Low-temperature decomposition of methanol on Au nanoclusters supported on a thin film of Al2O3/NiAl100

With a variety of surface probe techniques, we investigated low-temperature decomposition of methanol on Au nanoclusters formed by vapor deposition onto an ordered Al(2)O(3)/NiAl(100) thin film. Upon adsorption of methanol on the Au clusters (with mean diameter 1.5-3.8 nm and height 0.45-0.85 nm) at 110 K, some of the adsorbed methanol dehydrogenates directly into carbon monoxide (CO); the produced hydrogen atoms (H) begin to desorb near 125 K whereas most of the CO desorbs above 240 K. The reaction exhibits a significant dependence on the Au coverage: the produced CO increases in quantity with the Au coverage, reaches a maximum at about 1.0-1.5 ML Au, whereas decreases with further increase of the Au coverage. The coverage-dependence is rationalized partly by an altered number of reactive sites associated with low-coordinated Au in the clusters. At least two kinds of reactive sites for the low-temperature decomposition are distinguished through distinct C-O stretching frequencies (2050 cm(-1) and 2092 cm(-1)) while the produced CO co-adsorbs with H and methanol.     

Growth of Co clusters on thin films Al2O3NiAl(100)

We present a scanning tunnel microscopy study of Co clusters grown through vapor deposition on Al(2)O(3) thin films over NiAl(100) at different coverages and temperatures. Formation of Co clusters was observed at 90, 300, 450, and 570 K. At the three lower temperatures, we find narrow cluster size distributions and the mean sizes (with a diameter of 2.6 nm and a height of 0.7 nm) do not change significantly with the coverage and temperature, until the clusters start to coalesce. Even on 3-4-nm-wide crystalline Al(2)O(3) strips where the deposited Co atoms are confined, the same features sustain. Only at 570 K the normal growth mode where the cluster size increases with the deposition coverage is observed, although the data are less conclusive. A simple modeling of kinetic surface processes on a strip confirms the normal growth mode, but fails to show a favored size unless additional energetic constraints are applied on the cluster sizes. Increasing Co coverages to cluster coalescence, a larger preferable size (mean diameter of 3.5 nm and height of 1.4 nm) appears for growth at 450 K. These two sizes are corroborated by morphology evolution of high Co coverages deposited at 300 K and annealed to 750 K, in which the coalescence is eliminated and the two preferable geometries appear and coexist.     

Temperature-dependent growth shapes of Ni nanoclusters on NiAl(110)

Scanning tunneling microscopy studies reveal that two-dimensional nanoscale Ni islands formed by deposition of Ni on NiAl(110) between 200-400 K exhibit far-from-equilibrium growth shapes which change systematically with temperature. Island structure reflects the two types of adsorption sites available for Ni adatoms, and island shapes are controlled by the details of adatom diffusion along island edges accounting for numerous local configurations. The temperature dependence of the island shapes is captured and elucidated by kinetic Monte Carlo simulation of a realistic atomistic-level multisite lattice-gas model incorporating precise diffusion barriers. These barriers are obtained by utilizing density functional theory to probe energetics not just at adsorption sites but also at transition states for diffusion. This success demonstrates a capability for predictive atomistic-level modeling of nanocluster formation and shape selection in systems that have a high level of energetic and kinetic complexity.     

Low temperature H2O and NO2 coadsorption on theta-Al2O3/NiAl(100) ultrathin films

The coadsorption of H(2)O and NO(2) molecules on a well-ordered, ultrathin theta-Al(2)O(3)/NiAl(100) film surface was studied using temperature programmed desorption (TPD), infrared reflection absorption spectroscopy (IRAS), and X-ray photoelectron spectroscopy (XPS). For H(2)O and NO(2) monolayers adsorbed separately on the theta-Al(2)O(3)/NiAl(100) surface, adsorption energies were estimated to be 44.8 and 36.6 kJ/mol, respectively. Coadsorption systems prepared by sequential deposition of NO(2) and H(2)O revealed the existence of coverage and temperature-dependent adsorption regimes where H(2)O molecules and the surface NO(x) species (NO(2)/N(2)O(4)/NO(2)(-),NO(3)(-)) form segregated and/or mixed domains. Influence of the changes in the crystallinity of solid water (amorphous vs crystalline) on the coadsorption properties of the NO(2)/H(2)O/theta-Al(2)O(3)/NiAl(100) system is also discussed.     

