XPS studies of adatom-adatom interactions: I/Ag(111) and I/Cu(111)

We have studied submonolayer adsorption, at room temperature, of iodine on the (111) faces of silver and copper, using LEED and XPS. In both systems the √3 × √3 LEED pattern appears at ～0.2 monolayer (ML) coverage; no other superlattice pattern was observed. The $\text{I}\text{4}\text{d}{}_{\mathrm{<mtext>5</mtext><mtext>2</mtext>}}$ core electron binding energy in both cases decreases by ～0.15 eV between very dilute coverage and 0.33 ML. The leveling-off of the binding energy for I/Ag(111) for coverages >0.2 ML is shown to be a unique experimental manifestation of an indirect, substrate-mediated adatom-adatom interaction, an attraction of several meV between next-nearest neighbor iodine atoms. The more nearly linear decrease in the I binding energy on Cu(111) is shown to imply a significantly weaker next-nearest neighbor interaction on this surface. The appearance of the √3 × √3 LEED pattern at low coverages on Cu is shown to be consistent with short-range order produced merely by a size effect, that is, by nearest neighbor exclusion. These conclusions are reached with the help of Monte Carlo calculations of a triangular lattice gas.     

Face-dependent bond lengths in molecular chemisorption: the formate species on Cu(111) and Cu(110)

Many previous structural studies of molecular adsorbates on metal surfaces indicate that the local coordination and bonding is closely similar to that in organometallic compounds, implying that the metallic substrate has no significant influence. Here we show that such an influence is detectable for one model system, namely, the formate species, HCOO, adsorbed on the atomically rough and smooth (110) and (111) surfaces of Cu, leading to a statistically significant difference (0.09±0.05 ?) in the Cu-O chemisorption bond length. The effect is reproduced in density functional theory calculations.     

Static sims studies of adsorbate structure: II. CO adsorption on Pd(111); adsorbate-adsorbate interactions on Ru(001), Ni(111) and Pd(111)

In a study of CO adsorption on Pd(111) it is shown that the secondary ion mass spectrum contains information on both adsorbate site geometry and adsorbate coverage. The fractional yields of PdCO⁺, Pd₂CO⁺ and Pd₃CO⁺, as a function of CO coverage are correlated with the changing site geometries suggested by reflection IR data. A relationship between secondary ion emission and the adsorbate-adsorbate interactions revealed by IR and EELS is also demonstrated for CO adsorption on Ru(001), Ni(111) and Pd(111).     

Oxygen on Cu(100): a new type of an adsorbate induced reconstruction

High resolution electron energy loss spectroscopy (EELS), Auger- spectroscopy (AES) and low energy electron diffraction (LEED) have been used to study the adsorption of oxygen on Cu(100). With increasing oxygen exposure a c(2×2) and a

R45 diffraction pattern are observed by LEED at and above room temperature. The c(2×2) pattern however always shows weak extra-

R45 spots. This is consistent with the corresponding EELS spectrum, which shows a weak dipole-active substrate phonon at 160 cm⁻¹ which should not be dipole active for a genuine c(2×2) overlayer. These findings suggest that the

R45 structure is the only well-ordered overlayer at room temperature. By an in-situ AES comparison with a well ordered c(2×2) overlayer on Ni(100) the

R45 structure is shown to correspond, to an oxygen coverage q_o = 0.48 ± 0.05. This excludes several structural models for the

)R45 structure. The EELS spectra give evidence for the adsorption of oxygen in or close to fourfold hollow sites. This indicates that the

)R45 structure can be derived from a genuine c(2×2) structure by a displacivc transition. Two structural models are proposed.     

Substrate mediated long-range oscillatory interaction between adatoms: Cu /Cu(111)

A quantitative study of the long-range interaction between single copper adatoms on Cu(111) mediated by the electrons in the two-dimensional surface-state band is presented. The interaction potential was determined by evaluating the distance distribution of two adatoms from a series of scanning tunneling microscopy images taken at temperatures of 9-21 K. The long-range interaction is oscillatory with a period of half the Fermi wavelength and decays for larger distances d as 1/d(2). Five potential minima were identified for separations of up to 70 A. The interaction significantly changes the growth of Cu/Cu(111) at low temperatures.     

