Chiral substituierte Schwefelfluoride

Chirally Substituted Sulfur Fluorides The compounds CF₃? CFCl? SF₃, (CF₃? CFCl)₂SF₂, and CF₃? CFCl? SOF were prepared and their ¹⁹F-nmr spectra fully analysed. In CF₃? CFCl? SF₃ the chiral carbon atom leads to a splitting of the two axial fluorine atoms on sulfur. (CF₃? CFCl)₂SF₂ exists in a dl-form with equivalent (sulfur)-F atoms and a meso form with non-equivalent (sulfur)-F atoms. CF₃? CFCl? SOF exists in two diastereomeric forms.     

Perfluoro-4-methyl-1,3-dioxole: a new monomer for high-Tg amorphous fluoropolymers

A 4-Chloro-5-trifluoromethyl-2,2,4-trifluoro-1,3-dioxolane (1) was synthesised by reaction of CF₂(OF)₂ with CF₃CHCFCl; the elimination of HCl from (1) in basic conditions led to the formation of dioxole perfluoro-4-methyl-1,3-dioxole (2). Both these synthetic steps gave the corresponding product in high yield.A new synthetic route for the preparation of CF₃CHCFCl, starting from CF₂ClBr and CH₂CF₂, together with some examples of polymerisation products obtained by reaction of dioxole (2) with fluoroolefins are also reported.     

Ion and radical reactions in the silane glow discharge deposition of a-Si:H films

A mass spectrometric analysis of the positive ions and neutral products in a silane glow discharge has been performed. The active species, created by dissociation, disproportionation, and ion-molecule reactions are mainly SiH₂, SiH₃, and H. A calculation of the distribution of the SiH _n ⁺ ions shows that the silane concentration monitors the abundance of SiH ₃ ⁺ . The diffusional transport of radicals toward the discharge-tube walls can explain the observed deposition rates. The study of SiH₄-SiD₄ and SiH₄-D₂ plasmas emphasizes several reactions which modify the free-radical populations depending on the discharge conditions: disproportionation, termination, recombination, and abstraction. Heterogeneous reactions have also been observed: etching of the film by H atoms and direct incorporation of hydrogen in the growing film. A general scheme for the plasma deposition mechanism is proposed.     

UV absorption spectrum of CF3CFClO2 and kinetics of the self reaction of CF3CFCl and CF3CFClO2 and the reactions of CF3CFClO2 with NO and NO2

The ultraviolet absorption spectrum of CF₃CFClO₂ and the kinetics of the self reactions of CF₃CFCl and CF₃CFClO₂ radicals and the reactions of CF₃CFClO₂ with NO and NO₂ have been studied in the gas phase at 295 K by pulse radiolysis/transient UV absorption spectroscopy. The UV absorption cross section of CF₃CFCl radicals was measured to be (1.78 ± 0.22) × 10^?18 cm² molecule^?1 at 220 nm. The UV spectrum of CF₃CFClO₂ radicals was quantified from 220 nm to 290 nm. The absorption cross section at 250 nm was determined to be (1.67 ± 0.21) × 10^?18 cm² molecule^?1. The rate constants for the self reactions of CF₃CFCl and CF₃CFClO₂ radicals were (2.6 ± 0.4) × 10^?12 cm³ molecule^?1 s^?1 and (2.6 ± 0.5) × 10^?12 cm³ molecule^?1 s^?1, respectively. The reactivity of CF₃CFClO₂ radicals towards NO and NO₂ was determined to (1.5 ± 0.6) × 10^?11 cm³ molecule^?1 s^?1 and (5.9 ± 0.5) × 10^?12 cm³ molecule^?1 s^?1, respectively. Finally, the rate constant for the reaction of F atoms with CF₃CFClH was determined to (8 ± 2) × 10^?13 cm³ molecule^?1 s^?1. Results are discussed in the context of the atmospheric chemistry of HCFC-124, CF₃CFClH. © 1994 John Wiley & Sons, Inc.     

