金属纳米团簇复合薄膜Au/BaTiO3与Fe/BaTiO3的PLD制备及其光吸收特征

用脉冲激光沉积技术制备了掺杂纳米金属颗粒Au或Fe的BaTiO₃复合薄膜.用透射电子显微镜和x射线光电子能谱表征了金属颗粒的形态和化学态.330—800nm范围的吸收谱研究表明，掺Au颗粒的BaTiO₃薄膜在580nm附近有一个明显的共振吸收峰，而掺Fe颗粒的BaTiO₃薄膜没有这样的吸收峰.用Mie散射理论对结果进行了分析. 关键词： 复合薄膜 金属颗粒 脉冲激光沉积 吸收谱     

Au-BaTiO3复合薄膜的脉冲激光沉积制备及其非线性光学效应

利用脉冲激光沉积技术制备了掺杂金纳米颗粒的钛酸钡复合薄膜Au-BaTiO3,用高分辨透射电镜和X射线光电子能谱对薄膜进行了表征。从透射电镜照片可以看出,制备的样品中金颗粒大小约为2~3 nm,呈球形,均匀分布在载体介质中。X射线光电子能谱给出了Ba3d、Ti2p和Au4f电子芯能级结合能,结果表明载体介质是以BaTiO3的形式存在,而Au以金属的状态掺杂其中。330~800 nm范围的线性吸收谱表明样品中Au颗粒的共振吸收峰在500 nm附近。用单光束纵向扫描方法测量了样品的三阶非线性光学效应,使用的光源为调Q的YAG激光器,波长为532 nm,脉宽为10 ns,得到的非线性折射率和非线性吸收系数分别为-2.42×10-6esu和2.22×10-6m/W,表明了Au-BaTiO3复合薄膜有较大的非线性光学响应。     

多孔氧化铝薄膜的制备和光学特性研究

采用阳极氧化法制备了二维有序纳米孔氧化铝膜.研究了工艺参数对多孔薄膜有序性、孔径、膜厚度等的影响，测量了多孔氧化铝有序膜的光透过、光吸收和光发射等光学特性.结果表明，在波长360 nm附近多孔氧化铝有序膜的光透过谱线和光吸收谱线发生突变，波长大于360 nm时，光透过增强；波长小于360 nm时，光吸收增强.多孔氧化铝有序膜的光致发光强度和峰位与激发光波长有关，光致发光谱范围在340~600 nm.     

Au/SiO2纳米复合薄膜的微结构及光吸收特性研究

用多靶磁控溅射技术制备了Au/SiO₂纳米多层薄膜.利用透射电子显微镜以及吸 收光谱对Au/SiO₂复合薄膜的微观结构、表面形貌及光学性能进行了表征和测试 .研究结果表明：单层Au/SiO₂薄膜中Au沉积时间小于10s时，分散在SiO_{2< /sub>中的Au颗粒随Au的沉积时间的延长而增大；当沉积时间超过10s后，Au颗粒的尺寸几乎 不随沉积时间变化，但Au颗粒的形状由网络状结构变为薄膜状结构.［Au(t1关键词： 尺寸效应 纳米复合薄膜 吸收光谱 有效媒质理论}     

Comparison of the sensitivity of extraordinary transmittance peaks with the surrounding media for hole and slit arrays

In this paper we compare the sensitivity of the Extraordinary Transmittance (ET) peak position with the surrounding media for two types of metallic structures: arrays of holes and arrays of slits recorded in Au films. Both types of array were fabricated using Interference Lithography (IL) with a period of 700 nm and an Au thickness of 150 nm. The transmission spectra measurements were performed at normal incidence using a spectrophotometer. The results show that an array of slits presents a higher sensitivity for the surrounding media than the array of holes. Theoretical TE and TM simulations of the transmission spectra for the slit arrays agree very well with the experimental results, confirming the better sensitivity of the slit arrays.     