Surface state energy shifts by molecular adsorption: CO ON Cu(111)

Molecular adsorption induced energy shifts of a surface state is observed for the Cu(111)/CO system. Angle resolved photoelectron energy spectra show that a zone center surface state shifts to higher energy relative to the Cu bulk bands. The effects is discussed in terms of charge transfer, molecular interaction range and absorption site.     

Long-lived excited states at surfaces: Cs/Cu(111) and Cs/Cu(100) systems

One-electron and multielectron contributions to the decay of transient states in the Cs/Cu(111) and (100) systems are studied by a joined wave-packet propagation and many-body metal response approach. The long lifetime of these states is due to the Cu L and X band gaps which reduce the electron tunneling between Cs and Cu. In the (111) case, the decay is mainly by inelastic e-e interaction, whereas in the (100) case, electron tunneling is dominating. This accounts very well for the experimental findings [Bauer et al., Phys. Rev. B 55, 10 040 (1997) and Ogawa et al., Phys. Rev. Lett. 82, 1931 (1999)].     

Atomic Diffusion in Cu/Si （111） and Cu/SiO2/Si （111） Systems by Neutral Cluster Beam Deposition

The Cu films are deposited on two kinds of p-type Si （111） substrates by ionized duster beam （ICB） technique. The interface reaction and atomic diffusion of Cu/Si （111） and Cu/SiO2/Si （111） systems are studied at different annealing temperatures by x-ray diffraction （XRD） and Rutherford backscattering spectrometry （RBS）. Some significant results are obtained： For the Cu/Si （111） samples prepared by neutral dusters, the interdiffusion of Cu and Si atoms occurs when annealed at 230℃. The diffusion coefficients of the samples annealed at 230℃ and 500℃ are 8.5 ×10^-15 cm^2.s^-1 and 3.0 ×10^-14 cm^2.s^-1, respectively. The formation of the copper-silicide phase is observed by XRD, and its intensity becomes stronger with the increase of annealing temperature. For the Cu/SiO2//Si （111） samples prepared by neutral dusters, the interdiffusion of Cu and Si atoms occurs and copper silicides are formed when annealed at 450℃. The diffusion coefficients of Cu in Si are calculated to be 6.0 ×10^-16 cm^2.s^-1 at 450℃, due to the fact that the existence of the SiO2 layer suppresses the interdiffusion of Cu and Si.     

Island shape selection in Pt(111) submonolayer homoepitaxy with or without CO as an adsorbate

The microscopic selection mechanisms of single-layer island shapes in Pt(111) homoepitaxy with or without minute amounts of CO adsorbate have been investigated theoretically. For clean growth, only triangular islands of a fixed orientation are obtained within a wide range of growth temperatures, with the orientation uniquely determined by a disparity in the rates of atom supply to an island corner site from the two island edges defining the corner. This novel picture is further corroborated by growth predictions in the presence of CO, whose preferential decoration of one type of the island edges reverses the intrinsic rate disparity for atom supply, thereby inverting the island orientation.     

Magnetic properties of (111) Cu/Fe multilayers

The magnetic properties of (111) Cu/Fe multilayers grown on Cu underlayers of several thickness (2000-500-50 Å) on cleaved mica have been investigated by Mössbauer spectroscopy and SQUID magnetometry. The analysis of experimental results suggests that 2.5 monolayers of ψ-Fe interfaced with Cu evolves partially from paramagnetic to ferromagnetic states as the Cu underlayer thickness is reduced to 50 Å and partially from weak to strong antiferromagnetism.     

K/Cu(111)表面功函数的变化

本工作用俄歇电子能谱(AES)测定K在Cu(111)表面上的覆盖度,用Kelvin探头测量表面功函数的变化,得出功函数依赖于K覆盖度的关系曲线,功函数最大变化值△φ_max=3.14eV,功函数最小时的覆盖度θ_min=0.18,初始偶极矩p(0)=7.0Debye,实验结果与武汝前等人的理论模型相一致。 关键词：