Determination of thin film refractive index and thickness by means of film phase thickness

A new approach for determination of refractive index dispersion n(λ) (the real part of the complex refractive index) and thickness d of thin films of negligible absorption and weak dispersion is proposed. The calculation procedure is based on determination of the phase thickness of the film in the spectral region of measured transmittance data. All points of measured spectra are included in the calculations. Barium titanate thin films are investigated in the spectral region 0.38–0.78 μm and their n(λ) and d are calculated. The approach is validated using Swanepoel’s method and it is found to be applicable for relatively thin films when measured transmittance spectra have one minimum and one maximum only.      

利用泄漏波导测量低折射率薄膜的折射率和厚度

根据泄漏波导原理对K_9玻璃基板上的冰晶石薄膜进行折射率测量,达到的精度为1×10~(-4),与真实波导的情况相似。文中讨论了利用添加高折射率薄层减小待测薄膜的最小厚度的可能性。文中还利用光电方法观察反射光中暗条纹的方法判别波导的激发,并测出了冰晶石薄膜在4500到6500范围内的折射率。     

宽带膜厚实时监控过程中膜层折射率的确定方法

为了准确计算出镀膜过程中每层膜的折射率，介绍了实时监控过程中确定膜层折射率的2种方法：一种是由实测的透射比光谱直接反算出膜层的折射率；另一种是用最小二乘法的优化算法实时拟合折射率。试验结果表明：在线反算适合单点监控，所得折射率误差小于2%。然而在实际镀膜过程中,由于宽带内膜层参数误差较大,一般大于25%。为此，采用最小二乘法拟合，即在整个宽光谱范围内采集每个波长点的信息，所得结果误差很小，一般都在2％～5%之间,有时可达到10%,在很大程度上提高了实际镀膜时膜厚监控的精度。     

分子束外延法在Sapphire衬底上生长的Zn1-xMgxO薄膜折射率及厚度的测试

利用偏振光椭圆率测量仪对分子束外延(MBE)法在Sapphire衬底上生长的Zn1-xMgxO薄膜的薄膜折射率和厚度进行了测试.结合ICP法测得的薄膜中的Mg组成量,经数值拟合,导出表征薄膜厚度与薄膜生长条件、薄膜折射率与薄膜中的Mg组成量之间关系的曲线,为MBE法在Sapphire衬底上生长Zn1-xMgxO薄膜时控制薄膜厚度以及在制作Zn1-xMgxO薄膜的波导时控制薄膜的折射率提供了理论依据.     

Measuring the thickness and refractive index of a thick transparent plate by an unexpanded laser beam

The thickness and refractive index of a thick transparent plate are measured by using an unexpanded HeNe laser beam. The laser beam is incident at different angles onto the plate; and then two reflected beams; from the front and back surfaces; are received on a distant screen: the corresponding separations between them are measured. A theoretical relation between the refractive index; thickness; angle of incidence and separation is derived. This relation is experimentally verified and shows good agreement. The errors in the measured thickness and refractive index are analysed. The method is non-contact; non-destructive and low cost.     

A method for measuring the complex refractive index and thickness of a thin metal film

A circularly polarized heterodyne light beam is incident on a thin metal film, causing successive reflections and refractions to occur at the two sides of the thin film. The phase difference between p- and s-polarizations of the multiple-beam interference signal can be measured accurately with an analyzer and heterodyne interferometry. The phase difference depends on the azimuth angle of the analyzer, the complex refractive index and the thickness of the thin metal film. The measured values of the phase differences under three different azimuth angles of the analyzer can be substituted into the special equations derived from Fresnels equations and multiple-beam interference. Hence, the complex refractive index and the thickness of the thin metal film can be estimated by using a personal computer with a numerical analysis technique. Because of its common-path optical configuration and its heterodyne interferometric phase measurement, this method has many merits, such as high stability against surrounding vibrations, high resolution and easy operation. PACS 78.66.Bz; 78.20.Ci; 07.60.Cy     

