Structural and electrical analysis of S ion bombarded p-InP(1 0 0)

The chemical state of sulfur and surface structure on low-energy S⁺ ion-treated p-InP(1 0 0) surface have been investigated by high-resolution X-ray photoelectron spectroscopy (XPS) and low-energy electron diffraction (LEED). S⁺ ion energy over the range of 10-100 eV was used to study the effect of ion energy on surface damage and the process of sulfur passivation on p-InP(1 0 0) by S⁺ ion beam bombardment. It was found that sulfur species formed on the S⁺ ion-treated surface. The S⁺ ions with energy above 50 eV were more effective in formation of In-S species, which assisted the InP surface in reconstruction into an ordered (1 × 1) structure upon annealing. After taking into account physical damage due to the process of ion bombardment, we found that 50 eV was the optimal ion energy to form In-S species in the sulfur passivation of p-InP(1 0 0). The subsequent annealing process removed donor states that were introduced during the ion bombardment of p-InP(1 0 0). Results of theoretical simulations by Transport of Ions in Materials (TRIM) are in accordance with those of experiments.     

Ar+, He+，S+离子轰击n-InP单晶表面的机理研究

通过X射线光电子能谱和低能电子衍射实验研究了10～180 eV的Ar⁺、 He⁺、S⁺离子轰击n-InP(100)表面, 发现S⁺离子轰击可以产生In-S组分,减轻离子轰击对表面的物理损伤.对于Ar⁺离子轰击后的表面,经过S⁺离子处理和加热过程以后,表面损伤得到了修复,最终得到了2×2的InP表面,进一步验证了S⁺离子对InP表面的修复作用.     

PED沉积La-Sr-Cu-O薄膜表面的有序纳米结构

采用脉冲电子束沉积(PED)技术在Si(100)衬底上生长La_Sr_Cu_O薄膜，在750℃生长温度下获得具有有序纳米结构的表面形貌.采用聚集离子束(FIB)技术对获得的纳米结构进行表征，结果表明，这种有序的纳米结构是由于Si衬底和La_Sr_Cu_O薄膜之间的热膨胀系数和晶格的 失配引起的纳米裂纹.在这些纳米裂纹处，La_Sr_Cu_O成核生长获得独立的纳米线.通过控制 这种有序的纳米结构的生长，这种有序的纳米结构可以用来构造弱连接形成的器件. 关键词： 脉冲电子束沉积 La_Sr_Cu_O薄膜 纳米结构     

Sputtering of SiC with low energy He and Ar ions under grazing incidence

The effect of low energy sputtering under grazing incidence upon the surface composition of SiC was investigated by Auger electron spectroscopy. The energy of the sputtering projectiles (He, Ar) varied from 200 to 1500?eV. Peak shifts to the higher energies with increasing argon ion energy were observed for all silicon and carbon Auger transitions. These shifts were explained by enhanced damage of the surface region within the sampling depth of the Auger electrons. The insensitivity of the Auger peak position to the energy of helium ions indicates that the damage state in the surface region does not change with the increasing energy of helium ions. An increase of the carbon concentration with the decrease of the argon energy was observed. The experiments were accompanied by dynamic Monte Carlo simulations by the TRIDYN code.     

Structure of ordered and disordered InxGa1−xP(0 0 1) surfaces prepared by metalorganic vapor phase epitaxy

Ordered and disordered InGaP(0 0 1) films were grown by metalorganic vapor-phase epitaxy and studied by low energy electron diffraction, reflectance difference spectroscopy, and X-ray photoemission spectroscopy. Both alloy surfaces were covered with a monolayer of buckled phosphorus dimers, where half of the phosphorus atoms were terminated with hydrogen. Ordered InGaP(0 0 1) appeared indium rich, and exhibited a reflectance difference spectrum like that of InP(0 0 1). These results support a model whereby the strain energy on the ordered InGaP surface is reduced by aligning the group III atoms in alternating [1 1 0] rows, with the indium and gallium bonding to the buckled-down and buckled-up phosphorus atoms, respectively.     

