Mn掺杂对ZnO薄膜结构及发光性能的影响

利用脉冲激光沉积的方法在Si衬底上生长出了c轴高度取向的Mn掺杂ZnO薄膜.X射线衍射表明所有样品都具有纤锌矿结构,没有发现其它相,随着掺杂量的增加,c轴晶格常数增大.原子力显微镜结果显示:Mn的掺杂引起了ZnO薄膜表面粗糙度的变化.由光致发光谱发现,在387 nm附近出现了由于近带边自由激子复合引起的紫外峰,还有以4...     

第一性原理的广义梯度近似+U方法的纤锌矿Zn1-xMgxO极化特性与Zn0.75Mg0.25O/ZnO 界面能带偏差研究

在纤锌矿结构Zn_1-xMg_xO/ZnO异质结构中发现了高迁移率的二维电子气(2DEG), 2DEG 的产生很可能是由于界面上存在不连续极化, 而且2DEG通常也被认为是由极化电荷产生的结果. 为了探索2DEG的形成机理及其产生的根源, 研究Zn_1-xMg_xO合金的极化特性与ZnO/Zn_1-xMg_xO超晶格的能带排列是非常必要的. 基于第一性原理广义梯度近似+U方法研究了Zn_1-xMg_xO合金的自发极化随Mg组分x的变化关系, 其中极化特性的计算采用Berry-phase方法. 由于ZnO与Zn_1-xMg_xO 面内晶格参数大小相当, ZnO 与Zn_1-xMg_xO 的界面匹配度优良, 所以ZnO/Zn_1-xMg_xO 超晶格模型较容易建立. 计算了Mg_0.25Zn_0.75O/ZnO超晶格静电势的面内平均及其沿着Z(0001)方向上的宏观平均. (5+3)Mg_0.25Zn_0.75O/ZnO超晶格拥有较大的尺寸, 确保远离界面的Mg_0.25Zn_0.75O与ZnO区域与块体计算情况一致. 除此之外, 基于宏观平均为能量参考, 计算得到Mg_0.25Zn_0.75O/ZnO超晶格界面处价带偏差为0.26 eV, 并且导带偏差与价带偏差的比值处于合理区间, 这与近来实验上报道的结果相符. 除了ZnO在[0001]方向上产生自发极化外, 由于在ZnO中引入Mg杂质会产生应变应力, 导致Mg_xZn_1-xO层产生额外的极化值. 这样必然会在Mg_0.25Zn_0.75O/Zn界面处产生非连续极化现象, 促使单极性电荷在界面处积累, 从而在Mg_0.25Zn_0.75O/Zn超晶格中产生内在电场. 此外, 计算了Mg_0.25Zn_0.75O/ZnO超晶格的能带排列, 由于价带偏差Δ E_V=0.26 eV与导带偏差ΔE_C=0.33 eV, 表明能带遵循I型排列. Mg_0.25Zn_0.75O/ZnO 的这种能带排列方式足以让电子与空穴在势阱中产生禁闭作用. 2DEG在电子学与光电子学领域都有重要应用, 本文的研究结果将对Mg_0.25Zn_0.75O/ZnO 界面2DEG的设计与优化中起到重要作用, 并且可以作为研究其他Mg组分的Mg_xZn_1-xO/ZnO超晶格界面电子气特性的参考依据.     

溶胶-凝胶法制备MgxZn1-xO薄膜的结构及光学特性

用溶胶-凝胶法制备了一系列的Mg_xZn_1-xO(0≤x≤0.3)薄膜,并用X射线衍射(XRD)和光致发光(PL)研究了不同的退火温度和Mg的掺杂含量对Mg_xZn_1-xO薄膜的结构和光学性质的影响.研究表明:Mg_xZn_1-xO薄膜为单相六角纤锌矿结构,并且具有沿c轴的择优取向;发现了中间热处理温度为350℃的Mg_xZn_1-xO薄膜退火温度的转折点为700℃,低于这个温度时随退火温度的升高,(002)衍射峰强度增强且掺Mg的薄膜既有紫外光又有绿光发射;800℃退火时,薄膜的(002)衍射峰强度减小,出现了(100)和(101)衍射峰,且掺Mg的薄膜只有紫外发光峰.不同的掺杂浓度对于发光也有影响,低于700℃退火时,ZnO薄膜只出现紫外发光峰,掺Mg的薄膜却出现了紫外和绿光两个发光峰.     