Low temperature deposition of transparent conducting ITO/Au/ITO films by reactive magnetron sputtering

Transparent conducting indium tin oxide/Au/indium tin oxide (ITO) multilayered films were deposited on unheated polycarbonate substrates by magnetron sputtering. The thickness of the Au intermediated film varied from 5 to 20 nm. Changes in the microstructure, surface roughness and optoelectrical properties of the ITO/Au/ITO films were investigated with respect to the thickness of the Au intermediated layer. X-ray diffraction measurements of ITO single layer films did not show characteristic diffraction peaks, while ITO/Au/ITO films showed an In₂O₃ (2 2 2) characteristic diffraction peak. The optoelectrical properties of the films were also dependent on the presence and thickness of the Au thin film. The ITO 50 nm/Au 10 nm/ITO 40 nm films had a sheet resistance of 5.6 Ω/□ and an average optical transmittance of 72% in the visible wavelength range of 400-700 nm. Consequently, the crystallinity, which affects the optoelectrical properties of ITO films, can be enhanced with Au intermediated films.     

Au/SiO2纳米多层薄膜的制备及其性质表征

利用多靶磁控溅射技术制备了Au/SiO₂纳米颗粒分散氧化物多层复合薄膜.研究了在保持Au单层颗粒膜沉积时间一定时薄膜厚度一定、变化SiO₂的沉积时间及SiO₂的沉积时间一定而改变薄膜厚度时，多层薄膜在薄膜厚度方向的微观结构对吸收光谱的影响.研究结果表明：具有纳米层状结构的Au/SiO₂多层薄膜在560 nm波长附近有明显的表面等离子共振吸收峰，吸收峰的强度随Au颗粒的浓度增加而增强，在Au颗粒浓度相同的情况下，复合薄膜 关键词： 2纳米复合薄膜')" href="#">Au/SiO₂纳米复合薄膜 多靶磁控溅射 吸收光谱 有效介质理论     

The effect of annealing on the photoluminescent and optical properties of porous anodic alumina films formed in sulfamic acid

Photoluminescent and optical properties of porous oxide films formed by two-step aluminum anodization at a constant potential of 30 V in sulfamic acid have been investigated after their annealing, ranging from room temperature up to 600 °C. X-ray diffraction reveals the amorphous nature of porous oxide films. Infrared and energy dispersive spectroscopy indicates the presence of sulfuric species incorporated in oxide films during the anodization. Photoluminescence (PL) measurements show PL bands in the range from 320 to 600 nm. There are two peaks in emission and excitation spectra. One emission peak is at constant wavelength centered at 460 nm and the other shifts from 390 to 475 nm, depending on excitation wavelength. For excitation spectra, one spectral peak is at constant wavelength at 270 nm and the other also shifts to longer wavelengths while increasing emission wavelength. Upon annealing of the as-prepared oxide films PL increases reaching maximum value at about 300 °C and then decreases. The results indicate the existence of two PL centers, one placed at surface of the pore wall, while the other positioned inside the oxide films.     

有序金纳米颗粒阵列的制备及光吸收特性研究

采用纳米球刻蚀技术中漂移法在玻璃基片上制备较大 面积不同直径的聚苯乙烯小球掩模板, 采用磁控溅射技术在掩模板上沉积不同厚度的金薄膜, 去除聚苯乙烯小球后, 通过扫描电子显微镜观察到周期排列的三角状金纳米颗粒点阵. 通过紫外-可见分光光度计测试所制备样品的光吸收特性, 发现表面等离子体共振峰随粒径增大发生红移, 随金纳米颗粒高度增加发生蓝移. 基于Mie理论, 利用Matlab软件编程对不同粒径的金阵列光吸收特性进行理论模拟, 并与实验结果进行对比. 关键词： 纳米球刻蚀 金纳米颗粒阵列 表面等离子体共振     

Fabrication and characterization of Au/SiO2 nanocomposite films

Au/SiO₂ nanocomposite films were prepared by radio frequency sputtering technique and annealing. The above nanocomposite films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), and atomic force microscopy (AFM). The surface of the nanocomposite films was uniform with the particle diameter of 100-300 nm. The size of Au crystallites increased on increasing annealing time. The luminescent behavior of the nanocomposite films was characterized by photoluminescence (PL) with different excitation wavelengths. Two emission peaks at around 525 nm and 560 nm were observed with the excitation wavelength at 325 nm. An intensive emission peak at around 325 nm was observed with the excitation wavelength at 250 nm, which is related to the defective structure of the amorphous SiO₂ layer because of oxygen deficiency, and could be applied to many fields, such as ultraviolet laser and ultraviolet detector.     

