Heteroepitaxial growth of thin InAs layers on GaAs(1 0 0) misoriented substrates: A structural and morphological comparison

Thin InAs epilayers were grown on GaAs(1 0 0) substrates exactly oriented and misoriented toward [1 1 1]A direction by atmospheric pressure metalorganic vapor phase epitaxy. InAs growth was monitored by in situ spectral reflectivity. Structural quality of InAs layers were studied by using high-resolution X-ray diffraction. No crystallographic tilting of the layers with respect to any kind of these substrates was found for all thicknesses. This result is discussed in terms of In-rich growth environment. InAs layers grown on 2° misoriented substrate provide an improved crystalline quality. Surface roughness of InAs layers depend on layer thickness and substrate misorientation.     

Annealing effect on InAs islands on GaAs(0 0 1) substrates studied by scanning tunneling microscopy

Post-annealing effects on InAs islands grown on GaAs(0 0 1) surfaces have been investigated by scanning tunneling microscopy (STM) connected to molecular beam epitaxy (MBE). It is found that for islands grown by 1.6 ML InAs deposition at 450 °C, post-annealing at 450 °C in an As₄ atmosphere causes dissolving of the InAs islands. In contrast, for larger islands obtained by 2.0 ML InAs deposition at 450 °C, the post-annealing leads to coarsening of the islands. The result can be explained in terms of a critical nucleus in heterogeneous nucleation.     

Epitaxial Heusler alloy films on GaAs(0 0 1) substrates

We present results on fabrication, and structural and electrical properties of single-crystal heterostructures grown by molecular beam epitaxy. The exact stoichiometry of the Heusler alloy films can be achieved for almost lattice matched films. As evidenced by high-resolution X-ray diffraction, transmission electron microscopy, and resistivity measurements, we find an optimum growth temperature of , to obtain ferromagnetic layers with high crystal and interface perfection as well as high degree of atomic ordering. .     

Investigation of hillocks formation on (1 0 0) HgCdTe layers grown by MOCVD on GaAs epi-ready substrates

In this paper we present the recent progress in the growth of (1 0 0) HgCdTe epilayers using metal organic chemical vapour deposition on GaAs epi-ready substrates. Particular progress has been achieved in the reduction of macro-defects known as “hillocks”, revealed on the surface of HgCdTe epilayers with (1 0 0) crystallographic orientation. The large-scale defects can arise from such sources as poor substrate processing, dust and remnants from previous deposition, and non optimal parameters of nucleation and growth process. In our experiment, hillocks density was decreased to <10² cm⁻² by proper choice of the growth parameters.Obtained epilayers are suitable for device fabrication. So far, significant improvements has been obtained in photoconductors operated at near-room temperatures. Devices fabricated from (1 0 0) HgCdTe have about one order of magnitude higher voltage responsivity than their (1 1 1) B counterparts.     

Surface deformation phenomena induced by electron-beam irradiation in strained InGaAs/AlGaAs layers on GaAs (1 0 0) and (3 1 1)B substrates

The strained InGaAs/AlGaAs layer structures have been grown on GaAs ( 10 0) and (3 1 1)B substrates in a horizontal low-pressure metalorganic vapor-phase epitaxy system at a temperature of 800°C. In the surface observation using a high-resolution scanning electron microscope, we have found that surface deformation phenomena induced by electron-beam irradiation in strained In_0.36Ga_0.64As,/Al_0.3Ga_0.7As layers on GaAs (1 0 0) and (3 1 1)B substrates. The change of the surface morphology was observed in real time on the display of SEM with the accelerating voltage of 30 kV and the irradiated time of 60–120 s. The surface deformation through mass transport seems to be the cause of the residual strain relaxation due to electron-beam irradiation.     

Surface phonons of GaP(1 1 0) and InAs(1 1 0)

The dispersions of low energy surface phonon modes of GaP(1 1 0) and InAs(1 1 0) measured with inelastic He-atom scattering along the and 0 0 1 directions are presented. Aside from the Rayleigh mode, additional distinct acoustic modes are observed as well as indications of optical modes. Contrary to results for GaAs(1 1 0), a rocking mode was not observed. The experimentally determined phonon dispersions are in excellent agreement with recent ab initio calculations by C. Eckl, et al. [1].     

