原子光刻

与光子和电子不同,原子的激发亚稳态具有方便操作的内能态结构,这使利用内能态的光学淬灭原理实现光刻技术成为现实.基于原子光学的中性原子束光刻技术是下一代光刻技术(the next generation lithography, NGL)的一种, 它可分两种途径实现：激光驻波原子直沉积技术和亚稳态中性原子光刻技术.前者可以实现图案的纳米尺度特征、大面积平行沉积和高分辨率;后者结合有效的抗蚀剂,同样可以实现纳米图形制造,在基板上获得的尖锐边缘分辨率目前可达40 nm.两种途径的原理相差甚远,但最终获得的结果相似.     

原子光刻

与光子和电子不间,原子的激发亚稳态具有方便操作的内能态结构,这使利用内能态的光学淬灭原理实现光刻技术成为现实.基于原子光学的中性原子束光刻技术是下一代光刻技术(the next generation lithography,NGL)的一种,它可分两种途径实现:激光驻波原子直沉积技术和亚稳态中性原子光刻技术.前者可以实现图案的纳米尺度特征、大面积平行沉积和高分辨率;后者结合有效的抗蚀剂,同样可以实现纳米图形制造,在基板上获得的尖锐边缘分辨率目前可达40 nm.两种途径的原理相差甚远,但最终获得的结果相似.     

亚微米结构的可见光聚合全息制作

报道用激光全息技术结合可见光光聚合制作周期结构的方法和物理机理;对多束激光相干产生的空间干涉光场进行了讨论;提供了一组激光束的偏振态的最佳组合,使激光全息技术制作理想的亚微米单晶结构更有效和快捷.分析了曝光量与制作效果的关系,此法可实现小球自排无法实现的大幅度占空比调节.与紫外光光聚合相比,可见光光聚合可在监视下调节,操作方便安全. 关键词： 激光全息技术 光学晶格 光子晶体     

Atom lithography with ytterbium beam

We successfully produced periodic ytterbium (Yb) narrow lines on a substrate using near-resonant laser light and the direct-write atom-lithography technique. The Yb atom is a promising material for nanofabrication using atom optics due to its electrical conductivity, the laser wavelength required for handling the atoms, the vapor pressure of the fabrication process, etc. The ¹⁷⁴Yb atoms collimated by Doppler cooling were channeled by the dipole force of an optical standing wave and then deposited onto a substrate. We clearly observed a grating pattern of Yb atoms fabricated on the substrate with a line separation of approximately 200 nm after examining the surface of the substrate with atomic force microscope. This is the first demonstration of nanofabrication using the atom-optical approach with Yb atoms. PACS 32.80.-t; 32.80.-Pj     

Atom lithography with two-dimensional optical masks

With a two-dimensional (2D) optical mask at =1083 nm, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrophobic resist layer, which is removed in a wet etching process. Experiments have been performed with several polarizations for the optical mask, resulting in different intensity patterns, and corresponding nanoscale structures. The results for a linear polarized light field show an array of holes with a diameter of 260 nm, in agreement with a computed pattern. With a circularly polarized light field a line pattern is observed with a spacing of /2^0.5=766 nm. Simulations taking into account many possible experimental imperfections can not explain this pattern. PACS 32.80.Lg; 39.25.+k; 81.16.Nd     

Photonic crystals with a chiral basis by holographic lithography

We demonstrate the use of holographic lithography to fabricate chiral photonic crystals. These structures are calculated to exhibit strong optical activity even though they are made from material that is not intrinsically optically active. By control of the polarizations of the interfering plane waves that are used to define the three-dimensional microstructure it is possible to create left- and right-handed and closely related non-chiral structures.     

Atom lithography with a cold, metastable neon beam

We study different aspects of atom lithography with metastable neon atoms. Proximity printing of stencil masks is used to test suitable resists that are sensitive to the internal energy of the atoms, including dodecanethiols on gold and octadecyltrichlorosilanes grown on a SiO₂ surface. As an example of patterning the atomic beam with laser light, we create parallel line structures on the surface with a periodicity of half the laser wavelength by locally de-exciting the atoms in a standing quenching wave. Received: 29 June 1999 / Revised version: 30 August 1999 / Published online: 10 November 1999     

全息光刻中的驻波效应研究

对光刻胶内光强分布进行了计算与模拟, 结果表明, 来自基底的反射光与入射光干涉, 光强在垂直基底的方向上呈现强弱周期性变化, 即驻波效应. 进一步的分析与实验结果表明, 随着基底反射率的增加, 驻波效应变得严重, 进而影响光栅掩模的槽形、占宽比并限制线条高度. 为减弱驻波效应的影响, 尝试了使用减反射膜降低基底反射光强度, 实验结果表明, 在基底与光刻胶之间增加一层减反射膜吸收来自基底的反射光强度, 减弱驻波效应的效果显著. 关键词： 全息光刻 驻波 减反射膜     

准晶结构的激光全息人工制作

报道了用激光全息刻写技术结合感光聚合材料体系制作介观尺度二维准周期结构(准晶). 并在前期工作的基础上，研究了不同曝光量对二维空气柱孔径的影响，不同偏振对准晶结构花样的影响. 实验结果显示，可以制作的二维准晶的空气柱孔径可达100nm，而且结构均匀，无缺陷面积大. 用此实验系统可以制作多种花样二维甚至是三维准晶结构. 目前，除激光全息刻写技术外，用其他传统精密机械加工技术来人工制作介观准晶体尚存在很大挑战性. 关键词： 准晶结构 光子晶体 激光全息技术     

Atom lithography without laser cooling

Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.     