Growth and electronic structure of Sm on thin Al2O3/Ni3Al(111) films

The growth and electronic structure of vapor-deposited Sm on a well-ordered Al(2)O(3)/Ni(3)Al(111) ultrathin film under ultrahigh vacuum conditions at room temperature have been studied comprehensively using synchrotron radiation photoemission spectroscopy, X-ray photoelectron spectroscopy, work function measurements, scanning tunneling microscopy, and low-energy electron diffraction. Our results indicate that at room temperature Sm grows in a layer-by-layer fashion up to at least 1 ML, followed by three-dimensional growth. The interaction of Sm with Al(2)O(3) thin films leads to an initial oxidation of Sm, accompanied by a parallel reduction of the Al(2)O(3) substrate. Both the oxidation states of Sm(2+) and Sm(3+) are found at low coverage (<1 ML). The concentration of Sm(2+) saturates below 0.4 ML, while that of Sm(3+) keeps increasing until the metallic state of Sm appears at high coverages.     

Interaction of water with ordered theta-Al(2)O(3) ultrathin films grown on NiAl(100)

The structure of an ordered, ultrathin theta-Al(2)O(3) film grown on a NiAl(100) single-crystal surface was studied by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and low-energy electron diffraction (LEED), and its interaction with water was investigated with temperature programmed desorption (TPD) and XPS. Our results indicate that H(2)O adsorption on the theta-Al(2)O(3)/NiAl(100) surface is predominantly molecular rather than dissociative. For theta(H)()2(O) < 1 ML (ML = monolayer), H(2)O molecules were found to populate Al(3+) cation sites to form isolated H(2)O species aligned in a row along the cation sites on the oxide surface with a repulsive interaction between them. For theta(H)()2(O) > 1 ML, three-dimensional ice multilayers were observed to form, which then desorb during TPD with approximate zero-order kinetics as expected. A small extent of H(2)O dissociation was observed to occur on the theta-Al(2)O(3)/NiAl(100) surface, which was attributed to the presence of a low concentration of oxygen atom vacancies. Titration of these defect sites with adsorbed H(2)O molecules revealed an estimated defect density of 0.05 ML for the theta-Al(2)O(3)/NiAl(100) system consistent with the ordered nature of the synthesized oxide film.     

Agglomeration, sputtering, and carbon monoxide adsorption behavior for Au/Al(2)O(3) prepared by Au(n)(+) deposition on Al(2)O(3)/NiAl(110)

Size-selected gold clusters, Au(n)(+) (n = 1, 3, 4), were deposited on an ordered Al(2)O(3) film grown on NiAl(110), and changes in morphology and electronic properties with deposition/annealing temperature and cluster size were investigated by X-ray photoelectron spectroscopy (XPS) and ion-scattering spectroscopy (ISS). Extensive agglomeration was observed by ISS for annealing temperatures above 300 K, accompanied by large shifts in the Au XPS binding energy. Agglomeration is more extensive in room-temperature deposition, compared to samples prepared by low-temperature deposition, then annealed to room temperature. Agglomeration is also observed to be dependent on deposited cluster size. CO adsorption was studied by ISS and temperature-programmed desorption, and we looked for CO oxidation under conditions where substantial activity is seen for Au(n)/TiO(2). No activity was observed for Au(n)/Al(2)O(3). The differences between the two systems are interpreted in terms of the nature of the metal-support interactions.     

Ba deposition and oxidation on theta-Al2O3/NiAl(100) ultrathin films. Part II: O2(g) assisted Ba oxidation

Ba deposition on a theta-Al(2)O(3)/NiAl(100) substrate and its oxidation with gas-phase O(2) at various surface temperatures are investigated using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and temperature programmed desorption (TPD) techniques. Oxidation of metallic Ba by gas-phase O(2) at 800 K results in the growth of 2D and 3D BaO surface domains. Saturation of a metallic Ba layer deposited on theta-Al(2)O(3)/NiAl(100) with O(2)(g) at 300 K reveals the formation of BaO(2)-like surface states. These metastable peroxide (O(2)(2-)) states are converted to regular oxide (O(2-)) states at higher temperatures (800 K). In terms of thermal stability, BaO surface layers (theta(Ba) < 5 ML) that are formed by O(2)(g) assisted oxidation on the theta-Al(2)O(3)/NiAl(100) substrate are significantly more stable (with a desorption/decomposition temperature of c.a. 1050 K) than the thick (2 < theta(Ba) < 10 ML) metallic/partially oxidized Ba layers prepared in the absence of gas-phase O(2), whose multilayer desorption features appear as low as 700 K.     

Sol-gel derived (LiCl)2-Al2O3-SiO2 thin film solid electrolyte

(LiCl)₂-Al₂O₃-SiO₂ thin film solid electrolyte was prepared by a sol-gel process with a spin coating technique. The thin film was studied by X-ray photoelectron spectroscopy (XPS) and ac impedance. The ionic conductivity of the solid electrolyte film is comparable to that of the bulk xerogel. The highest conductivity measured by ac impedance is 2.5×10^–4 S·cm^–1 at 300°C with E_a=0.75 eV.     

