IR absorption and Raman spectra of single crystals of stable germanium isotopes

The Raman and IR absorption spectra of single crystals of germanium isotopes ⁷²Ge, ⁷³Ge, ⁷⁴Ge, and ⁷⁶Ge in the region of phonon absorption and interband electronic transitions are studied at room temperature. The dependence of the Raman peak position on the atomic mass has the form ν ~ M^–1/2. The shifts of the phonon absorption peaks of individual isotopes with respect to germanium of natural isotopic composition ^natGe are determined. With increasing average atomic mass of germanium, these peaks shift to longer wavelengths. In the region of interband electronic transitions, the intrinsic absorption edge of ⁷⁶Ge is observed to shift by 1 meV to higher energies with respect to Ge of natural isotopic composition. For isotopes with atomic masses close to that of natural germanium (⁷²Ge,⁷³Ge, ⁷⁴Ge), we found no significant difference in the band gap width at room temperature.     

Isotope effect for the thermal expansion coefficient of germanium

The first experimental and theoretical investigation of the difference in the temperature behavior of the linear expansion coefficients of single crystals grown from isotopically highly enriched and natural germanium is reported. A comparison of the data for ⁷⁰Ge and ^natGe crystals reveals the significant influence of isotopic composition over a wide range of temperatures 30–230 K. Zh. éksp. Teor. Fiz. 115, 243–248 (January 1999)     

X-ray standing wave analysis of the effect of isotopic composition on the lattice constants of Si and Ge

The x-ray standing wave (XSW) technique is used to measure the isotopic mass dependence of the lattice constants of Si and Ge. Backreflection allows substrates of moderate crystallinity to be used while high order reflection yields high accuracy. The XSW, generated by the substrate, serves as a reference for the lattice planes of an epilayer of different isotopic composition. Employing XSW and photoemission, the position of the surface planes is determined from which the lattice constant difference Deltaa is calculated. Scaled to DeltaM = 1 amu we find (Deltaa/a) of -0.36x10(-5) and -0.88x10(-5) for Ge and -1.8x10(-5) and -3.0x10(-5) for Si at 300 and 30 K, respectively.     

简并态锗在大注入下的自发辐射谱模拟

基于费米狄拉克模型模拟了应变、温度以及掺杂对简并态锗的直接带自发辐射谱的影响.随着温度升高,更多的电子被激发到导带中,使得锗自发辐射谱的峰值强度和积分强度随温度的升高而增大.对自发辐射谱峰值强度的m因子进行计算,结果表明张应变可以显著提高锗自发辐射的温度稳定性.在相同应变水平下,由Γ-hh跃迁引起的自发辐射谱峰值强度大于Γ-lh跃迁引起的自发辐射谱峰值强度,但二者的积分强度几乎相等.此外,计算结果还证明了n型掺杂能显著提高锗的自发辐射强度.以上结果对于研究简并态半导体的自发辐射性质有重要的参考意义.     

73Ge NMR spectra in germanium single crystals with different isotopic composition

We have studied the influence of isotopic disorder on the local deformations in Ge single crystals from both experimental and calculation points of view. The nuclear magnetic resonance (NMR) spectra of⁷³Ge nuclei (the nuclear spin equals 9/2) in perfect single crystals of germanium with different isotopic content were measured at temperatures 80, 300 and 450 K. Abnormal broadening of the spectrum was found to occur when the magnetic field was aligned along the [111] axis of a crystal. The observed specific angular dependence of the quadrupole broadening was attributed to isotopic disorder among atoms of germanium sited around the⁷³Ge NMR probe. Local lattice deformations in germanium crystal lattice due to isotopic impurity atoms were calculated in the framework of the adiabatic bond charge model. The results obtained were applied to study random noncubic crystal field interactions with the nuclear quadrupole moments and corresponding effects in NMR spectra. Simulated second and fourth moments of resonance frequency distributions caused by the magnetic dipole-dipole and electric quadrupole interactions are used to analyze the lineshapes, theoretical predictions agree qualitatively with the experimental data.     

Defects in a disordered world: the structure of glassy GeSe2

The full set of partial structure factors for the prototypical network glass GeSe2 was measured using the method of isotopic substitution in neutron diffraction. The basic building block of the network is the Ge(Se(1/2))(4) tetrahedron in which 34(5)% of the Ge reside in edge-sharing configurations. The intrinsic chemical order of the glass is, however, broken with a maximum of 25(5)% Ge and 20(5)% Se being involved in homopolar bonds at distances of 2.42(2) and 2.32(2) A, respectively.     

