Contact instability of thin elastic films on patterned substrates

The free surface of a soft elastic film becomes unstable and forms an isotropic labyrinth pattern when a rigid flat plate is brought into adhesive contact with the film. These patterns have a characteristic wavelength, lambda approximately 3H, where H is the film thickness. We show that these random structures can be ordered, modulated, and aligned by depositing the elastic film (cross-linked polydimethylsiloxane) on a patterned substrate and by bringing the free surface of the film in increasing adhesive contact with a flat stamp. Interestingly, the influence of the substrate "bleeds" through the film to its free surface. It becomes possible to generate complex two-dimensional ordered structures such as an array of femtoliter beakers even by using a simple one-dimensional stripe patterned substrate when the instability wavelength, lambda approximately 3H, nearly matches the substrate pattern periodicity. The free surface morphology is modulated in situ by merely varying the stamp-surface separation distance. The free surface structures originating from the elastic contact instability can also be made permanent by the UV-ozone induced oxidation and stiffening.     

Stamp collapse in soft lithography

We have studied the so-called roof collapse in soft lithography. Roof collapse is due to the adhesion between the PDMS stamp and substrate, and it may affect the quality of soft lithography. Our analysis accounts for the interactions of multiple punches and the effect of elastic mismatch between the PDMS stamp and substrate. A scaling law among the stamp modulus, punch height and spacing, and work of adhesion between the stamp and substrate is established. Such a scaling law leads to a simple criterion against the unwanted roof collapse. The present study agrees well with the experimental data.     

Edge spreading lithography and its application to the fabrication of mesoscopic gold and silver rings

A new form of edge lithography, edge spreading lithography (ESL), has been demonstrated and applied to the formation of coinage metal rings. In this process, alkanethiols are delivered from a flat PDMS stamp to the surface of a metal film through a two-dimensional array of spherical silica colloids. The thiols further spread on the metal surface, forming highly ordered SAMs in the form of a ring pattern. Following lift-off of beads, the pattern in the SAMs can be transferred into the metal film through wet chemical etching, with SAMs serving as the resist. The dimensions of the rings can be readily controlled by several parameters such as the beads diameter, the concentration of the thiol solution, and the contact time between the stamp and the silica beads.     

Photopatternable silicon elastomers with enhanced mechanical properties for high-fidelity nanoresolution soft lithography

Soft lithography has been widely used in stamping and printing processes for microfabrication as a low cost alternative to photolithography. However, conventional poly(dimethyl)siloxane (PDMS) stamp materials have limitations, especially in the submicrometer range, due to their low physical toughness and requirements for thermocuring. A new version of functional stamp materials with adjustable physical toughness has been developed for advanced soft lithography. We thus demonstrate here its photopatternability and nanoresolution soft lithography, which have proven to be difficult using commercial stamp materials.     

Replication of vertical features smaller than 2 nm by soft lithography

This communication demonstrates a simple, soft lithographic approach to the replication and metrology of nanoscale vertical displacements. We patterned test structures with regular patterns that minimize artifacts in measurements by atomic force microscopy. A composite stamp of poly(dimethylsiloxane) (PDMS) molded against the original test structure served as a template to generate polyurethane replicas. We replicated vertical displacements down to approximately 1.5 nm. This replication demonstrates the capability of soft lithography to reproduce features with dimensions similar to those of large molecules.     

薄层软刻蚀法制备PMMA微图案结构

对现有的软刻蚀方法提出了改进,让其与压印技术及毛细力刻蚀技术相结合形成一种薄层软刻蚀技术,并以这种技术制备出PMMA薄膜微图案化结构.在30 mm/h的拉膜速度以及弹性印章表面图形深度确定不变的情况下,PMMA流体能够完全填充到弹性印章的微通道中,SEM和光学显微镜照片证明得到的PMMA微图案是相互分离的.因此,薄层软刻蚀技术可以克服普通微模塑方法制备分离图形困难和纳米压印技术中需要使用巨大机械压力的缺点.     