过渡金属与F共掺杂ZnO薄膜结构及磁、光特性

采用溶胶-凝胶法在玻璃衬底上制备了过渡金属元素与F共掺杂Zn_0.98-xTM_xF_0.02O (TM_x=Cu_0.02, Ni_0.01, Mn_0.05, Fe_0.02, Co_0.05)薄膜, 进而利用X射线衍射仪、扫描电子显微镜、紫外-可见透过谱、光致发光及振动样品磁强计等研究了薄膜的表面形貌、微结构、禁带宽度及光致发光(PL)和室温磁学特性. 研究表明: 掺杂离子都以替位的方式进入了ZnO晶格, 掺杂不会破坏ZnO的纤锌矿结构. 其中Zn_0.93Co_0.05F_0.02O薄膜样品的颗粒尺寸最大, 薄膜的结晶度最好且c轴择优取向明显; Zn_0.93Mn_0.05F_0.02O薄膜样品的颗粒尺寸最小, 薄膜结晶度最差且无明显的c轴择优取; Cu, Ni, Fe与F共掺杂样品的颗粒尺寸大小几乎相同. TM掺杂样品均表现出很高的透过率, 同时掺杂后的薄膜样品的禁带宽度都有不同程度的红移. PL谱观察到Zn_0.98-xTM_xF_0.02O薄膜的发射峰主要由较强的紫外发射峰和较弱的蓝光发射峰组成. Zn_0.93Mn_0.05F_0.02O薄膜样品的紫外发光峰最弱, 蓝光发射最强, 饱和磁化强度最大; 与之相反的是Zn_0.96Cu_0.02F_0.02O薄膜, 其紫外发光峰最强, 蓝光发射最弱, 饱和磁化强度最小. 结合微结构和光学性质对Zn_0.98-xTM_xF_0.02O薄膜的磁学性质进行了讨论.     

Magnesium incorporation efficiencies in Mg_xZn_(1-x)O films on ZnO substrates grown by metalorganic chemical vapor deposition

We investigate the magnesium(Mg) incorporation efficiencies in Mg_xZn_(1-x)O films on c-plane Zn-face ZnO substrates by using metalorganic chemical vapor deposition(MOCVD) technique. In order to deposit high quality Mg_xZn_(1-x)O films,atomically smooth epi-ready surfaces of the hydrothermal grown ZnO substrates are achieved by thermal annealing in O_2 atmosphere and characterized by atomic force microscope(AFM). The AFM, scanning electron microscope(SEM),and x-ray diffraction(XRD) studies demonstrate that the Mg_xZn_(1-x)O films each have flat surface and hexagonal wurtzite structure without phase segregation at up to Mg content of 34.4%. The effects of the growth parameters including substrate temperature, reactor pressure and Ⅵ/Ⅱ ratio on Mg content in the films are investigated by XRD analysis based on Vegard's law, and confirmed by photo-luminescence spectra and x-ray photoelectron spectroscopy as well. It is indicated that high substrate temperature, low reactor pressure, and high Ⅵ/Ⅱratio are good for obtaining high Mg content.     

MOCVD外延Hg1-xCdxTe/Cd1-yZnyTe薄膜的光致发光

利用Raman显微镜系统对两块用MOCVD方法在Cd_0.96Zn_0.04Te衬底上生长的Hg_0.8Cd_0.2Te外延薄膜样品在光谱范围50～5000cm^-1进行了测量,在其中的一块样品上首次发现了143eV至193eV范围内出现的具有周期结构的光致发光峰,该发光峰对应的能带中心位于Hg_0.8Cd_0.2Te外延层导带底上方173eV,在另外一块外延薄膜样品中仅观察到四个Raman散射峰,没有周期结构的发光峰。为了分析上述光致发光的起因,对两块样品进行了X射线的双晶回摆曲线样品结构分析,得出样品在143eV至193eV范围的光致发光峰是由于改进MOCVD生长工艺提高了样品的结构质量所致,通过分析指出该光致发光峰是来源于Hg_0.8Cd_0.2Te外延层中的阴性离子空位的共振能级。     

