大气压等离子体辅助多晶硅薄膜化学气相沉积参数诊断

本文采用发射光谱法诊断了大气压下Ar气、SiCl₄及H₂气混合气体（Ar/SiCl₄/H₂）射频放电等离子体射流特性.利用Si原子谱线强度计算了电子激发温度并以此估算了Si原子数密度,研究了射频功率及气体流量对电子激发温度和Si原子数密度以及SiCl₄解离率的作用. 关键词： 大气压等离子体射流 发射光谱 电子激发温度 多晶硅薄膜沉积     

大气压等离子体辅助多晶硅薄膜化学气相沉积参数诊断

本文采用发射光谱法诊断了大气压下Ar气、SiCl₄及H₂气混合气体（Ar/SiCl₄/H₂）射频放电等离子体射流特性.利用Si原子谱线强度计算了电子激发温度并以此估算了Si原子数密度,研究了射频功率及气体流量对电子激发温度和Si原子数密度以及SiCl₄解离率的作用.     

大气压直流氩等离子体射流工作特性研究

介绍了一种新型大气压直流双阳极等离子喷枪,并对其电特性参数和发射光谱进行了测量.通过对氩等离子体射流的电信号进行时域和频域分析,研究了载气流量和弧电流的变化对射流脉动的影响,结果表明氩等离子体电弧的伏安特性呈上升趋势,射流脉动属于接管模式,电源特性中的交流分量引起的电压波动是影响氩等离子体射流脉动的主要因素. 通过光谱法测量了氩等离子体射流在弧室内和弧室出口的发射光谱,利用玻尔兹曼曲线斜率法计算了射流的激发温度,根据Ar I谱线的斯塔克展宽得到了射流的电子密度,并对等离子体射流满足局域热力学平衡(LTE) 关键词： 等离子喷枪 射流脉动 激发温度 局域热力学平衡     

Spectroscopic study of an atmospheric pressure plasma generated for the deposition of titanium dioxide thin films

TiO₂ thin films are applied in various domains, e.g. air or water purification, self-cleaning surfaces etc. The deposition of titanium dioxide at industrial scale remains challenging. Atmospheric pressure plasma chemical vapor deposition methods are currently developed to provide an easy and viable method for deposition at industrial scale. Even though those methods lead to promising applicative coatings their formation mechanisms remain poorly investigated. In order to investigate the effect of the plasma parameters, i.e. plasma power and introduction of oxygen, on the plasma chemistry, optical emission spectroscopy (OES) is employed to monitor the various species present in the discharge. X-ray Photoelectron Spectroscopy (XPS) analyses of the deposited thin films are carried out and show that by either decreasing the plasma power or introducing oxygen the carbon impurities in the layer can be reduced. By comparing OES and XPS data, the ratio of carbon containing species (CH and C₂) to oxygen, i.e. I_CH/I_O or I_C2/I_O, in the discharge is shown to be related to the carbon/oxygen composition ratio in the layer.     

一种大气压放电氦等离子体射流的实验研究

大气压介质阻挡放电（DBD）等离子体射流获得了广泛的应用.但是到目前为止,人们对其形成机理仍不甚清楚.为此,本文对其进行了一系列的实验研究.与其他采用高速CCD进行的研究不同,本文研究的主要手段是两个带有狭缝的光电倍增管,数码相机和电学测量.虽然这些实验条件相对比较简陋,但是本文仍然根据这些实验结果探讨了等离子体射流的形成机理,传输特性,以及影响等离子体射流长度的实验参数,并发现了“电荷溢流”现象. 关键词： 介质阻挡放电 电晕放电 大气压等离子体射流 电荷溢流     

