X波段接收机低噪声放大器设计

设计了一种采用Ga As p HEMT管芯的小型化宽带超低噪声放大器,利用ADS微波仿真软件进行原理图设计、优化。其中管芯采用单电源加电,避免了双电源输入端隔直电容对噪声的引入;另外,电路结构采用电阻负反馈拓展了带宽,同时也增加了电路的稳定性,实现较好的输入输出匹配特性。设计的低噪放在7GHz—10GHz频率范围内噪声系数小于0.7d B,增益大于30d B,输入输出回波损耗小于-10d B。低噪声放大器的尺寸仅为23mm×18mm×10mm。     

生物分子膜门电极AlGaN/GaN高电子迁移率晶体管(HEMT)生物传感器研究

设计并制作了结构尺寸为毫米量级的AlGaN/GaN高电子迁移率晶体管(HEMT)生物传感器,采用数值分析的方法分析了器件传感区域长度与宽度比值及待测物调控二维电子气(2DEG)距离与感测信号之间的关系,给出了结构尺寸为毫米量级的AlGaN/GaN HEMT生物传感器的设计依据,以不同浓度的前列腺特异性抗原(PSA)为待测物,对制作的AlGaN/GaN HEMT生物传感器进行了初步测量,测试结果表明,在50 mV的电压下,毫米量级的AlGaN/GaN HEMT生物传感器的对PSA的探测极限低于0.1 pg/ml.实验表明毫米量级的AlGaN/GaN HEMT生物传感器具有灵敏度高,易于集成等优点,具备良好的应用前景.     

GaN基HEMT器件的缺陷研究综述

GaN基高电子迁移率晶体管(HEMT)因具有高输出功率密度、高工作频率、高工作温度等优良特性,在高频大功率等领域具有广泛应用前景。目前,HEMT器件在材料生长和工艺制备方面都取得了巨大的进步。但是,由缺陷产生的陷阱效应一直是限制其发展的重要原因。本文首先论述了HEMT器件中的表面态、界面缺陷和体缺陷所在位置及其产生的原因。然后,阐述了由陷阱效应引起的器件电流崩塌、栅延迟、漏延迟、Kink效应等现象,从器件结构设计和工艺设计角度,总结提出了改善缺陷相关问题的主要措施,其中着重总结了器件盖帽层、表面处理、钝化层和场板结构4个方面的最新研究进展。最后,探索了GaN基HEMT器件在缺陷相关问题上的未来优化方向。     

星载X频段1600 W高幅相一致性脉冲行波管放大器

空间高分辨率合成孔径雷达(SAR)系统对大功率脉冲行波管放大器的带宽、输出脉冲能力、幅相一致性提出了更高的要求,基于宽带功率合成的k W级脉冲行波管放大器技术是空间应用的关键技术问题。研究了大功率脉冲行波管放大器宽带高幅相一致性控制技术和宽带功率合成技术,提出了空间用小型化脉冲双路合成行波管放大器集成结构,在3 GHz宽带内,实现了大于95%的合成效率,多台产品相位一致性≤±10°。     

一种高功率微波宽带紧耦合偶极子阵列天线

提出了一种新型高功率微波宽带紧耦合偶极子阵列天线。在常规的紧耦合偶极子阵列天线的基础上,该阵列天线通过采用全金属结构设计、天线匹配层和密封层一体化设计以及调节天线结构的手段,获得了宽带高功率性能。仿真结果显示,在0.8～4.0 GHz的范围内,天线未扫描时的驻波比小于2;在16 mm×32 mm单元尺寸内和1个大气压的SF6气体中,功率容量达到0.12 MW;以该单元天线组成10×10阵列,100个单元总尺寸仅为160 mm×320 mm,在1个大气压的SF6气体中,功率容量可以达到12 MW,另外,该天线可实现45°的宽角扫描。该阵列天线的提出为实现高功率微波宽带天线的宽频带、大角度扫描、紧凑化、小型化以及低剖面化提供了参考。     

AlGaN/GaN HEMT器件直流扫描电流崩塌机理及其物理模型

通过对AlGaN/GaN HEMT器件直流扫描情况下电流崩塌现象和机理的分析，建立了一个AlGaN/GaN HEMT器件的直流扫描电流崩塌模型.该模型从AlGaN/GaN器件工作机理出发，综合考虑了器件结构、半导体表面与界面，以及量子阱特殊结构对电流崩塌的影响.实验反复证明了该模型与实验结果有良好的一致性. 关键词： AlGaN/GaN HEMT 直流扫描 电流崩塌 模型     

