Influence of the substrate type on the microstructural,optical and electrical properties of sol–gel ITO films

Indium tin oxide (ITO) is recognized as the best transparent and conductive material [transparent conducting oxide (TCO)] until now and its properties are dependent on the preparation method. In the present work ITO films with In:Sn atomic ratio 9:1 were prepared by a sol–gel route on different substrates (microscope glass slides, microscope glass covered with one layer of SiO₂ and Si wafers) for TCO applications. The multilayer ITO films were obtained by successive deposition by the dip-coating method and the films were characterized from the structural, morphological, optical, and electrical points of view using X-ray diffraction, scanning electron microscopy, atomic force microscopy, spectroscopic ellipsometry and by Hall effect measurements, respectively. The results showed that the thickness, optical constants and carrier numbers depend strongly on the type of substrate, number of deposited layers and sol concentration. The optical properties of ITO films are closely related to their electrical properties. The enhancement of the conductivity was possible with the increase of crystallite size (which occurred after thermal treatment) and with the reduction of surface roughness.     

Characterization and electrochemical deposition of natural melanin thin films

Melanin is an important class of biological pigments because of its distinct chemical and physical properties. The electrochemical deposition of natural melanin thin films was studied using two different techniques; constant potential and cyclic voltammetry along with a deposition time of five hours. The thin films deposited electrochemically on a fluorine-doped tin oxide conductive glass substrate using the constant potential method, exhibited faster growth rate and better adhesion to the fluorine-doped tin oxide working electrodes than those deposited using the cyclic voltammetry method. The thin films deposited on the fluorine-doped tin oxide conductor glass using the constant potential method were also more homogeneous than those deposited via the cyclic voltammetry technique. The increase of film thickness is related to the increase of electrochemical deposition time. Interestingly, the electrochemical deposition using the constant potential method had the advantage of consuming less electric charge. The physical and chemical structures of the melanin thin films were characterized using ultraviolet–visible absorption spectroscopy, Fourier-transform infrared spectroscopy, and X-ray diffraction analysis. The ultraviolet–visible absorption spectra showed the correlation between the variation of deposition rates of melanin and the type of electrochemical technique employed as well as the thickness of the film. The average thickness of the film is 500 nm which absorb 40% of light in both type of films. The atomic force microscopy images illustrated the homogeneous deposition of the melanin molecules on the fluorine-doped tin oxide conductive glass substrate, indicating that the thickness of the thin films can be controlled. We estimated an average grain size of 14.093 Å. The ease of preparing such thin films of organic materials can open new avenues towards the use of soft conductors, in contrast to the complex preparation of industrial semiconductors.     

Probing Catalytic Solid‐Liquid Interfaces by Attenuated Total Reflection Infrared Spectroscopy: Adsorption of Carboxylic Acids on Alumina and Titania

The adsorption of carboxylic acids (formic, acetic, and pyruvic acid) from corresponding solutions in CH₂Cl₂ solvent on Al₂O₃ and TiO₂ thin films has been studied by attenuated total reflection infrared spectroscopy. The metal‐oxide films were vapor‐deposited on a Ge internal reflection element, which was mounted into a specially designed flow cell. The system allowed in situ monitoring of the processes occurring at the solid‐liquid interface. The metal‐oxide films were characterized by X‐ray photoelectron spectroscopy, ellipsometry, and atomic force microscopy. Formic acid and acetic acid adsorbed predominantly as bridging species on alumina surfaces. Adsorbed free acids were not observed under a flow of neat solvent. Based on the position of the ν_AS(COO) and of the keto‐group stretching vibration of the pyruvate ion, pyruvic acid is proposed to coordinate to the Al₂O₃ surface in a monodentate fashion, whereas, on TiO₂, a bidentate species is preferred. Comparison of the adsorption behavior on the vapor‐deposited alumina film and on an α‐Al₂O₃ layer deposited from a water suspension of the corresponding metal‐oxide powder indicated that pyruvic acid adsorbs in a similar mode, irrespective of the metal‐oxide deposition technique.     