光学薄膜折射率和厚度测试仪检定规程解读

简要介绍光学薄膜折射率和厚度测试仪检定规程的构成，被检测量仪器的技术指标、主要检定参数和检定方法等。该规程适用于光谱椭偏法测量光学薄膜折射率和厚度的仪器，在从事光学薄膜研究、生产和使用的单位具有广泛的应用前景。     

Dual-confocal fiber-optic method for absolute measurement of refractive index and thickness of optically transparent media

We present a novel noncontact optical method for absolute measurement of refractive index and thickness of optically transparent media. The method is based on a simple dual-confocal fiber-optic sensor design. It includes two independent confocal channels consisting of two identical apertureless fiber-optic-type confocal microscopes constructed by use of a single 2x2 fiber coupler. A geometrical-ray model is used to obtain the analytical dependence between the sample's refractive index and its thickness. The measurement method provides high accuracy in spatially locating the specific imaging points that correspond to the backreflected intensity peaks of the confocal responses. Thus, a simultaneous measurement of the sample refractive index and thickness is achieved.     

提拉法SiO2化学膜厚度与折射率的变化规律研究

采用提拉法在硅基底上制备了多孔溶胶凝胶SiO2膜,用椭偏法测量薄膜的厚度与折射率,考察了提拉速度和胶体浓度对膜层厚度与折射率的影响。对厚度与提拉速度的关系进行线性与幂函数拟合,并比较分析两种拟合的关系及其对工艺流程的作用。比较了不同浓度胶体所得到的同一厚度薄膜的折射率变化规律。结果表明：对于同一胶体浓度下薄膜厚度与提拉速度的正相关关系,线性拟合相比幂函数拟合可以更好地解释实验结果的规律性。同时,折射率在一定范围内也会随着提拉速度的增加而减小。镀同一厚度膜时,浓度大的胶体膜层折射率大。通过对提拉速度和胶体浓度的控制可以得到理想的薄膜厚度与折射率。     

提拉法SiO_2化学膜厚度与折射率的变化规律研究

采用提拉法在硅基底上制备了多孔溶胶凝胶SiO2膜,用椭偏法测量薄膜的厚度与折射率,考察了提拉速度和胶体浓度对膜层厚度与折射率的影响。对厚度与提拉速度的关系进行线性与幂函数拟合,并比较分析两种拟合的关系及其对工艺流程的作用。比较了不同浓度胶体所得到的同一厚度薄膜的折射率变化规律。结果表明:对于同一胶体浓度下薄膜厚度与提拉速度的正相关关系,线性拟合相比幂函数拟合可以更好地解释实验结果的规律性。同时,折射率在一定范围内也会随着提拉速度的增加而减小。镀同一厚度膜时,浓度大的胶体膜层折射率大。通过对提拉速度和胶体浓度的控制可以得到理想的薄膜厚度与折射率。     

Investigation of light reflection at Brewster angles from a nonlinear optical film on a magnetoelectric substrate

We investigate the light reflection from a nonlinear optical dielectric film on a bigyrotropic magneto-electric substrate magnetized parallel to the interface. The reflection matrix has been obtained and reflection coefficients are investigated with respect to the incidence angle for both polarizations of the incident light. We analyzed the optical nonlinearity and the magnetoelectric coupling contributions to the reflection of the electromagnetic waves and the appearance of so-called pseudo-Brewster angles.     

Theoretical study of the normal-incidence reflective spectra for determining the thickness and refractive index of dielectric film

We theoretically study and propose the design concept of a new non-contact measurement method of the thickness and refractive index of dielectric film. The needed measurement set-up includes a probe, an optical detection head and a spectrometer. The probe is composed of two patches of dielectric substrates, and the optical detection head is used to detect the reflective spectra. After depositing a testing dielectric film on the two patches, the coating film thickness and refractive index can be determined by analyzing the normal-incidence reflective spectra of the two dielectric substrates. This method has two requirements. First, the coating dielectric films on the two substrates must be the same. Second, the two dielectric substrates respectively have higher and lower refractive indices than the testing dielectric film.     

