气相外延ZnSe单晶薄膜的蓝色电致发光

本文在300℃—700℃温度范围内,在GaAs衬底上气相外延生长了ZnSe单晶薄膜。讨论了衬底温度对外延层电学性质及光学特性的影响。ZnSe外延层经Zn气氛热处理后,发光特性大为改善。用处理后的ZnSe外延膜做成MIS发光二极管,首次得到了室温下气相外延ZnSe单晶薄膜的蓝色电致发光。     

Ca_9Al(PO_4)_7:Eu~(2+)的发光、浓度猝灭及温度稳定性（英文）

采用高温固相法制备了Ca9Al(PO4)7:Eu2+蓝色荧光粉,研究了Ca9Al(PO4)7:Eu2+的发光、浓度猝灭及温度稳定性.Ca9Al(PO4)7:Eu2+的激发光谱覆盖200~350nm紫外区;发射光谱为一主峰位于445nm的宽谱,对应Eu2+的4f65d1→4f7特征跃迁.研究发现,随Eu2+掺杂量的增大,Ca9Al(PO4)7:Eu2+的发射强度呈现先增大、后减小的变化趋势,最大发射强度对应的Eu2+掺杂量为0.01,即存在浓度猝灭效应,对应的机理为电偶极-电偶极相互作用;依据晶格常数,得出临界距离为2.297nm.在25~300℃范围内改变光谱测量温度,发现温度升高到150℃时,Ca9Al(PO4)7:Eu2+的发射强度变为25℃时的81.0%,对应的激活能为0.268eV,说明材料具有较好的温度稳定性.     

Ca9Al(PO4)7∶Eu2+的发光、浓度猝灭及温度稳定性

采用高温固相法制备了Ca9Al(PO4)7∶Eu2+蓝色荧光粉,研究了Ca9Al(PO4)7∶Eu2+的发光、浓度猝灭及温度稳定性.Ca9Al(PO4)7∶Eu2+的激发光谱覆盖200～350 nm紫外区;发射光谱为一主峰位于445 nm的宽谱,对应Eu2+的4f6 5d1--→4f特征跃迁.研究发现,随Eu2+掺杂量的增大,Ca9Al(PO4)7∶Eu2+的发射强度呈现先增大、后减小的变化趋势,最大发射强度对应的Eu2+掺杂量为0.01,即存在浓度猝灭效应,对应的机理为电偶极-电偶极相互作用;依据晶格常数,得出临界距离为2.297 nm.在25～300℃范围内改变光谱测量温度,发现温度升高到150℃时,Ca9Al(PO4)7∶Eu2+的发射强度变为25℃时的81.0％,对应的激活能为0.268 eV,说明材料具有较好的温度稳定性.     

Y3Al5O12∶Eu3+磷光体的溶胶-凝胶法合成及发光特性

以金属烷氧基化合物为原料,采用溶胶-凝胶法在1 000℃下合成了Eu3+掺杂的Y3Al5O12(YAG)磷光体.利用TG-DSC,XRD和发光光谱等对样品进行了表征.结果表明,YAG∶Eu3+的晶相形成温度为991℃.Eu3+在非晶态和晶态YAG中的发射光谱有明显差异.研究了Eu3+含量和烧结温度对Eu3+的5D0→7F1和5D0→7F2发射峰强度的影响.随煅烧温度的升高和Eu3+浓度的增加,Eu3+发射峰强度增强.     