Adhesion and debonding of soft elastic films: crack patterns, metastable pathways, and forces

We study the phenomenon of debonding in a thin soft elastic film sandwiched between two rigid plates as one of the plates is brought into intimate contact and then pulled away from contact proximity by application of a normal force. Nonlinear simulations based on minimization of total energy (composed of stabilizing elastic strain energy and destabilizing adhesive interaction energy) are employed to address the problems of contact hysteresis, cavitation, crack morphology, variation of contact area, snap-off distance, pull-off force, work done, and energy loss. Below a critical distance (d(c)) upon approach, simulations show the formation of columnar structures and nonrandom, regularly arranged nanocavities at the soft interface at a length scale of approximately 3h (h being the thickness of the film). The persistence of such instability upon withdrawal (distance >d(c)) indicates a contact hysteresis, which is caused by an energy barrier that separates the metastable states of the patterned configuration and the global minimum state of the flat film. The energy and the pull-off force are found to be nonequilibrium and nonunique properties depending on the initial contact, defects, noise, etc. Three broad pathways of debonding leading to adhesive failure of the interface, depending on the stiffness of the film, step size of withdrawal, and the imposed noise, are identified: a catastrophic column collapse mode, a peeling mode involving a continuous decrease in the contact area, and a column splitting mode. The first two modes are caused by a very high stress concentration near the cavity edges. These metastable patterned configurations engender pull-off forces that are orders of magnitude smaller than that required to separate two flat surfaces from contact.     

Versatile multilevel soft lithography method with micrometer alignment using all-flexible rubber stamps and moiré fringe technique

Soft lithography has gathered wide interest for the fabrication of unconventional micrometer and nanometer-sized structures and devices. Nevertheless, accurate alignment is essential to achieve multilevel soft lithography. Because of the soft nature of the stamp materials, such as soft polydimethylsiloxane, they are susceptible to mechanical distortions, which lower the registration accuracy. To reduce the distortions we backed the stamp with a polymer foil and minimized the overall forces applied to the stamp. We furthermore employed an alignment method using additive type moiré fringe technique that is easy to implement and does not require extensive processing steps. The alignment results show less than 1 μm misalignment when the stamp is brought again onto a previously structured rigid template. When performing two consecutive lithography steps by transfer printing of thin gold films, we were able to obtain average registration accuracy of 1.3 μm over an area of 400 mm(2). This method is versatile and can be used for several soft lithography techniques. Better results can be obtained with smaller moiré gratings and the use of harder materials.     

A Simple Method for Fabricating Patterned Curvilinear Microstructures in Poly(dimethylsiloxane) by Selective Wetting

The fabrication of patterned microstructures in poly(dimethylsiloxane) (PDMS) is a prerequisite for soft lithography. Herein, curvilinear surface relief microstructures in PDMS are fabricated through a simple three‐stage approach combining microcontact printing (μCP), selective surface wetting/dewetting and replica molding (REM). First, using an original PDMS stamp (first‐generation stamp) with linear relief features, a chemical pattern on gold substrate is generated by μCP using hexadecanethiol (HDT) as an ink. Then, by a dip‐coating process, an ordered polyethylene glycol (PEG) polymer‐dot array forms on the HDT‐patterned gold substrate. Finally, based on a REM process, the PEG‐dot array on gold substrate is used to fabricate a second‐generation PDMS stamp with microcavity array, and the second‐generation PDMS stamp is used to generate third‐generation PDMS stamp with microbump array. These fabricated new‐generation stamps are utilized in μCP and in micromolding in capillaries (MIMIC), allowing the generation of surface micropatterns which cannot be obtained using the original PDMS stamp. The method will be useful in producing new‐generation PDMS stamps, especially for those who want to use soft lithography in their studies but have no access to the microfabrication facilities.     

Patterning polymerized lipid vesicles with soft lithography

The applications of soft lithography in patterning polymerized lipid vesicles of 1,2-bis(tricosa-10,12-diynoyl)-sn-glycero-3-phosphocholine on glass substrates are reported. We demonstrate that the polymerized vesicles can be used as a high molecular weight ink to be transferred from a PDMS stamp onto a glass substrate to form two-dimensional stripes with a controlled separation. By combining channel flow with dewetting within microfluidic networks, we assemble the polymerized vesicle into three-dimensional stripes and one-dimension lines on glass substrates. Atomic force microscopy shows that these patterned vesicle structures are stable on glass substrates. The simple, stable, and precise immobilization of lipid vesicles on solid substrates will open up the possibility of integrating them in biosensors and microelectronic devices.     

