Fabrication of nanoporous templates from diblock copolymer thin films on alkylchlorosilane-neutralized surfaces

The fabrication of nanoporous templates from poly(styrene)-b-poly(methyl methacrylate) diblock copolymer thin films (PS-b-PMMA, volume ratio 70:30) on silicon requires precise control of interfacial energies to achieve a perpendicular orientation of the PMMA cylindrical microdomains relative to the substrate. To provide a simple, rapid, yet tunable approach for surface neutralization, we investigated the self-assembled ordering of PS-b-PMMA diblock copolymer thin films on silicon substrates modified with a partial monolayer of octadecyldimethyl chlorosilane (ODMS), i.e., a layer of ODMS with a grafting density less than the maximum possible monolayer surface coverage. We demonstrate herein the fabrication of nanoporous PS templates from annealed PS-b-PMMA diblock copolymer thin films on these partial ODMS SAMs.     

Solvent-induced novel morphologies in diblock copolymer blend thin films

We report the morphology and phase behaviors of blend thin films containing two polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with different blending compositions induced by a selective solvent for the PMMA block, which were studied by transmission electron microscopy (TEM). The neat asymmetric PS-b-PMMA diblock copolymers employed in this study, respectively coded as a1 and a2, have similar molecular weights but different volume fractions of PS block (fPS=0.273 and 0.722). Another symmetric PS-b-PMMA diblock copolymer, coded as s, which has a PS block length similar to that of a1, was also used. For the asymmetric a1/a2 blend thin films, circular multilayered structures were formed. For the asymmetric a1/symmetric s blend thin films, inverted phases with PMMA as the dispersed domains were observed, when the weight fraction of s was less than 50%. The origins of the morphology formation in the blend thin films via solvent treatment are discussed. Combined with the theoretical prediction by Birshtein et al. (Polymer 1992, 33, 2750), we interpret the formation of these special microstructures as due to the packing frustration induced by the difference in block lengths and the preferential interactions between the solvent and PMMA block. Results obtained here suggest that diblock copolymer blend thin films treated with a selective solvent offer an alternative and attractive approach to control the self-organization of polymers.     

Controlling the size of nanostructures in thin films via blending of block copolymers and homopolymers

The effects of molecular weight and concentration of poly (methyl methacrylate) (PMMA) homopolymer or symmetric short polystyrene-block-poly (methyl methacrylate) (PS-b-PMMA) diblock copolymer on the size of the nanostructures of its blends with symmetric long PS-b-PMMA diblock copolymer have been investigated by atomic force microscopy. By careful controlling of the film thickness, solvent selectivity, and annealing time, PMMA cylindrical microdomains oriented normal to the film surface were obtained in all thin films. With the addition of both low- and high-molecular-weight PMMA homopolymers, the cylindrical domain sizes increased although it was less obvious for the lower molecular weight homopolymer. In contrast to the homopolymer, adding the short chain diblock copolymer resulted in a decrease in the cylindrical domain size, which was ascribed to the reduction of the interfacial tension and increase in the stretching energy.     

Elucidation of protein adsorption behavior on polymeric surfaces: toward high-density, high-payload protein templates

The elucidation of protein adsorption behavior on polymeric surfaces is very important, since their use as arrays and carriers of biomolecules is ever growing for a wide variety of bioapplications. We evaluate protein adsorption characteristics on chemically homogeneous and heterogeneous polymeric surfaces by employing polystyrene-block-polymethylmethacrylate (PS-b-PMMA) diblock copolymer, PS homopolymer, PMMA homopolymer, and PS/PMMA blend as protein templates. We also investigate distance-dependent protein adsorption behavior on the interfacial region between PS and PMMA. We observe selective protein adsorption exclusively onto PS areas for the chemically heterogeneous PS-b-PMMA and PS/PMMA blend templates. On blend films, protein adsorption is highly favored on the PS regions located near the PS:PMMA interface over that on the PS areas situated away from the interface. Protein density on PS domains is inversely proportional to the separation distance between two neighboring PS:PMMA interfaces. We also observe a higher protein density on the PS-b-PMMA than on the PS or PMMA homopolymer templates. This effect is due to the fact that chemically heterogeneous PS-b-PMMA presents periodically spaced PS:PMMA interfaces on the nanometer scale, whereas no such interfaces are present on homopolymer films. The density of protein molecules on the heterogeneous PS-b-PMMA surface is approximately 3-4-fold higher than on the homogeneous PS surface for the identical experimental conditions. These results demonstrate that self-assembling, chemically heterogeneous, nanoscale domains in PS-b-PMMA diblock copolymers can be used as excellent, high-payload, high-density protein templates. The unique advantages of the diblock copolymer may prove the spontaneously constructed protein nanotemplates to be highly suitable as functional substrates in many proteomics applications.     

