜复数折射率的主要原因。测量了单层膜的透过率和CD RW相变光盘中Ag11In12 Te2 6Sb51薄膜非晶态和晶态的反射率  相似文献   

8.
溅射气压对Ge2Sb2Te5薄膜光学常数的影响   总被引:1,自引:0,他引:1  
实验研究了氩气气压对溅射制备的Ge2 Sb2 Te5 薄膜的光学常数随波长变化的影响 ,结果表明 :随薄膜制备时氩气气压的增加 ,Ge2 Sb2 Te5 薄膜的折射率n先增大后减小 ,而消光系数k先减小后增大。二者都随波长的变化而变化 ,且在长波长范围变化较大 ,短波长范围变化较小 ,解释了溅射气压对Ge2 Sb2 Te5 薄膜的光学常数影响的机理  相似文献   

9.
翟凤潇  梁广飞  王阳  吴谊群 《光学学报》2012,32(6):631006-320
利用磁控溅射法在K9玻璃基底上制备了Ag8In14Sb55Te23(AIST)纳米薄膜,并利用激光抽运-探测技术测量了薄膜的时间分辨反射率变化特性。研究结果表明,在合适能量密度的单脉冲纳秒激光脉冲作用下,AIST薄膜可以快速从沉积非晶态转化为晶态结构,晶化过程包含中间熔化态。在较低能量密度范围内,反射率变化量和晶化时间都随能量密度变化呈线性增加趋势。  相似文献   

10.
OpticalRecordingPerformanceofIn_(47)Sb_(14)Te_(39)PhaseChangeThinFilmsusing514.5nmWavelengthLaserBeam¥MENLiqiu;JIANGFusong;GAN?..  相似文献   

11.
刘超  姜复松 《光学学报》1996,16(10):471-1474
研究了632.8nm波长下适用的相变光盘介质Ge2Sb2Te5薄膜的制备方法和静态光存诸记录特性,发现该薄膜可在100ns条件下实现直接重写,在优化膜层结构后,写擦循环次数高达10^6,反射率对比度在15%以上。  相似文献   

12.
Sb掺和对TeOx薄膜光学和静态记录特性的影响   总被引:2,自引:2,他引:0  
李青会  干福熹 《光子学报》2001,30(11):1421-1424
以真空蒸镀法在K9玻璃基底上制备了TeOx:Sb单层薄膜,对薄膜的结构、光学和静态记录特性进行了研究.结果表明,Sb掺和后TeOx薄膜的结构、反射光谱和光学常量均发生了明显变化.TeOx:Sb薄膜具有良好的写入灵敏性并具有了一定的可擦除性能,该类薄膜有望作为可擦除光存储介质.  相似文献   

13.
TeOx薄膜结构及短波长静态记录特性的研究   总被引:4,自引:3,他引:1  
以真空蒸镀法在K9玻璃基底上制备了TeOx单层薄膜.使用X射线光电子能谱仪(XPS)、X射线衍射仪(XRD)、原子力显微镜(AFM)对薄膜的结构进行了分析.实验结果表明,薄膜是由晶态Te分散在非晶态TeO2基体中形成的混合体系,TeO2基体的存在增强了Te的抗氧化性能;薄膜具有精细粒状结构和粗糙的表面;退火后薄膜的反射率增加和Te向表面的偏析、重聚集及表面粗糙度的降低有关.采用波长为514.4nm的短波长静态记录仪对薄膜静态记录性能的测试结果表明:薄膜具有良好的记录灵敏性,在记录功率1.5mW、脉宽50ns时就可产生较高的反射率衬比(度).研究结果为选择合适掺和物使TeOx薄膜实际用作高密度光存储介质有重要意义.  相似文献   

14.
AgInSbTe薄膜的短波长记录性能分析   总被引:1,自引:0,他引:1  
魏劲松  阮昊  陈仲裕  干福熹 《光学学报》2002,22(11):281-1285
采用自制的装置研究了Ag5In5Sb47Te33薄膜的静态记录性能与记录激光的功率和脉冲宽度的关系,并对其记录畴形貌特点进行了直接观察。结果表明只有记录激光的功率和脉冲宽度在一定范围之内才能起到信息记录的作用,所得的记录畴形貌十分清晰,基本为非晶态Ag5In5Sb47Te33;小于该范围的激光能量不能使材料结构发生较大的变化,所得的记录畴形貌模糊,反射率对比度低于2%;大于该范围所得的记录畴由烧蚀区和其周围的非晶态Ag5In5Sb47Te33组成。另外,得到了记录激光功率为12mW、脉冲宽度为90ns的Ag5In5Sb47Te33薄膜的短波长最佳记录条件,其记录畴的反射率对比度为22%,直径为380nm-400nm。  相似文献   