新型近红外超长余辉材料Zn_3Al_2Ge_2O_(10)∶Cr~(3+)的发光性能

采用高温固相法制备了新型近红外长余辉材料Zn3Al2Ge2O10∶Cr3+,利用X射线衍射、荧光光谱和余辉衰减曲线等对合成的样品进行了分析。结果表明:样品Zn3Al2Ge2O10∶Cr3+是Ge4+取代ZnAl2O4∶Cr3+尖晶石中的部分Al3+而形成的固溶体。在397 nm光的激发下,发射光谱主要由两个明显的窄峰叠加在Cr3+离子的自旋允许跃迁4T2→4A2辐射的宽发射带上。发光强度随着Cr3+离子掺杂浓度的增大和煅烧温度的升高而出现浓度猝灭及温度猝灭现象。当Zn3Al2-xGe2O10∶xCr3+中的Cr3+离子掺杂量x为2%且煅烧温度为1 350℃时,样品的近红外发光及余辉强度最大。材料的余辉持续时间超过300 h,余辉发射谱峰位与荧光发射光谱中的N线一致,均位于697 nm附近。最后分析了煅烧温度对样品余辉性能的影响,并对材料的余辉机制进行了探讨。     

Znse:Al电学性能的研究

本文研究了77～300K温度区间内ZnSe:Al的电学性能,讨论了ZnSe:Al中的缺陷及其补偿比,得出了随掺杂温度的升高,极化光学声子对载流子的散射作用变弱,电离杂质对载流子的散射作用变强的结论。同时,本文也给出了霍尔系数、载流子浓度与掺杂温度及测量温度的关系,计算了Al施主能级的电离能。     

C-ZnSe:Al的黄色注入式发光

用高速率升华法制备的ZnSe晶体,研究了C-ZnSe:Al的电致发光.这种新型发光系统可产生黄色自激活发射,峰值波长在5900X.阈值电压0.8伏.在2伏4mA下亮度为50fL,在3伏60mA下,最高外量子效率在10-4,最大平均结面亮度600fL,讨论指出,发光是由注入空穴在Al和Zn空位组成的联合中心上与电子复合引起.利用这一现象制作了简易的发光管、数码管及发光矩阵.     

ZnS∶Zn,Pb宽带蓝色发光和发光机制

用固相反应法制备了一系列ZnS∶Zn,Pb荧光粉.改变不同的灼烧温度和激活剂的掺杂量,通过对灼烧后荧光粉进行光谱分析,我们发现Pb2+在ZnS基质中的发光与制备条件有关:灼烧温度为800～950℃时,能得到Pb2+在ZnS基质中的蓝色发光.测量了其光致发射光谱、激发光谱,以及灼烧后荧光粉的成分.研究了阴极射线下ZnS∶Zn,Pb荧光粉的相对发光亮度与荧光粉电压的关系,ZnS∶Zn,Pb的相对亮度比ZnS∶Ag,Cl的高,比ZnS∶Zn更高.研究了发光衰减时间与温度的关系,得到了ZnS∶Zn,Pb的蓝色发光可能来源于Pb2+的D波段发射的结论.并对其发光机制进行了一些探讨.这种新型蓝粉可应用于VFD和FED等低压显示屏.     

激发波长和Eu2+的掺杂量对Sr4 Al14 O25:Eu2+,Dy3+发光性能的影响

采用溶胶-凝胶法在低温、还原气氛下制备了长余辉发光材料Sr4 Al14O25:Eu2+,Dy3+.用X射线粉末晶衍射对其进行了物相鉴定,表明在1200℃已经得到纯相的Sr4Al14O25产物.研究了铕和锶的比值、激发光波长对所制备的Sr4 Al14O25:Eu2+,Dy3+发光性能的影响并对其影响机理进行了探讨.样品的发光性能测试结果表明:采用溶胶-凝胶法制备长余辉发光材料Sr4Al14O25:Eu2+,Dy3+,其灼烧温度比高温固相法灼烧温度低;激发光谱向长波方向延伸时,在488 nm处发射峰增强,在410 nm处发射峰减弱;在一定范围内发光强度随着Eu2+量的增加而增强,Eu2+的最佳掺杂量为0.007,Eu2+的掺杂量超过0.007时会发生浓度猝灭.     