微秒脉冲激励的大气压氦等离子体射流放电特性

研究了不同电极结构以及放电参数对微秒脉冲激励的氦等离子体射流放电特性的影响。实验中采用不同管内径、不同电极形状、不同重复频率等参数, 通过采集放电阶段的电流电压图、发光图像以及发射光谱等, 对等离子体射流的电学特性和光学特性进行诊断。实验结果表明, 随着管内直径的增大, 氦等离子体射流的长度减小;管内径为8 mm时, 等离子体射流的击穿电压与放电电流最小, 同时, 其发射光谱中第二正带系N2, N+2和O等高能活性粒子的强度最高;管内径为5 mm的等离子体射流的放电电流、功率及消耗的能量最大;在相同实验条件下, 针尖电极结构中的放电电流、消耗的功率还有发射光谱强度都较大;随着重复频率的增加, 氦等离子体射流的长度会增加, 但击穿电压减小。     

微秒脉冲激励的大气压氦等离子体射流放电特性北大核心CSCD

研究了不同电极结构以及放电参数对微秒脉冲激励的氦等离子体射流放电特性的影响。实验中采用不同管内径、不同电极形状、不同重复频率等参数,通过采集放电阶段的电流电压图、发光图像以及发射光谱等,对等离子体射流的电学特性和光学特性进行诊断。实验结果表明,随着管内直径的增大,氦等离子体射流的长度减小;管内径为8mm时,等离子体射流的击穿电压与放电电流最小,同时,其发射光谱中第二正带系N2,N+2和O等高能活性粒子的强度最高;管内径为5mm的等离子体射流的放电电流、功率及消耗的能量最大;在相同实验条件下,针尖电极结构中的放电电流、消耗的功率还有发射光谱强度都较大;随着重复频率的增加,氦等离子体射流的长度会增加,但击穿电压减小。     

Surface modification of a polyamide 6 film by He/CF4 plasma using atmospheric pressure plasma jet

Polyamide 6 (PA 6) films are treated with helium(He)/CF₄ plasma at atmospheric pressure. The samples are treated at different treatment times. The surface modification of the PA 6 films is evaluated by water contact angle, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The etching rate is used to study the etching effect of He/CF₄ plasma on the PA 6 films. The T-peel strengths of the control and plasma treated films are measured to show the surface adhesion properties of the films. As the treatment time increases, the etching rate decreases steadily, the contact angle decreases initially and then increases, while the T-peel strength increases first and then decreases. AFM analyses show that the surface roughness increases after the plasma treatment. XPS analyses reveal substantial incorporation of fluorine and/or oxygen atoms to the polymer chains on the film surfaces.     

Basic characteristics of an atmospheric pressure rf generated plasma jet

A plasma jet has been developed which operates using radio frequency (rf) power and produces a stable homogeneous discharge at atmospheric pressure. Its discharge characteristics, especially the dependence of stable discharge operating range on the feed gas, were studied, and the electric parameters such as RMS current, RMS voltage and reflected power were obtained with different gas flows. These studies indicate that there is an optimum range of operation of the plasma jet for a filling with a gas mixture of He and O_2. Two "failure" modes of the discharge are identified. One is a filamentary arc when the input power is raised above a critical level, another is that the discharge disappears gradually as the addition of O_2 approaches 3.2%. Possible explanations for the two failure modes have been given. The current and voltage waveform measurements show that there is a clear phase shift between normal and failure modes. In addition, I－V curves as a function of pure helium and for 1% addition of oxygen have been studied.     

Thin-film deposition by combining plasma jet with spark discharge source at atmospheric pressure

This study demonstrates a method for the deposition of CuO_x thin films by combining atmospheric pressure plasma jet with spark discharge. In this type of discharge source, the bulk copper material of spark discharge electrodes plays the role of a precursor. Copper atoms and particles go through the physical processes of sputtering, evaporation, and further agglomeration and condensation in the plasma jet and on the substrate. The experiments were carried out with and without a combination of discharges. The material coated on the substrate was studied using a scanning electron microscope, Raman spectroscopy, and energy-dispersive X-ray spectroscopy. The characteristics of the set-up and plasma, such as I-V curves, optical emission spectra, and substrate temperature, were also measured. Copper electrodes were examined for erosion by a scanning electron microscope. The results demonstrate that deposits coated by combined discharge show denser and thicker films.     