Carbon-doped high-mobility hole gases on (0 0 1) and (1 1 0) GaAs

Since Stormer and Tsang have introduced the first two-dimensional hole gas (2DHG) in the GaAs/AlGaAs heterosystem, the choice of suitable dopants was limited to beryllium and silicon over the last 20 years. Both acceptor atoms have significant disadvantages, i.e. either high-diffusion rates or a limitation to specific growth directions. Utilizing a carbon filament-doping source, we prepared high-quality 2DHGs in the (0 0 1) and the nonpolar (1 1 0) crystal plane with carrier mobilies beyond 10⁶ cm²/Vs in quantum well and single interface structures. Low-temperature magnetoresistance measurements recover a large number of fractional QHE states and show a pronounced beating pattern from which the Rashba induced spin-splitting has been determined. In addition, 2DHGs have been grown on cleaved edges of (1 1 0) and (0 0 1) wafers with transport features in qualitative agreement to our findings on (1 1 0) substrates.     

Photoreflectance study of InAs quantum dots on GaAs(n 1 1) substrates

InAs self-assembling quantum dots (SAQDs) were grown on GaAs(n 1 1) substrates (n=2,3,4,5) by molecular beam epitaxy. Their structural and optical properties were studied by reflection high-energy electron diffraction, atomic force microscopy (AFM) and photoreflectance spectroscopy (PR). The PR spectra from 0.7 to 1.3 eV presented transitions associated to the SAQDs. The energy transitions were obtained by fitting the PR spectra employing the third derivative line-shape model. For n=2,4,5, two functions were required to fit the spectra. For n=3 only one function was required, in agreement with the more uniform SAQDs size distribution observed by AFM on GaAs(3 1 1)A. Franz–Keldysh oscillations (FKO) were observed in the PR spectra at energies higher than the GaAs band gap. From the FKO analysis we obtained the GaAs built-in internal electric field strength (F_int) at the InAs/GaAs(n 1 1) heterointerface. From F_int we made an estimation of the GaAs strain at the heterointerface.     

InAs wetting layer evolution on GaAs(0 0 1)

The evolution of two-dimensional (2D) strained InAs wetting layers on GaAs(0 0 1), grown at different temperatures by molecular beam epitaxy, was studied by in situ high-resolution scanning tunneling microscopy. At low growth temperature (400 °C), the substrate exhibits a well-defined GaAs(0 0 1)-c(4 × 4) structure. For a disorientation of 0.7°, InAs grows in the step-flow mode and forms an unalloyed wetting layer mainly along steps, but also in part on the terrace. The wetting layer displays some local c(4 × 6) reconstruction, for which a model is proposed. 1.2 monolayer (ML) InAs deposition induces the formation of 3D islands. At a higher temperature (460 °C), the wetting layer is obviously alloyed even at low InAs coverage. The critical thickness of the wetting layer for the 2D-to-3D transition is shifted to 1.50 ML in this case presumably since the strain is reduced by alloying.     

Heteroepitaxial thin film of iron phthalocyanine on Ag(1 1 1)

Ordering of submonolayer iron phthalocyanine (FePc) molecules deposited on Ag(1 1 1) was investigated using scanning tunneling microscopy. The room temperature deposition of FePc alone, without any annealing, results in no ordered overlayers. However, posterior annealing the substrate to 475 K leads to the formation of a two-dimensional oblique lattice with the lattice constants of 16.2 ± 0.3 Å and the angle of 78 ± 1° between them. The resulting FePc lattice is commensurate to the substrate lattice. In addition, the nearest neighbor distance in the lattice is significantly increased through a distinctive molecular orientation of the FePc molecules within the unit cell. The commensurate lattice with a large intermolecular distance is in sharp contrast to that observed from a close-packed square lattice that many other metallo-phthalocyanine molecules often self-assemble into. A possible reasoning behind this intriguing structure is discussed.     