A Combinatorial Approach for Optimization of Oxygen Evolution Catalyst Loading on Mo‐doped BiVO4 Photoanodes

The incident photon to current efficiency (IPCE) of a photoactive surface strongly depends on the loading and thickness of the active materials. We present a combinatorial approach based on an optical scanning droplet cell for simultaneous deposition and systematic characterization of co‐catalysts for the oxygen evolution reaction (OER) on Mo‐doped BiVO₄ (Mo?BiVO₄) photoanodes electrochemically pre‐deposited on transparent conductive FTO substrates. The loading and photoelectrochemical characterization of 10 different OER co‐catalysts deposited by three different deposition techniques on FTO‐supported Mo?BiVO₄ were investigated aiming at determination of the suitable deposition parameters affording the highest enhancement of photoelectrochemical oxygen evolution for the different OER/Mo?BiVO₄ films. A comparison of the photoelectrochemical performance of films of various OER co‐catalyst deposited on FTO‐supported Mo?BiVO₄ by electrodeposition, photo‐assisted electrodeposition and photodeposition revealed the necessity of a material specific optimization with respect to co‐catalyst loading and deposition technique to achieve optimal IPCE for each co‐catalysts.     

Structural and electrical properties of nickel–iron thin film on copper substrate for dynamic random access memory applications

Using pulse electrodeposition technique, nano crystalline NiFe films were deposited on conductive copper substrates, under galvanostatic mode in an ultrasonic field at different conditions such as pulse current magnitude, deposition time and ultrasonic bath temperature. As-prepared NiFe/Cu thin films were characterized for phase analysis, surface morphology, surface roughness and resistivity measurements. The results show that the use of ultrasonic bath at room temperature has reduced the surface roughness, resistivity, average grain size and crystallite size of NiFe/Cu thin films. The resistivity is reduced with increasing deposition current from 44.2 µΩ cm at 40 mA to 33.0 µΩ cm at 100 mA. On the other hand, a significant drop of the resistivity from 35.7 to 9.4 µΩ cm is observed if the deposition time was reduced from 5 to 3 min.     

Flame spray pyrolysis for the one-step fabrication of transition metal oxide films: Recent progress in electrochemical and photoelectrochemical water splitting

Developing large scale deposition techniques to fabricate thin porous films with suitable opto-electro nic properties for water catalysis is a necessity to mitigate climate change and have a sustainable environment.In this review,flame spray pyrolysis(FSP)technique,a rapid and scalable methodology to synthesize nanostructured transitional metal oxide films with designed functionalities,is firstly introduced.Furthermore,applications in electrochemical(EC)and photoelectrochemical(PEC)water splitting for the production of hydrogen fuel is also presented.The high combustion temperature and the aggregation of flame aerosol ensure that the FSP-made films possess high crystallinity,tunable porosity and high surface areas,making this method suitable either as catalysts for EC water splitting or as efficient semiconductor materials for PEC water splitting.Finally,a perspective on the next generation FSP engineered films with potential applications in energy storage and conversion is described.     

液相沉积法制备光催化活性TiO2薄膜和纳米粉体

采用液相沉积法，在35℃通过向六氟钛酸铵水溶液中添加硼酸和结晶诱导剂锐 铁矿型TiO2纳米晶，沉积出具有光催化活性的Ti02薄膜和纳米粉体．用XRD，AFM， 阶梯仪,UV-vis，BET法对Ti02薄膜和粉体的沉积条件、结构、厚度和性能进行了测 定和表征，并用亚甲兰的降解，评价了TiO2薄膜和纳米粉体的光催化活性．结果表 明，当反应物六氟钛酸铵与硼酸的摩尔比为1：2—1：4时，沉积的粉体和薄膜含有 锐钛矿相Ti02；经300℃热处理的Ti02薄膜和纳米粉体具有最高的光催化活性，它 的光催化活性是未经热处理前的5倍．本文还解释了经300℃热处理的薄膜和纳米粉 体具有最高光催化活性的原因．     

