Self-assembly of well-ordered and highly uniform nanoripples induced by focused ion beam

Well-ordered and highly uniform nanoripple structures on the surface of single crystal LaAlO₃ (1 0 0), SrTiO₃ (1 0 0) and Al₂O₃ (0 0 0 1) were formed via self-assembly (not by beam writing) by focused ion-beam bombardment. The morphology and topography of nanoripple structures were characterized using in-situ focused ion-beam/scanning electron microscope, as well as ex-situ atomic force microscopy. Under off-normal bombardment without sample rotation, the characteristic wavelength of nanoripples varying from 248 to 395 nm on the LaAlO₃ (1 0 0) surface can be obtained by changing ion fluence and incident angle. When all sputtering parameters except the ion fluence are constant, the wavelength of nanoripples is increased with the enhanced ion fluence. These results demonstrate the potential application of using ion sputtering method for fabricating the well-ordered and highly uniform nanoripples which can be used in nanodevices.     

IR multiple-photon dissociation by a focused uniform beam

An improved analytical method is presented in which the reaction yield in the IR multiple-photon dissociation by a focused uniform beam is expressed in a generalized form as a function of fluence. The analytical solution is derived for a real focusing geometry by assuming the cumulative log-normal distribution (CLND) for the functional form of the dissociation probability vs. fluence. Also presented is a shortcut analytical method with simple and convenient algebraic expressions which approximate the exact analytical solution, thereby speeding up the analysis of experimental data.     

Micro-Raman and ion channeling study of crystal damage in Si induced by focused Co ion beam implantation

The lattice damage of silicon produced by ion implantation at extremely high current density of 0.8 A/cm² (2.5᎒¹⁸ cm^-2 s^-1) was investigated. In a focused ion beam system, implantation was carried out with 70 keV Co ions, fluences of 1.2᎒¹⁶ cm^-2 and 6.7᎒¹⁵ cm^-2 into Si (111) at room temperature and elevated temperatures between 355 °C and 400 °C. Radiation damage measurements were performed by Rutherford backscattering/channeling spectroscopy and micro-Raman analysis. The radiation damage was studied as a function of pixel dwell-time and implantation temperature. The critical temperature for amorphization increases with current density. Although the fluence of the focused ion implantation was constant, crystalline layers were obtained for short and amorphous layers for long pixel dwell-times. The critical dwell-time of crystalline/amorphous transition increases with implantation temperature. From the results a typical time for defect annealing of 10^-5 s at 400 °C and an activation energy of (2.5ǂ.6) eV were deduced.     

Self-assembled film thickness determination by focused ion beam

The thickness evolution of multilayer film is investigated by focused ion beam (FIB) in the domain of polymer multilayers. This method, currently used in the modification and the characterization of integrated circuits, proves it is possible to determine the polymer film thickness. Sample cutting and its observation of the cross-section are performed in the FIB without leaving the vacuum chamber. Two main conclusions can be drawn: (1) the roughness of the film increases with the number of layer deposit, (2) the film growth changes from nonlinear (called exponential) to linear beyond 300 nm (70 layers).     

发射系统遮拦比对均强聚焦光束光斑扩展的影响

 利用数值模拟方法讨论了发射系统遮拦比对均强聚焦光束湍流大气传输光斑扩展的影响。结果表明，对于均强聚焦光束湍流大气传输，在弱湍流效应条件下，光斑扩展受遮拦比影响较大；在较强湍流效应条件下，不同遮拦比光斑扩展变化趋势相同，此时远场光斑扩展主要还是受湍流效应强弱的影响。获得了常用遮拦比条件下均强聚焦光束光斑扩展和湍流效应特征参数的定标关系。     

Nanoscale effects in focused ion beam processing

Focused ion beams with diameters of 8 to 50 nm are used for material processing in the nanoscale regime. In this paper, effects of the ion beam–solid interaction determining the formation of small structures by ion-beam sputtering and chemically assisted material deposition and etching are investigated. In the case of decreasing feature size, angle-dependent sputtering, a non-constant sputter rate, and scattered ions play an important role. The impact on side-wall angle, aspect ratio, and shape of the bottom of the etched structures is discussed. In beam tail regions, these effects will be especially pronounced, leading to material swelling instead of material removal. Ion beam assisted etching and deposition will face additional effects. For small structures, gas depletion becomes a significant drawback. The impact on gas depletion and the competition with sputtering are discussed. Received: 21 August 2002 / Accepted: 21 August 2002 / Published online: 12 February 2003 RID="*" ID="*"Corresponding author. Fax: +49-9131/761360, E-mail: frey@iis-b.fhg.de     

Formation mechanisms of uniform arrays of periodic nanoparticles and nanoripples on 6H-SiC crystal surface induced by femtosecond laser ablation

Uniform arrays of periodic nanoparticles with 80-nm period are formed on 6H-SiC crystal irradiated by circularly polarized 400-nm femtosecond laser pulses. In order to understand the formation mechanism, the morphology evolvement as a function of laser pulse energy and number is studied. Periodic nanoripples are also formed on the sample surface irradiated by linearly polarized 400-, 510- and 800-nm femtosecond laser pulses. All these results support well the mechanism that second-harmonic generation plays an important role in the formation of periodic nanostructures. PACS 79.20.Ds; 42.62.Cf; 61.80.Ba; 81.05.Cy; 78.30.Am     