Control of the microdomain orientation in block copolymer thin films with homopolymers for lithographic application

Block copolymer lithography is a promising method for fabricating periodical nanopatterns of less than 20 nm by self-assembly and can be applicable for fabricating patterned magnetic media with a recording density over 1 Tb/in.2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Simply by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the homopolymer (PS or PMMA) of the major component, we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes the perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.     

Highly ordered nanoporous thin films by blending of PSt‐b‐PMMA block copolymers and PEO additives as structure directing agents

Herein, we present a simple method for producing nanoporous templates with a high degree of lateral ordering by self‐assembly of block copolymers. A key feature of this approach is control of the orientation of polymeric microdomains through the use of hydrophilic additives as structure directing agents. Incorporation of hydrophilic poly(ethylene oxide) (PEO) moieties into poly(styrene‐b‐methyl methacrylate) (PSt‐b‐PMMA) diblock copolymers gives vertical alignment of PMMA cylinders on the substrate after solvent annealing. Because of the miscibility between PEO and PMMA, PEO additives were selectively positioned within PMMA microdomains and by controlling the processing conditions, it was found that ordering of PSt‐b‐PMMA diblock copolymers could be achieved. The perpendicular orientation of PMMA cylinders was achieved by increasing the molecular size of the PEO additives leading to an increased hydrophilicity of the PMMA domains and consequently to control the orientation of microdomains in PSt‐b‐PMMA block copolymer thin films. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 8041–8048, 2008     

An optical waveguide study on the nanopore formation in block copolymer/homopolymer thin films by selective solvent swelling

Thin films of mixtures of asymmetric poly(styrene-block-methyl methacrylate) (PS-b-PMMA) diblock copolymers and PMMA homopolymers with cylindrical PMMA microdomains oriented normal to the substrate surface were used to couple optical modes in the Kretschmann configuration, and their optical properties were investigated by optical waveguide spectroscopy (OWS). The nanopore formation in the block copolymer (BCP) waveguide layer via selective solvent swelling and subsequent reannealing was monitored in terms of shifts in the coupling mode angles. The sequential swelling/reannealing of the initial mixture film resulted in a number of discrete or partially interconnected pores instead of cylindrical pores with a high aspect ratio. The simultaneous processes occurring inside and on top of the BCP waveguide layer were discerned independently with high selectivity for p- and s-polarization.     

Block copolymer film with sponge-like nanoporous strucutre for antireflection coating

We prepared nanoporous films by spin-coating of polystyrene-block-poly(methyl methacrylate) copolymers (PS-b-PMMA) to a glass and irradiating by ultra-violet source followed by selective removal of PMMA blocks with acetic acid. When spin-coated PS-b-PMMA was no longer annealed at high temperatures, microphase separation between two blocks occurred only in the short-range scale. The porous films prepared from PS-b-PMMA with the volume fraction of PMMA block of 0.69 exhibited a spongelike nanoporous structure over the entire film thickness and showed excellent antireflection with a minimum reflection less than 0.1% at visible and near-infrared wavelengths. The observed reflectances were in good agreement with the predictions based on the characteristic matrix theory.     

Electrochemical characterization of nanoporous films fabricated from a polystyrene-poly(methylmethacrylate) diblock copolymer: monitoring the removal of the PMMA domains and exploring the functional groups on the nanopore surface

Cyclic voltammetry (CV) was used to assess fabrication of a nanoporous film from a polystyrene-poly(methyl methacrylate) diblock copolymer (PS-b-PMMA) and also to explore the surface functional groups on the resulting nanopores. Polymer films containing vertically aligned cylindrical nanoscale pores (ca. 10 nm in pore radius, 20-30 nm in film thickness) were prepared on gold substrates by removing the cylindrical PMMA domains from PS-b-PMMA films via UV irradiation and subsequent acetic acid treatment. CV measurements provided a simple means for monitoring the extent of the removal of the PMMA domains and for assessing the formation of a recessed nanodisk-array electrode (RNE) structure. The resulting RNEs exhibited a decrease in redox current of anionic Fe(CN)6(3-) with increasing solution pH from 4.6 to 6.3 and a negligible change in CV of uncharged 1,1'-ferrocenedimethanol. The decrease in redox current of Fe(CN)6(3-) at the higher pH was due to electrostatic repulsion between Fe(CN)6(3-) and the electrical double layer formed in the neighborhood of the negatively charged nanopore surface. Indeed, the reduction of effective pore radius measured from CVs of Fe(CN)6(3-) was correlated to the change in the thickness of the electrical double layer. The pH range that showed the decrease in redox current of Fe(CN)6(3-) was consistent with the presence of -COOH groups on the nanopore surface, although they were not detected using Fourier transform infrared spectra of etched PS-b-PMMA films.     