软模板印刷法制备超疏水性聚苯乙烯膜

首次利用软模板印刷的方法,以微米-亚微米-纳米复合结构的PDMS为软模板,在平滑聚苯乙烯表面上成功制备了同样具有微米-亚微米-纳米复合结构的超疏水表面,该表面与水的接触角高达161.2º。软模板印刷方法可以用在其它热塑性聚合物如聚丙烯、聚甲基丙烯酸甲酯和聚碳酸酯等材料上,是一种简单有效地制备超疏水性表面的方法。     

Biocatalytic microcontact printing

Immobilized biocatalytic lithography is presented as an application of soft lithography. In traditional microcontact printing, diffusion limits resolution of pattern transfer. By using an immobilized catalyst, the lateral resolution of microcontact printing would depend only on the length and flexibility of the tether (<2 nm) as opposed to diffusion (>100 nm). In the work, exonuclease reversibly immobilized on a relief-patterned stamp is used to ablate ssDNA monolayers Percent of ablation was determined via confocal fluorescence microscopy to be approximately 70%.     

Microscale features and surface chemical functionality patterned by electron beam lithography: a novel route to poly(dimethylsiloxane) (PDMS) stamp fabrication

Poly(dimethylsiloxane) (PDMS) has become a ubiquitous material for microcontact printing, yet there are few methods available to pattern a completed PDMS stamp in a single step. It is shown here that electron beam lithography (EBL) is effective in writing patterns directly onto cured PDMS stamps, thus overcoming the need for multiple patterning steps. Not only does this method allow the modification of an existing lithographic pattern, but new 3D features such as cones, pits, and channels can also be fabricated. EBL can also be used to fabricate PDMS masks for photolithography whereby 1:1 pattern transfer into a photoresist is achieved. Additionally, direct EBL writing of surface chemical features has been achieved using a PDMS stamp coated with a self-assembled monolayer. An electrostatic mechanism appears to be operative in the EBL patterning process, as supported by calculations, thermogravimetric analysis, time-of-flight secondary ion mass spectroscopy, optical and atomic force microscopy, and chemical functionalization assays.     

Construction of microfluidic chips using polydimethylsiloxane for adhesive bonding

A thin layer of polydimethylsiloxane (PDMS) prepolymer, which is coated on a glass slide, is transferred onto the embossed area surfaces of a patterned substrate. This coated substrate is brought into contact with a flat plate, and the two structures are permanently bonded to form a sealed fluidic system by thermocuring (60 degrees C for 30 min) the prepolymer. The PDMS exists only at the contact area of the two surfaces with a negligible portion exposed to the microfluidic channel. This method is demonstrated by bonding microfluidic channels of two representative soft materials (PDMS substrate on a PDMS plate), and two representative hard materials (glass substrate on a glass plate). The effects of the adhesive layer on the electroosmotic flow (EOF) in glass channels are calculated and compared with the experimental results of a CE separation. For a channel with a size of approximately 10 to 500 microm, a approximately 200-500 nm thick adhesive layer creates a bond without voids or excess material and has little effect on the EOF rate. The major advantages of this bonding method are its generality and its ease of use.     

"Contact" of nanoscale stiff films

We investigated the contact behaviors of a nanoscopic stiff thin film bonded to a compliant substrate and derived an analytical solution for determining the elastic modulus of thin films. Microscopic contact deformations of the gold and polydopamine thin films (<200 nm) coated on polydimethylsiloxane elastomers were measured by indenting a soft tip and analyzed in the framework of the classical plate theory and Johnson-Kendall-Roberts (JKR) contact mechanics. The analysis of this thin film contact mechanics focused on the bending and stretching resistance of thin films and is fundamentally different from conventional indentation measurements where the focus is on the fracture and compression of the films. The analytical solution of the elastic modulus of nanoscopic thin films was validated experimentally using 50 and 100 nm gold thin films coated on polydimethylsiloxane elastomers. The technical application of this analysis was further demonstrated by measuring the elastic modulus of thin films of polydopamine, a recently discovered biomimetic universal coating material. Furthermore, the method presented here is able to quantify the contact behaviors of nanoscopic thin films, effectively providing fundamental design parameters, the elastic modulus, and the work of adhesion, crucial for transferring them effectively into practical applications.     

Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry.     

Direct printing of self-assembled lipid tubules on substrates

Lipid tubules formed by rolled-up bilayer sheets have shown promise in drug delivery systems, nanofluidics, and microelectronics. Here we report a method for directly printing lipid tubules on substrates. Preformed lipid tubules of 1,2-bis(tricosa-10,12-diynoyl)-sn-glycero-3-phosphocholine are aligned in the recessed channels of a thin poly(dimethylsiloxane) (PDMS) stamp. The aligned lipid tubules then serve as an "ink" for microcontact printing. We demonstrate that two-dimensional (2-D) arrays of aligned lipid tubules can be transferred onto planar, patterned, and curved substrates from the recessed channels of the PDMS stamp by bringing the tubule-inked PDMS stamp into contact with these substrates. We show that the 2-D array of aligned lipid tubules can be transcribed into a 2-D array of aligned silica cylinders through templated sol-gel condensation of tetraethoxysilane.     