Evaporated thin films of insulating poly-(tetrabromo-p-phenylenediselenide)

It has been shown that thin insulating film at the interface transparent conductive oxide/organic electroluminescent film could improve the performance of organic electroluminescent diodes (OLED). Such insulating film can be inorganic or organic. Poly-(tetrabromo-p-phenylenediselenide) (PBrPDSe) has been proved to be an efficient insulating film in OLED. The properties of these evaporated PBrPDSe thin films have been systematically studied by IR absorption, X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, electron spin resonance and optical transmission measurements. It is shown that, when the deposition temperature is kept below the decomposition temperature of the polymer, tetrabromo-p-phenylenediselenide molecule is preserved during the deposition process. However the polymer, which is insoluble in powder form, becomes soluble after deposition. It can be concluded that films are mainly composed of oligomers of tetrabromo-p-phenylenediselenide.The electrical properties of SnO₂/PBrPDSe/Al thin films structures have been studied. The current-voltage characteristics exhibit a rectifying behaviour with a forward direction corresponding to a positive bias of the transparent conductive oxide film, the SnO₂.     

Patterned Deposition of Sol-Gel Thin Films Using an Airbrush

ABSTRACT

In this article, we present a method to pattern glass substrates with sol-gel derived thin films. This method is based on the aerosol deposition of sol-gel precursor solutions using an inexpensive, commercially available airbrush. The technique was demonstrated using Cy5-doped sol-gel thin films for the creation of wavelength conversion devices. The films deposited were mechanically and chemically rigid, and patterns could be achieved with a resolution limit of approximately 250 μm. Constructing channel waveguides was also attempted using both zirconium- and titanium-based sol-gel thin films. Deposited thin films of these materials showed graininess that limited the ability to couple light into the films and increased the observed scatter. However, light was successfully coupled into the titanium-based sol-gel film using small lens-like structures created on the glass surface.     

Preparation of conductive,flexible and transparent films by in situ deposition of polypyrrole nanoparticles on polyethylene terephthalate

In this study polypyrrole (PPy) nanoparticles were deposited as a thin film on the modified surface of polyethyleneterephthalate (PET) by in situ chemical polymerization in the presence of sodium dodecylsulfate (SDS), sodium dodecylbenzenesulfonate (DBSNa) and mixture of them as the surfactant. The surface of PET was modified by KOH before deposition and was investigated for conductivity and adhesion of PPy nanoparticles to PET. Resulting conductive flexible films were characterized by UV–Vis spectroscopy, fieldemission scanning electron microscopy, contact angle measurements and four-point-probe technique for conductivity. Direct morphological observation (FESEM) and electrical measurements indicated that the morphology, conductivity and the nature of deposited PPy films depend on surfactant, surface modification of PET and monomer concentration. In optimized process condition, uniform conductive films of PPy were obtained with good adhesion to PET.     

纯相Li2MnO3薄膜的制备及作为锂离子电池正极材料的电化学行为

采用固相烧结法制备了纯相Li₂MnO₃正极材料及靶材,采用脉冲激光沉积（PLD）法在氧气气氛、不同温度下沉积了Li₂MnO₃薄膜. 通过X射线衍射（XRD）和拉曼（Raman）光谱表征了薄膜的晶体结构,采用扫描电镜（SEM）观察薄膜形貌及厚度,利用电化学手段测试了Li₂MnO₃薄膜作为锂离子电池正极材料性能. 结果表明,PLD 方法制备的纯相Li₂MnO₃薄膜随着沉积温度升高薄膜结晶性变好. 25 ℃沉积的薄膜难以可逆充放电,400 ℃沉积的薄膜具有较高的电化学活性和循环稳定性. 相对于粉末材料,400与600 ℃制备的Li₂MnO₃薄膜电极平均放电电位随着循环次数的衰减速率明显低于相应的粉体材料.     