Synthese d'ethers et de thioethers allyliques fluores par catalyse par transfert de phase

Several fluorinated allylic ethers, thioethers and diethers have been prepared in excellent yields by phase transfer catalysis (CTP). The used halogenated compounds are allyl chloride and bromide, p-chloromethylstyrene. The used fluorinated alcohols are aromatic pentafluorophenol and various aliphatics: CF₃CH₂OH, CF₂HCF₂CH₂OH ClCF₂CF₂CH₂OH,C₆F₁₃C₂H₄OH, HOCH₂CF₂CFClCF₂CH₂OH and HOC₆H₄C(CF₃)₂C₆H₄OH. All these new compounds have been characterized by ¹H and ¹³C NMR. We conclude that CTP is the best method to obtain allylic and diallylic compounds.     

A new mechanism of nucleophilic vinylic substitution and unexpected products in the reaction of chlorotrifluoroethylene with [Re(CO)5]Na and [CpFe(CO)2]K

The mechanism of chloride substitution in CF₂CFCl with [Re(CO)₅]⁻ and [CpFe(CO)₂]⁻ anions is investigated experimentally and theoretically. The substitution reaction begins with the nucleophile addition to CF₂CFCl producing the carbenoid anion [MCF₂CFCl]⁻ (A) (M = Re(CO)₅, CpFe(CO)₂). This is shown by trapping the intermediate A with electrophiles - proton donor (t-BuOH) to give MCF₂CFClH or with CF₂CFRe(CO)₅ to give acylmetallate III, and by the formation of the substitution products CF₂CFM from the anion A, generated by the deprotonation of MCF₂CFClH with t-BuOK. 1,2-Shift of metal carbonyl group concerted with the α-elimination of chloride anion is proposed as the transformation pathway of carbenoid A into CF₂CFM. A competing process of carbene insertion into Fe-CO bond is proposed to explain the formation of (XI). The feasibility of these two pathways is confirmed by DFT (B3LYP/SDD and 6-31G^∗) calculations of the carbenes [MCF₂CF:] and carbenoid anions [MCF₂CFCl]⁻. Transition states (TS) for 1,2-shift (+3.2 kcal/mol) and for nucleophilic addition at CO ligand (+5.4 kcal/mol) are located for [(CO)₅ReCF₂CFCl]⁻, but only one TS corresponding to carbene insertion into Fe-CO bond (+2.1 kcal/mol) is located for [(CO)₂CpFeCF₂CFCl]⁻. The formation of other newly observed products, F(CO)CHFRe(CO)₅ (V) and Cp(CO)₂FeCCFeCp(CO)₂ (VIII) is also discussed.     

Some aspects of the chemistry of chlorofluoro-olefins which contain allylic chlorine atoms

Routes to perflouroallyl chloride, CF₂:CF.CF₂Cl, and to $\text{cis}$-and $\text{trans}$-1-chloro-hexafluoro-2-trifluoromethyl(but-2-ene), (CF₂Cl)(CF₃)C:CF.CF₃ are reported, and their susceptibility to attack by nucleophiles discussed; the allylic chlorine atoms in these olefins are the controlling factor in determining the products obtained.The conversion of 3-chloropentafluoropropene into a series of perfluoroallyl derivatives of general formula R.CF₂.CF:CF₂ [R = (CF₃)₃C-, CF₃O-, C₆F₅-, l-, MeO-, etc.] is described, and the further chemistry of 3-chloropentafluoropropene and its derivatives outlined.Water reacts rapidly with (CF₂Cl)(CF₃)C:CF.CF₃ to give CF₂:C(CF₃).CFCl.CF₃ or CF₃.CO.CH₂.CF₃. Methanol affords CF₂:C(CF₃).CFOMe.CF₃ and (MeOCF₂)(CF₃)C:CF.CF₃ as initial products, with subsequent secondary products such as CF₃.CFOMe.CH(CF₃).CF₂OMe, (CF₃)(MeO)C:C(CF₃).CF₃OMe, MeO.CF:C(CF₃).CFOMe.CF₃, (CF₃)(MeO)CF.CH(CF₃).CO₂Me, and (CF₃)(MeO)C:C(CF₃).CO₂Me. The influence of allylic chlorine and of reaction time on the formation of these products, and mechanistic pathways for their formation are considered.     