AES, EELS and TRIM investigation of InSb and InP compounds subjected to Ar ions bombardment

The interaction of ions with matter plays an important role in the treatment of material surfaces. In this paper we study the effect of argon ion bombardment on the InSb surface in comparison with the InP one. The Ar⁺ ions, accelerated at low energy (300 eV) lead to compositional and structural changes in InP and InSb compounds. The InP surface is more sensitive to Ar⁺ ions than that of InSb. These results are directly inferred from the qualitative Auger electron spectra (AES) and electron energy loss spectroscopy (EELS) analysis. However, these techniques alone do not allow us to determine with accuracy the disturbed depth in Ar⁺ ions of InP and InSb compounds. For this reason, we combine AES and EELS with the simulation method TRIM (transport and range of ions in matter) to show the mechanism of interaction between the ions and the InP or InSb and hence determine the disturbed depth as a function of Ar⁺ energy.     

Investigation of helium implantation induced blistering in InP

 Four-inch InP wafers were implanted with 100 keV helium ions with a dose of 5×10¹⁶ cm⁻² and subsequently annealed in air in the temperature range of 225-400°C in order to determine the blistering kinetics of these wafers. An Arrhenius plot of the blistering time as a function of reciprocal temperature revealed two different activation energies for the formation of surface blisters in InP. The activation energy was found to be 0.30 eV in the higher temperature regime of 300-400 °C and 0.74 eV in the lower temperature regime of 225-300 °C. The implantation induced damage was analyzed by cross-sectional transmission electron microscopy, which revealed a band of defects extending from 400-700 nm from the surface of InP. The damage band was found to be decorated with a large number of nanovoids having diameters between 2 and 5 nm. These nanovoids served as precursors for the formation of microcracks inside InP upon annealing, which led to the formation of surface blisters.     

In situ monitoring and benchmarking in UHV of InP/GaAsSb heterointerface reconstructions prepared via MOVPE

Thin InP layers were grown by metalorganic vapor phase epitaxy on the ternary compound GaAs_0.5Sb_0.5 lattice matched to InP(1 0 0). The heterojunctions were studied with in situ reflectance anisotropy spectroscopy and benchmarked in ultrahigh vacuum with ultraviolet and X-ray photoelectron spectroscopy and low energy electron diffraction with regard to the sharpness of the interface. During growth of GaAs_0.5Sb_0.5 an Sb-rich (1×3)-like reconstruction was observed and during stabilization with TBAs an As-rich c(4×4) reconstruction. These two different reconstructions of GaAs_0.5Sb_0.5(1 0 0), well-known from the binaries GaSb(1 0 0) and GaAs(1 0 0) respectively, were used for preparing InP/GaAs_0.5Sb_0.5 heterojunctions. The RA spectra of thin heteroepitaxial InP layers were compared to a well-established RA spectrum of MOVPE-prepared homoepitaxial, (2×1)-like reconstructed P-rich InP(1 0 0), that was used as a reference spectrum of a well defined surface. Growing InP on the c(4×4) reconstructed GaAsSb(1 0 0) surface resulted in a significantly sharper interface than InP growth on (1×3) reconstructed GaAsSb(1 0 0).     

An empirical relationship between atoms and ions sputtered from single crystal surfaces

The temperature dependence of long range order at a (100) surface of Cu₃Au has been determined by low energy electron diffraction. Auger electron spectroscopy revealed that the composition of the alloy near the surface is changed by ion bombardment, but the stoichiometric composition is reconstituted by annealing. The order parameter of the surface, which was obtained from the temperature dependence of a superlattice beam, appears to be a continuous function of temperature, unlike the bulk order parameter. The disordering process at the surface begins about 60°K below a critical temperature which is common to both the surface and the volume. Monte Carlo calculations of the order parameter as a function of temperature for a model incorporating nearest- and next-nearest-neighbor interactions reproduce the experimental results and also provide an evaluation of the change in order parameter as a function of layer number for boundary conditions corresponding to a copper or a copper-gold surface.     

二次电子分布函数对绝缘壁面稳态鞘层特性的影响

由于缺乏详细的理论计算和实验结果,在研究绝缘壁面稳态流体鞘层特性时,通常假设壁面出射的总二次电子服从单能分布(0)、半Maxwellian分布等.在单能电子轰击壁面的详细二次电子发射模型基础上,采用Monte Carlo方法统计发现:当入射电子服从Maxwellian分布时,绝缘壁面发射的总二次电子服从三温Maxwellian分布.进而,采用一维稳态流体鞘层模型进行对比研究,结果表明:二次电子分布函数对鞘边离子能量、壁面电势、电势及电子/离子密度分布等均具有明显影响;总二次电子服从三温Maxwellian分布时,临界空间电荷饱和鞘层无解,表明随着壁面总二次电子发射系数的增加,鞘层直接从经典鞘层结构过渡到反鞘层结构.     