Radiation‐induced fabrication of polymer nanoporous materials from microphase‐separated structure of diblock copolymers as a template

Polymer nanoporous materials with periodic cylindrical holes were fabricated from microphase‐separated structure of diblock copolymers consisting of a radiation‐crosslinking polymer and a radiation‐degrading polymer through simultaneous crosslinking and degradation by γ‐irradiation. A polybutadiene‐block‐poly(methyl methacrylate) (PB‐b‐PMMA) diblock copolymer film that self‐assembles into hexagonally packed poly(methyl methacrylate) cylinders in polybutadiene matrix was irradiated with γ‐rays. Solubility test, IR spectroscopy, and TEM and SEM observations for this copolymer film in comparison with a polystyrene‐block‐poly(methyl methacrylate) diblock copolymer film revealed that poly(methyl methacrylate) domains were removed by γ‐irradiation and succeeding solvent washing to form cylindrical holes within polybutadiene matrix, which was rigidified by radiation crosslinking. Thus, it was demonstrated that nanoporous materials can be prepared by γ‐irradiation, maintaining the original structure of PB‐b‐PMMA diblock copolymer film. © 2007 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 5916–5922, 2007     

Synthesis and self-assembly of dynamic covalent block copolymers: towards a general route to pore-functionalized membranes

A diblock copolymer is designed to have incompatible blocks, unsymmetrical block lengths, and a reversible linkage. This copolymer self-assembles into nanostructured cylindrical morphology in thin films. Removal of the nanosized cylinders by breaking the reversible linkage then affords nanoporous membranes featuring a chemically reactive functionality in the pores.     

Highly Ordered Nanoporous Films from Supramolecular Diblock Copolymers with Hydrogen‐Bonding Junctions

We designed efficient precursors that combine complementary associative groups with exceptional binding affinities and thiocarbonylthio moieties enabling precise RAFT polymerization. Well defined PS and PMMA supramolecular polymers with molecular weights up to 30 kg mol^?1 are synthesized and shown to form highly stable supramolecular diblock copolymers (BCPs) when mixed, in non‐polar solvents or in the bulk. Hierarchical self‐assembly of such supramolecular BCPs by thermal annealing affords morphologies with excellent lateral order, comparable to features expected from covalent diblock copolymer analogues. Simple washing of the resulting materials with protic solvents disrupts the supramolecular association and selectively dissolves one polymer, affording a straightforward process for preparing well‐ordered nanoporous materials without resorting to crosslinking or invasive chemical degradations.     

Microphase separation in thin films of supramolecular assemblies composed of a triblock copolymer and low-molecular-weight additive

The phase behavior of supramolecular assemblies (SMAs) formed by poly(4-vinylpyridine)-block-polystyrene-block-poly(4-vinylpyridine) (P4VP-b-PS-b-P4VP) triblock copolymer with 2-(4′-hydroxybenzeneazo)benzoic acid (HABA) was investigated with respect to the molar ratio (X) between HABA and 4VP monomer unit in bulk as well as in thin films. The results were compared with SMAs formed by a PS-b-P4VP diblock copolymer of similar composition as the triblock but half the molecular weight to ascertain the effect of molecular architecture on microphase separation. In bulk, both the di- and triblock SMAs showed composition-dependent morphological transitions, which could be tuned by HABA/4VP molar ratio. The domain spacing of the SMA was not significantly affected by the molecular architecture of the constituting block copolymers. In thin films also, both the di- and triblock SMAs showed more or less similar morphological transitions depending on X. Interestingly, the domain orientation of the cylindrical or lamellar microdomains in the SMAs was influenced by the molecular architecture of the block copolymer. After chloroform annealing, although the diblock SMAs showed in-plane orientation of the domains, triblock SMAs showed perpendicular domain orientation. The perpendicular orientation of the microdomains in triblock was favored because it allowed the mid-PS blocks to acquire normal distribution of loop and bridged conformations. Furthermore, the orientation of the lamellar and cylindrical microdomains of the diblock SMAs was found to switch to perpendicular orientation after annealing in 1,4-dioxane vapors. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 1594–1605, 2010     

Morphologies in solvent-annealed thin films of symmetric diblock copolymer

We have systematically studied the thin film morphologies of symmetric poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer after annealing to solvents with varying selectivity. Upon neutral solvent vapor annealing, terraced morphology is observed without any lateral structures on the surfaces. When using PS-selective solvent annealing, the film exhibits macroscopically flat with a disordered micellar structure. While PMMA-selective solvent annealing leads to the dewetting of the film with fractal-like holes, with highly ordered nanoscale depressions in the region of undewetted films. In addition, when decreasing the swelling degree of the film in the case of PMMA-selective solvent annealing, hills and valleys are observed with the coexistence of highly ordered nanoscale spheres and stripes on the surface, in contrast to the case of higher swelling degree. The differences are explained qualitatively on the basis of polymer-solvent interaction parameters of the different components.     

