类石墨烯硼-磷单层材料的电子与光学性能的第一性原理计算研究

基于第一性原理计算,对硼-磷单层材料的电子结构和光学性质进行系统地理论研究. 全局结构搜索和第一性原理分子动力学模拟现实二维硼-磷单层材料能量最低的结构与石墨烯类似,具有很高的稳定性. 类石墨烯二维硼-磷单层是直接带隙半导体,带隙宽度1.37 eV,其带隙宽度随层数增加而减少. 硼-磷单层的带隙宽度受外界应力影响.硼-磷单层的载流子迁移率达到106 cm2/V. MoS2/BP二维异质结可用于光电器件,其理论光电转换效率为17.7%?19.7%. 表明类石墨烯硼-磷二维材料在纳米电子器件与光电子器件的潜在应用价值.     

单层缺陷碲烯电子结构与光学性质的第一性原理研究

碲烯是性质优异的新型二维半导体材料,研究缺陷碲烯的电子结构有助于理解载流子掺杂、散射等效应,对其在电子和光电器件中的应用有重要意义.本文采用基于密度泛函理论的第一性原理计算,研究了常见点缺陷对单层β相碲烯电子结构和光学性质的影响,包括单空位、双空位及Stone Wales缺陷.研究发现,单层β相碲烯中单空位、双空位和Stone Wales缺陷的形成能在0.83—2.06 eV范围,低于石墨烯、硅烯、磷烯和砷烯中对应缺陷的形成能,说明实验上单层β相碲烯中容易形成点缺陷.点缺陷出现后,单层β相碲烯带隙宽度少有变化,禁带中出现依赖于缺陷类型的局域能级,部分双空位缺陷和Stone Wales缺陷使其由直接带隙变为间接带隙.同时我们发现,单层β相碲烯的光吸收性质与缺陷类型密切相关.部分缺陷能增大其静态介电常数,使它的复介电函数的实部、虚部及吸收系数在0—3 eV能量范围内出现新的峰,增强它在低能区的光响应、极化能力及光吸收.本文研究可为碲烯在电子和光电子器件中的应用提供理论参考.     

Rb吸附石墨烯纳米带电子性质和光学性质的研究

本文基于密度泛函理论的第一性原理方法了计算了Rb、O和H吸附石墨烯纳米带的差分电荷密度、能带结构、分波态密度和介电函数,调制了石墨烯纳米带的电子性质和光学性质,给出了不同杂质影响材料光学特性的规律.结果表明本征石墨烯纳米带为n型直接带隙半导体且带隙值为0.639 eV;Rb原子吸附石墨烯纳米带之后变为n型简并直接带隙半导体,带隙值为0.494eV;Rb和O吸附石墨烯纳米带变为p型简并直接带隙半导体,带隙值增加为0.996eV;增加H吸附石墨烯纳米带后,半导体类型变为n型直接带隙半导体,且带隙变为0.299eV,带隙值相对减小,更有利于半导体发光器件制备.吸附Rb、O和H原子后,石墨烯纳米带中电荷密度发生转移,导致C、Rb、O和H之间成键作用显著.吸附Rb之后,在费米能级附近由C-2p、Rb-5s贡献;增加O原子吸附之后,O-2p在费米能级附近贡献非常活跃,杂化效应使费米能级分裂出一条能带;再增加H原子吸附之后,Rb-4p贡献发生蓝移,O-2p在费米能级附近贡献非常强,费米能级分裂出两条能带.Rb、O和H的吸附后,明显调制了石墨烯纳米带的光学性质.     

金红石相VO2电子结构与光电性质的第一性原理研究

采用完全势线性缀加平面波方法(FP-LAPW)结合密度泛函+U(DFT+U)模型计算了金红石相VO₂的电子结构和光学性质. 电子态密度计算结果表明所采用的方法可以较好的描述体系的导带电子结构. 计算得到体系为导体,V-O键主要由O原子的2 p轨道与V原子的3 d轨道杂化形成,外加光场垂直和平行于c轴时体系的等离子振荡频率为3.44 eV和2.74 eV,光电导率在0-1 eV之间有一个与带内跃迁有关的德鲁德峰,而大于1 eV的光电导率主要由电子带间跃迁产生,得到并分析了带内跃迁过程和带间跃迁过程各自对反射谱和电子能量损失谱的贡献. 关键词： 光电性质 电子结构 缀加平面波方法 2')" href="#">VO₂     