Comparison of singlet methylene removal rates by group IV hydrides

The technique of laser flash photolysis/laser absorption has been used to obtain an absolute removal rate constant of (3.85 ± 0.18) × 10^?10 cm³ molecule^?1 s^?1 for singlet methylene, ¹CH₂ (ã¹A₁), with germane (GeH₄) at ambient temperature. The removal rate constant is compared with the values for methane (CH₄) and silane (SiH₄) which have been determined previously. © 1995 John Wiley & Sons, Inc.     

Communication: The insertion of silylene in C?H bonds; rate constant limits and the energy barrier

The technique of laser flash photolysis has been used to set limits on the rate constants for the bimolecular reactions of SiH₂ with methane (CH₄) and tetramethylsilane (SiMe₄) at both ambient and elevated temperatures (ca 600 K). These limits show that the energy barriers to insertion reactions of SiH₂ in the C H bonds of CH₄ are at least 45(±6) kJ mol⁻¹ and in the C H and/or Si C bonds of SiMe₄ are at least 23(±6) kJ mol⁻¹. The best thermochemical estimate of the activation energy for SiH₂+CH₄ is 59(±12) kJ mol⁻¹. Reasons for the greatly diminished reactivity of SiH₂ with C H as compared with Si H bonds are discussed. © 1999 John Wiley & Sons, Inc. Int J Chem Kinet 31: 393–395, 1999     

Fluoration de telomeres polyhalogenes par le fluorure de potassium (2ème partie). Synthese d'olefines perfluorees de hauts poids moleculaires

Fluorination of chlorofluorinated telomers of general formula Cl(CFClCF₂)_nCCl₃ (n ? 7) was studied using potassium fluoride in dimethylsulfoxide as fluorinating agent. The reaction leads to a mixture of perfluorinated linear olefins having 15 to 30 carbon atoms : CF₃(CF₂)_pCFCF(CF₂)_mCF₃ (p + m = 2n?3).We perfected a method to determine molecular weights of the telomers by gel permeation chromatography (G.P.C.). The olefins obtained by fluorination are analyzed both by vapor phase chromatography (V.P.C.) and by ¹⁹F nuclear magnetic resonance (N.M.R.).     

Reaction of 1,2-dichloroiodotrifluoroethane with zinc

The zinc coupling reaction of 1,2-dichloroiodotrifluoroethane (I) in acetic anhydride-methylene chloride has been reinvestigated in more detail than its original disclosure. The expected coupling product C₄F₆Cl₄ was shown to be an isomeric mixture of three components, CF₂ClCFClCFClCF₂Cl (II, 80%), CFCl₂CF₂CF₂CFCl₂ (IIa, 15%) and CF₂ClCFClCF₂CFCl₂ (IIb, 5%). In addition, other products e.g. CF₂CFCl, C₆F₉Cl₅ and C₈F₁₂Cl₆ were formed in minor quantities. A probable mode of formation of the various byproducts via initial formation of CF₂CFCl and subsequent telomerization is presented.     

Dissociative photoionization of SiH4 in the 12–19 eV region

Relative photoexcitation spectra of ionic fragments SiH⁺₃, SiH⁺₂, SiH⁺ and Si⁺ originating from photofragmentation of molecular silane (SiH₄) have been measured in the 12–19 eV region using a time-of-flight mass-analytic method combined with synchrotron radiation as a light source. No SiH⁺₄ could be detected in a measurement time of a few microseconds. The excitation spectra show a maximum photoionization efficiency around 13.3 eV for SiH⁺₂ and around 14.8 eV for SiH⁺₃. Correlations between photoionization and dissociation are discussed. The assignment of the autoionization structure between 15 and 18 eV by Börlin et al. has been positively examined and extended to include two vibrational progressions composed of the ν₁ mode with a frequency of 1690 ± 60 cm⁻¹ and the ν₂ mode with 730 ± 80 cm⁻¹.     