Robust control of microdomain orientation in thin films of block copolymers by zone casting

Block copolymers with chemically immiscible segments exhibit a variety of microphase-separated nanostructures on the scale of 10-100 nm. Controlling the orientation of these microphase separated nanostructures is vital in many applications such as lithography, membranes, data storage, and so forth. Typical strategies involve the use of external fields or patterned substrates. Here, we report a robust zone casting technique to achieve highly ordered thin films of block copolymers on centimeter-scale substrates. The robustness of this technique is its powerful control on diverse morphologies and exceptional tolerance on versatility of block copolymer chemistry as well as allowance of a wide spectrum of substrates. We demonstrate that perpendicular orientations with respect to the surface are achieved for block copolymers with both lamellar and cylindrical morphologies by controlling solution casting rate, temperatures, and block copolymer chemical structures. Thin films of both noncrystalline and crystalline block copolymers exhibit excellent orientational order and lateral order. However, the lateral order in the thin films of crystalline block copolymers shows dependence on casting temperature and melting temperature of the crystalline segment. Remarkably, all the ordering is independent of the substrates on which the block copolymer films are cast.     

Ordering transition of block copolymer films

It is well-known that a bulk, symmetric, A-b-B diblock copolymer forms a lamellar morphology, with period L, below an order-disorder transition (T(ODT)) temperature, for chiN < 10.5; chi is the Flory-Huggins interaction parameter and N is the degree of polymerization of the copolymer. The ordering temperatures of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) thin film diblock copolymers of thickness h 相似文献   

Interfacial behaviors of PMMA-PEO block copolymers at the air/water interface

Amphiphilic block copolymers are attracting con-siderable attention because they exhibit unique self- assembly properties in selective organic solvents[1―4]. Semicrystalline poly(ethylene oxide) (PEO), having many interesting physicochemical properties s…     

Nanohole structure prepared by a polystyrene-block-poly(methyl methacrylate)/poly(methyl methacrylate) mixture film

Cylindrical nanoporous structures were prepared by using a mixture film of polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) and PMMA homopolymer (hPMMA), and they were analyzed by transmission electron microtomography (TEMT), X-ray reflectivity (XR), and grazing incidence small-angle X-ray scattering. For this purpose, the mixture film was spin-coated onto a silicon wafer modified by a neutral brush for PS and PMMA blocks, which generates PMMA cylindrical microdomains oriented normal to the substrate. Two methods were employed to prepare nanoporous structures: (1) all of the PMMA phase (PMMA block and PMMA homopolymer) in the film was removed by UV irradiation, followed by rinsing with a selective solvent (acetic acid) to PMMA and (2) only PMMA homopolymer was removed by selective solvent etching without UV irradiation. We found via TEMT and XR that the nanoporous structure in the film prepared by UV irradiation exhibited almost perfect cylindrical shape throughout the entire film thickness. However, when the film was rinsed with a selective solvent, nanoporous structures were not straight cylinders but had a funnel shape in which the diameter of nanopores located near the top of the film was larger than that located near the bottom of the film.     

SELF ASSEMBLY OF ABC TRIBLOCK COPOLYMER THIN FILMS ON A BRUSH-COATED SUBSTRATE

Self assemblies of ABC triblock copolymer thin films on a densely brush-coated substrate were investigated by using the self-consistent field theory.The middle block B and the coated polymer form one phase and the alternating phase A and phase C occur when the film is very thin either for the neutral or selective hard surface(which is opposite to the brushcoated substrate).The lamellar phase is stable on the hard surface when it is neutral and interestingly,the short block tends to stay on this hard surf...     

Study of self-assembly of symmetric coil-rod-coil ABA-type triblock copolymers by self-consistent field lattice method

The self-assembly of symmetric coil-rod-coil ABA-type triblock copolymer melts is studied by applying self-consistent field lattice techniques in a three-dimensional space. The self-assembled ordered structures differ significantly with the variation of the volume fraction of the rod component, which include lamellar, wave lamellar, gyroid, perforated lamellar, cylindrical, and spherical-like phases. To understand the physical essence of these phases and the regimes of occurrence, we construct the phase diagram, which matches qualitatively with the existing experimental results. Compared with the coil-rod AB diblock copolymer, our results revealed that the interfacial grafting density of the separating rod and coil segments shows important influence on the self-assembly behaviors of symmetric coil-rod-coil ABA triblock copolymer melts. We found that the order-disorder transition point changes from f(rod)=0.5 for AB diblock copolymers to f(rod)=0.6 for ABA triblock copolymers. Our results also show that the spherical-like and cylindrical phases occupy most of the region in the phase diagram, and the lamellar phase is found stable only at the high volume fraction of the rod.