Influence of excitation light wavelength on the photoluminescence properties for ZnO films prepared by magnetron sputtering

Highly orientated polycrystalline ZnO films were deposited on sapphire, silicon and quartz substrates at room temperature by r.f. magnetron sputtering. Different photoluminescence (PL) spectra were observed when excited with different wavelength light. A UV emission peak (356 nm) and a blue peak (446 nm) were generated for the films on sapphire, silicon and quartz substrates, and only the 446 nm blue emission appeared for the films on glass substrates when the wavelength of the excitation light was 270 nm. With increasing the wavelength of the excitation light up to 300 and 320 nm, the UV emission disappeared for films on various substrates and the wavelength of the PL peaks increased up to 488 and 516 nm, respectively. When the wavelength of the excitation light increased to 398 nm, the PL spectrum becomes a wide band that is consistent with three emission peaks.     

胶体金纳米颗粒的表面等离子体发射特性

利用电化学方法制备出粒径为20-80 nm的胶体金纳米颗粒。研究其荧光发射光谱特性,在485nm处观察到表面自由电子集体激发导致的表面等离子体共振发射峰,其位置不随激励光波长的变化而移动。当激励光波长为485 nm时,观察到最强的发射峰。在240和640 nm处,还观察到倍频发射峰和3/4分频发射峰。增加金纳米颗粒粒径,观察到发射谱的峰值增大而发射峰的位置只有很小的红移。     

Visible photoluminescence of co-sputtered Ge–Si duplex nanocrystals

The photoluminescence (PL) characteristics of co-sputtered Ge–Si duplex nanocrystal films were examined under excitation by a 325-nm HeCd laser, combined with Raman and Fourier-transform infrared reflection spectra analysis. A broad visible PL spectrum from the as-deposited Ge–Si nanocrystal films was observed in the wavelength range 350–700 nm. Basically, the PL spectrum can be considered to consist of two distinct parts originating from different emission mechanisms: (i) the spectrum in the range 350–520 nm, consisting of characteristic double peaks at 410 and 440 nm with PL intensities decreasing after vacuum annealing, probably due to vacancy defects in Si nanocrystals; and (ii) the spectrum in the range 520–700 nm, consisting of a characteristic peak at 550 nm with a PL intensity not affected by vacuum annealing, probably due to Ge-related interfacial defects. No size dependence of PL peak energy expected from quantum confinement effects was observed in the wavelength range investigated. However, with an increase of crystal size, the PL peak intensity in the blue zone decreased. The PL intensity is found to be strongly affected by silicon concentration. A film heated in air has a different PL mechanism from the as-deposited and vacuum-annealed films. PACS 78.67.Bf; 81.05.Cy; 81.15.Cd     

退火对溶胶-凝胶法制备的ZnO薄膜结构和光致发光的影响

采用溶胶-凝胶法在n-Si(100)衬底上制备ZnO薄膜并从三个方面对其研究。X射线衍射结果表明,在含氧气氛中退火的ZnO薄膜为多晶六角纤锌矿结构,有明显的c轴择优结晶取向;退火时间的长短和温度的高低对结晶取向性和粒径均有较大影响,通过进一步的研究发现最佳处理温度在500℃左右。用扫描电子显微镜观察样品的表面和侧面形貌,晶体的生长比较均匀,粒径平均在70~160nm范围内,与XRD测量结果相一致。室温下ZnO胶体的光致发光谱表明,随着胶体老化时间的延长,胶体的紫外峰位发生了蓝移。室温下ZnO薄膜的光致发光谱表明,紫外部分的发光峰位在365,390nm,发光强度较强;在可见光区的发光强度相对较弱,但是还没有被氧完全抑制掉。     

溶胶-凝胶法纳米ZnO薄膜的绿光发射

利用溶胶-凝胶法制备了纳米ZnO薄膜,室温下测量了样品的光致发光谱(PL)和X射线衍射谱(XRD),观测到中心波长在523 nm附近的绿色荧光发射,研究了纳米ZnO薄膜的绿光发射机制,证实了纳米ZnO薄膜绿光可见发射带来自氧空位(Vo)形成的浅施主能级和锌空位(Vzn)形成的浅受主能级之间的复合。     

Synthesis and microstructure of metal oxide thin films containing metal nanoparticles by liquid phase deposition (LPD) method