Ternary semiconductor compounds CuInS2 (CIS) thin films synthesized by electrochemical atomic layer deposition (EC-ALD)

In this paper the formation and characterization of the I-III-VI₂ semiconductor compound CuInS₂ (CIS) on gold substrate at room temperature by electrochemical atomic layer deposition (EC-ALD) method are reported. Optimum deposition potentials for each element are determined using cyclic voltammetry (CV) technique and Amperometric I-t method is used to prepare the semiconductor compound. These thin films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FE-SEM) and Fourier transform infrared spectroscopy (FT-IR). XRD results indicate that the CIS thin films have a (1 1 2) preferred orientation. The XPS analyses of the films reveal that Cu, In and S are present in an atomic ratio of approximately 1:1:2. And their semiconductor band gaps are found to be 1.50 eV by FT-IR.     

金属有机化学气相沉积生长Zn1-xMnxSe薄膜的发光和磁光性质

利用金属有机化学气相沉积(MOCVD)方法在GaAs衬底上生长了不同组分的Zn_1-xMn_xSe薄膜。X射线衍射和X射线摇摆曲线证明样品具有较好的结晶质量。在低温、强磁场下对样品的发光进行了研究,在带边附近观察到两个发光峰的相对强度随着磁场增强发生了变化。通过变温光谱探讨了这两个发光峰的来源,并被分别归因于自由激子跃迁和与Mn有关的束缚态激子跃迁。同时随着磁场的增强,ZnMnSe带隙发光红移是由于类S带和类P带电子与Mn离子的3d⁵电子的自旋交换作用。     

脉冲激光沉积制备MgxNi1-xO合金薄膜的表征及光学性质研究

应用脉冲激光沉积(PLD)技术,固定脉冲激光能量密度为5 J/cm2,调节薄膜生长基底温度为300~700 ℃,制备了系列Mg_xNi_1-xO合金薄膜。通过透射电子显微镜(TEM)、X射线光电子能谱(XPS)、原子力显微术(AFM)等表征分析手段,详细分析了薄膜的成分及组织,研究了退火处理对样品的影响。通过UV-Vis分光光度计研究了透射光谱,结合理论计算了光学带隙宽度。结果表明:薄膜由非晶及多晶构成,紫外吸收边约为290 nm, 接近日盲波段的上限; 衬底温度为500 ℃、激光脉冲能量密度为5 J/cm2时生长的薄膜在短波部分吸收强烈,而长波部分几乎不吸收,有利于紫外探测; 退火处理改善了样品表面质量, 但不能有效拓宽光学带隙。     

Nanostructure and optical properties of M doped ZnO (M=Ni, Mn) thin films prepared by sol-gel process

The transparent thin films of undoped, Mn-doped, and Ni-doped zinc oxide (ZnO) have been deposited on glass substrates via sol-gel technique using zinc acetate dehydrate, nickel chloride, and manganese chloride as precursors. The structural properties and morphologies of the deposited undoped and doped ZnO thin films have been investigated. X-ray diffraction (XRD) spectra, scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS) were used to examine the morphology and microstructure of the thin films. Optical properties of the thin films were determined by photoluminescence (PL) and UV/vis spectroscopy. The analyzed results indicate that the obtained films are of good crystal quality and have smooth surfaces, which have a pure hexagonal wurtzite ZnO structure without any Mn or Ni related phases. The band gap energy was estimated by Tauc's method and found to be 3.28, 3.26, and 3.34 eV for ZnO, Ni-doped ZnO, and Mn-doped ZnO thin films at room temperature, respectively. Room temperature photoluminescence is observed for the ZnO, Ni-doped ZnO, and Mn-doped ZnO thin films.     