测量透明液体折射率的一种实验方法

介绍了利用分光计测量透明液体折射率的一种实验方法，实验中使用了两个等边三棱镜，将液体夹在两棱镜之间形成厚度均匀的液膜，利用全反射原理对液膜进行测量，结果表明，这种实验方法操作简便，重复性好，准确度高。     

薄透明体厚度及折射率的测量

介绍了测量薄透明体厚度及折射率的一种方法.     

Simultaneous measurement of refractive index and thickness with a convergent beam

A new approach to the simultaneous measurement of refractive index and thickness based on the focus shifts of a convergent beam intercepted by a test plate is proposed. By using ray optics, a defined focus shift can be derived as a function of the refractive index and thickness as well as the angular position of the test plate with respect to the optical axis. From a pair of focus shifts obtained at two different angular positions, it is shown that the desired measurands can be simultaneously determined without prior knowledge of either parameter. A simulation result for the proposed concept based on graphically solving the equations of their respective focus shifts is presented.     

玻璃基片上SiO_2膜层厚度的测量方法

钠钙玻璃基片在液晶显示器件（ＬＣＤ） 等制造业中得到了广泛的应用。为防止基片中的碱金属离子扩散到器件的工作介质中,进而影响其化学稳定性和使用寿命,一般要在基片表面镀上一定厚度的ＳｉＯ２ 膜层,以便起到阻挡层的作用。基于Ｐ 蚀刻剂对ＳｉＯ２ 膜层和基片有显著不同的蚀刻速度,提出了一种测量玻璃基片上的ＳｉＯ２ 膜层厚度的方法,即：利用表面轮廓仪,在测量三个不同的蚀刻数据后,计算出ＳｉＯ２ 膜层的厚度。以用射频溅射法制备的ＳｉＯ２ 膜层为样品进行了测量,具体的实验数据证实了该方法的可靠性和有效性     

分子束外延法在Sapphire衬底上生长的Zn1－xMgxO薄膜折射率及厚度的测试

利用偏振光椭圆率测量仪对分子束外延(MBE)法在Sapphire衬底上生长的Zn_1-xMg_xO 薄膜的薄膜折射率和厚度进行了测试. 结合ICP法测得的薄膜中的Mg组成量，经数值拟合，导出表征薄膜厚度与薄膜生长条件、薄膜折射率与薄膜中的Mg组成量之间关系的曲线，为MBE法在Sapphire衬底上生长Zn_1-xMg_xO 薄膜时控制薄膜厚度以及在制作Zn_1-xMg_xO 薄膜的波导时控制薄膜的折射率提供了理论依据. 关键词： ZnMgO薄膜 偏振光椭圆率测量仪 折射率 分子束外延(MBE)     

Temperature coefficient of the refractive index for PbTe film

Specimens of PbTe single film are deposited on Ge substrates by vacuum thermal evaporation.During the temperature range of 80–300 K,the transmittance of a PbTe film within 2–15μm is measured every 20 K by the Perkin Elmer Fourier transform infrared spectroscopy cryogenic testing system.Then,the relationship between the refractive index and wavelength within 7–12μm at different temperatures is received by the full spectrum inversion method fitting.It can be seen that the relationship conforms to the Cauchy formula,which can be fitted.Then,the relationship between the refractive index of the PbTe film and the temperature/wavelength can be expressed as n(λ,T)=5.82840-0.00304T+4.61458×10~(-6)T~2+8.00280∕λ~2+0.21544∕λ~4,which is obtained by the fitting method based on the Cauchy formula.Finally,the designed value obtained by the formula and the measured spectrum are compared to verify the accuracy of the formula.