Polymerdimethylsiloxane surface treatment with an atmospheric pressure helium plasma jet driven by unipolar nanosecond pulses

A nanosecond-pulse power source transfers energy to electrons of atmospheric pressure discharges in a nanosecond-scale rising time and shows different plasma chemistry than a slowly varying sinusoidal discharge. We report how the operation parameters, such as applied voltage, pulse duration, and repetition frequency, affect the discharge characteristics and the surface property of polydimethylsiloxane (PDMS). The applied voltage controls the energy delivery per a pulse cycle, and the repetition frequency dominantly affects the plasma density in a long-term operation. The water contact angle, the optical emission spectroscopy, and the atomic force microscope diagnostics on the PDMS are presented. While the polarity of the nano pulse bias changes the emission length of the plasma jet, the hydrophilicity is not affected by it because the chemical reactions by radicals are more dominant than the physical reactions of charged particles on PDMS.     

纳秒脉冲放电等离子体射流特性

采用单针式电极,使用单极性重复频率脉冲电源,在常压氦气、氩气、氮气和空气中得到等离子体射流,并改变电压、流量和气体种类,分别观察不同的实验条件对等离子体射流的影响。实验结果表明:射流长度随施加电压的增加而增长;随着流量的连续变化,射流长度先逐渐变长,达到峰值后由于湍流影响,长度又逐渐缩短,达到一定流量后趋于饱和。此外,不同工作气体中的等离子体射流呈现截然不同的外观,氦气和氩气中射流呈针状模式,长度可达7 cm以上;而在氮气和空气中,射流呈现为长度不超过2 cm的刷状模式。     

纳秒脉冲放电等离子体射流特性

采用单针式电极,使用单极性重复频率脉冲电源,在常压氦气、氩气、氮气和空气中得到等离子体射流,并改变电压、流量和气体种类,分别观察不同的实验条件对等离子体射流的影响。实验结果表明：射流长度随施加电压的增加而增长;随着流量的连续变化,射流长度先逐渐变长,达到峰值后由于湍流影响,长度又逐渐缩短,达到一定流量后趋于饱和。此外,不同工作气体中的等离子体射流呈现截然不同的外观,氦气和氩气中射流呈针状模式,长度可达7 cm以上;而在氮气和空气中,射流呈现为长度不超过2 cm的刷状模式。     

Surface modification of polypropylene with an atmospheric pressure plasma jet sustained in argon and an argon/water vapour mixture

In this paper, an atmospheric pressure plasma jet sustained in pure argon and an argon/water vapour mixture has been used to modify the surface of polypropylene (PP) films. The gas temperature of the plasma jet was found to be 625 K in an active zone between the electrodes and was found to increase in the afterglow. Based on these results, the PP films are placed as close as possible to the edge of the capillary in order to avoid thermal damage to the polymer. XPS results on the untreated and modified PP samples revealed incorporation of a significant amount of oxygen on the polymer surface, however, this oxygen inclusion is more pronounced for the argon/water vapour jet due to the higher radicals density in the jet afterglow. One can therefore conclude that adding water vapour to an argon plasma jet can be a convenient way to increase the efficiency of plasma surface modification.     

大气压氖气介质阻挡放电脉冲等离子射流特性

采用自行研制的低造价、小体积、可产生幅值0~35 kV、重复频率1 kHz的高压s脉冲电源,设计了一套以大气压氖气为工作气体的介质阻挡放电（DBD）等离子体射流源,通过测量并计算放电过程中的电压-电流波形、拍摄放电图像、光谱分析等手段,对电压幅值、气体流速对氖气等离子体射流特性的影响进行了研究。结果表明:s脉冲电源激励下大气压氖气DBD能产生锥状的等离子射流且其等离子强度适中;s脉冲电源电压幅值的快速上升,可在放电空间瞬间施加高的过电压,能有效促进放电功率、电子密度、电子激发温度和射流长度的增加;工作气体流速的增加使得放电功率、电子激发温度和电子密度减小,而射流长度变化很小;一定条件下,能形成长距离的射流。     