Simulation of Surfactant Effects on Growth of Semiconductor Hetero-Epitaxial Sb-Ge/Si(111)

A kinetic Monte Carlo simulation is performed in order to study the effect of Sb as a surfactant on the growth of Ge/Si(111). In our model the exchange mechanism between Ge and Sb atoms and the re-exchange mechanism in which the exchanged Ge adatom re-exchange with the lifted Sb atom to return to the surfactant layer, are considered. Our simulation shows the re-exchange process plays an important role on the growth mode transition in Ge/Sb/Si(111)
system. The influences of the substrate temperature and the deposition rate on the growth of Ge/Sb/Si(111) system is discussed.     

Raman scattering in germanium at high pressure: Isotope effects

The first-order Raman scattering in isotopically enriched samples of germanium ⁷⁰Ge, ⁷²Ge, and ⁷⁴Ge and germanium with the natural isotopic composition is investigated at high pressures. It is found that the isotopic dependence of the frequency of the LTO(Γ) mode in isotopically pure germanium samples can be described in the harmonic approximation (ν∝m ^−1/2). At the same time, the frequency of the LTO(Γ) mode of germanium of natural isotopic composition apparently contains a contribution due to isotopic disorder effects. Pis’ma Zh. éksp. Teor. Fiz. 69, No. 3, 211–214 (10 February 1999)     

不同周期结构硅锗超晶格导热性能研究

构造了均匀、梯度、随机3种不同周期分布的硅/锗(Si/Ge)超晶格结构.采用非平衡分子动力学(NEMD)方法模拟了硅/锗超晶格在3种不同周期分布下的热导率,并研究了样本总长度和温度对热导率的影响.模拟结果表明:梯度和随机周期Si/Ge超晶格的热导率明显低于均匀周期结构超晶格;在不同的周期结构下,声子分别以波动和粒子性质输运为主;均匀周期超晶格热导率具有显著的尺寸效应和温度效应,而梯度、随机周期Si/Ge超晶格的热导率对样本总长度和温度的依赖性较小.     

Growth dynamics studied by RHEED during Si/Ge epitaxy from gaseous hydrides

Si and Ge epitaxial growth from disilane and germane in a gas-source molecular beam epitaxy (GSMBE) system is followed in situ by reflection high-energy electron diffraction (RHEED) intensity oscillations. During Ge homoepitaxy, the growth rate on a Ge(100) substrate is found to be limited by surface hydrogen desorption below 350°C and by hydride adsorption above this temperature. Ge heteroepitaxy on Si results in incomplete layer growth leaving exposed Si at the surface during the initial stages of growth. Therefore, a gradual change in the observed Si surface concentration is seen as growth proceeds. Si heteroepitaxy on Ge follows the Volmer-Weber growth mode and proceeds via island formation. This, combined with Ge surface segregation, results in a slow decrease of the Ge surface population at the growth front. During heteroepitaxial growth, hydride reaction rates differ on Si and Ge surfaces, and therefore a changing concentration of the surface species is manifest as a gradual change in the observed oscillation frequency. This effect, observed during the early stages of growth, shows strong temperature dependence, consistent with previous observations on SiGe alloys. Following several layers of growth, however, the surfaces become rough. The influence of this roughness on the oscillation frequency is also discussed.     

Evolution of self-assembled Ge/Si island grown by ion beam sputtering deposition

The effect of temperature and Ge coverage on the evolution of self-assembled Ge/Si islands grown by ion beam sputtering deposition is studied. Atomic force microscopy and Raman spectroscopy are used to analyze the island morphology and the intermixing between Si and Ge. The experiments are presented in two aspects. First, when the temperature is increased, intermixing is promoted, resulting in the reappearance of low aspect ratio islands. Second, a different evolution pathway is observed, in which short islands initially don’t grow along the constant ratio of 11:1 (diameter:height) and the islands always grow faster in vertical direction. In summary, the interdiffusion, surface diffusion, and amount of Ge determines the evolution of Ge/Si islands.     