Al2O3(1120) surface as a template for the ordered growth of Ni and Co nanoclusters

The morphology and thermal stability of Ni and Co nanoclusters grown by physical vapour deposition on a reconstructed (1120) surface of α-Al(2)O(3) is investigated using non-contact atomic force microscopy (NC-AFM). NC-AFM images reveal that the clean α-Al(2)O(3)(1120) substrate adopts a characteristic (12 × 4) reconstruction when prepared in vacuum at high temperature. Subsequent deposition of Ni and Co onto this substrate at room temperature facilitates the growth of well-ordered metal nanocluster arrays with a preferred inter-cluster distance determined by the (12 × 4) periodicity of the substrate surface. The order in the cluster arrangement remains intact even upon annealing the system to temperatures up to 500 °C indicating a high resistance against sintering. The reconstructed α-Al(2)O(3)(1120) surface can, therefore, serve as an appropriate insulating template for studies of size-dependent magnetic or catalytic effects in a well-defined ensemble of metallic nanoclusters.     

Prediction of a highly activated state of CO adsorbed on an Al/Fe(100) bimetallic surface

Using periodic slab density functional theory, we investigate CO adsorption, diffusion, and dissociation energetics on a monolayer of Al covering Fe(100) [Al/Fe(100)]. We predict a weakly chemisorbed state of CO to exist on Al/Fe(100), with CO adsorbing on the 4-fold hollow site in a very tilted fashion. This state is predicted to have an extremely low CO stretching frequency of only 883 cm(-1), indicating a dramatically weakened CO bond relative to gaseous CO, even though the molecule is predicted to bind to Al/Fe(100) quite weakly. We predict that dissociation of CO starting from this weakly adsorbed state has a barrier of only approximately 0.35 eV, which is approximately 0.70 eV lower than that on Fe(100). To understand how the underlying substrate changes the electronic properties of the supported Al monolayer, we compare CO adsorption on Al/Fe(100) to its adsorption on analogous pure Al(100) surfaces. This highly activated yet weakly bound state of CO on Al/Fe(100) suggests that Al/Fe(100) could be an effective low-temperature bimetallic catalyst in reducing environments.     

Ba deposition and oxidation on theta-Al2O3/NiAl(100) ultrathin films. Part I: Anaerobic deposition conditions

Room-temperature Ba deposition on an oxygen-terminated theta-Al(2)O(3)/NiAl(100) ultrathin film substrate under ultrahigh vacuum (UHV) conditions is studied using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and temperature programmed desorption (TPD) techniques. In addition, Ba oxidation by the ions of the alumina substrate at 300 K < T < 1200 K in the absence of a gas-phase oxidizing agent is investigated. Our results indicate that at room temperature Ba grows in a layer-by-layer fashion for the first two layers, and Ba is partially oxidized. Annealing at T < 700 K results in further oxidation of the Ba species, whereas annealing at higher temperatures leads to loss of Ba from the surface via desorption and subsurface diffusion.     

Epitaxial growth of single-crystalline Al(2)O(3) films on Cr(2)O(3)(0001)

Thin, crystallographically oriented single-crystalline Al2O3 films can be grown epitaxially on Cr2O3(0001) by codeposition of Al vapor and O2 at a substrate temperature of 825 K. The properties and growth of these films were monitored by Auger electron spectroscopy (AES), low-energy electron diffraction (LEED), low-energy ion scattering (LEIS), and X-ray photoelectron spectroscopy (XPS). Two routes of preparation were investigated: (i) stepwise growth by alternating deposition of Al at room temperature and subsequent exposure to O2 at elevated temperatures; (ii) codeposition of Al and O2 at T > 800 K. The first route was consistently found to result in the growth of a complex interfacial oxide followed by the growth of polycrystalline Al2O3. The second mode of preparation provided homogeneous and ordered, probably (0001)-oriented, films of Al2O3 that maintained a LEED pattern up to a thickness around 10 A. The surface sensitive Cr MVV Auger transition at 34 eV was completely attenuated once the Al2O3 layer had reached a thickness of 6 A, pointing to film homogeneity at an early stage. This was confirmed by the absence of a significant Cr signal in LEIS spectra.     

Crystallographic parameters of Bi2O3 and reduced Graphene-Bi2O3 nano-composite thin film

The Bi₂O₃ and reduced graphene (RG)-Bi₂O₃ nano-composite thin films are synthesized using modified sol-gel process. For structural examination, the samples are analyzed using XRD. Using the Scherrer equation and a modified Scherrer plot, the sample's structural parameters are calculated. The materials' size and strain were estimated from different methods like modified Williamson-Hall (W–H), Halder-Wagner (H–W), and Size Strain Plot (SSP) with logical validity. The different crystallographic parameters obtained are compared and presented in this work.     