溶胶凝胶燃烧合成法制备Y_2O_3∶RE(RE=Er或Er/Yb)上转换发光材料

采用溶胶凝胶燃烧合成法制备了稀土掺杂Y2O3粉体,考察了煅烧温度、Er3+浓度和Yb3+浓度对粉体发光性能的影响。研究结果表明,在800℃的温度下可以得到结晶良好的单相Y2O3粉体;随着煅烧温度的升高,样品结晶度越高,其上转换发光强度变强;在900℃的煅烧温度下,样品的粒径大约为lμm左右,颗粒尺寸分布较均匀;当Er3+掺杂浓度达到1mol%时,绿光发射强度达到最大值,而对于红光发射,其发射强度的最大值出现在4mol%的掺杂浓度;当Yb3+与Er3+掺杂比例达到4:1时,绿光发射强度达到最大值,而红光发射强度随着Yb3+浓度的增加一直增强。     

ZnSe晶体中Cu杂质深能级的ODLTS谱

用控制Cu杂质在ZnSe品格中占据位置的方法,成功地得到了Cu-G和Cu-R中心分别占优势的ZnSe:Cu晶体.首次用ODLTS方法测得与Cu-R和Cu-G中心相应的受主能级分别位于价带顶上0.72eV和0.30eV.     

用ODLTS法研究ZnSe:Ga晶体中的自激活深能级

本文用光学深能级瞬态谱(ODLTS)方法研究了ZnSe:Ga晶体中的自激活(SA)深受主能级。首次用ODLTS技术测量了ZnSe:Ga晶体中与SA中心相应的深受主能级为0.65eV。文中还研究了该深受主中心在晶体中的空间分布。     

Mn掺杂Zn-In-S量子点的制备及发光性质研究

制备了Mn掺杂Zn-In-S量子点并研究了Zn/In的量比和反应温度对其发光性质的影响。在Mn掺杂的Zn-In-S量子点的发光谱中观测到一个600 nm发光带。通过改变Zn/In的量比,掺杂量子点的吸收带隙可从3.76 e V(330 nm)调谐到2.82 e V(440 nm),但600 nm发光峰的波长只有略微移动。这些掺杂量子点的最长荧光寿命为2.14 ms。当反应温度从200℃增加到230℃时,掺杂量子点的发光强度增加并达到最大值;而继续升高温度至260℃时,发光强度迅速减弱。此外,测量了Mn掺杂Zn-In-S量子点的变温发光光谱。发现随着温度的升高,发光峰位发生蓝移,发光强度明显下降。分析认为,Mn掺杂Zn-In-S量子点的600 nm发光来自于Mn2+离子的4T1和6A1之间的辐射复合。     

Temperature dependent photoluminescence studies of ZnSe:I single crystals grown by chemical vapor transport

The single crystal ZnSe:I sample was grown by the chemical vapor transport (CVT) method using iodine as the transporting agent. The iodine incorporates itself effectively as a donor in the lattice. The sample shows a 〈111〉 optical quality surface and has an absorption edge at 2.55 eV due to a deep impurity band nearly 0.15eV below the conduction band. The photoluminescence emission spectra of this crystal have been measured for its temperature dependence as well as for excitation energy dependence. The photoluminescence is in accordance with a donor-acceptor complex formation involving iodine activated donors and self-activated acceptors. The configuration coordinate model has been used to explain the temperature dependent changes in the peak position and the bandwidth of the emission band. The decrease in luminescence efficiency with increasing temperature is explained by using a simple model for thermal quenching. The activation energy at low temperature range (T<200K) is different from that at high temperature range (200K<T<300K).     