基于GaN基HEMT结构的传感器件研究进展

GaN基高电子迁移率晶体管(HEMT)具有异质结界面处的高二维电子气(2DEG)浓度、宽禁带、高击穿电压、稳定的化学性质以及高的电子迁移率,这些特性使它发展起来的传感器件在灵敏度、响应速度、探测面、适应恶劣环境上具备了显著的优点。本文首先围绕GaN基HEMT的基本结构发展起来的两类研究成熟的传感器,对其结构、工作机理、工作进展以及优缺点进行了探讨与总结;而后,着重从改变器件材料及优化栅结构与栅上材料的角度,阐述了3种GaN基HEMT新型传感器的最新进展,其中,从材料体系、关键工艺、探测结构、原理及新机理方面重点介绍了GaN基HEMT光探测器;最后,探索了GaN基HEMT传感器件未来的发展方向。     

基于感光栅极GaN高迁移率晶体管的新型探测器制备与优化（英文）

利用GaN高电子迁移率晶体管(HEMT)的栅控特性和锆钛酸铅(PZT)铁电薄膜的光伏效应,在HEMT器件的栅极处沉积一层PZT铁电薄膜,提出了一种新型的(光敏感层/HEMT)探测结构.为制备出光伏性能优异的薄膜,对不同的溅射功率和退火温度制备的PZT铁电薄膜进行表面形貌和铁电性能分析.发现200 W溅射功率、700℃的退火温度制备的薄膜表面晶粒生长明显,剩余极化强度为38.0μC·cm-2.工艺制备GaN基HEMT器件并把PZT薄膜沉积到器件栅极上.在无光和365nm紫外光照射下对有、无铁电薄膜的HEMT探测器的输出特性进行测试.结果显示,在光照时,有铁电薄膜的HEMT器件相较于无光时,源-漏饱和电压最多降低3.55V,饱和电流最多增加5.84mA,表明新型感光栅极HEMT探测器对紫外光具有优异的探测效果.为实现对新型探测器的结构进行优化的目的,对栅长为1μm、2μm和3μm等不同栅长的探测器进行光照测试.结果表明,在紫外光照射下,三种探测器的漏极饱和电流分别为23mA、20mA和17mA,所以栅长越长器件的饱和电流越小,探测性能越差.     

具有高开启/关断电流比的Al_2O_3/AlGaN/GaN金属氧化物半导体高电子迁移率晶体管（英文）

采用原子层淀积(ALD)方法,制备了Al_2O_3为栅介质的高性能AlG aN/GaN金属氧化物半导体高电子迁移率晶体管(MOS-HEMT)。在栅压为-20 V时,MOS-HEMT的栅漏电比Schottky-gate HEMT的栅漏电低4个数量级以上。在栅压为+2 V时,Schottky-gate HEMT的栅漏电为191μA;在栅压为+20 V时,MOS-HEMT的栅漏电仅为23.6 nA,比同样尺寸的Schottky-gate HEMT的栅漏电低将近7个数量级。AlG aN/GaN MOSHEMT的栅压摆幅达到了±20 V。在栅压Vgs=0 V时,MOS-HEMT的饱和电流密度达到了646 mA/mm,相比Schottky-gate HEMT的饱和电流密度(277 mA/mm)提高了133%。栅漏间距为10μm的AlG aN/GaN MOSHEMT器件在栅压为+3 V时的最大饱和输出电流达到680 mA/mm,特征导通电阻为1.47 mΩ·cm2。Schottky-gate HEMT的开启与关断电流比仅为105,MOS-HEMT的开启与关断电流比超过了109,超出了Schottkygate HEMT器件4个数量级,原因是栅漏电的降低提高了MOS-HEMT的开启与关断电流比。在Vgs=-14 V时,栅漏间距为10μm的AlG aN/GaN MOS-HEMT的关断击穿电压为640 V,关断泄露电流为27μA/mm。     

AlGaN/GaN双异质结F注入增强型高电子迁移率晶体管

理论模拟了不同GaN沟道厚度的双异质结(AlGaN/GaN/AlGaN/GaN)材料对高电子迁移率晶体管(HEMT)特性的影响,并模拟了不同F注入剂量下用该材料制作的增强型器件的特性差异.采用双异质结材料,结合F注入工艺成功地研制出了较高正向阈值电压的增强型HEMT器件.实验研究了三种GaN沟道厚度制作的增强型器件直流特性的差异,与模拟结果进行了对比验证.采用降低的F注入等离子体功率,减小了等离子体处理工艺对器件沟道迁移率的损伤,研制出的器件未经高温退火即实现了较高的跨导和饱和电流特性.对14 nm GaN沟道厚度的器件进行了阈值电压温度稳定性和栅泄漏电流的比较研究,并且分析了双异质结器件的漏致势垒降低效应.     