Production of highly enriched Carbon-13 by IR multiphoton dissociation of dichlorodifluoromethane mixed with hydrogen iodide

Isotope-selective IR multiphoton dissociation of CF₂C1₂ molecules in a mixture with HI was experimentally investigated. It was shown that irradiation of the CF₂C1₂-HI mixture leads to the successive buildup of the intermediates CF₂HC1 and CF₂HI, which also isotopically selectively dissociate simultaneously with the substrate to yield the final product CF₂H₂ enriched in¹³C up to 97% at an initial¹³C concentration of 1.1% in CF₂C1₂. When CF₂C1₂ preliminarily enriched in¹³C up to 12.3% was used, the attained¹³C concentration in CF₂H₂ was as high as ≥99%. Isotopic selectivity and dissociation yields of¹³C- and¹²C-containing components of the substrate CF₂C1₂ and both intermediate dissociation products, CF₂HC1 and CF₂HI, were measured, depending on experimental conditions. The¹³C distribution over the intermediate and final dissociation products was studied. The side products C₂F₄C1₂ and CF₂IC1 were detected.     

The time-resolved LMR method as used to measure elementary reaction rates of CI atoms and SiH3 radicals in pulse photolysis of S2Cl2 in the presence of SiH4

The time-resolved laser magnetic resonance (LMR) method has been applied to kinetic measurements for the first time. An intracavity spectrometer based on a CO₂ laser with resonant modulation of the magnetic field and with phase-sensitive detection of the signal has been used. Kinetic curves of generation and disappearance of CI atoms and SiH₃ radicals were obtained in the pulse photolysis of a mixture of S₂Cl₂ + SiH₄ under the fourth harmonic of a Nd laser (265 nm, 0.5 mJ, 12.5 Hz) at a total pressure of 520–980 Pa (he as diluent) and a temperature of 326 K. The reagent concentrations were: [S₂Cl₂ = (2.0?10.2)×10¹⁴ cm^?3, [SiH₄ = (2.4?17.4)×10¹³ cm^?3. To remove the transition saturation, 5.3×10¹⁵ cm^?3 CCl₄ was introduced into the reactor. The fraction of dissociated S₂Cl₂ was 1‰ Rate constants of the reactions (I) Cl+S₂Cl₂ → products, (II) Cl+SiH₄ → HCl+SiH₃ and a preliminary rate constant of the reaction (III) SiH₃ + S₂Cl₂ → products were obtained: k₁ ≤ (4.3±1.2)×10^?12 cm³/s, k₂ = (2.3±0.5)×10^?10 cm³/s, k₃ = (2.4±0.5)×10^?11 cm³/s. At a signal-to-noise ratio of 1:1, 1000 pulses and a 12 cm long detection zone the sensitivity to Cl atoms and to SiH₃ radicals was 4×10¹⁰ cm^?3 and = 10¹¹ cm^?3, respectively. The time resolution of the method was 4 μs. The method is shown to be promising for kinetic investigations and experiments on fast processes.     

Time-resolved tunable diode laser detection of products of CF2HCl IRMPD: A linestrength measurement for CF2

Tunable diode laser transient detection of CF₂ C₂F₄, and HCl following infrared multiphoton dissociation (IRMPD) of CF₂HCl has been achieved. Quantification of the HCl and C₂F₄ leads to the calculation of an infrared absorption linestrength and the ν₁ bandstrength for CF₂ (X̃¹A₁). In addition, the rate coefficient for recombination of CF₂ was found to be (1.4± 0.4) × 10¹⁰ cm³ mol⁻¹ s⁻¹.     