Te掺杂单层MoS2的电子结构与光电性质

采用基于密度泛函理论的第一性原理计算,研究了Te掺杂对单层MoS₂能带结构、电子态密度和光电性质的影响。结果表明,本征单层MoS₂属于直接带隙半导体材料,其禁带宽度为1.64 eV。本征单层MoS₂的价带顶主要由S-3p态电子和Mo-4d态电子构成,而其导带底则主要由Mo-4d态电子和S-3p态电子共同决定;Te掺杂单层MoS₂为间接带隙半导体材料,其禁带宽度为1.47 eV。同时通过Te掺杂,使单层MoS₂的静态介电常数增大,禁带宽度变窄,吸收光谱产生红移,研究结果为单层MoS₂在光电器件方面的应用提供了理论基础。     

扶手椅型C3B纳米带:结构稳定性、电子特性及调控效应

单层C₃B是典型的类石墨烯二维材料,已在实验上成功制备.采用密度泛函理论方法(DFT)研究了扶手椅型单层C₃B纳米带的结构稳定性、电子性质及物理调控效应,计算结果表明:对于裸边纳米带,如果带边缘全由C原子组成(AA型),则电子相为半导体;两个带边缘均由C与B原子混合组成时(BB型),则纳米带的电子相为金属;而纳米带的一边由C原子组成、另一边由B与C原子混合构成(AB型),则纳米带的电子相为金属.这说明纳米带边缘的B原子对于纳米带成为金属或半导体起决定作用.而对于H端接的纳米带,它们全部为直接或间接带隙半导体.H端接的纳米带载流子迁移率一般比裸边纳米带低,这与它们较大的有效质量及较高的形变势有密切关系.同时发现半导体性质的纳米带对物理调控非常敏感,特别是在压应变和外电场作用下,纳米带的带隙明显变小,这有利于对光能的吸收和研发光学器件.     

硅烯饱和吸附碱金属原子的第一性原理研究

基于密度泛函理论的第一性原理计算, 研究了硅烯饱和吸附碱金属元素原子的稳定性、微观几何结构和电子性质, 并与纯硅烯及其饱和氢化结构进行了对比分析. 研究发现复合物SiX(X=Li, Na, K, Rb)的形成能都是负的, 相对于纯硅烯来说可以稳定存在. Bader电荷分析表明, 电荷从碱金属原子转移至硅原子. 从成键方式来看, 硅烯与氢原子形成共价键, 而与碱金属原子之间形成的键主要是离子性成键, 但还存在部分共价关联成分. 能带计算表明, 锂原子饱和吸附在硅烯形成的复合物SiLi是直接带隙的半导体, 带隙大小为0.34 eV. 其他碱金属饱和吸附在硅烯上形成的复合物都表现为金属性.     

BaZrO3和CaZrO3能带和光学性质的第一性原理研究

采用基于密度泛函理论基础上的CASTEP软件包,计算了BaZrO3和CaZrO3的能带以及光学性质.计算得到BaZrO3直接带隙和间接带隙分别为3.49 eV和3.23eV,CaZrO3直接带隙和间接带隙分别为3.73 eV和3.38 eV.对这两种材料的介电函数、吸收系数、反射系数、折射系数、湮灭系数和能量损失系数等光学系数进行了计算,并基于电子能带对光学性质进行了解释.得出,光学特性的异同是由于其内部微观结构上的异同所引起的.     

表面氢化双层硅烯的结构和电子性质

采用密度泛函理论(DFT)广义梯度近似GGA和HSB06方法研究了氢化双层硅烯(silicene)的结构和电子性质, 结果表明: 氢化后的双层硅烯可能存在三种稳定的构型, AA椅型、AB椅型和AA船型, 其中AA椅型和AB椅型结构最为稳定, 氢化后这三种稳定构型材料的性质由零带隙的半金属(semimetal)转变为禁带宽度分别为1.208, 1.437和1.111 eV 的间接带隙的半导体, 采用混合泛函HSB06计算修正得到的带隙分别为1.595, 1.785 和1.592 eV. 进一步分析了在双轴应变下氢化双层硅烯的带隙随应变的关系, 得到应变可以连续的调节材料的带隙宽度, 这些性质有可能应用于未来的纳米电子器件.     