Effects of growth conditions on the formation of self-assembled InAs quantum dots grown on (1 1 5)A GaAs substrate

Effects of growth conditions on the formation of InAs quantum dots (QDs) grown on GaAs (1 1 5)A substrate were investigated by using the reflection high-energy electron diffraction (RHEED) and photoluminescence spectroscopy (PL). An anomalous evolution of wetting layer was observed when increasing the As/In flux ratio. This is attributed to a change in the surface reconstruction. PL measurements show that QDs emission was strongly affected by the InAs deposited amount. No obvious signature of PL emission QDs appears for sample with 2.2 ML InAs coverage. Furthermore, carrier tunneling from the dots to the non-radiative centers via the inclination continuum band is found to be the dominant mechanism for the InAs amount deposition up to 4.2 MLs.     

Large scale atomic ordering on uncovered GaAs(0 0 1) after InAs monolayer capping: Atomic structure of the (12 × 6) reconstruction

A well ordered c(8 × 2)-InAs monolayer is grown by molecular beam epitaxy (MBE) on a GaAs(0 0 1) substrate. After slow sublimation of this monolayer up to 560 °C, a homogeneously (n × 6) reconstructed GaAs surface is obtained. This surface is studied by scanning tunneling microscopy (STM) in UHV. This shows that it is well-ordered on a large scale with 200 nm long As dimer rows along and is also locally (12 × 6) reconstructed, the cell structure is proposed. We believe that this surface organization results from the specific As/Ga (0.7) surface atomic ratio obtained after the InAs monolayer growth and sublimation cycle.     

Stress and morphological development of CdS and ZnS thin films during the SILAR growth on (1 0 0)GaAs

Cadmium sulfide and zinc sulfide films were grown on (1 0 0)GaAs substrate by successive ionic layer adsorption and reaction (SILAR) technique from aqueous precursor solutions at room temperature and normal pressure. The stress development of the thin films was characterized by laser interferometry as a function of the thickness of the films. The morphology and roughness of the films were monitored by atomic force microscopy. Additionally the crystallinity and crystallite size were analyzed by X-ray diffraction and composition by electron spectroscopy for chemical analysis. The CdS thin films had significantly higher stress level and also better crystallinity compared with ZnS thin films. Both films were polycrystalline and cubic, but the CdS thin films followed the substrate (1 0 0) orientation, whereas the ZnS films were (1 1 1) orientated. The roughness vs. film thickness curves of both films followed each other in shape, but the CdS films consisted of smaller particles.     

Nucleation, growth and morphology of Co thin films on Ag(1 1 0)

Scanning tunneling microscopy (STM) experiments reveal that Co growth on Ag(1 1 0), at coverages of Co < 1 ML and low substrate temperatures (150 K), involves a concomitant insertion of Co into the top Ag layer and exchange of Ag out onto the surface. At 300 K, coverages of Co > 1 ML gives rise to a 3D nanocluster growth on the surface, with the clusters covered by Ag. Depending slightly on coverage, the clusters have a typical diameter of 3 nm and a height of 0.4 nm. Upon annealing to 500 K, major changes are observed in the morphology of the surface. STM and AES show that there is a reduction of the number of Co islands on the surface, partly due to subsurface Co cluster migration and partly due to sintering into larger clusters.     

Composition and morphological characteristics of chemically sprayed fluorine-doped zinc oxide thin films deposited on Si(1 0 0)

Fluorine-doped zinc oxide thin films (ZnO:F) were deposited on Si(1 0 0) substrates by the chemical spray technique (CST) from an aged-solution. The effect of the substrate temperature on the morphology and composition of the ZnO:F thin films was studied. The films were polycrystalline, with a preferential growth along the ZnO (0 0 2) plane, irrespective of the deposition temperature. The average crystal size within the films was ca. 35 nm and the morphology of the surface was found to be dependent on the substrate temperature. At low substrate temperatures irregular-shaped grains were observed, whereas at higher temperatures uniform flat grains were obtained. Elemental analysis showed that the composition of the films is close to stoichiometric ZnO and that samples contain quite a low fluorine concentration, which decreases as a function of the deposition temperature.     

