Impacts of appearance parameters on perceived image quality for mobile-phone displays

In order to investigate the perceived image quality (IQ) influenced by different image appearance parameters, a psychophysical experiment was carried out on two mobile-phone displays of different technologies, the in-plane switching (IPS) and the active matrix organic light emitting diode (AMOLED). The test images were generated within a wide range of variations by applying various manipulation methods, involving changes in several kinds of image appearance parameters, i.e. lightness, chroma, hue, and spatial frequency. The perceived attributes of naturalness, colourfulness, brightness, contrast, sharpness, clearness, preference, and overall IQ were visually assessed via categorical judgement method for several application types of test images. The impacts of the manipulation methods on individual attributes have been deeply discussed based on the interrelationships of these attributes, which reveal that the significant parameters towards better overall IQ for mobile-phone displays include high lightness, suitable chroma and lightness frequency distribution, and impartial hue, accordingly better image quality will be accomplished after all these parameters have been optimised at the same time. The achievements of this study would provide constructive instructions on achieving excellent display effects for researchers and manufactories of mobile-phone displays.     

Improvement in the electrical performance and bias-stress stability of dual-active-layered silicon zinc oxide/zinc oxide thin-film transistor

Si-doped zinc oxide(SZO) thin films are deposited by using a co-sputtering method,and used as the channel active layers of ZnO-based TFTs with single and dual active layer structures.The effects of silicon content on the optical transmittance of the SZO thin film and electrical properties of the SZO TFT are investigated.Moreover,the electrical performances and bias-stress stabilities of the single- and dual-active-layer TFTs are investigated and compared to reveal the effects of the Si doping and dual-active-layer structure.The average transmittances of all the SZO films are about 90% in the visible light region of 400 nm-800 nm,and the optical band gap of the SZO film gradually increases with increasing Si content.The Si-doping can effectively suppress the grain growth of ZnO,revealed by atomic force microscope analysis.Compared with that of the undoped ZnO TFT,the off-state current of the SZO TFT is reduced by more than two orders of magnitude and it is 1.5 × 10~(-12) A,and thus the on/off current ratio is increased by more than two orders of magnitude.In summary,the SZO/ZnO TFT with dual-active-layer structure exhibits a high on/off current ratio of 4.0 × 10~6 and superior stability under gate-bias and drain-bias stress.     

Improving the color purity and efficiency of blue organic light-emitting diodes (BOLED) by adding hole-blocking layer

This work demonstrates the fabrication of a bright blue organic light-emitting diode (BOLED) with good color purity using 4,4′-bis(2,2-diphenylvinyl)-1,1′-biphenyl (DPVBi) and bathocuproine (BCP) as the emitting layer (EML) and the hole-blocking layer (HBL), respectively. Devices were prepared by vacuum deposition on indium tin oxide (ITO)-glass substrates. The thickness of DPVBi used in the OLED has an important effect on color and efficiency. The blue luminescence is maximal at 7670 cd/m² when 13 V is applied and the BCP thickness is 2 nm. The CIE coordinate at a luminance of 7670 cd/m² is (0.165, 0.173). Furthermore, the current efficiency is maximum at 4.25 cd/A when 9 V is applied.     

一种有源有机发光显示屏(AM-OLED)驱动电路的设计

介绍一种有源有机发光显示屏(AM-OLED)的驱动电路的设计方法。像素驱动电路采用常用的两管电路结构,依据此像素驱动电路,提出一种利用多晶硅TFT将部分外围驱动电路集成于衬底的设计方法和电路结构。采用互补的多晶硅TFT管设计屏上移位寄存器,传输门等模块,将部分外围驱动电路集成于OLED显示屏的衬底上,极大地减小了数据信号线的数目,降低了屏内信号线布线和屏外驱动电路的复杂程度。进一步讨论了利用复杂可编程逻辑器件(CPLD)设计驱动AM-OLED显示屏专用集成芯片的设计方案。     

Performance improvement of blue InGaN light-emitting diodes with a specially designed n-AlGaN hole blocking layer

Blue InGaN light-emitting diodes (LEDs) with a conventional electron blocking layer (EBL), a common n-AlGaN hole blocking layer (HBL), and an n-AlGaN HBL with gradual Al composition are investigated numerically, which involves analyses of the carrier concentration in the active region, energy band diagram, electrostatic field, and internal quantum efficiency (IQE). The results indicate that LEDs with an n-AlGaN HBL with gradual Al composition exhibit better hole injection efficiency, lower electron leakage, and a smaller electrostatic field in the active region than LEDs with a conventional p-AlGaN EBL or a common n-AlGaN HBL. Meanwhile, the efficiency droop is alleviated when an n-AlGaN HBL with gradual Al composition is used.