以(10■5)面为籽晶的6H-SiC单晶生长与缺陷研究

本文以升华法实现了以(10(1)5)面为籽晶的6H-SiC单晶扩径生长,获得最大直径达33 mm的6H-SiC单晶.采用光学显微镜观察晶体纵切片,发现源于包裹体的沿生长方向延伸的微管发生转弯现象,转向后在(0001)面内延伸,同时籽晶内沿c轴延伸的微管也终止于生长界面.通过光学显微镜观察单晶生长表面形貌,发现(101n)面生长,随着n的增大层错密度逐渐减小,这与横切片的腐蚀结果相对应;随着微管的终止和层错的减少得到了无微管的高质量单晶区.     

6H-SiC单晶生长温度场优化及多型控制

本文模拟了升华法生长6H-SiC单晶的不同温度场,并进行了相应的生长实验.结果表明:改变石墨坩埚和感应线圈的相对位置,可以改变温度场形状;下移石墨坩埚;可以增大温度场径向温度梯度.在不同的径向温度梯度下,6H-SiC晶体分别以凹界面、平界面和凸界面生长.晶体生长界面的形状和速率影响晶体多型的产生,在平界面,生长速率小于300μm/h的晶体生长条件下,可获得无多型的高质量6H-SiC单晶.     

6H-SiC晶片的退火处理

本文在背景Ar气压力为8×104Pa、温度为1800～2000℃的条件下,对升华法生长SiC单晶的籽晶进行了原位退火处理,利用原子力显微镜和光学显微镜对退火后的6H-SiC晶片表面进行了观察,研究了退火温度和时间对晶片表面的影响.发现经过退火处理后的籽晶表面存在规则的生长台阶,有助于侧面生长模式的发展,进一步有助于台阶流生长模式的发展.通过对籽晶的退火处理,降低了螺旋生长中心的密度,从而减少多型夹杂、小角度晶界和微管等缺陷的出现,提高了晶体质量.     

高品质6英寸N型4 H-SiC单晶生长研究

PVT法生长SiC单晶生长腔的温场分布是影响晶体质量的重要因素.采用数值模拟研究了保温层和坩埚结构以及线圈位置对6英寸SiC晶体生长温场的影响,优化出了适合高品质6英寸SiC晶体生长温场分布,在此条件下生长无裂纹的6英寸N型4H-SiC晶体.用高分辨率X射线衍射、拉曼光谱和缺陷检测系统对所加工的SiC衬底片的质量进行了表征.测试结果表明,晶型为单一的4H-SiC,微管密度小于1 cm-2,电阻率范围为0.02～0.022Ω·cm,X射线摇摆曲线半高宽为21.6″.     

半绝缘SiC单晶生长和表征

使用升华法生长碳化硅(SiC)单晶,借助数值模拟方法优化温场,在不同条件下分别获得单一晶型的4H-SiC和6H-SiC单晶,利用拉曼光谱进行表征。采用V掺杂的方法,制备半绝缘SiC单晶,使用非接触式电阻率测试仪进行了测试,并对4H-SiC和6H-SiC电阻率进行了比较和分析。     

4H-SiC同质外延生长及Ti/4H-SiC肖特基二极管

利用台阶控制外延生长技术在偏晶向Si-面衬底上进行了4H-SiC的同质外延生长研究,衬底温度为1500℃,在厚度为32μm、载流子浓度为2～5×1015cm-3的外延材料上制备出了反向阻塞电压大于1kV的Ti/4H-SiC肖特基二极管,二极管的正向与反向电流的整流比(定义偏压为±1V时的电流比值)在室温下超过107,在265℃的温度下超过102,在20～265℃的温度范围内,利用电流电压测量研究了二极管的电学特性,室温下二极管的理想因子和势垒高度分别为1.33和0.905eV,开态电流密度在2.0V的偏压下达到150A/cm2,比开态电阻(Ron)为7.9mΩ·cm2,与温度的关系遵守Ron～T2.0规律.     

