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1.
C. Viswanathan V. Senthilkumar R. Sriranjini D. Mangalaraj Sa. K. Narayandass Junsin Yi 《Crystal Research and Technology》2005,40(7):658-664
Thin films of InSe were obtained by thermal evaporation techniques on glass substrates maintained at various temperatures (Tsb = 30°, 400°C). X‐ray diffraction analysis showed the occurrence of amorphous to polycrystalline transformation in the films deposited at higher substrate temperature (400°C). The polycrystalline films were found to have a hexagonal lattice. Compositions of these films have been characterized by EDAX and the surface analysis by scanning electron microscopy. Optical properties of the films, investigated by using spectrophotometer transmittance spectra in the wavelength range (300 – 1100 nm), were explained in terms of substrate temperatures. Films formed at room temperature showed an optical band gap (Egopt) 1.56 eV; where as the films formed at 400°C were found to have a Egopt of 1.92 eV. The increase in the value of Egopt with Tsb treatment is interpreted in terms of the density of states model as proposed by Mott and Davis. The analysis of current ‐Voltage characteristics, based on space charge limited currents (SCLC) measurements, confirms the exponential decrease of density of states from the conduction band edge towards the Fermi level for both the amorphous and polycrystalline films. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
2.
M. G. Syed Basheer Ahamed V. S. Nagarethinam A. R. Balu A. Thayumanavan K. R. Murali C. Sanjeeviraja M. Jayachandran 《Crystal Research and Technology》2010,45(4):421-426
ZnSe films were deposited on glass substrates keeping the substrate temperatures, at room temperature (RT), 75, 150 and 250 °C. The films have exhibited cubic structure oriented along the (111) direction. Both the crystallinity and the grain size increased with increasing deposition temperature. A very high value of absorption co‐efficient (104 cm‐1) is observed. The band gap values decrease from a value of 2.94 eV to 2.69 eV with increasing substrate temperature. The average refractive index value is in the range of 2.39 – 2.41 for the films deposited at different substrate temperatures. The conductivity values increases continuously with temperature. Laser Raman spectra showed peaks at 140.8 cm‐1, 246.7 cm‐1and 204.5 cm‐1which are attributable to 2TA LO phonon and TO phonon respectively. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
3.
N. Tigau 《Crystal Research and Technology》2008,43(9):964-969
Thin films of antimony trisulfide (Sb2S3) were prepared by thermal evaporation under vacuum (p=5×10–5 torr) on glass substrates maintained at various temperatures between 293 K and 523 K. Their microstructural properties have obtained by transmission electron microscopy (TEM). The electron diffraction analysis showed the occurrence of amorphous to polycrystalline transition in the films deposited at higher temperature of substrates (523 K). The polycrystalline thin films were found to have an orthorhombic structure. The interplanar distances and unit‐cell parameters were determined by high‐resolution transmission electron microscopy (HRTEM) and compared with the standard values for Sb2S3. The surface morphology of Sb2S3 thin films was investigated by scanning electron microscopy (SEM). The optical transmission spectra at normal incidence of Sb2S3 thin films have been measured in the spectral range of 400–1400 nm. The analysis of the absorption spectra revealed indirect energy gaps, characterizing of amorphous films, while the polycrystalline films exhibited direct energy gap. From the photon energy dependence of absorption coefficient, the optical band gap energy, Eg, were calculated for each thin films. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
4.
CdS thin films of varying thicknesses were deposited on cleaned glass substrates at room temperature by thermal evaporation technique in a vacuum of about 2 x 10‐5 torr. UV‐VIS spectra of the films were studied using the optical transmittance measurements which were taken in the spectral region from 300 nm to 1100 nm. The absorbance and reflectance spectra of the films in the UV‐VIS region were also studied. Optical constants such as optical band gap, extinction coefficient, refractive index, optical conductivity and complex dielectric constant were evaluated from these spectra. All the films were found to exhibit high transmittance (∼ 60 ‐ 93 %), low absorbance and low reflectance in the visible/near infrared region from ∼ 500 nm to 1100 nm. The optical band gap energy was found to be in the range 2.28 – 2.53 eV. All the films annealed at 300°C for 4 hours in vacuum (∼ 10‐2 torr) showed a decrease in the optical transmittance with its absorption edge shifted towards the longer wavelength, leading to the result that the optical band gap decreases on annealing the films. Also, on annealing crystallinity of the films improves, resulting in decrease in the optical transmittance. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
5.