掺AlZnO纳米线阵列的光致发光特性研究

采用化学气相沉积方法，以金做催化剂，在Si (100)衬底上制备了掺AlZnO纳米线阵列.扫描电子显微镜(SEM)表征发现ZnO纳米线的直径在30nm左右.X射线衍射(XRD)图谱上只存在ZnO的(002)衍射峰，说明ZnO纳米线沿c轴择优取向.掺AlZnO纳米线阵列的室温光致发光(PL)谱中出现了3个带边激子发射峰：373nm，375nm，389nm.运用激子理论推算出掺AlZnO纳米线的禁带宽度为3.343eV ，束缚激子结合能为0.156eV；纯ZnO纳米线阵列PL谱中3个带边激子发射 关键词： 光致发光 化学气相沉积(CVD) 激子 ZnO纳米线阵列     

ZnSe:A1深能级的研究

为研究ZnSe中的本征缺陷和A1在ZnSe中的深能级行为,首先测量了Znse单晶体中的深能级,发现只存在Ec-0.33eV一个电子陷阱。然后,通过热扩散的方法,在300℃～700℃温度范围内把A1掺杂到ZnSe单晶体中,结果发现存在Ec-0.33eV和Ec-0.70eV两个电子陷阱。本文从缺陷化学角度对ZnSe中的本征缺陷和Ec-0.70eV深能级的结构及起源进行了讨论。     

Al掺杂原子分数及退火温度对ZnO薄膜光学特性的影响

 采用溶胶凝胶法在（0001）Al₂O₃衬底上制备了不同掺杂原子分数的ZnO:Al薄膜，在Ar气氛中进行了600～950 ℃不同温度的退火处理，研究了掺杂原子分数和退火温度对薄膜光致发光、光吸收和透射的影响。结果显示，薄膜的紫外峰强度随掺杂原子分数和退火温度的提高而增强，与缺陷相关的绿光强度却随着掺杂原子分数和退火温度的提高而降低；薄膜光学带隙随掺杂原子分数的提高从3.21 eV增大到3.25 eV；光吸收在可见光区随着退火温度的升高而增大，在紫外区却随着退火温度的升高而减小，透射与吸收的变化规律相反；薄膜吸收边随退火温度的升高出现轻微的红移。     

Temperature-Dependent Defect-Induced New Emission in ZnSe Crystal

The temperature-dependent photoluminescence behaviour of chemical vapour transport （CVT）-grown ZnSe crystal is investigated. A new emission band appears when temperature is reduced to 155K. It is shown that the new emission band is strongly related to defect emission peaked at around 2.1 eV. The emergence of the new emission band is accompanied by decreasing emission intensity of free exciton, as well as redshiR of defect emission with temperature decreases. The activated energy of the defect state is estimated to be 60.6 meV, which is approximately equal to the energy difference between the new emission and the free exciton emission at 155K.     

Bound-to-bound and bound-to-free yellow emission of ion-implanted zinc telluride

Broad structureless emission bands centred near 580 nm have been observed in the low temperature cathodoluminescence emission spectra of zinc telluride single crystals implanted with zinc, argon or aluminum ions. Time-resolved spectroscopy measurements and measurements of the emission intensities as a function of sample temperature and of temperature of post-implantation isochronal annealing show that one yellow band occurs in both ZnTe : Zn and ZnTe : Ar and results from bound-to-free recombination involving an intrinsic donor level, probably due to a V_Te defect. In addition, there is a second yellow band present in ZnTe : A1 which is due to donor-acceptor pair recombination with the donors and acceptors identified with Al_Zn and V_ZnAl_Zn respectively.     

CL study of yellow emission in ZnO nanostructures annealed in Ar and O2 atmospheres

The yellow emission of thermally treated undoped and In doped ZnO nanostructures was studied by the cathodoluminescence (CL) technique. CL spectra acquired at room temperature of the as-grown samples revealed two emissions at about 3.2 eV and 2.13 eV, corresponding to the near band edge and defect related emissions, respectively. On annealing the samples at 600  ^°C in Ar and O₂ atmospheres, the defect emission suffers a red shift, irrespective of the annealing atmosphere. This red shift is explained in terms of variations in the relative intensities of the two component bands centered at about 2.24 eV and 1.77 eV, which were clearly resolved in the CL spectra acquired at low temperature of the annealed samples. A decrease of the relative intensity of the yellow emission (2.24 eV) was observed for all thermally annealed samples. The annealing of zinc interstitial point defects is proposed as a possible mechanism to explain this intensity decrease.