P掺杂硅纳米管电子结构与光学性质的研究

采用基于密度泛函理论的第一性原理计算,研究了P掺杂对单壁扶手型硅纳米管电子结构和光学性质的影响.结果表明:经过P掺杂,单壁扶手型硅纳米管的能带结构从间接带隙变为直接带隙,其价带顶主要由Si-3p态电子构成,导带底主要由Si-3p态电子和Si-3s态电子共同决定;同时通过P掺杂,使单壁扶手型硅纳米管的禁带宽度变窄,导电性增强,吸收光谱产生红移.研究结果为硅纳米管在光电器件方面的应用提供了理论基础.     

硅烯的化学功能化

硅烯是一种零能隙的狄拉克费米子材料,对其能带结构的有效调控进而打开带隙是硅烯进一步器件化的基础.而化学功能化是调控二维材料的结构和电子性质的一种有效方法.本文简要介绍了近几年在硅烯的化学功能化方面取得的进展,主要包括硅烯的氢化、氧化、氯化以及其他几种可能的化学修饰方法.     

Tunable band gap and optical properties of surface functionalized Sc_2C monolayer

Using the density functional theory, we have investigated the electronic and optical properties of two-dimensional Sc_2C monolayer with OH, F, or O chemical groups. The electronic structures reveal that the functionalized Sc_2C monolayers are semiconductors with a band gap of 0.44–1.55 eV. The band gap dependent optical parameters, like dielectric function, absorption coefficients, reflectivity, loss function, and refraction index were also calculated for photon energy up to 20 eV. At the low-energy region, each optical parameter shifts to red, and the peak increases obviously with the increase of the energy gap. Consequently, Sc_2C monolayer with a tunable band gap by changing the type of surface chemical groups is a promising 2D material for optoelectronic devices.     

Functionalizing AlN monolayer with hydroxyl group: Effect on the structural and electronic properties

Two-dimensional (2D) materials play key role in designing and fabricating diminutive optoelectronic devices with high efficiency. In this paper, we report the results of a comprehensive first-principles study on the structural and electronic properties of the pristine and hydroxyl group OH-functionalized (OH-AlN-OH) AlN monolayer. GGA-PBE and hybrid HSE06 functionals are employed to describe the exchange-correlation potential. According to our calculations, the pristine AlN monolayer has a wide indirect band gap of 2.954(4.000) eV determined by PBE(HSE06) level of theory. Indirect-direct gap transition is obtained through the chemical functionalization and the band gap reduces to 0.775(2.125) eV. Results shows that the OH-AlN-OH monolayer is more suitable for optoelectronic applications. Finally, the strain is proven to be efficient factor to tune the electronic properties of the studied monolayers.     

Novel two-dimensional PdSe phase: A puckered material with excellent electronic and optical properties

By combining structural search and first-principles calculations, we predict a new stable two-dimensional PdSe monolayer, and systematically investigate its structural, electronic and optical properties. The calculated formation enthalpy, phonon spectra and molecular dynamic simulations confirm that PdSe monolayer possesses excellent thermodynamic and dynamic stability. PdSe monolayer is a semiconductor with an indirect band gap of ∼ 1.10 eV. The carrier transport of PdSe monolayer is dominated by hole and exhibits remarkable anisotropy due to the intrinsic structure anisotropy. The optical properties also show obvious anisotropic characteristic with considerable absorption coefficient and broad absorption from the visible to ultraviolet regions. Benefiting from these excellent physical properties, PdSe monolayer is expected to be a promising candidate as electronic and optoelectronic devices.     

Strain and chirality effects on the mechanical and electronic properties of silicene and silicane under uniaxial tension

We present first principles theory calculations on the mechanical and electronic properties of silicene and silicane structure under uniaxial tensile strain along different directions. Chirality effect is more significant in the mechanical properties of silicene than those of silicane. Different failure mechanisms are identified. A small band gap (up to 0.8 eV) is developed from zero with silicene structure under uniaxial tension and vanishes before the structure reaches its in-plane ultimate strength. However, a pre-existing band gap (2.39 eV) exists with silicane structure and decreases to zero with the increasing tensile strain without chirality effects.     