Polyaniline thin film optical waveguides for integrated optics and VLSI prepared by vacuum evaporation technique

Polyaniline is emerging as an important polymer material which offers challenging opportunities for both fundamental research and new technological applications in waveguides. Metal doped polyaniline has been prepared initially in the form of powder by a solution growth technique. The emeraldine salt with doped metal was also prepared by solution growth technique. This powder was used for vacuum evaporation on optically flat glass substrate. The dark green doped (Fe, Al) polyaniline thin films were prepared by vacuum evaporation technique (10^?4 torr). Deposited waveguide thin films have been characterized structurally, using X‐ray diffraction (XRD), optically etc. Effective refractive index of the thin film waveguide was also calculated theoretically and experimentally. Waveguide parameters, namely refractive index, propagation loss and depth of vacuum deposited polyaniline thin films optical waveguide have been determined. The optical spectra and structure and waveguide parameters of vacuum deposited polyaniline thin films are strongly affected by the type of doping. It is possible to reduce the losses by addition of Fe to the vacuum deposited polyanine thin film and modify the effective refractive index (O_eff) according to particular requirements. Results are compared with the results in the literature. Copyright © 2002 John Wiley & Sons, Ltd.     

An investigation of the microstructure,optical and electrical properties of ZITO thin film using the sol–gel method

The multi-compound ZITO transparent conductive oxide (TCO) thin films were synthesized using the sol–gel method. The ZITO thin films with various volume ratios of ZnO to ITO (1:1, 2:1 and 9:1) were crystallized at different temperatures (600–700 °C). The results showed that the crystalline characteristics and optical transmittance were mainly dependent on ITO content and crystallization. Notably, the 650 °C Z₉ITO film not only had better conductivity but also possessed excellent optical transmittance. In addition, the surface roughness of the ZITO films and optoelectric properties of IZO (indium doped ZnO) films were analyzed to confirm the contribution of indium dopants on the optical transmittance. Also, the ZITO films were subjected to the effects of indium and tin dopants and this improved the related characteristics of ZnO films.     

Precise Control of Metal Oxide Thin Films Deposition in Magnetron Sputtering Plasmas for High Performance Sensing Devices Fabrication

Magnetron sputtering deposition is a widely used technique to deposit thin film precisely at nanoscale level. During the deposition of metal oxide thin films, reactive oxygen gas is introduced into the deposition chamber. Pure metal and metal oxide materials can be used as sputter target, although the simplest way is by using a pure metal target. In such reactive process, the effect of target poisoning significantly influence the deposition process and the growth mechanisms of metal oxide thin films became very complex. In general, external parameters such as discharge power, working pressure, reactive gases ratio and substrate temperature are used to optimize the properties of deposited thin films. Then, ex-situ analyses such as scanning electron microscope and X-ray diffraction analysis are performed to obtain the optimized parameter. Sample depositions and ex-situ analyses consume time to achieve the goal through try and error. In this article, in-situ plasma diagnostics are reviewed focusing on an optical emission spectroscopy to precisely control and investigate the sputter target poisoning effect during the deposition of metal oxide thin films. The emission of atomic lines from several metal and oxygen atoms were used to discuss the deposition mechanisms and their correlation with the deposited thin films was observed. Finally, the deposited metal oxide thin films were proposed and tested for several applications such as gas sensor and frequency selective surface glass.     

The effect of different gas atmospheres on the structure,morphology and photoluminescence properties of pulsed laser deposited Y3(Al,Ga)5O12:Ce3+ nano thin films

Luminescent properties of Y₃(Al,Ga)₅O₁₂:Ce³⁺ phosphor powder and thin films were obtained. The phosphor powder was used as target material for Pulsed Laser Deposition (PLD) of the thin films in the presence of different background gases. Excitation peaks for the powder were obtained at 439, 349, 225 and 189 nm and emission peaks at 512 and 565 nm. X-ray diffraction indicated that better crystallization took place for films deposited in a 20 mTorr O₂ atmosphere. Atomic force microscope revealed an RMS value of 0.7 nm, 2.5 nm and 4.8 nm for the films deposited in vacuum, O₂ and Ar atmospheres, respectively. The highest PL intensity was observed for films deposited in the O₂ atmosphere. A slight shift in the wavelength of the PL spectra was obtained for the thin films due to a change in the crystal field. The thickness of the films varied from 120 nm to 270 nm with films deposited in vacuum having the thin layer and those in Ar having the thick layer. The stoichiometry of the powder was maintained in the film during the deposition as confirmed by Rutherford backscattering spectroscopy.     