Preparation and characterization of ultrathin [Ru(CO)3Cl2]2 and [BMIM][Tf2N] films on Al2O3/NiAl(110) under UHV conditions

Towards a better understanding of the interface chemistry of ionic liquid (IL) thin film catalytic systems we have applied a rigorous surface science model approach. For the first time, a model homogeneous catalyst has been prepared under ultrahigh vacuum conditions. The catalyst, di-μ-chlorobis(chlorotricarbonylruthenium) [Ru(CO)(3)Cl(2)](2), and the solvent, the IL 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide [BMIM][Tf(2)N], have been deposited by physical vapor deposition onto an alumina model support [Al(2)O(3)/NiAl(110)]. First, the interaction between thin films of [Ru(CO)(3)Cl(2)](2) and the support is investigated. Then, the ruthenium complex is co-deposited with the IL and the influence of the solvent on the catalyst is discussed. D(2)O, which is a model reactant, is further added. Growth, surface interactions, and mutual interactions in the thin films are studied with IRAS in combination with density functional (DFT) calculations. At 105 K, molecular adsorption of [Ru(CO)(3)Cl(2)](2) is observed on Al(2)O(3)/NiAl(110). The IRAS spectra of the binary [Ru(CO)(3)Cl(2)](2) + [BMIM][Tf(2)N] and ternary [Ru(CO)(3)Cl(2)](2) + [BMIM][Tf(2)N] + D(2)O show every characteristic band of the individual components. Above 223 K, partial decomposition of the ruthenium complex leads to species of molecular nature attributed to Ru(CO) and Ru(CO)(2) surface species. Formation of metallic ruthenium clusters occurs above 300 K and the model catalyst decomposes further at higher temperatures. Neither the presence of the IL nor of D(2)O prevents this partial decomposition of [Ru(CO)(3)Cl(2)](2) on alumina.     

尖晶石型衍生的Ni/Al2O3催化剂低温催化顺酐加氢合成丁二酸酐

开发高活性的顺酐加氢制丁二酸酐和γ-丁内酯催化剂具有重要的工业意义.顺酐加氢多采用Cu基和Ni基催化剂,但一般Cu基和Ni基催化剂存在反应温度高(170–260℃)和稳定性差等缺点,很有必要开发高活性的顺酐加氢催化剂.我们以拟薄水铝石作为Al2O3载体的前驱体,采用浸渍法制备了一系列镍铝尖晶石型衍生的不同Ni含量的Ni/Al2O3催化剂,并研究了它们在顺酐加氢反应中的催化性能.还原前Ni/Al2O3催化剂的X射线衍射结果表明,催化剂含有NiAl2O4物种.氮吸附结果显示,不同Ni含量的催化剂均具有介孔结构.氢-程序升温还原研究发现,Ni/Al2O3催化剂经750℃还原2 h后,其表面上NiAl2O4物种能被高效还原.X射线粉末衍射结果表明,750℃还原的Ni/Al2O3催化剂中金属Ni颗粒尺寸随着Ni负载量升高而增大.利用一氧化碳-程序升温脱附对750℃还原的Ni/Al2O3催化剂进行研究,发现750℃还原的催化剂上金属Ni物种含量从高到低依次为:Ni(7.5%)/Al2O3>Ni(5%)/Al2O3>Ni(2.5%)/Al2O3.采用CO化学吸附获得的Ni(2.5%)/Al2O3,Ni(5%)/Al2O3和Ni(7.5%)/Al2O3催化剂上金属Ni颗粒尺度分别为8.0,12.8和15.7 nm.活性研究结果表明,750℃还原的Ni(5%)/Al2O3催化剂具有最高的催化活性,这可能是由于Ni(5%)/Al2O3催化剂具有较多的Ni活性位点和较合适的Ni颗粒粒度所致.进一步研究发现,在650–750℃还原温度下,Ni(5%)/Al2O3催化剂的还原度随着还原温度的升高而升高,Ni分散度随着还原温度的升高而降低.活性结果研究表明,700℃还原的Ni(5%)/Al2O3催化剂具有较多的Ni活性位点和较合适的Ni颗粒粒度,具有最高的加氢催化活性,其在120℃,H2压力为0.5 MPa和质量空速为2 h?1的反应条件下,能获得近100%的顺酐转化率和90%的丁二酸酐选择性,同时该催化剂具有优良的稳定性.以上结果表明,尖晶石型衍生的Ni/Al2O3催化剂是一个十分有应用前景的顺酐加氢催化剂.     

TPR Investigation of bimetallic Ru-Cu samples supported on SiO2, Al2O3 and MgO

Journal of Thermal Analysis and Calorimetry - Bimetallic Ru-Cu samples supported on SiO2, Al2O3 and MgO were studied by the temperature-programmed reduction (TPR) technique. Experiments were...