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采用固相合成和液相合成两种方法成功制备了Ca9Y0.5La0.5(VO4)7晶体的多晶原料,并采用提拉法生长了尺寸分别为30 mm×33 mm(固相合成多晶原料)和20 mm×27 mm(液相合成多晶原料)的Ca9Y0.5La0.5(VO4)7晶体。测试了该晶体在紫外、可见和近红外区域的透过率,采用Kurtz法测试了晶体的粉末倍频效应。结果表明,采用液相合成原料生长的晶体透过率大于采用固相合成原料生长的晶体约10%。前者粉末倍频效应约为KDP的1.8倍,后者约为KDP的2.5倍。晶体化学腐蚀实验表明采用液相合成原料生长的晶体具有更少的缺陷。采用液相合成方法制备多晶原料有利于提高晶体的光学质量。 相似文献
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以高纯硼酸、碳酸锂和碳酸铯为原料,摩尔比硼酸:碳酸锂:碳酸铯=11:1:1,采用顶部籽晶法,生长出尺寸为65 mm×22 mm×12 mm CsLiB6O10(CLBO)单晶,探讨了影响CLBO晶体生长的因素.对生长出的CLBO晶体的相关光学性质进行了研究.CLBO晶体的光学均匀性为3.6×10-5/cm,透过光谱表明该晶体的透光范围为185 nm到2790 nm,其紫外吸收边低于185 nm;用Maker干涉条纹测定了CLBO晶体的非线性光学系数为:d36(CLBO)=1.8d36(KDP). 相似文献
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用改进的熔盐顶部籽晶法生长了KTiOPO4(KTP)晶体并对该晶体进行了抗"灰迹"性能测试.测试表明,在功率密度为120kW/cm2的1064nm激光和10kW/cm2的532nm激光共同照射1000s后, 晶体在633nm处的吸收依然维持在1.05×10-4/cm左右,表明该晶体比普通KTP晶体具有更高的抗 "灰迹"性能.透过率测试表明,用本方法生长的KTP晶体在波长短于500nm的区域比普通KTP晶体有更高的透过率.通过实验测定,得出该晶体在室温下1064nm倍频Ⅱ类相位匹配角θ=90°时φ=24.40°. 相似文献
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对一种黑心片样品进行了分析.在确认黑心区为低少子寿命区的基础上,发现其电阻率明显偏高;发现黑心区经Secco刻蚀后,表面密布重叠圆形蚀坑,但与普通位错蚀坑有明显特征性区别;从其密度、形状与出现条件来看,它与电子半导体业中普遍报告的氧化堆垛层错(OSF)也不一致;进一步发现黑心区经Sirtle刻蚀后,表面呈现典型的大小明显不同的两种漩涡缺陷蚀坑,其密度明显低于上述Secco蚀坑.根据所得结果推测:黑心区主要密布一种性质上与普通位错相近,而所造成晶格畸变特征与范围不同于普通位错的晶格缺陷,它不属于已知的OSF微缺陷,而可能是一种由结晶生长过程中过饱和氧沉淀诱发形成的位错环;此外,黑心区还含有少量漩涡缺陷. 相似文献
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因晶体硅是间接带隙半导体材料,其较低的吸收系数限制了对近红外波段入射光的吸收.为此,引入金属有机化学气相沉积(MOCVD)技术制备的ZnO薄膜,并通过改变掺杂流量和沉积时间调节ZnO∶ B(BZO)薄膜的光学和电学性能.将BZO薄膜用于硅异质结(SHJ)太阳电池的背反射电极,相比于传统结构,电池的反射率和外部量子效率在近红外波段得到显著改善.为进一步解释外量子效率增加的原因,在四甲基氢氧化铵(TMAH)湿法制绒的硅衬底上沉积BZO薄膜,得到了新型微纳米嵌套结构,并对其光吸收进行了测试分析. 相似文献
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采用一步溶液法制备"三明治"PbS纳米晶/rGO复合材料,通过X射线衍射仪和场发射扫描电子显微镜对样品的晶体结构和表面形貌进行表征,并制作旁热式气敏元器件,测试其气敏特性。研究结果表明在PbS纳米晶/rGO复合材料中,PbS纳米晶均匀负载在rGO片层上,且复合材料存在类似"三明治"的三维结构。该复合材料在室温下对NH_3具有良好检测能力,对1000 ppm NH_3的灵敏度达到3.45,与纯PbS纳米晶及rGO相比,气敏性能得到显著提升,其最低检测极限为1 ppm,且具有良好的氨气选择性。对"三明治"PbS纳米晶/rGO复合材料气敏机理进行分析认为,rGO加入起到载流子传输层的作用,三维结构增加气体扩散速度及吸附面积。三明治状PbS纳米晶/rGO复合材料因其特殊结构及优异的气敏性能,有望在气敏领域得到广泛应用。 相似文献
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Suciati Mary J. Garson Paul V. Bernhardt Gregory K. Pierens 《Journal of chemical crystallography》2011,41(11):1669-1672
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N6-methyl mucronatine (C8H12N5O) has been isolated from a dictyoceratid sponge collected in South East Queensland. The solid state structure of the new metabolite (I) was confirmed by X-ray crystallography, while an NMR study in d 4-MeOH reveals the presence of a minor tautomer identified as (II). 相似文献18.
B.P. Wagner Z.J. Reitmeier J.S. Park D. Bachelor D.N. Zakharov Z. Liliental-Weber R.F. Davis 《Journal of Crystal Growth》2006,290(2):504-512
Growth on AlN/4H–SiC substrates of coalesced, non-polar GaN films having volumes of material with reduced densities of dislocations and stacking faults has been achieved from etched stripes via the statistical and experimental determination of the effect of temperature and V/III ratio on the lateral and vertical growth rates of the GaN{0 0 0 1} faces combined with pendeo-epitaxy. AFM of the uncoalesced GaN(0 0 0 1) and GaN vertical faces revealed growth steps with some steps terminating at dislocations on the former and a pitted surface without growth steps, indicative of decomposition, on the latter. Coalescence was achieved via (a) a two-step route and the parameters of (1) and V/III=1323 for 40 min and (2) 1020 °C and V/III=660 for 40 min and (b) a one-step route that employed and a V/III ratio=660 for 6 h. The densities of dislocations in the GaN grown vertically over and laterally from the stripes were 4×1010 cm−2 and 2×108 cm−2, respectively; the densities of stacking fault in these volumes were 1×106 cm−1 and 2×104 cm−1, respectively. The defects in the wing material were observed primarily at the bottom of the film where lateral growth of the GaN occurred from the AlN and the SiC. Plan view AFM also revealed different microstructures and a reduction in the RMS roughness values from 1.2 to 0.95 nm in these respective regions. 相似文献
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The crystal structure of 6,13-bis-(N,N-dimethylcarbamoyl)thioquinanthrene 3 has been determined as monoclinic, with space group P2(1)/c with lattice parameters a = 10.044(2) Å, b = 21.385(4) Å, c = 10.889(3) Å, = 102.92(3)°, Z = 4 and Dcalc = 1.342 Mg/m3. The middle 1,4-dithiin ring in the title compound 3, C24H20N4O2S2 is in a boat conformation with the dihedral angle between the planes of the aromatic rings 132.45(8)°. 相似文献