A PdO(1 0 1) thin film grown on Pd(1 1 1) in ultrahigh vacuum

We present experimental results demonstrating that a high quality PdO(1 0 1) thin film can be grown on Pd(1 1 1) in ultrahigh vacuum by oxidizing the metal at 500 K using an oxygen atom beam, followed by annealing to 675 K. Low energy electron diffraction (LEED) images show that the [0 1 0] direction of the PdO(1 0 1) thin film aligns with the [−1 1 0] direction of the Pd(1 1 1) substrate, and that the PdO film grows in three degenerate domains, rotated 120° relative to one another. Based on excellent agreement between the experimental and simulated LEED patterns, we conclude that the surface structure of the PdO thin film deviates minimally from bulk-terminated PdO(1 0 1). Recent temperature programmed desorption (TPD) experiments also provide evidence that the PdO(1 0 1) thin film on Pd(1 1 1) is terminated by the stoichiometric surface in which half of the Pd atoms are coordinatively unsaturated (cus), corresponding to a cus-Pd atom density equal to about 35% of the surface density of Pd(1 1 1). The ability to generate a well-defined PdO(1 0 1) surface in ultrahigh vacuum should provide new opportunities for conducting model surface science studies of PdO, particularly studies aimed at elucidating the reactivity of PdO(1 0 1) toward species important in commercial applications of Pd catalysis.     

Magnetic anisotropy of epitaxial Fe layers grown on Si(0 0 1)

The magnetic properties of epitaxial iron films up to 80 monolayers (ML) thickness grown on Si(0 0 1) by using a template technique were investigated by means of superconducting quantum interference device and magneto-optic Kerr effect techniques. The thinnest films investigated (∼3 ML) exhibit a composition close to Fe₃Si with a Curie temperature below room temperature (RT) and strong out-of-plane remanent magnetization that reflects the presence of a dominant second order surface anisotropy term. Thicker films (⩾4 ML) are ferromagnetic at RT with remanent magnetization in film-plane and a composition closer to pure Fe with typically 8–10% silicon content. When deposited at normal incidence such films show simple in-plane fourfold anisotropy without uniaxial contribution. The relevant fourth-order effective anisotropy constant K₄^eff was measured versus film thickness and found to change its sign near 18 ML. The origin of this remarkable behavior is investigated by means of a Néel model and mainly traced back to fourth-order surface anisotropy and magneto-elastic effects related to the large biaxial in-plane compressive strain up to 3.5% in the thinnest (⩽25 ML) films.     

Growth and characterization of CoSi2 films on Si (1 0 0) substrates

In the present work, a special solid phase epitaxy method has been adapted for the preparation of CoSi₂ film. This method includes an epitaxial growth of Co films on Si (1 0 0) substrate, and in situ annealing of the Co/Si films in vacuum. It has been found that at the substrate temperature of 360°C, fcc cobalt film grows epitaxially on the Si (1 0 0) surface. The crystallographic orientation relations between fcc Co film and Si substrate determined from the electron diffraction result are: (0 0 1) Co//(0 0 1) Si, [1 0 0] Co//[1 1 0]Si. Upon annealing at temperatures range from 500 to 600°C, Co film reacts with Si substrate and transforms into CoSi₂. The CoSi₂ films prepared by this way are characterized by XTEM, XPS and AFM.     

A novel method for positioning of InAs islands on GaAs (1 1 0)

A novel method for positioning of InAs islands on GaAs (1 1 0) by cleaved edge overgrowth is reported. The first growth sample contains strained In_xGa_1−xAs/GaAs superlattice (SL) of varying indium fraction, which acts as a strain nanopattern for the cleaved-edge overgrowth. Atoms incident on the cleaved edge will preferentially migrate to InGaAs regions where favorable bonding sites are available. By this method InAs island chains with lateral periodicity defined by the thickness of InGaAs and GaAs of SL have been realized by molecular beam epitaxy (MBE). They are observed by means of atomic force microscopy (AFM). The strain nanopattern's effect is studied by the different indium fraction of SL and MBE growth conditions.