Au nanoparticles dispersed SiO₂-TiO₂ composite films have been prepared by a novel wet process, Liquid Phase Deposition (LPD) method. The composite films were characterized by XRD, XPS, TEM, ICP, SEM and UV-VIS absorption spectroscopy. The results showed that the SiO₂-TiO₂ composite films containing Au^III and Au^I ionic species were co-deposited from a mixed solution of ammonium silicofluoride, ammonium hexafluorotitanate, boric acid and tetrachloroauric acid. The heat treatment induced the reduction of Au ions and formation of Au nanoparticles in the film. TEM observation revealed that the Au nanoparticles with 5-10 nm in diameter were found to be dispersed uniformly in the SiO₂-TiO₂ matrix. The optical absorption band due to the surface plasmon resonance of dispersed Au particles were observed at the wavelength of 550 nm and shifted toward longer wavelength with increasing heat treatment temperature. Received 28 November 2000     

Nonlinear optical properties of Au/ZnO nanoparticle arrays

The triangular-shaped Au/ZnO nanoparticle arrays were fabricated on fused quartz substrate using nanosphere lithography. The structural characterization of the Au/ZnO nanoparticle arrays was investigated by atomic force microscopy. The absorption peak due to the surface plasmon resonance of Au particles at the wavelength of about 570 nm was observed. The nonlinear optical properties of the nanoparticle arrays were measured using the z-scan method at a wavelength of 532 nm with pulse duration of 10 ns. The real and imaginary part of third-order nonlinear optical susceptibility, Re χ⁽³⁾ and Im χ⁽³⁾, were determined to be 1.15 × 10⁻⁶ and −5.36 × 10⁻⁷ esu, respectively. The results show that the Au/ZnO nanoparticle arrays have great potential for future optical devices.     

Influence of Al-doping on the structure and optical properties of ZnO films

Al-doped ZnO (ZnO:Al) thin films with c-axis preferred orientation were deposited on glass substrates using the radio frequency reactive magnetron sputtering technique. The effect of Al concentrations on the microstructure and the luminescence properties of the ZnO:Al thin films were studied by atomic force microscopy (AFM), X-ray diffraction (XRD), and fluorescence spectrophotometer. The results showed that the crystallization of the films was promoted by appropriate Al concentrations; the photoluminescence spectra (PL) of the samples were measured at room temperature. Strong blue peak located at 437 nm (2.84 eV) and two weak green peaks located at about 492 nm (2.53 eV) and 524 nm (2.37 eV) were observed from the PL spectra of the four samples. The origin of these emissions was discussed. In addition, absorption and transmittance properties of the samples were researched by UV spectrophotometer; the UV absorption edge shifted to a shorter wavelength first as Al was incorporated, and then to a longer wavelength with the increasing Al concentrations. The optical band gaps calculated based on the quantum confinement model are in good agreement with the experimental values.     

纳米ZnO薄膜的光致发光性质

利用溶胶－凝胶法制备了纳米ZnO薄膜,室温下测量了样品的光致发光谱(PL)、吸收谱(ABS)、X射线衍射谱(XRD)．X射线衍射(XRD)的结果表明：纳米ZnO薄膜呈多晶状态,具有六角纤锌矿晶体结构和良好的C轴取向．观察到二个荧光发射带,中心波长分别位于395 nm的紫带、524 nm的绿带和450 nm附近的蓝带．证实了纳米ZnO薄膜绿光可见发射带来自氧空位(VO)形成的浅施主能级和锌空位(VZn)形成的浅受主能级之间的复合;450 nm附近的蓝带来自电子从VO的浅施主能级到价带顶或锌填隙(Zni) 到价带顶或导带底到VZn的浅受主能级的复合．     

ZnO薄膜光学常数测量

利用Kramers-Kronig方法(K-K方法)测量了ZnO薄膜的复介电常数和复折射率(折射率和消光系数)。为了满足K-K方法所要求的条件,光源发出的光束通过一个特殊设计的中间带孔的反射镜垂直投射到ZnO薄膜表面,在ZnO薄膜表面产生的反射光穿过反射镜中间的小孔进入单色仪,从而测量出正入射情况下ZnO薄膜的反射光谱。对有限波段下测量的数据经合理的外推后,得出全波段的薄膜反射谱,然后利用K-K方法计算出ZnO薄膜的复介电常数和复折射率。实验结果表明,氧化锌薄膜在可见光范围内的折射率近似为一常数3．5;在430nm附近出现折射率最大值,而在短波长范围所对应的折射率大大降低,其值在0．5—2．5之间起伏波动。