Mechanism and kinetics of the silane decomposition in the presence of acetylene and in the presence of olefins

Kinetic data and product studies are reported for the silane pyrolysis in the presence of olefins and acetylene. The kinetics of silane loss in the presence of acetylene was found to be identical to the initial gas phase silane decomposition step (SiH₄ + M → SiH₂ + H₂ + M) when corrected for pressure fall-off effects. This result and the absence of methane or ethane from the pyrolysis of SiH₄ in the presence of 1-butene or 1-pentene demonstrate that silyl radicals and H atoms are not involved in silane-olefin or silane-acetylene reactions. Qualitative aspects and kinetic data from the SiH₄ pyrolysis in the presence of propylene are in accord with propylsilane formation via propylsilylene formed by silylene addition to propylene.     

Trifluoromethylsilane,CF3SiH3

CF₃SiH₃ (I) has been obtained in ～90 % yield from the reaction of CF₃SiF₃ or CF₃SiF₂I with LiAlH₄ in dibutyl ether at ?78°. (I) has been characterized by its ¹H, ¹⁹F, ¹³C and ²⁹Si NMR-, mass-, IR- and Raman spectra. It is thermally stable up to 180° and not attacked by O₂, H₂O and H₃PO₄, but cleaved by aqueous alkali. From a rovibrational analysis, B_o = 0.09769(2) cm^?1 is deduced, and a long SiC bond, 1.95(1)Å, is predicted.     

Applications of ESCA to polymer chemistry: Studies of some nitroso rubbers

Molecular core binding energies of the polymers formed by copolymerization of CF₃NO with CF₂?CF₂, CF₂?CFCl, and CF₂?CFH, respectively, have been studied by means of ESCA. The results are interpreted in terms of CNDO/2 SCF MO calculations on some model systems. Some evidence for structural irregularity is found for the copolymers with CF₂?CFCl and with CF₂?CFH. The reaction mechanism for the polymerization is also discussed in terms of the experimental results and INDO SCF MO calculations.     

Reaction of crystalline fluoro olefins with bromine vapor. 3. Solid-state stereospecificity for (E) and (Z)-2-(4′-carboxyphenyl)-1-chloro-1-fluoroethene. [1]

The gas-solid addition reaction between gaseous bromine and solid (E) and (Z)-4-HO₂CC₆H₄CHCFCl has been examined. Reaction under ionic conditions leads to predominant anti-addition of bromine (80% anti for the E isomer; 90% for Z). Addition under radical conditions is slightly stereoselective with a small excess (54:46 for E; 56:44 for Z) of the S,R diastereomer of 4-HO₂CC₆H₄CHBrCFClBr being formed. It is concluded that this olefin system has greater freedom of molecular motion in the solid than 4-HO₂CC₆H₄CFCFX (X = Cl, CF₃).     

Reactions of SiH2(X̄1A1) with H2, CH4, C2H4, SiH4 and Si2H6 at 298 K

Reaction rate constants of SiH₂(X̄¹A₁) have been directly measured for the first time using the laser photolysis—laser-induced fluorescence method. The preparation of SiH₂ radical in the laser photolysis (193 nm) of phenylsilane and the concentration of the radical is demonstrated by a dye laser at 580.1 nm (X̄¹A₁-Ā¹B₁). The reaction rate constants of SiH₂(X̄¹A₁) with H₂, CH₄, C₂H₄, SiH₄ and Si₂H₆, are 0.001, 0.01, 0.97, 1.1 and 5.7×10⁻¹⁰ cm³ molecule⁻¹ s⁻¹, respectively. For SiH₂(Ā¹B₁(0.2,0)), the collision-free lifetime is 0.6 μs and the quenching rate constant for He is 3.8×10⁻¹⁰ cm³ molecule⁻¹ s⁻¹.