Cross sections of fast neutron induced reactions on selenium isotopes

Cross sections for^{74, 76, 77, 78}Se(n, p)^{74, 76, 77, 78}As,⁷⁶,Se(n,2n)⁷⁵Se and⁸⁰Se(n, α)⁷⁷,Ge reactions have been measured in the energy range from 13.0 to 16.6 MeV by the activation technique using Ge(Li) detectorγ-ray spectroscopy. Samples of selenium of natural isotopic composition were used as targets. The measurements provide information on the evolution of the (n, p) excitation functions with the increasing target neutron number (isotopic effect). The reaction model combining the compound nucleus and the preequilibrium emission processes is used to interpret these three types of reactions. The isotopic trend for the (n, p) reactions due to the neutron-proton competition in the compound nucleus is satisfactorily reproduced. However, a further experimental and theoretical work is needed for a better understanding of the origins of discrepancies which are suggested to be related to the precompound aspects of the assumed reaction model.     

Nature of contrast in Ge/Si(111) layers in scanning tunneling microscopy in the presence of Bi and Sb surfactants

It is known that the use of Bi surfactant (unlike Sb) upon the growth of Ge layers on Si(111) increases the contrast between Ge and Si atoms in a scanning tunneling microscope. This makes it possible to distinguish the Ge and Si surfaces. This effect is studied using computer simulation based on the density functional theory. To explain the observed difference between the Ge and Si layers, both structural and electronic effects are considered. The local density of electronic states, as well as the corresponding decay length to vacuum, has been calculated for each of the surfaces. The simulation results have been compared to the previous scanning tunneling microscopy data.     

Ge组分分布对基区杂质非均匀分布的SiGe HBT温度特性的影响

众所周知, 双极型晶体管的设计主要是基区的设计. 一般而言, 基区的杂质分布是非均匀的. 本文首先研究了非均匀的杂质高斯分布对器件温度分布、增益和截止频率的温度特性的影响, 发现增益和截止频率具有正温度系数, 体内温度较高. 随后研究了基区Ge组分分布对这些器件参数的影响. 均匀Ge组分分布和梯形Ge组分分布的SiGe 异质结双极型晶体管增益和截止频率具有负温度系数, 具有较好的体内温度分布. 进一步的研究表明, 具有梯形Ge组分分布的SiGe 异质结双极型晶体管, 由于Ge组分缓变引入了少子加速电场, 不但使它的增益和截止频率具有较高的值, 而且保持了较弱的温度敏感性, 在增益、特征频率大小及其温度敏感性、体内温度分布达到了很好的折中.     

Local Vibrations of Oxygen-Containing Thermal Donors in Germanium

The vibrational absorption bands associated with some types of double thermal donors (TD) in Ge enriched with the oxygen isotopes ¹⁶O and ¹⁸O have been identified. The thermal donors were formed during heat treatment of Ge:O crystals at 300 and 350°C. Absorption spectra were measured at room temperature and at 10 K. The formation of the thermal donors was accompanied by the appearance of three absorption bands, which in the Ge:¹⁶O spectra at room temperature are located at 600, 740, and 780 cm^–1. In low-temperature measurements, the bands at 600 and 780 cm^–1 exhibited splitting into series of narrow lines (up to 9) associated with some types of thermal donors (TD1–TD9). The absorption spectra measured at 10 K after different cooling conditions display bistability of the first four types of thermal donors (TD1–TD4). In the samples cooled by illumination with light in the region of frequencies of the fundamental absorption of Ge, pairs of lines are observed that belong to the bistable thermal donors in the helium-like configuration of double donors (DD). After cooling the samples in the dark, these pairs of lines are replaced by three new bands, which belong to local vibrational modes of bistable thermal donors in the low-energy neutral configuration. Based on the isotopic shift of the local vibrational modes of the thermal donors in Ge:¹⁶O and Ge:¹⁸O, a rigorous proof of the oxygen atoms entering into the composition of thermal donors is obtained.     

Impact of O2 exposure on surface crystallinity of clean and Ba terminated Ge(1 0 0) surfaces

In analogy with the case of Sr on Si [Y. Liang, S. Gan, M. Engelhard, Appl. Phys. Lett. 79 (2001) 3591], we studied surface crystallinity and oxidation behaviour of clean and Ba terminated Ge(1 0 0) surfaces as a function of oxygen pressure and temperature. The structural and chemical changes in the Ge surface layer were monitored by LEED, XPS and real-time RHEED. In contrast to the oxidation retarding effect, observed for 1/2 monolayer of Sr on Si, the presence of a Ba termination layer leads to a pronounced increase in Ge oxidation rate with respect to clean Ge. In fact, while the Ge(1 0 0) surface terminated with 1/2 ML Ba amorphizes for a pO₂ of 10⁻² Torr, LEED indicates that clean Ge forms a thin (4.5 Å), 1 × 1 ordered oxide upon aggressive O₂ exposure (150 Torr, 200 °C, 30 min). We briefly discuss the origins for the difference in behaviour between Ba on Ge and Sr on Si.     