15.
The optical properties of monolayer Ge2Sb2Te5 thin films with three different thicknesses prepared by dc magnetron sputtering method at the range of 400 - 800 nm were studied. The optical absorption coefficients and the optical energy gap (Eg) were calculated. The results gave values for the absorption coefficients in the range of (1.3 - 7.5) × 105 cm-1 which were in the high absorption wavelength region of 400 - 800 nm. The optical energy gaps were 0.684, 0.753 and 0.810 eV corresponding the films thicknesses of 57, 88 and 127 nm, respectively, showing the characteristic of increasing with the increase of the film thickness.  相似文献   

16.
We have investigated a room-temperature growth mode of ultrathin Ag films on a Si(111) surface with an Sb surfactant using STM in a UHV system. On the Sb-passivated Si surface, small sized islands were formed up to 1.1 ML. Flat Ag islands were dominant at 2.1 ML, coalescing into larger islands at 3.2 ML. Although the initial growth mode of Ag films on the Sb-terminated Si(111) surface was Volmer-Weber (island growth), the films were much more uniform than Ag growth on clean (Si(111) at the higher coverages. From the analysis of STM images of Ag films grown with and without an Sb surfactant, the uniform growth of Ag films using an Sb surfactant appears to be caused by the kinetic effects of Ag on the preadsorbed Sb layer. Our STM results indicated that Sb suppresses the surface diffusion of Ag atoms and increases the Ag-island density. The increased island density is believed to cause coalescence of Ag islands at higher coverages of Ag, resulting in the growth of atomically flat and uniform Ag islands on the Sb surfactant layer.  相似文献   

17.
Polycrystalline p-type Ag 0.9 Sb 1.1 x Mn x Te 2.05(x = 0.05,0.10,and 0.20) compounds have been prepared by a combined process of melt-quenching and spark plasma sintering.The sample composition of Ag 0.9 Sb 1.1 x Mn x Te 2.05 has been specially designed in order to achieve the doping effect by replacing part of Sb with Mn and to present the uniformly dispersed Ag 2 Te phase in the matrix by adding insufficient Te,which is beneficial for optimizing the electrical transport properties and enhancing the phonon scattering effect.All the samples have the NaCl-type structure according to our X-ray powder diffraction analysis.After the treatment of spark plasma sintering,only the sample with x = 0.20 has a small amount of MnTe 2 impurities.The thermal analysis indicates that a tiny amount of Ag 2 Te phase exists in all these samples.The presence of the MnTe 2 impurity with high resistance and high thermal conductivity leads to the deteriorative thermoelectric performance of the sample with x = 0.20 due to the decreased electrical transport properties and the increased thermal conductivity.In contrast,the sample with x = 0.10 exhibits enhanced thermoeletric properties due to the Mn-doping effect.A dimensionless thermoelectric figure of merit of 1.2 is attained for the sample with x = 0.10 at 573 K,showing promising thermoelectric properties in the medium temperature range.  相似文献   

18.
HighReflectionGe0.45Te0.55RecordingFilmsLIUHuiyongJIANGFusongMENLiqiuFANZhengxiuGANFuxi(ShanghaiInstituteofOptics&FineMechani...  相似文献   

19.
Electrical and optical studies have been carried out on aluminium-modified Ge2Sb2Te5 thin films to check its applicability as an active material in optical and electrical memory storage devices. Five polycrystalline bulk samples were prepared with compositions: Alx(Ge2Sb2Te5)1?x; x = 0, 0.08, 0.14, 0.21, 0.25. Amorphous thin films were deposited from the polycrystalline bulk by thermal evaporation. Temperature-dependent resistance shows the increase in crystallization temperature of Ge–Sb–Te films on aluminium addition. Activation energy for conduction, conductivity, optical band gap, coefficient of refraction and extinction coefficient are studied with respect to Al content in both amorphous and crystalline phases of Ge–Sb–Te alloy films.  相似文献   

20.
Using a first-principles cluster expansion, we shed light on the solid-state phase diagram and structure of the recently discovered high-performance Pb-Ag-Sb-Te thermoelectrics. The calculated bulk thermodynamics favors the formation of coherent precipitates of ordered Ag(m)Sb(n)Te(m+n) phases immiscible with rocksalt PbTe, such as AgSbTe2. The solubility is high for Pb in AgSbTe2 and low for (Ag,Sb) in PbTe (8% vs 0.6% at 850 K). The differences in the phonon spectra of PbTe and AgSbTe2 suggest that these precipitates enhance the thermoelectric performance by lowering thermal conductivity.  相似文献   

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