Inverted microcontact printing on polystyrene-block-poly(tert-butyl acrylate) films: a versatile approach to fabricate structured biointerfaces across the length scales

The combination of the recently introduced soft lithographic technique of inverted microcontact printing (i-muCP) and spin-coated films of polystyrene- block-poly( tert-butyl acrylate) (PS 690- b-P tBA 1210) as a reactive platform is shown to yield a versatile approach for the facile fabrication of topographically structured and chemically patterned biointerfaces with characteristic spacings and distances that cross many orders of magnitude. The shortcomings of conventional muCP in printing of small features with large spacings, due to the collapse of small or high aspect ratio stamp structures, are circumvented in i-muCP by printing reactants using a featureless elastomeric stamp onto a topographically structured reactive polymer film. Prior to molecular transfer, the substrate-supported PS 690- b-P tBA 1210 films were structured by imprint lithography resulting in lateral and vertical feature sizes between >50 microm-150 nm and >1.0 microm-18 nm, respectively. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and water contact angle measurements provided evidence for the absence of surface chemical transformations during the imprinting step. Following the previously established hydrolysis and activation protocol with trifluoroacetic acid and N-hydroxysuccinimide, amino end-functionalized poly(ethylene glycol) (PEG-NH 2), as well as bovine serum albumin and fibronectin as model proteins, were successfully transferred by i-muCP and coupled covalently. As shown, i-muCP yields increased PEG coverages and thus improved performance in suppressing nonspecific adsorption of proteins by exploiting the high local concentrations in the micro- and nanocontacts during molecular transfer. The i-muCP strategy provides access to versatile biointerface platforms patterned across the length scales, as shown for guided cancer cell adhesion, which opens the pathway for systematic cell-surface interaction studies.     

Creating patterned carbon nanotube catalysts through the microcontact printing of block copolymer micellar thin films

We report a route for synthesizing patterned carbon nanotube (CNT) catalysts through the microcontact printing of iron-loaded poly(styrene-block-acrylic acid) (PS-b-PAA) micellar solutions onto silicon wafers coated with thin aluminum oxide (Al(2)O(3)) layers. The amphiphilic block copolymer, PS-b-PAA, forms spherical micelles in toluene that can form quasi-hexagonal arrays of spherical PAA domains within a PS matrix when deposited onto a substrate. In this report, we dip a poly(dimethylsiloxane) (PDMS) molded stamp into an iron-loaded micellar solution to create a thin film on the PDMS features. The PDMS stamp is then put in contact with a substrate, and uniaxial compressive stress is applied to transfer the micellar thin film from the PDMS stamp onto the substrate in a defined pattern. The polymer is then removed by oxygen plasma etching to leave a patterned iron oxide nanocluster array on the substrate. Using these catalysts, we achieve patterned vertical growth of multiwalled CNTs, where the CNTs maintain the fidelity of the patterned catalyst, forming high-aspect-ratio standing structures.     

A benchtop method for the fabrication and patterning of nanoscale structures on polymers

A benchtop method for the facile production of nanoscale metal structures on polymers is demonstrated. This approach allows for the design and patterning of a wide range of metallic structures on inexpensive polymer surfaces, affording the fabrication of nanoscaled platforms for use in the design of sensors, actuators, and disposable electronic and photonic devices. Numerous structures, from simple nanowires to multilayered metallic gratings, are demonstrated, with sizes ranging from microns to the nanoscale. The process involves molding a malleable metal film deposited on a rigid substrate such as mica, by the compression of a plastic polymer stamp with the desired pattern against the metal film. While under compression, an etchant is then used to modify the metal. Upon separation of the stamp from the support, micro- to nanoscaled metallic structures are found on the stamp and/or on the substrate. The sizes of the structures formed depend on the sizes of the features on the stamp but can be fine-tuned by about 4-fold through variations in both pressure and duration of etching. Also, depending on the processing, multiple dimension metallic structures can be obtained simultaneously in a single stamping procedure. The metallic structures formed on the stamp can also be subsequently transferred to another surface allowing for the construction of multilayered materials such as band gap gratings or the application of electrical contacts. Using this approach, fabrication of both simple and complex micro- to nanoscaled structures can be accomplished by most any researcher as even the grating structure of commercial compact disks may be used as stamps, eliminating the requirement of expensive lithographic processes to form simple structures.