K. Ashok B. Subramanian P. Kuppusami M. Jayachandran 《Crystal Research and Technology》2009,44(5):511-516
Thin zirconium nitride (ZrN) films were prepared by using reactive direct current (DC) magnetron sputtering onto D9 steel substrates. XRD technique was employed to study the coatings, observing variations of crystallite size, crystallite texture and lattice constant, as a function of substrate temperature. Chemical states of the ZrN thin films were determined by X‐ray photoelectron microscopy (XPS). AFM picture showed the presence of spherical shaped grains on the top of homogeneous granular surface. The hardness and elastic modulus values were measured by nanoindendation and their values are 18.5 and 343 GPa respectively. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
6.
M. G. Syed Basheer Ahamed A. R. Balu V. S. Nagarethinam A. Thayumanavan K. R. Murali C. Sanjeeviraja M. Jayachandran 《Crystal Research and Technology》2010,45(4):387-392
CdSe films have been deposited on glass substrates at different substrate temperatures between room temperature and 300 °C. The films exhibited hexagonal structure with preferential orientation in the (002) direction. The crystallinity improved and the grain size increased with temperature. Band gap values are found decreasing from about 1.92 eV to 1.77 eV with increase of the substrate temperature. It is observed that the resistivity decreases continuously with temperature. Laser Raman studies show the presence of 2 LO and 3 LO peaks at 416 cm‐1 and 625 cm‐1respectively. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
7.
E. Bacaksiz M. Altunba S. Ylmaz M. Tomakin M. Parlak 《Crystal Research and Technology》2007,42(9):890-894
The structural, morphological and optical properties of vacuum‐evaporated CdTe thin films were investigated as a function of substrate temperature and post‐deposition annealing without and with CdCl2/treatment at 400°C for 30 min. Diffraction patterns are almost the same exhibiting higher preferential orientation corresponding to (111) plane of the cubic phase. The intensity of the (111) peak increased with the CdCl2/annealing treatment. The microstructure observed for all films following the CdCl2/annealing treatment are granular, regardless of the as‐deposited microstructure. The grain sizes are increased after the CdCl2/annealing treatment but now contain voids around the grain boundaries. The optical band gaps, Eg, were found to be 1.50, 1.50 and 1.48 eV for films deposited at 200 K and annealed without and with CdCl2/treatment at 400°C for 30 min respectively. A progressive sharpening of the absorption edge upon heat treatment particularly for the CdCl2/treated was observed. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
8.
M. Sridharan M. Mekaladevi Sa. K. Narayandass D. Mangalaraj Hee Chul Lee 《Crystal Research and Technology》2004,39(4):328-332
Cd0.9Zn0.1Te thin films were prepared by vacuum evaporation onto well‐cleaned glass substrates maintained at 300, 373 and 473 K. X‐ray diffraction studies revealed that the films have zinc blende structure with preferential (111) orientation. Raman peak of the room temperature deposited film appeared at 140.30 cm‐1 and 159.65 cm‐1 were for the transverse optic (TO) and longitudinal optic (LO) phonons respectively. The XRD patterns of the higher substrate temperature deposited films exhibited an improvement in the crystallinity of the films. The Raman peak intensity increases and the FWHM decreases for the films deposited at higher substrate temperature. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
9.
N. Tigau 《Crystal Research and Technology》2006,41(5):474-480
Sb2S3 amorphous thin films were prepared by thermal evaporation of corresponding powder on thoroughly cleaned glass substrates held at temperature in the range 300‐473 K. X‐ray diffraction and atomic force microscopy have been used to order to identify the structure and morphology of surface thin films. The optical constants of the deposition films were obtained from the analysis of the experimental recorded transmission data over the wavelength range 400‐1400 nm. An analysis of the absorption coefficient values revealed an optical indirect transition with the estimation of the corresponding band gap values. It was found that the optical band gap energy decrease with substrate temperature from 1.67 eV at 300 K to 1.48 eV at 473K. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
10.
Deep ultraviolet emission of ZnO films prepared by RF magnetron sputtering at changing substrate temperature 总被引:2,自引:0,他引:2
ZnO films with deep ultraviolet emission on (0 0 0 6) sapphire substrates were prepared by RF magnetron sputtering at periodically changing substrate temperature. It is found that the as-prepared ZnO films consist of the obvious multilayered structures from the SEM images of their cross-sections. Room temperature photoluminescence of ZnO films with multilayered structure shows two emissions centered at 332 and 388 nm with 260 nm excited wavelength. The strong deep ultraviolet emission at 332 nm is due to the O 2p dangling-bond state in the multilayered structure of ZnO films. Raman scattering spectrum of sample shows that such structured ZnO film possesses strong compressive stress. 相似文献
11.