大气压氖气介质阻挡放电脉冲等离子射流特性

采用自行研制的低造价、小体积、可产生幅值0~35 kV、重复频率1 kHz的高压s脉冲电源,设计了一套以大气压氖气为工作气体的介质阻挡放电（DBD）等离子体射流源,通过测量并计算放电过程中的电压-电流波形、拍摄放电图像、光谱分析等手段,对电压幅值、气体流速对氖气等离子体射流特性的影响进行了研究。结果表明：s脉冲电源激励下大气压氖气DBD能产生锥状的等离子射流且其等离子强度适中;s脉冲电源电压幅值的快速上升,可在放电空间瞬间施加高的过电压,能有效促进放电功率、电子密度、电子激发温度和射流长度的增加;工作气体流速的增加使得放电功率、电子激发温度和电子密度减小,而射流长度变化很小;一定条件下,能形成长距离的射流。     

Electromagnetic interaction between local surface plasmon polaritons and an atmospheric surface wave plasma jet

We analyze the electromagnetic interaction between local surface plasmon polaritons （SPPs） and an atmospheric surface wave plasma jet （ASWPJ） in combination with our designed discharge device. Before discharge, the excitation of the SPPs and the spatial distribution of the enhanced electric field are analyzed. During discharge, the critical breakdown electric field of the gases at atmospheric gas pressure and the surface wave of the SPPs converted into electron plasma waves at resonant points are studied. After discharge, the ionization development process of the ASWPJ is simulated using a two- dimensional fluid model. Our results suggest that the local enhanced electric field of SPPs is merely the precondition of gas breakdown, and the key mechanism in maintaining the discharge development of a low-power ASWPJ is the wave-mode conversion of the local enhanced electric field at the resonant point.     

大气压微波等离子体射流装置放电特性研究

基于同轴传输线结构设计了两种不同喷嘴结构的大气压微波等离子体射流(MW-APPJ)装置,其工作频率2.45 GHz,工作气体为氩气,分别研究了两种不同喷嘴结构对等离子体放电特性产生的影响。仿真结果表明,MW-APPJ在气体喷嘴处会产生高强度的电场,经过优化结构,实现在频率2.45 GHz下,喷嘴处的场强满足氩气电离的击穿场强阈值要求。同时,利用多物理场耦合仿真软件对装置的气流分布进行了稳态模拟,并通过实验对比分析了两种喷嘴结构下大气压氩等离子体射流的基本特性。实验结果表明,不同的喷嘴结构会影响等离子体装置的反射系数随输入功率的变化规律,但并不影响等离子体射流长度随输入功率的变化规律和反射功率随进气流量的变化规律;同时,在大气压下,稳态微波等离子体射流呈现出类金属性,等离子体中的电子只能在很薄的区域中吸收微波能量,因而造成微波的反射功率较大。     

大气压冷等离子体射流灭活子宫颈癌Hela细胞

研究了大气压冷等离子体射流对子宫颈癌Hela细胞的灭活机制. 在倒置显微镜下观察不同等离子体处理条件下的细胞形态, 并通过中性红吸收测试定量测定各个条件下的细胞存活率. 将功率维持在18 W, 在900 mL/min 氩等离子体中添入氧气的百分含量分别为1%, 2%, 4% 和8%的条件下处理Hela细胞, 探讨活性气体氧气在惰性气体氩气中的百分含量对Hela癌细胞灭活效率的影响, 发现添加2%氧气时, 氩/氧等离子体灭活效果最佳, 处理180 s后细胞存活率可降至7%. 当继续添加氧超过2%时, 灭活效果逐渐减弱, 直至8%时, 其效果反而不如单纯氩等离子体. 通过测量等离子体发射光谱, 结果表明活性氧自由基在癌细胞灭活过程中可能起关键作用. 关键词： 大气压冷等离子体射流 Hela癌细胞 存活率 发射光谱