Practical mm-Wave pHEMT Frequency Multiplier

Details on a broadband MMIC frequency doubler targeting the MVDS market are presented. The design evolution from an individual pHEMT device to the complete practical doubler realisation is discussed. The doubler MMIC, which has been fabricated using the GMMT H40 GaAs process, has been evaluated in a customised package. An output power of +10 dBm at 40 GHz has been achieved with an associated conversion gain of 1.5 dB. The measured and predicted performance responses are compared. This chip is ideally suited to use in a number of emerging mm-wave applications.     

A GaAs planar Schottky varactor diode for left-handed nonlinear transmission line applications

The left-handed nonlinear transmission line(LH-NLTL) based on monolithic microwave integrated circuit(MMIC) technology possesses significant advantages such as wide frequency band,high operating frequency,high conversion efficiency,and applications in millimeter and submillimeter wave frequency multiplier.The planar Schottky varactor diode(PSVD) is a major limitation to the performance of the LH-NLTL frequency multiplier as a nonlinear component.The design and the fabrication of the diode for such an application are presented.An accurate large-signal model of the diode is proposed.A 16 GHz-39.6 GHz LH-NLTL frequency doubler using our large-signal model is reported for the first time.The measured maximum output powers of the 2nd harmonic are up to 8 dBm at 26.4 GHz,and above 0 dBm from 16 GHz to 39.6 GHz when the input power is 20 dBm.The application of the LH-NLTL frequency doubler furthermore validates the accuracy of the large-signal model of the PSVD.     

A Millimeter-wave Power Combining Amplifier Based on a Waveguide-Microstrip E-Plane Dual-probe Four-way Power Combining Network

This paper presents a new millimeter-wave solid-state power combining amplifier, which is based on a waveguide-microstrip E-plane dual-probe four-way power combining network. With a compact structure and an easy fabrication process, this combining network fulfils waveguide-to-microstrip transition and power combining simultaneously, and shows a broad-band low loss performance in Ka-band. With good thermal property, a four-way high power combining amplifier is fabricated. The measured output power is more than 40 dBm in 32–37 GHz, and the highest output power, 15.8 W, occurs at 32 GHz. The corresponding combining efficiency is more than 77% in 32–38 GHz.     

An improved EEHEMT model for kink effect on AlGaN/GaN HEMT

In this paper, a new current expression based on both the direct currect(DC) characteristics of the AlGaN/GaN high election mobility transistor(HEMT) and the hyperbolic tangent function tanh is proposed, by which we can describe the kink effect of the AlGaN/GaN HEMT well. Then, an improved EEHEMT model including the proposed current expression is presented. The simulated and measured results of I–V, S-parameter, and radio frequency(RF) large-signal characteristics are compared for a self-developed on-wafer AlGaN/GaN HEMT with ten gate fingers each being 0.4-μm long and 125-μm wide(Such an AlGaN/GaN HEMT is denoted as AlGaN/GaN HEMT(10 × 125 μm)). The improved large signal model simulates the I–V characteristic much more accurately than the original one, and its transconductance and RF characteristics are also in excellent agreement with the measured data.     