B. Karunagaran D. Mangalaraj Kyunghae Kim Byungyou Hong Yonghan Roh Cheon Seok Park Junsin Yi 《Crystal Research and Technology》2005,40(3):222-225
Titanium dioxide films have been deposited using DC magnetron sputtering technique onto silicon substrates at an ambient temperature and at an oxygen partial pressure of 7 × 10 –5 mbar and sputtering pressure (Ar + O2) of 1 × 10 –3 mbar. The deposited films were calcinated at 673 and 773 K. The composition of the films as analyzed using Auger Electron Spectroscopy (AES) revealed the stoichiometry with an O and Ti ratio of 2.08. The influence of post‐deposition calcination on the Raman scattering of the films was studied. The existence of Raman active modes A1g, B1g and Eg corresponding to the Raman shifts are reported in this paper. The improvement of crystallinity of the TiO2 films as shown by the Raman scattering studies has also been reported. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
12.
K. Sivaramamoorthy S. Asath Bahadur M. Kottaisamy K. R. Murali 《Crystal Research and Technology》2010,45(4):414-420
CdSxSe1‐x films were deposited by the electron beam evaporation technique on glass substrates at different temperatures in the range 30 – 300 °C using the laboratory synthesized powders of different composition. The films exhibited hexagonal structure and the lattice parameters shifted from CdSe to CdS side as the composition changed from CdSe to CdS side. The bandgap of the films increased from 1.68 to 2.41 eV as the concentration of CdS increased. The root‐mean‐roughness (RMS) values are 3.4, 2.6, 1.2 and 0.6 nm as the composition of the films shifted towards CdS side. The conductivity varies from 30 Ωcm‐1 to 480 Ωcm‐1 as the ‘x’ value increases from 0 to 1. The films exhibited photosensitivity. The PL spectrum shifts towards lower energies with decreasing x, due to the decrease of the fundamental gap with Se composition. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
13.
N. Tigau 《Crystal Research and Technology》2007,42(3):281-285
Sb2S3 thin films are obtained by evaporating of Sb2S3 powder onto glass substrates maintained at room temperature under pressure of 2×10‐5 torr. The composition of the thin films was determined by energy dispersive analysis of X‐ray (EDAX). The effect of thermal annealing in vacuum on the structural properties was studied using X‐ray diffraction (XRD) technique and scanning electron microscopy (SEM). The as‐deposition films were amorphous, while the annealed films have an orthorhombic polycrystalline structure. The optical constants of as‐deposited and annealed Sb2S3 thin films were obtained from the analysis of the experimental recorded transmission spectral data over the wavelength range 400‐1400 nm. The transmittance analysis allowed the determination of refractive index as function of wavelength. It was found that the refractive dispersion data obeyed the single oscillator model, from which the dispersion parameters (oscillator energy, E0, dispersion energy, Ed) were determined. The static refractive index n(0), static dielectric constant, ε∞, and optical band gap energy, Eg, were also calculated using the values of dispersion parameters. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
14.
Luís F. Santos Ashtosh Ganjoo Himanshu Jain Rui M. Almeida 《Journal of Non》2009,355(37-42):1984-1988
A previews study of germanium selenide glass films by scanning electron microscopy and atomic force microscopy revealed a heterogeneous surface morphology consisting of granular regions 15–50 nm in size, which cause high optical losses. The present work was performed in order to further characterize such materials using spectroscopic ellipsometry, infrared (IR) and Raman spectroscopies. Chalcogenide glass films with GeSe2, Ge28Sb12Se60 and GeSe compositions have been deposited on single crystal silicon and silica glass substrates by vacuum thermal evaporation. The film thickness and the optical constants were obtained from spectroscopic ellipsometry using the Tauc-Lorenz dispersion formula. A model was derived for the film structure, which included a roughness layer at the surface. This top layer was found to have a thickness of 5–15 nm, of the order of the size of the granular regions previously reported. The optical bandgap of the samples increased with increasing selenium content, while the refractive index decreased. Despite a previous report of large scale phase separation in bulk Ge26Sb14Se60 glass, the fundamental IR and Raman spectra obtained in the present work did not provide any clear evidence for such phase separation which could be associated with the heterogeneous nanostructure observed at the surface of the films. 相似文献
15.
N. Kumar V. Sharma N. Padha N. M. Shah M. S. Desai C. J. Panchal I. Yu. Protsenko 《Crystal Research and Technology》2010,45(1):53-58
Thin films of tin selenide (SnSe) were deposited on sodalime glass substrates, which were held at different temperatures in the range of 350‐550 K, from the pulverized compound material using thermal evaporation method. The effect of substrate temperature (Ts) on the structural, morphological, optical, and electrical properties of the films were investigated using x‐ray diffraction analysis (XRD), scanning electron microscopy (SEM), transmission measurements, and Hall‐effect characterization techniques. The temperature dependence of the resistance of the films was also studied in the temperature range of 80‐330 K. The XRD spectra and the SEM image analyses suggest that the polycrystalline thin films having uniform distribution of grains along the (111) diffraction plane was obtained at all Ts. With the increase of Ts the intensity of the diffraction peaks increased and well‐resolved peaks at 550 K, substrate temperature, were obtained. The analysis of the data of the optical transmission spectra suggests that the films had energy band gap in the range of 1.38‐1.18 eV. Hall‐effect measurements revealed the resistivity of films in the range 112‐20 Ω cm for films deposited at different Ts. The activation energy for films deposited at different Ts was in the range of 0.14 eV‐0.28 eV as derived from the analysis of the data of low‐temperature resistivity measurements. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
16.