Carrier storage in Ge nanoparticles produced by pulsed laser deposition

In this work, we report on the electrical characterization of Ge nanoparticles (NPs) produced by pulsed laser deposition (PLD) at room temperature (RT) in Ar gas inert atmosphere using a shadowed off‐axis deposition geometry. Our results show that functional thin films of crystalline Ge NPs embedded between thin alumina films can be obtained on p‐type Si(100) substrates following a low temperature and short rapid thermal annealing (RTA) treatment. Metal–oxide–semiconductor (MOS) structures with and without Ge NPs embedded in the alumina were prepared for the electrical measurements. The results indicate a strong memory effect at relatively low programming voltages (±4 V) due to the presence of Ge NPs. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Ferromagnets based on diamond-like semiconductors GaSb,InSb, Ge,and Si supersaturated with manganese or iron impurities during laser-plasma deposition

Properties of thin (30–100 nm) layers of diluted magnetic semiconductors based on diamond-like compounds III–V (InSb and GaSb) and elemental semiconductors Ge and Si doped with 3d impurities of manganese and iron up to 15% were measured and discussed. The layers were grown by laser-plasma deposition onto heated single-crystal gallium arsenide or sapphire substrates. The ferromagnetism of layers with the Curie temperature up to 500 K appeared in observations of the ferromagnetic resonance, anomalous Hall effect, and magneto-optic Kerr effect. The carrier mobility of diluted magnetic semiconductors is a hundred times larger than that of the previously known highest temperature magnetic semiconductors, i.e., copper and chromium chalcogenides. The difference between changes in the magnetization with temperature in diluted semiconductors based on III–V, Ge, and Si was discussed. A complex structure of the ferromagnetic resonance spectrum in Si:Mn/GaAs was observed. The results of magnetic-force microscopy showed a weak correlation between the surface relief and magnetic inhomogeneity, which suggests that the ferromagnetism is caused by the 3d-impurity solid solution, rather than ferromagnetic phase inclusions.     

新型宽温区高热稳定性微波功率SiGe 异质结双极晶体管

宽温区大电流下的热不稳定性严重制约着功率SiGe 异质结双极晶体管 (HBT) 在射频和微波电路中的应用.为改善器件的热不稳定性, 本文利用SILVACO TCAD建立的多指功率SiGe HBT模型, 分析了器件纵向结构中基区Ge组分分布对微波功率SiGe HBT电学特性和热学特性的影响. 研究表明, 对于基区Ge组分为阶梯分布的HBT, 由于Ge组分缓变引入了少子加速电场, 使它与均匀基区Ge组分HBT相比, 具有更高的特征频率f_T, 且电流增益β和f_T随温度变化变弱, 这有利于防止器件在宽温区工作时电学特性的漂移.同时, 器件整体温度有所降低, 但器件各指温度分布均匀性较差.考虑多指HBT各发射极指散热能力存在差异, 在器件纵向结构设计为基区Ge组分阶梯分布的同时, 对其横向版图进行发射极指间距渐变结构设计, 用于改善器件各指温度分布的均匀性, 进而提高HBT的热稳定性.结果表明, 与基区Ge组分为均匀分布的等发射极指间距结构HBT相比, 新器件各指温度分布均匀性明显改善, f_T保持了较高的值, 且β和f_T 随温度变化不敏感, 热不稳定性得到显著改善, 显示了新器件在宽温区大电流下工作的优越性. 关键词： SiGe 异质结双极晶体管 Ge组分分布 发射极指间距渐变技术 热稳定性     

Raman scattering in annealed isotopic ( Ge) ( Ge) superlattices

Raman scattering by optical phonons is used to study the interface intermixing in isotopic ( Ge) ( Ge) thin superlattices, with and equal to 8, 12, 16 and 24 atomic monolayers, for annealling at C and various times. The experimental results compares very well with theoretical calculations within the planar force constant model and the bond polarizability approach. The diffusion is simulated by a combination of the virtual crystal approximation and the solution of the Fick’s diffusion equation for the superlattice geometry.