Zn,Cd对CaTiO3：Pr3+的发光性质的影响

采用高温固相反应合成CaTiO₃:Pr³⁺、Zn₂TiO₄、Ca_0.7Zn_0.3-xCd_xTiO₃:Pr³⁺(x=0.01,0.03,0.05,0.07,0.09,0.1)红色系列粉末状发光材料。经X射线衍射检测其结构,CaTiO₃结构为正交晶系,其结果与JCPDS标准卡(42-423)相符。Zn₂TiO₄结构属立方晶系,结果与JCPDS标准卡(25-1164)一致。Ca_0.7Zn_0.3-xCd_xTiO₃:Pr³⁺(x=0.01,0.03,0.05,0.07,0.09,0.1)由两种物相组成,一种为CaTiO₃,另一种为Zn₂TiO₄。检测了材料的激发光谱和发射光谱。发现,在CaTiO₃:Pr³⁺中加入适量Zn可形成Zn₂TiO₄相,使材料的激发光谱在324nm附近的吸收增强。少量Cd可进入Zn₂TiO₄晶格,增强激发光谱在324nm附近的吸收,同时提高发射光谱的强度;但过量的Cd的加入会导致发射光谱强度下降。     

Zn1-xMgxO电子结构及光学性质的第一性原理GGA+U方法研究

Mg掺杂ZnO形成的固溶体Zn_1-xMg_xO（ZMO）（0 ≤ x ≤ 0.25）是一种带隙较宽、电子学性质可调控的半导体材料,在薄膜太阳电池及光电设备的透明电极等方面具有重要的应用价值。基于密度泛函理论下的第一性原理超软赝势方法,采用GGA+U计算了ZMO的电子结构和光学性质。计算结果表明,随着x值的增加,ZMO的禁带宽度由x=0时的3.32 eV增加到x=0.25时的3.78 eV;光吸收边及反射谱和能量损失谱均发生明显蓝移,峰值存在于紫外光区。计算结果与实验结论相符合。     

Zn1-xTMxO (TM=Al,Ga, In)导电性能的模拟计算

基于密度泛函理论框架下的第一性原理平面波超软赝势方法, 构建了未掺杂与相同掺杂浓度的Zn_1-xTM_xO (TM=Al, Ga, In) 超胞模型,分别对模型进行了几何结构优化、态密度分布和能带分布的计算. 结果表明, 分别高掺杂 (Al, Ga, In) 相同原子分数3.125 at%的条件下, In掺杂对ZnO导电性能最好的结果, 计算结果和实验结果相一致. 关键词： (Al,Ga,In) 高掺ZnO 导电性能 第一性原理     

利用脉冲激光沉积法制备高Mg掺杂的六方相MgZnO薄膜

选用Mg0.2Zn0.8O陶瓷靶,利用脉冲激光沉积(PLD)法,在单晶Si(100)和石英衬底上生长了一系列MgZnO薄膜(MZO)。通过X射线衍射(XRD)、扫描电子显微镜(SEM)、X射线能谱(EDS)和紫外可见光透射光谱(UV-Vis)等实验手段,研究了在不同工作压强下生长的薄膜样品的晶体结构、微观形貌和光学性能的变化。结果表明:所有的薄膜样品都是单一的ZnO六方相,禁带宽度随生长压强的升高而增加,变化范围在3.83～4.05eV之间,最短吸收边接近300nm。     

H2S硫化CuInSe2生成CuIn(SxSe1-x)2薄膜的XRD及Raman分析

将CuInSe₂薄膜在H₂S与Ar的混合气体中硫化是制备CuIn(S_xSe_1-x)₂薄膜的一种常用方法。硫化所用到的CuInSe₂薄膜是用溶剂热法生成的CuInSe₂纳米颗粒旋涂而成。不同于其他真空条件下制备CuInSe₂薄膜的方法.溶剂热法的优点是其相对简单的制备工艺和较低廉的成本。对硫化过程进行研究后发现,硫化温度和时间直接影响CuIn(S_xSe_1-x)₂薄膜的质量,诸如薄膜成分、结晶度、均匀性和带隙宽度都可以通过改变这些实验条件来进行控制。     

Formation of high quality gallium nitride thin films on Ga-diffused Si(1 1 1) substrate

High quality gallium nitride thin films have been successfully grown on the Ga-diffused Si(1 1 1) substrates through ammoniating Ga₂O₃ thin films deposited by r.f. magnetron sputtering. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), atomic force microscope (AFM) and photoluminescence (PL) were used to characterize the synthesized samples. The analyses reveal that the formed films are high quality polycrystalline hexagonal gallium nitride. The as-formed GaN films show a flat surface topography with RMS roughness varied from 29 to 48 Å. The strong near-band-edge-emission peak around 368 nm was observed at room temperature. This is a novel method to fabricate GaN thin films based on the direct reaction between Ga₂O₃ and NH₃ on the Ga-diffused Si(1 1 1) substrates.     