O. Lengyel A. atka T. Haber J. Kova
H. Sitter R. Resel 《Crystal Research and Technology》2008,43(1):44-49
Sexiphenyl thin films were grown by Hot Wall Epitaxy on air‐cleaved mica (001) surfaces at substrate temperatures between 293 K and 440 K. For the entire temperature range, organic thin films show nano‐needle like morphology. The nano‐needles grown at low substrate temperature (293 K) are shortest, and their growth is accompanied by a simultaneous formation of flat islands which disturbs the growth of nano‐needles. On the contrary, unusually long nano‐needles with typical lengths up to the mm range evolve during the growth at a substrate temperature close to the material's thermal desorption temperature at about 440 K. X‐ray diffraction reveals two different crystalline orientations for nano‐needles in the entire temperature range. At low substrate temperatures dominantly the (11 ) plane of the β‐phase is formed parallel to the mica (001) surface. At elevated temperatures another strong texture becomes dominant which is close to the (11 ) crystal orientation. In contrast to this, crystallites with the preferred orientation (001) parallel to the surface of the substrate are formed at low substrate temperature (293 K). This crystal orientation can be associated with flat islands observed in the early growth stage. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
17.
ZnTe thin films were deposited onto well‐cleaned glass substrates kept at different temperatures (Ts = 303, 373 and 423 K), by vacuum evaporation method under the pressure of 10–5 Torr. The thickness of the film was measured by quartz crystal monitor and verified by the multiple beam interferometer method. The structural characterization was made using X‐ray diffractometer with filtered CuKα radiation. The grain sizes of the microcrystallines in films increases with increase in substrate temperature. The strain (ε), grain size (D) and dislocation density (δ) was calculated and results are discussed based on substrate temperature. Optical behaviour of the film was analyzed from transmittance spectra in the visible region (400–800 nm). The optical transition in ZnTe films is direct and allowed type. The optical band gap energy shows an inverse dependence on substrate temperature and thickness. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
18.
Cadmium Oxide films have been prepared by vacuum evaporation method on a glass substrate at room temperature. Detailed structural, optical, and electrical properties of the films are presented at different annealing temperatures. The crystal structure of the samples was studied by X‐ ray diffraction. The spectral absorption coefficient of the CdO film at the fundamental absorption region (450‐650nm) was determined using the spectral data of transmittance. The direct and indirect band gap energies were determined and found to be 2.33 eV and 1.95 eV respectively. The third order optical nonlinearities χ(3) of CdO films has been measured used the z‐can technique. The real and imaginary parts of χ(3) have been measured at 514 nm and found to be 1.7x10‐3 esu and 3.0x10‐3 esu, respectively. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
19.
Nanocrystalline and transparent conducting SnO2‐ ZnO films were fabricated by employing an inexpensive, simplified spray technique using a perfume atomizer at relatively low substrate temperature (360±5 °C) compared with conventional spray method. The structural studies reveal that the SnO2‐ZnO films are polycrystalline in nature with preferential orientation along the (101) plane. The dislocation density is very low (1.48×1015lines/m2), indicating the good crystallinity of the films. The crystallite size of the films was found to be in the range of 26–34 nm. The optical transmittance in the visible range and the optical band gap are 85% and 3.6 eV respectively. The sheet resistance increases from 8.74 kΩ/□ to 32.4 kΩ/□ as the zinc concentration increases from 0 to 40 at.%. The films were found to have desirable figure of merit (1.63×10–2 (Ω/□)–1), low temperature coefficient of resistance (–1.191/K) and good thermal stability. This simplified spray technique may be considered as a promising alternative to conventional spray for the massive production of economic SnO2 ‐ ZnO films for solar cells, sensors and opto‐electronic applications. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
20.
ZnO: Al films were prepared using low cost spray pyrolysis technique. The dependence of the physical properties on the substrate temperature was studied. The best films obtained at 500°C substrate temperature with preferred [002] orientation. The sheet resistance decreases with increased substrate temperature, and values as low as Rsh = 207 Ω/cm2 are reached for substrate temperature of 500°C. The optical transmittance of films increased by increasing the substrate temperature and received to 75% at 500°C. (© 2007 WILEY ‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献