沿[1-100]方向升华法生长6H-SiC单晶

本文采用升华法沿着垂直于c轴方向的[1-100]方向生长6H-SiC单晶.利用光学显微镜对晶体表面及腐蚀后的晶片进行观察,发现沿[1-100]方向生长出的单晶与传统方法沿[0001]方向生长单晶有很多的不同之处,多型对于籽晶的继承性非常强,但是在生长过程中多型夹杂不会发生,该方法生长的晶体中没有发现螺位错(微管)缺陷.     

同步辐射单色光形貌术观察6H-SiC单晶中的微管缺陷

采用同步辐射单色光形貌术观察了6H-SiC单晶中的微管缺陷,发现晶片中Burgers矢量为1c的螺位错具有较高的密度.此外,还观察到对应较大Burgers矢量的微管.基于微管附近的应变场,并根据衍射几何,模拟计算了一系列具有不同Burgers矢量的微管在形貌像中的直径,计算结果与实验观察符合较好.     

沿[1 ■00]方向升华法生长6H-SiC单晶

本文采用升华法沿着垂直于c轴方向的[1 ■00]方向生长6H-SiC单晶。利用光学显微镜对晶体表面及腐蚀后的晶片进行观察,发现沿[1 ■00]方向生长出的单晶与传统方法沿[0001]方向生长单晶有很多的不同之处,多型对于籽晶的继承性非常强,但是在生长过程中多型夹杂不会发生,该方法生长的晶体中没有发现螺位错(微管)缺陷。     

显微激光拉曼光谱法鉴别SiC晶体的多型体结构

利用显微激光拉曼光谱法对掺氮6H-SiC单晶中的寄生多型体进行了鉴别,结果表明其中有4H-SiC和15R-SiC两种寄生多型体.不同SiC多型体的纵光学声子与等离子体激元的耦合模(LOPC模)表明:在掺氮6H-SiC单晶的生长条件下,6H-SiC的掺氮效应与4H-SiC存在明显差别,而与15R-SiC的掺氮效应相似.     

Growth of ZnO bulk crystals: A review

A critical review is proposed of the different techniques of bulk growth of ZnO crystals for their use as a substrate in the homoepitaxial growth of this attractive compound. The crystals are assessed from their structural and electrical properties and from the structural properties and purity of homoepitaxial films grown on them by various techniques such as plasma-assisted molecular beam epitaxy, pulsed laser deposition, magnetron sputtering, chemical vapor deposition, metalorganic chemical vapor epitaxy, liquid phase epitaxy.     

二苯甲酮晶体的生长习性预测和实验研究

从生长速度恒定的三维晶体几何学模型出发,计算出二苯甲酮晶体理想外形中各个晶面消失所需的最大临界生长速率,由此预测了各个晶面在晶习中消失的先后顺序.利用过冷熔体法在不同的过冷度条件下生长了二苯甲酮单晶,将单晶的实际生长习性进行比较,发现理论预测结果与实际生长习性变化比较吻合.     

用射频磁控溅射法在c-BN晶体基底上生长c-BN薄膜

本文用射频磁控溅射方法在片状c-BN晶体基底上生长了c-BN薄膜,显微拉曼光谱(μ-RS)和扫描电子显微镜(SEM)测试结果表明:沉积的薄膜是大约10μm厚、高结晶性、电子透明的高纯c-BN薄膜.岛状和层状生长模式在试验中清晰的展示出来.同时在生长的c-BN薄膜内部和被遮盖的基底部分上发现了籽晶.     

Shape evolution of detached Bridgman crystals grown in microgravity

Detached (or dewetted) Bridgman crystal growth defines that process in which a gap exists between a growing crystal and the crucible wall. In microgravity, the parameters that influence the existence of a stable gap are the growth angle of the solidifying crystal, the contact angle between the melt and the crucible wall, and the pressure difference across the meniscus. During actual crystal growth, the initial crystal radius will not have the precise value required for stable detached growth. Beginning with a crystal diameter that differs from stable conditions, numerical calculations are used to analyze the transient crystal growth process. Depending on the initial conditions and growth parameters, the crystal shape will either evolve towards attachment at the crucible wall, towards a stable gap width, or inwards towards eventual collapse of the meniscus. Dynamic growth stability is observed only when the sum of the growth and contact angles exceeds 180°.     