Plasmonic properties of two-dimensional metallic nanoholes fabricated by focused ion beam lithography

Plasmonic metallic nanoholes are widely used to focus or image in the nanoscale field. In this article, we present the results of the design, fabrication, and plasmonic properties of a two-dimensional metallic pentagram nanohole array. The nanoholes can excite the extraordinary transmission phenomenon. We used the finite-difference time-domain method to design the transmission and the localized surface plasmon resonance electric field distribution in the near field. The focused ion beam method was used to fabricate the nanoholes. The transmittance in the far field was measured by a scanning spectrophotometer. The difference between the design and the experimental results may be caused by the conversion between the near field and the far field. The near field electric field distribution on the surface plasmonic nanoholes was measured by a near-field scanning optical microscope. From our results, we found that the maximum transmission of the nanoholes is 2.4. Therefore, our plasmonic nanohole can significantly enhance the transmission by exciting the plasmonic phenomenon on the surface of the nanostructures.     

Analysis of polished polycrystalline diamond using dual beam focused ion beam microscopy

This paper presents a study on polycrystalline diamond (PCD) polished by dynamic friction polishing (DFP) with the aid of advanced dual beam FIB (focused ion beam) microscopy. After disclosing a variety of wear tracks by DFP using electron imaging in combination with the ion channelling effect, a dual beam FIB was successfully employed at wear track sites to specifically create both the large cross-sectional specimen for microanalysis and thin foil for nanoanalysis. The study concluded that the polished PCD subsurface was free from microscale cracking. However, the attached debris layer on the top surface contained metal oxides and non-diamond carbon phase with inhomogeneous distributions of C, Fe, Cr, Ni, Si and O across the layer. An attached layer directly above a diamond grain was composed of essentially amorphous carbon, suggesting that a direct phase transformation from diamond crystalline to amorphous occurred during DFP.     

Tunable photonic crystals based on ferroelectric and ferromagnetic materials by focused ion beam

By making photonic crystals in ferroelectric and ferromagnetic materials, field-provoked tunability of photonic crystals is broadening the interest in new applications of on-chip photonic devices. We report a nano-precise fabrication of various designs of photonic crystals in these non-conventional materials using the focused ion beam milling technique. Standard methods are developed and parameters for different materials are calibrated. Optical responses such as bandgaps and polarization status changing from planar film waveguide system with these patterns have been examined on ferromagnetic materials.     

Self-assembly of highly uniform LiFePO4 hierarchical nanostructures by surfactant molecules in a new mixture medium

In this work, the LiFePO₄ samples are synthesized in ethylene glycol/water (EG/W) and aqueous solution, respectively. The samples are characterized by X-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, electron diffraction, and nitrogen adsorption isotherms. The results show that the reaction medium and the surfactant molecules have the significant influences on the particle morphology. In the presence of dodecylbenzenesulfonic acid sodium, the highly uniform LiFePO₄ hierarchical nanostructures are obtained in EG/W, which consist of the nanoplates. Nevertheless, the irregular LiFePO₄ microparticles are obtained in aqueous solution. Furthermore, the electrochemical properties of the samples are mainly investigated. The hierarchical LiFePO₄ sample exhibits a higher rate capability and an improved cyclability than the aggregated irregular microparticles, which have been ascribed to the highly uniform hierarchical nanostructures.     

Micromachining structured optical fibers using focused ion beam milling

A focused ion beam is used to mill side holes in air-silica structured fibers. By way of example, side holes are introduced in two types of air-structured fiber, (1) a photonic crystal four-ring fiber and (2) a six-hole single-ring step-index structured fiber.     

Self-organization of ripples on Ti irradiated with focused ion beam

30 keV focused Ga⁺ ions were used to raster the metallographically polished surface of commercially pure Ti (CP Ti) at various FIB incidence angles over a wide range of doses (10¹⁶-10¹⁸ ions/cm²) at room temperature. The sputtered surfaces were observed in situ using FIB imaging and later carefully characterized ex situ under scanning electron microscope (SEM) and atomic force microscope (AFM). Ripples were observed on the irradiated surfaces even at the normal FIB incidence angle. The ripple evolution is analyzed as functions of surface diffusion, surface crystallographic orientation, ion dose and incidence angle. It is found that the ripple orientation was progressively influenced by the ion beam direction with incidence angle increasing and in some cases curved ripples or fragmented rods viewed from different angles occurred at high ion doses. The morphological evolution from the well-developed straight ripples to the curved ones is never observed. The formation of ripples is attributed to the competition between the formation of ripples due to anisotropic surface diffusion and the formation of incidence-angle dependent ripples determined by Bradley-Harper (BH) model.     