铝中气泡在电子束辐照下的异常放热现象

在室温下,利用离子加速器对纯铝透射样品分别注入He⁺,Ne⁺和Ar⁺三种惰性气体离子,通过透射电子显微镜原位观察分析了纯铝中三种气体气泡在电子束辐照下形貌及电子衍射花样的变化.实验表明,在200 keV电子束辐照下,三种惰性气体气泡均会合并长大,亮度逐渐增强,最终破裂,气泡内部产生许多约几个纳米的黑色斑点衬度像,选区电子衍射花样由单晶斑点衍射花样变为多晶衍射环.这一现象的原因可能是气泡在电子束辐照过程中发生了放热反应,使气泡附近铝熔化后再结晶产生多晶,从而在电子衍射花样中观察到了多晶衍射环.然而,氦气泡在80 keV电子束辐照下氦气泡形貌和选区电子衍射花样保持不变,辐照后衍射花样中无多晶衍射环产生;氦氩混合气体气泡在200 keV电子束辐照下气泡形貌和选区电子衍射花样同样保持不变;这可能与电子束能量和气泡内气体压力有关.     

The influence of ion irradiation on the structure and properties of amorphous carbon films

Presented in this work are the results of investigation of the structure and electrophysical properties of amorphous carbon films. The films were produced by sputtering of graphite by ion beam and usin ion irradiation (E=0–200 eV) during condensation process. The structure of i-C films has been studied by means of transmission electron microscope. The electron diffraction data have been interpretated by employing the calculated interference function of carbon clusters. The structure of V-band was obtained from AES by deconvolution method. Experimental data shows that under ion irradiation the transformation of short range order and electron bonds is an oscillating function of ion energy E. This paper presents a theoretical calculation of tunneling neutralization cross-section of Ar⁺ ions on carbon surface. The process also has an oscillating dependence on ion energy. A significant importance of inelastic processes in carbon phase transformation has been revealed.     

Chemically prepared well-ordered InP(0 0 1) surfaces

In the present work HCl-isopropanol treated and vacuum annealed InP(0 0 1) surfaces were studied by means of low-energy electron diffraction (LEED), soft X-ray photoemission (SXPS), and reflectance anisotropy (RAS) spectroscopies. The treatment removes the natural oxide and leaves on the surface a physisorbed overlayer containing InCl_x and phosphorus. Annealing at 230 °C induces desorption of InCl_x overlayer and reveals a P-rich (2 × 1) surface. Subsequent annealing at higher temperature induces In-rich (2 × 4) surface. The structural properties of chemically prepared InP(0 0 1) surfaces were found to be similar to those obtained by decapping of As/P-capped epitaxial layers.     

The adsorption of H2O on clean and oxygen-dosed silver single crystal surfaces

The adsorption of H₂O on the surface of a single-crystal sphere of silver with exposed (111), (100) and (112) facets has been examined using ESDIAD (electron stimulated desorption ion angular distribution), LEED (low energy electron diffraction) and TDS (thermal desorption spectroscopy). The purpose of the study was (a) to examine the influence of substrate geometry for adsorption of H₂O on a metal surface for which the adsorbate-substrate interaction is weak, and (b) to study the influence of a surface impurity, oxygen, on the surface chemistry and local bonding structure of H₂O on Ag. We have found no evidence for either long-range or short-range local bonding order for adsorbed H₂O at 80 K on any of the surfaces studied. This appears to be a consequence, in part, of the lattice mismatch between the Ag crystal structure and the two-dimensional H₂O ice crystal structure. Adsorbed H₂O reacts with preadsorbed oxygen to form OH species which are bonded with the molecular axis perpendicular to Ag(111) and (100) but “inclined” on (112) surfaces, as identified using ESDIAD. The “inclined” OH species are associated with atomic steps on the (112) surface.     