Monolayered semiconducting GeAsSe and SnSbTe with ultrahigh hole mobility

High carrier mobility and a direct semiconducting band gap are two key properties of materials for electronic device applications. Using first-principles calculations, we predict two types of two-dimensional semiconductors, ultrathin GeAsSe and SnSbTe nanosheets, with desirable electronic and optical properties. Both GeAsSe and SnSbTe sheets are energetically favorable, with formation energies of −0.19 and −0.09 eV/atom, respectively, and have excellent dynamical and thermal stability, as determined by phonon dispersion calculations and Born–Oppenheimer molecular dynamics simulations. The relatively weak interlayer binding energies suggest that these monolayer sheets can be easily exfoliated from the bulk crystals. Importantly, monolayer GeAsSe and SnSbTe possess direct band gaps (2.56 and 1.96 eV, respectively) and superior hole mobility (~20 000 cm²·V⁻¹·s⁻¹), and both exhibit notable absorption in the visible region. A comparison of the band edge positions with the redox potentials of water reveals that layered GeAsSe and SnSbTe are potential photocatalysts for water splitting. These exceptional properties make layered GeAsSe and SnSbTe promising candidates for use in future high-speed electronic and optoelectronic devices.     

A new stable polycrystalline Be2C monolayer: A direct semiconductor with hexa-coordinate carbons

In this paper, by means of the first principles calculations based on density functional theory, a new polycrystalline two-dimensional Be₂C namely Be₂C-III monolayer with orthorhombic atomic configuration is predicted. In this proposed monolayer, Be and C atoms are buckled in four different planes, in which each carbon atom binds to six beryllium atoms, while each beryllium atom is shared by three carbon and its three neighboring beryllium in a quasi-planar structure. First principles calculations confirmed that the new Be₂C-III monolayer is energetically, kinetically, and thermally stable. Through electronic properties investigations, it is found that the proposed monolayer is a direct semiconductor with a medium band gap of 1.75 (2.54 eV) calculated by PBE (HSE06) level of theory which can be effectively modulated by biaxial external strains. As a direct band gap semiconductor with high stabilities this new Be₂C monolayer is a promising candidate for application in electronics and optoelectronics devices.     

Penta-SiC5 monolayer: A novel quasi-planar indirect semiconductor with a tunable wide band gap

In this paper, by using of the first principles calculations in the framework of the density functional theory, we systematically investigated the structure, stability, electronic and optical properties of a novel two-dimensional pentagonal monolayer semiconductors namely penta-SiC₅ monolayer. Comparing elemental silicon, diamond, and previously reported 2D carbon allotropes, our calculation shows that the predicted penta-SiC₅ monolayer has a metastable nature. The calculated results indicate that the predicted monolayer is an indirect semiconductor with a wide band gap of about 2.82 eV by using Heyd–Scuseria–Ernzerhof (HSE06) hybrid functional level of theory which can be effectively tuned by external biaxial strains. The obtained exceptional electronic properties suggest penta-SiC₅ monolayer as promising candidates for application in new electronic devices in nano scale.     

A first principle calculation of electronic and dielectric properties of electrically gated low-buckled mono and bilayer silicene

The structural, electronic and dielectric properties of mono and bilayer buckled silicene sheets are investigated using density functional theory. A comparison of stabilities, electronic structure and effect of external electric field are investigated for AA and AB-stacked bilayer silicene. It has been found that there are no excitations of electrons i.e. plasmons at low energies for out-of-plane polarization. While for AB-stacked bilayer silicene 1.48 eV plasmons for in-plane polarization is found, a lower value compared to 2.16 eV plasmons for monolayer silicene. Inter-band transitions and plasmons in both bilayer and monolayer silicene are found relatively at lower energies than graphene. The calculations suggest that the band gap can be opened up and varied over a wide range by applying external electric field for bilayer silicene. In infra-red region imaginary part of dielectric function for AB-stacked buckled bilayer silicene shows a broad structure peak in the range of 75–270 meV compared to a short structure peak at 70 meV for monolayer silicene and no structure peaks for AA-stacked bilayer silicene. On application of external electric field the peaks are found to be blue-shifted in infra-red region. With the help of imaginary part of dielectric function and electron energy loss function effort has been made to understand possible interband transitions in both buckled bilayer silicene and monolayer silicene.