半导体单晶生长过程中的位错研究

阐述了现有的半导体单晶位错模型,即临界切应力模型和粘塑性模型的基本理论及应用状况.分析了熔体法单晶生长过程中影响位错产生、增殖的各种因素,以及抑制位错增殖的措施.与熔体不润湿、与晶体热膨胀系数相近的坩埚材料,低位错密度的籽晶可有效地抑制生长晶体的位错密度;固液界面的形状及晶体内的温度梯度是降低位错密度的关键控制因素,而两因素又受到炉膛温度梯度、长晶速率、气体和熔体对流等晶体生长工艺参数的影响.最后,对熔体单晶生长过程的位错研究进行了展望.     

Crystallization shelves for laboratory furnaces

Several designs of air coolers (modular bilateral “crystallization shelves”), installed in laboratory furnaces are presented. The setup allows easy regulation and simultaneous crystallization of several substances at different temperature gradients, shapes of crystallization fronts and rate intervals, with the purpose of obtaining crystals. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Growth of single‐grain GdBa2Cu3O7‐x superconductors by top seeded infiltration and growth technique

The top seeded infiltration and growth technique (TSIG) is an effective way for the preparation of bulk REBa₂Cu₃O_7‐x (RE‐123, where RE denotes rare earth) with finely dispersed RE₂BaCuO₅ (RE‐211) particles compared to the conventional melt growth (MG) method. The nucleation temperature and the ending growth temperature are the most important parameters need to be optimized during the preparation of RE‐123 bulks by the TSIG process. In this paper, the effects of these parameters on the growth of single‐grain GdBa₂Cu₃O_7‐x (GdBCO) superconductors have been investigated experimentally. It is found that the temperature for the growth of single‐grain GdBCO is in the region between 1040 °C and 1015 °C. In addition, the relation between growth rate and supercooling has been investigated in detail. The combined techniques of SEM and EDS were used to study the microstructure of the samples grown at different temperatures. Based on this, a two‐step slow cooling method during the crystallization process is proposed for the fabrication of RE‐123 bulks. Finally, the single‐grain GdBCO samples of the diameters 20 mm and 30 mm were fabricated successfully by the TSIG technique, with the slow‐cooling process in the temperature window 1030 °C–1020 °C for 60 h and 100 h respectively. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Understanding the growth mechanism of CuI crystals during gel growth experiments

Cuprous iodide crystals have been grown with decomplexation method in silica gel. Various crystal morphologies, such as polycrystalline aggregate, skeletal, dendrite, hopper crystals and regular tetrahedron crystals, were observed in different growth regions with an optical microscope. Their surfaces were photographed using a binocular metallographic microscope and the results were explained with the crystal growth mechanism which was determined by supersaturation. These observations support the general hypothesis that the concentration of reactant affects the relative growth rate by controlling the nucleation and diffusion. The mutual influence of the crystals grown in different regions was also discussed. Additionally, the suitable condition for getting regular tetrahedron crystals or large hopper crystals was obtained by changing the concentration of CuI·HI complex in the later period of crystal growth. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Improvement of Initial Conditions of the Crystal Growth by Dissolution and Refaceting

The influence of significant dissolution and refaceting of KDP and Rochelle salt crystals on their further growth is studied. It is shown that the crystal growth rate ‐ initial crystal size dependence is better defined for growth after refaceting. Initial conditions for growth of individual crystals after refaceting are better defined, than in the case of classical seed nucleation. By dissolution and refaceting, it is easy to provide the same initial conditions for crystal growth in each of several experiments, preformed under the same macroscopic external conditions.     

Effects of anions on rapid growth and growth habit of KDP crystals

The synthesis of KDP from its raw material has been found exist in the growth solution. In the crystal growth experiment, significant extension of specific faces was observed at low dopant concentration. At high doping concentration, the growth rate of the whole crystal decreased with no significant habit modification. The inhibiting effects of phosphite and other H-bonding anionic ions on the growth of pyramidal faces are discussed. Rapid growth rate experiments have been carried out with purified material and an averaged growth rate of 18.6mm/day was obtained.