Novel Electroless Deposition of Cu<Subscript>3</Subscript>Se<Subscript>2</Subscript> Film on Silicon Substrate by a Simple Galvanic Displacement Process

A novel electroless deposition method for depositing highly uniform adhesive thin films of copper selenide (Cu₃Se₂) on silicon substrates from aqueous solutions is described. The deposition is carried out by two coupled galvanic reactions in a single deposition bath containing copper cations, hydrogen fluoride, and selenous acid: the galvanic deposition of copper on silicon and the subsequent galvanic reaction between the deposited copper with selenous acid in the deposition bath. The powder X-ray diffraction and scanning electron microscopy are used to characterize and examine the deposited films.     

Observation of Organic Thin Film Surface by Atomic Force Microscopy

The 8-hydroxyquinoline neodymium(Ndq3) organic thin films deposited on the cleaned indium/tin oxide (ITO) at different deposition rates with the same vacuity (133.3×10^-5 Pa) were revealed by atomic force microscopy (AFM). Organic devices with one layer of Ndq3 as the e-type conductive material at different deposition rates sandwiched between ITO and aluminum electrodes have been fabricated. respectively. Evidence suggests that the current-voltage (I-V) characteristics were determined by the uniformity of organic film which was controlled by the deposition conditions.     

Photosensitive layers of TiO2/polythiophene composites prepared by electrodeposition

We adopted an electrophoretic deposition method for the preparation of thin layers of insoluble composite nanoparticles composed of TiO₂ core and about 2 nm thick shell of polythiophene, prepared by oxidative polymerization of thiophene. The reduced form of TiO₂-polythiophene composite material was deposited on the conductive surface from an ultrasonically generated microdispersion. Varying the dispersion media, applied voltage and the electrode arrangement made it possible to control the quality and morphology of the films. Compact semitransparent films deposited on ITO electrodes, suitable for photoelectrical measurements, were obtained within short deposition times.     

Photovoltaic Behaviour of Titanyl Phthalocyanine Thin Films and Titania Bilayer Films

Summary: Titanyl phthalocyanine (TiOPc) thin films were prepared using evaporation and surface polymerization by ion-assisted deposition (SPIAD) in a vacuum deposition system. These films were characterized by means of ultraviolet and X-ray photoelectron spectroscopy as well as UV/Vis absorption spectroscopy. Valence band and elemental content indicated that phthalocyanine electronic and chemical structures were largely preserved during SPIAD. Further, bilayer thin films of titania (TiO₂) and SPIAD TiOPc were prepared. TiO₂ film was deposited by reactive magnetron sputtering of TiO₂ target. Study of the structured samples was focused on the optical and electrical properties of the composite films. The films were characterized by non-contact photovoltage measurements and UV-Vis spectroscopy. These results suggest there is a possibility to use these bilayer thin films in photovoltaic solar cells, however further experiments to improve conductivity of the films will be required.     

Interest of Rapid Thermal Annealing (RTA) for the Elaboration of SnO2:Sb Transparent Conducting Oxide by the Sol-Gel Technique

Transparent Conducting Oxide (TCO) films of Sb doped SnO₂ have been successfully elaborated by us using the Sol-Gel Dip Coating (SGDC) technique. Good conductive and optical properties of such films depend on the densification and crystallisation of the SGDC deposits, which can be achieved by classical thermal procedures but such procedures are time consuming in case of multilayered films. Here are presented results of Rapid Thermal Annealing (RTA) of these films, which lead to good conductive properties even in the case of monolayered films.