Quantum lithography with classical light

We show how to achieve subwavelength diffraction and imaging with classical light, previously thought to require quantum fields. By correlating wave vector and frequency in a narrow band, multiphoton detection process that uses Doppleron-type resonances, we show how to achieve arbitrary focal and image plane patterning with classical laser light at submultiples of the Rayleigh limit, with high efficiency, visibility, and spatial coherence. A frequency-selective measurement process thus allows one to simulate, semiclassically, the path-number correlations that distinguish a quantum entangled field.     

3-D holographic lithography of organic-inorganic hybrids

Fabrications of ordered three-dimensional structures with submicron lattice constants were performed on organic-inorganic hybrids using a holographic lithography technique recently reported in the literature. The possibility of such a patterning has previously been demonstrated from single nanosecond laser pulse irradiation of thin films of epoxy photoresist and mixtures of methacrylate-alkoxy-silane with Zr or Ti alkoxides. In the present work, UV irradiation of similar hybrid resins were carried out through repeated laser pulses of low energy with a twofold objective: (i) to study the interference stability for future chemical gas phase decomposition experiments and (ii) to obtain patterning through large film thickness (e.g. 1 mm). The influence of several parameters on the structuration was examined from observations by scanning electron microscopy and optical diffraction. Many interdependent parameters were considered in different steps of the process, namely (i) hybrid resin preparations with required properties of stability, transparency and viscosity, (ii) film coating on different substrates, (iii) UV irradiation (energy and number of laser pulses), (iv) ultrasonic dissolution of monomer, and (v) sample drying. As results, different structuration resolutions were observed as a function of these parameters. But if the influence of a few parameters was easily understood and controlled, it has also appeared that it was not the case of all of them.     

Photonic band gap architectures for holographic lithography

Using symmetry considerations, we identify three families of large photonic band-gap (PBG) architectures defined by the isointensity surfaces of four beam laser interference. For particular choices of beam intensities, directions, and polarizations, we obtain a diamondlike crystal, a novel body-centered cubic architecture, and a simple cubic structure with PBG to center frequency ratios of 25%, 21%, and 11%, respectively, when the isointensity surface defines a silicon (dielectric constant of 11.9) to air boundary.     

Three-dimensional holographic lithography by an iterative algorithm

We have applied an iterative algorithm for hologram design with multiple output image planes arranged in close proximity to create continuous patterns within an imaging volume. These holograms have been designed for photolithography on three-dimensional surfaces. The influence of simulated image plane separation on the final image, and its suitability for lithography, is assessed. Results are presented and the most suitable case is demonstrated experimentally.     

Subnanometer-accuracy z-position monitor mask for optical lithography

A lithographic test pattern, the phase shift grating (PSG) z monitor, is introduced. Through the use of phase shift techniques, position errors of images in the z-direction translate into lateral shifts in the printed pattern. The lateral shifts are easily measurable using an overlay metrology tool. Each z monitor pattern in a test mask can be directly read for the sign and magnitude of the z error. When the experimental conditions, namely, the period of a PSG and a coherent factor of the lithography tool simultaneously satisfies a criterion of the asymmetric two-beam interference between the zeroth-order ray and either of the two first-order rays of diffraction, the linearity of a z-vs-overlay curve is always complete and the slope of the curve is constant everywhere in the image field. Using state-of-the-art overlay metrology tools, we realized subnanometer-order accuracy in the z measurement.     

全息制作不同晶面取向光子晶体模板

用单向光入射和单次曝光的激光全息技术制作了类金刚石结构, 此类金刚石结构有宽完全带隙和低介质折射率要求等优点. 在同一种光束配置下，引入恰当的匹配棱镜，用激光全息技术制作了大面积的类金刚石光学晶格不同晶面取向的亚微米周期结构. 满足如负折射效应等研究中所需的特殊晶面取向要求. 关键词： 激光全息技术 光学晶格 光子晶体     

Production of nanostructured magnetic materials using holographic lithography

The magnetic properties of Co, Ni and NiFe sub-micrometric structures produced by holographic lithography and sputtering techniques are investigated. The structures were obtained using a mask previously recorded by holography in a photo-resist film coated on a quartz substrates. After this procedure, the magnetic material was deposited using the sputtering technique, and the photo resist was removed by lift-off. Samples with thicknesses of around 500 Å were grown in stripes structures and periodicity of 800 nm. The results indicate that the samples with Co and NiFe present exchange bias effect and this is due the surface oxidation.     

Enhancement of LED light extraction via diffraction of hexagonal lattice fabricated in ITO layer with holographic lithography and wet etching

A novel method for enhancing light extraction efficiency of LEDs via diffraction of the lattice fabricated in ITO layers of LEDs is proposed. The lattice fabrication process includes holographic lithography and wet etching. 3-beam interference holographic approach was used to fabricate large-area hexagonal lattice mask which can cover 2-inch semiconductor wafer, and acid etching was used to transfer the lattice structure into p-contact ITO layer. 1.4 fold enhancement of light output at 20 mA injection current was obtained from GaN-based LEDs in the primary experiment. The lattice fabrication process is rapid and cost-effective thus enabling industrial mass production of high brightness LEDs.     

Atom funnel running with evanescent light generated by a thick hollow light beam

The use of a hollow light beam reduces the loss of atoms inside and outside an evanescent-light funnel. Therefore, we superimpose an LG₀₁ beam with a small hole onto a doughnut beam with a large outer diameter and couple the resultant hollow light beam to the 240-μm-wide outlet of an inverted trigonal-pyramidal funnel. Compared to the case where a Gaussian light beam is employed for generation of evanescent light, the flux intensity of the output cold ⁸⁷Rb atoms rises 13-fold when the inner diameter of the 4.5-mm wide hollow light beam is 1.7 times as large as the size of the outlet under optimal blue-detuning conditions.