强流离子束流聚焦状态的数值模拟

结合空间电荷透镜的原理图以及离子束流的磁流体运动方程对离子束流聚焦状态进行了理论研究。采用层流非碰撞模型数值计算了离子束流不同初始半径以及不同入射角的束流出射角、焦距以及最小焦斑半径。理论分析了能散度、色散像差等因素对束流最小焦斑半径的影响。在离子束流遵循能量和角动量守恒的原则下,对不同入射角度的离子束流的束流最大半径进行了模拟计算。研究表明,束流入射角度增大,会聚角和最小焦斑半径减小,焦距增大。束流半径增大,会聚角、焦距和最小焦斑半径都增大。最佳会聚角所在的平滑区域内束流的发散度以及能散度对最小焦斑半径的影响较大。束流发散度或者能散度的增加,都能导致最小焦斑半径的增大。入射角度绝对值相同的束流,束流最大半径相同。     

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The ion beam focused state is studied theoretically by combining the schematic of the charge lens in space and the magnetohydrodynamics equation of the ion beam. The theory applies laminar flow of non-collision model to calculate a series of parameters, such as the initial radius, the emergence angle, the focal length and the minimum radius of the focal spot. The effects of energy divergence and dispersion differs on the minimum radius of the focal spot are analyzed theoretically. Finally, in line with the principles of the conservation of energy and angular momentum, the maximum radius of the beam in view of different incidence angles of the ion beam are calculates. The results show that with the increase of incident angle, the confluence angle and the minimum radius of the focal spot will reduce, and the focal length will increase. Besides, when beam radius increases, the parameters above will increase. The minimum focal spot radius, within the smooth area, is in close relationship to the energy divergence and the divergence. The larger energy divergence and the divergence become, the larger the focal length will be. Besides, beam divergence with the same incidence angle will show common character on the maximum radius.     

Magnetization distribution in submicrometer iron-nickel antidot arrays patterned by a focused ion beam

Antidots of size 0.5 μm are prepared by patterning iron-nickel films with a focused ion beam. The magnetization distribution in antidot arrays is examined with Lorentz transmission electron microscopy. It is shown that one side of the array makes an angle of about 20° with the easy magnetic axis of the film. Magnetization reversal in the direction close to the easy magnetic axis starts with domain nucleation at the antidot edges that are perpendicular to the applied field and adjacent to the unpatterned region of the film, and propagates as the domain walls move. Magnetization reversal in the direction close to the hard magnetic axis starts with magnetization rotation outside the patterned region at the antidot edges and propagates as the domain walls execute a complicated motion. It is demonstrated that some areas between the edges of adjacent antidots can carry information bits. Results obtained are explained in terms of competition between the demagnetizing energy, energy of internal anisotropy, and misorientation effect. The feasibility of such structures as high-density storage elements is discussed.     

Improvement of sensitivity using principal component analysis by dual focused ion beam time-of-flight secondary ion mass spectrometry

It is important to develop and to practically use the method to analyze a micro-nanometer order area. Especially, three-dimensional microanalysis for minute structure that consists of the organic compounds and the polymer is difficult. We developed a novel three-dimensional microanalysis method by means of focused ion beam (FIB) for section processing and ToF-SIMS for mapping method. For the purpose of realization of three-dimensional microanalysis and a chemical and structural analysis of the organic matter, the sensitivity improvement of ToF-SIMS in the three-dimensional analysis device and the method of the spectral analysis are examined. To improve the sensitivity of ToF-SIMS, the sample stage was modified to arrange perpendicularly with the ToF optical axis, and the distortion of electric field was corrected. And, by analyzing the fragment ions by using the principal component analysis (PCA) to raise the efficiency of the spectrum analysis, spatial resolution has improved. As a result, the resolution of the device improved to sub micrometer order, and advanced to the achievement of the three-dimensional microanalysis.     

高数值孔径聚焦三维光链的研究

通过设计衍射光学元件对入射矢量光进行调制，在高数值孔径聚焦系统焦点附近产生沿光轴方向的三维多点光俘获结构——光链.并针对不同的入射矢量偏振、聚焦透镜的数值孔径以及衍射光学元件结构，对光链性能的影响分别进行了系统的分析，实现对该独特光俘获结构的可控性研究. 关键词： 衍射光学元件 矢量光 光镊     

The Gouy phase shift of the highly focused radially polarized beam

The Gouy phase shift in the focal field of high-NA focused radially polarized beam has been investigated in detail. Analytical expression for the Gouy phase shift can be derived using tilted wave interpretation, which provides a reasonable prediction compared to vectorial diffraction numerical simulation. Using this method, irregular wave spacing in the vicinity of the focus can be revealed.     

Investigation of physical properties of quartz after focused ion beam bombardment

Optical properties (transmission and refractive index) and phase change (from amorphous to crystal) of a commonly used glass, quartz, were investigated before and after focused ion beam (FIB) bombardment with ion energy from 30 to 50 keV. We found different influences of FIB bombardment on the optical properties and chemical structure of the quartz in the wavelength region of visible and near infrared, respectively. The quartz still can be used in the infrared wavelength for conventional optical applications. As an application example, an array of diffractive optical elements (DOEs) was directly fabricated on the quartz by the FIB milling. The measured diffraction efficiency of the DOEs is 83.5%, which is acceptable for practical use.This revised version was published online in March 2005. In the previous version, the published online date was missing