Ku波段微波单片集成电路6位数字衰减器设计

基于GaAs 0.25 μm增强/耗尽型（E/D）赝配高电子迁移率晶体管（pHEMT）工艺,研制了一款Ku波段6位数字衰减器微波单片集成电路（MMIC）。该6位数字衰减器由6个基本衰减位级联组成,可实现最大衰减量为31.5 dB、步进为0.5 dB的衰减量控制。采用简化的T型衰减结构,实现了0.5 dB和1 dB的衰减位。16 dB衰减位采用开关型衰减拓扑,在提高衰减平坦度的同时,有效降低其附加相移。测试结果表明,在12～18 GHz的频率内,数字衰减器衰减64态均方根误差（RMS）小于0.25 dB,附加相移为?0.5°～＋9.5°,插入损耗小于4.9 dB,输入输出驻波比均小于1.5∶1。芯片尺寸为3.00 mm×0.75 mm。该芯片电路具有宽频带、高衰减精度、小尺寸的特点,主要用于微波相控阵收发组件、无线通讯等领域。     

High linearity AlGaN/GaN HEMT with double-Vth coupling for millimeter-wave applications

We demonstrated an AlGaN/GaN high electron mobility transistor(HEMT)namely double-Vthcoupling HEMT(DVC-HEMT)fabricated by connecting different threshold voltage(Vth)values including the slant recess element and planar element in parallel along the gate width with N;O plasma treatment on the gate region.The comparative studies of DVC-HEMT and Fin-like HEMT fabricated on the same wafer show significantly improved linearity of transconductance(Gm)and radio frequency(RF)output signal characteristics in DVC-HEMT.The fabricated device shows the transconductance plateau larger than 7 V,which yields a flattened fT/fmax-gate bias dependence.At the operating frequency of 30 GHz,the peak power-added efficiency(PAE)of 41%accompanied by the power density(Pout)of 5.3 W/mm.Furthermore,the proposed architecture also features an exceptional linearity performance with 1-d B compression point(P1 d B)of 28 d Bm,whereas that of the Fin-like HEMT is 25.2 d Bm.The device demonstrated in this article has great potential to be a new paradigm for millimeter-wave application where high linearity is essential.     

High-power SiC MESFET using a dual p-buffer layer for an S-band power amplifier

A silicon carbide (SiC) based metal semiconductor field effect transistor (MESFET) is fabricated by using a standard SiC MESFET structure with the application of a dual p-buffer layer and a multi-recessed gate to the process for an S-band power amplifier. The lower doped upper-buffer layer serves to maintain the channel current, while the higher doped lower-buffer layer is used to provide excellent electron confinement in the channel layer. A 20-mm gate periphery SiC MESFET biased at a drain voltage of 85 V demonstrates a pulsed wave saturated output power of 94 W, a linear gain of 11.7 dB, and a maximum power added efficiency of 24.3% at 3.4 GHz. These results are improved compared with those of the conventional single p-buffer MESFET fabricated in this work using the same process. A radio-frequency power output greater than 4.7 W/mm is achieved, showing the potential as a high-voltage operation device for high-power solid-state amplifier applications.     

High-power SiC MESFET using dual p-buffer layer for S-band power amplifier

Silicon carbide (SiC) based metal semiconductor field effect transistor (MESFET) is fabricated by using a standard SiC MESFET structure with the application of a dual p-buffer layer and a multi-recessed gate to the process for S-band power amplifier. The lower doped upper-buffer layer serves to maintain the channel current, while the higher doped lower-buffer layer is used to provide excellent electron confinement in the channel layer. A 20-mm gate periphery SiC MESFET biased at a drain voltage of 85 V demonstrates a pulsed wave saturated output power of 94 W, a linear gain of 11.7 dB, and a maximum power added efficiency of 24.3% at 3.4 GHz. These results are improved compared with those of the conventional single p-buffer MESFET fabricated in this work using the same process. A radio-frequency power output greater than 4.7 W/mm is achieved, showing the potential as a high-voltage operation device for high-power solid-state amplifier applications.     

D波段功率放大器设计

基于0.13 m SiGe BiCMOS工艺, 研究和设计了一种D波段功率放大器芯片。该放大器芯片用了四个功率放大器单元和两个T型结网络构成。功率放大器单元采用了三级的cascode电路结构。低损耗的片上T型结网络既能起到片上功率合成/分配的功能, 又能对输入输出进行阻抗匹配。对电路结构进行了设计、流片验证和测试。采用微组装工艺将该芯片封装成为波导模块。小信号测试结果表明:该功放芯片工作频率为125~150 GHz, 最高增益在131 GHz为21 dB, 最低增益在150 GHz为17 dB, 通带内S22小于-7 dB, S11小于-10 dB。大信号测试结果表明:该功放模块在128~146 GHz带内输出功率都大于13 dBm, 在139 GHz时, 具有最高输出功率为13.6 dBm, 且1 dB压缩功率为12.9 dBm。