石英衬底上Au缓冲层对ZnO薄膜微结构的影响

采用单源化学气相沉积(SSCVD)法,在石英衬底上以Au为缓冲层,Zn4(OH)2(O2CCH3)6.2H2O为固相源制备ZnO薄膜。SEM和XRD测试ZnO薄膜的微结构,结果表明:相对于SiO2衬底上生长的ZnO薄膜,Au/SiO2衬底上生长的ZnO薄膜具有较好的结晶质量和表面平整度;对制备ZnO薄膜的衬底温度进行了工艺优化,结果表明:500℃时制备的ZnO薄膜颗粒大小均匀,结晶质量较好;通过荧光光谱仪对Au/SiO2衬底上的ZnO薄膜进行光致发光(PL)谱测试,ZnO薄膜在400nm出现紫光发射峰,而没有出现与缺陷相关的深能级发射峰,表明ZnO薄膜具有较好的结晶质量。     

The dopant concentration and annealing temperature dependence of ferromagnetism in Co-doped ZnO thin films

A series of Zn_1−xCo_xO thin films with the atomic fraction, x, in the range of 0.03–0.10 were deposited on glass substrates at room temperature by magnetron co-sputtering technique and subsequently coupled with the post-annealing treatment for half hour at different temperatures (350 °C and 500 °C) under vacuum. A systematic study was done on the structural, optical and magnetic properties of Zn_1−xCo_xO thin films as a function of Co concentration and annealing temperature. X-ray diffraction and UV–vis spectroscopy results indicated that there are not any secondary phases and Co²⁺ substituted for Zn²⁺ of ZnO host. Magnetic hysteresis loops were observed at room temperature, indicating that both the as-deposited samples and the annealed ones exhibit the room temperature ferromagnetism. It was also found that the magnetic saturation moment per Co atom decreases with increasing Co concentration, while the post-annealing treatment can enhance the magnetic moment of the films effectively.     

Characterization of gallium-doped CdS thin films grown by chemical bath deposition

Ga-doped CdS thin films, with different [Ga]/[Cd] ratios, were grown using chemical bath deposition. The effect of Ga-doping on optical properties and bandgap of CdS films is investigated. Resistivity, carrier density, and mobility of doped films were acquired using Hall effect measurements. Crystal structure as well as crystal quality and phase transition were determined using X-ray diffraction (XRD) and Micro-Raman spectroscopy. Film morphology was studied using scanning electron microscopy, while film chemistry and binding states were studied using X-ray photoelectron spectroscopy (XPS). A minimum bandgap of 2.26 eV was obtained at [Ga]/[Cd] ratio of 1.7 × 10⁻². XRD studies showed Ga³⁺ ions entering the lattice substitutionally at low concentration, and interstitially at high concentration. Phase transition, due to annealing, as well as induced lattice defects, due to doping, were detected by Micro-Raman spectroscopy. The highest carrier density and lowest resistivity were obtained at [Ga]/[Cd] ratio of 3.4 × 10⁻². XPS measurements detect an increase in sulfur deficiency in doped films.     

Influence of solvent on solution processed Cu2ZnSnS4 nanocrystals and annealing induced changes in the optical,structural properties of CZTS film

The well-known quaternary Cu₂ZnSnS₄ (CZTS) chalcogenide thin films are playing an important role in modern technology. The CZTS nanocrystal were successfully prepared by solution method using water, ethylene glycol and ethylenediamine as different solvent. The pure phase material was used for thin film coating by thermal evaporation method. The prepared CZTS thin films were characterized by XRD, Raman spectroscopy, FESEM, XPS and FT-IR spectroscopy. The XRD and Raman spectroscopy analysis revealed the formation of polycrystalline CZTS thin film with tetragonal crystal structure after annealing at 450 ^°C. The oxidation state of the annealed film was studied by XPS. A direct band gap about 1.36 eV was estimated for the film from FT-IR studies, which is nearly close to the optimum value of band gap energy of CZTS materials for best solar cell efficiency. The CZTS annealed thin films are more suitable for using as a p-type absorber layer in a low-cost solar cell.