Role of elastic scattering in high-order above threshold ionization

We investigate the target and intensity dependence of plateau in high-order above threshold ionization(HATI) by simulating the two-dimensional(2D) momentum distributions and the energy spectra of photoelectrons in HATI of rare gas atoms through using the quantitative rescattering model. The simulated results are compared with the existing experimental measurements. It is found that the slope of the plateau in the HATI photoelectron energy spectrum highly depends on the structure of elastic scattering differential cross section(DCS) of laser-induced returning electron with its parent ion. The investigations of the long- and short-range potential effects in the DCSs reveal that the short-range potential, which reflects the structure of the target, plays an essential role in generating the HATI photoelectron spectra.     

低能电子显微术及其应用

低能电子显微术是新发展起来的一种显微探测技术。它的特点是利用低能（１－３０ｅＶ）电子的弹性背散射使表面实空间实时成像，具有高的横向（１５ｎｍ）和纵向（原子级）分辩率，且易与低能电子衍射及其他电子显微术相结合。近年来它已有效地应用于金属和半导体表面的形貌观测、表面相变、吸附、反应及生长过程的研究。     

Sputtering of compound semiconductor surfaces. II. Compositional changes and radiation-induced topography and damage

Ion bombardment often leads to compositional changes in the surface layers of multicomponent targets. Such changes due to noble gas ion sputtering are discussed for InP and GaAs. The analyses show that the compositional change in InP (i.e., indium enrichment) is mainly due to preferential sputtering. In the case of GaAs. the changes are due to radiation-induced diffusion and segregation effects. Brief mention is made of compositional changes in a few other systems. The discussion on sputter-induced topography development deals mainly with InP because ion bombardment leads to dramatic topographical effects in this material. Ripple development on GaAs is also briefly discussed. Radiation damage has been well researched, and its mechanism and effects usually differ substantially when going from one semiconductor group to another. Bombardment-induced damage is briefly discussed for InP, GaAs, SiC, some II-VI semiconductors, and HgCdTe.     

Incident-energy dependence of crystalline structures of ion beam deposited Au thin films

The energy dependence of crystalline structures in Au thin-film deposition processes was investigated with the use of a low-energy mass-selected ion beam system. Au films deposited on Si(100) untreated wafer surfaces by the beam system at different ion energies in the range of 20–200?eV were analyzed by atomic force microscopy (AFM), X-ray diffraction (XRD) and in-situ reflection high-energy electron diffraction (RHEED). The XRD results show that the kinetic energy provided by ion bombardment can facilitate crystal growth with specific orientations such as (100) or (110), the surfaces of which have relatively high surface energies. Our observations also suggest that each crystalline orientation appears only in a specific energy range of ion bombardment. These results indicate that Au crystalline orientations may be controlled by the ion irradiation energy during deposition processes.     

Ion beam enhanced deposition of AINxOy alloys on InP

AIN_xO_y alloy films are deposited on InP by low energy (20 eV) ion beam enhanced reactive evaporation of aluminum in ultra-high vacuum. The resistivity of the films ranges between 10¹⁵ and 10¹⁶ Ω cm and the dielectric strength exceeds 10⁶ V/cm. The energy of the ions is kept below the threshold energy (found to be in the range 20–100 eV) beyond which ion bombardment of InP surface results in irreversibly degraded electronic properties. Despite this precaution, further improvement of interface properties (implying lowering of ion energy and appropriate post-annealing schemes of the structures) are required for a full development of this technique, which is compatible with the molecular beam epitaxy technology.     

LEED structure determination of the Ni(1 1 1)(√3×√3)R30°-Sn surface

Quantitative low energy electron diffraction has been used to determine the structure of the Ni(1 1 1)(√3×√3)R30°-Sn surface phase. The results confirm that the surface layer comprises a substitutional alloy of composition Ni₂Sn as previously found by low energy ion scattering (LEIS), and also shows that there is no stacking fault at the substrate/alloy interface as has been found in (√3×√3)R30°-Sb surface alloys on Ag and Cu(1 1 1). The surface alloy layer is rumpled with the Sn atoms 0.45 ± 0.03 Å higher above the substrate than the surrounding Ni atoms. This rumpling amplitude is almost identical to that previously reported on the basis of the LEIS study. Comparison with similar results for Sn-induced surface alloy phases on Ni(1 0 0) and Ni(1 1 0) shows a clear trend to reduced rumpling with reduced surface atomic layer density, an effect which can be rationalised in terms of the different effects of valence electron charge smoothing at the surface.