利用倒梯矩形电子阻挡层降低深紫外激光二极管的电子泄露

为了有效降低深紫外激光二极管(DUV-LD)在有源区的电子泄露,提出了一种新颖的具有倒梯矩形的电子阻挡层(EBL)结构。通过使用Crosslight软件将矩形,梯矩形和倒梯矩形三种不同的结构进行仿真研究,比较三种结构器件的能带图、辐射复合率、电子空穴浓度、P-I以及V-I特性等,得出倒梯矩形EBL更能有效地抑制电子的泄露,从而改善了器件的光学和电学性能。     

电子阻挡层Al组分对GaN基蓝光激光二极管光电性能的影响

采用SiLENSe（Simulator of light emitters based on nitride semiconductors）软件仿真研究了Al_xIn_yGa_1-x-yN电子阻挡层（EBL）Al组分渐变方式对GaN基激光二极管（LD）光电性能的影响,实现了提高输出功率和电光转换效率的目的。文中提出的四种Al组分渐变方式分别是传统均匀组分、右阶梯渐变组分（0～0.07～0.16）、三角形渐变组分（0～0.16～0）、左阶梯渐变组分（0.16～0.07～0）。结果表明,与传统均匀组分EBL结构相比,Al组分阶梯渐变Al_xIn_yGa_1-x-yN EBL LD导带底的电子势垒显著提高,价带顶的空穴势垒降低。这主要是由于该结构能有效抑制电子泄漏和提高空穴注入效率,从而提高有源区载流子浓度,进而提高有源区辐射复合效率。当注入电流为0.48 A时,采用Al组分阶梯渐变Al_xIn_yGa_1-x-y...     

利用山形空穴存储层结构对深紫外激光二极管的性能优化

为了有效提高深紫外激光二极管的空穴注入效率和减少电子泄露,优化其性能,设计出了在基础矩形空穴存储层结构上改进后的山形空穴存储层和倒山形空穴存储层。使用Crosslight软件模拟仿真倒山形和山形空穴存储层结构的电子浓度、电子电流密度、能带图以及P-I特性曲线。结果显示山形空穴存储层激光器的光学和电学性能优于矩形和倒山形激光器,因此山形空穴存储层激光器能有效地增加有源区空穴注入和减少电子泄露,提高有源区载流子浓度和辐射复合速率,实现了激光器优越的光电性能。     

多量子势垒双阻挡层结构对AlGaN 基深紫外激光二极管的性能优化

为提高AlGaN基深紫外激光二极管(Deep Ultraviolet Laser Diodes,DUV-LD)有源区内载流子浓度,减少载流子泄露,提出一种DUV-LD双阻挡层结构,相对于传统的单一电子阻挡层(Electron Blocking Layer, EBL)结构,又引入一空穴阻挡层(Hole Blocking Layer, HBL),仿真结果证明空穴阻挡层的应用能很好地减少空穴泄漏.同时又对双阻挡层改用五周期Al_0.98Ga_0.02N/Al_0.9Ga_0.1N多量子势垒层结构,结果显示与矩形EBL和HBL激光二极管相比,多量子势垒EBL和HBL激光二极管有更好的斜率效率,并且有源区内电子和空穴载流子浓度以及辐射复合速率都有效提高,其中多量子势垒EBL在阻挡电子泄露方面效果更显著.     

利用双阶梯波导层对深紫外激光二极管的性能优化

在深紫外激光二极管中,波导层的作用是用来传输并限制光束.传统的深紫外激光二极管存在很强的极化感应电场,这种电场能够降低深紫外激光二极管的光电性能.本文提出了一种新型双阶梯型上波导层(UWG)和下波导层(LWG),可以提高半导体激光器的性能.通过使用Crosslight软件将矩形、单阶梯型和双阶梯型波导层三种不同的结构进行仿真研究,比较三种结构器件的能带图、电子空穴浓度、辐射复合率、P-I以及V-I特性等.结果表明,新型双阶梯波导层结构的应用增加了电子有效势垒的高度,缓解了电子阻挡层的能带弯曲,减小了极化电场的影响,从而提升了该器件的光学和电学性能.     

太赫兹量子级联激光器中有源区上激发态电子向高能级泄漏的研究

利用热力学统计理论和激光器输出特性理论,建立了太赫兹量子级联激光器(THz QCL)有源区中上激发态电子往更高能级电子态泄漏的计算模型,以输出功率度量电子泄漏程度研究分析了晶格温度和量子阱势垒高度对电子泄漏的影响.数值仿真结果表明,晶格温度上升会加剧电子泄漏,并且电子从上激发态泄漏到束缚态的数量大于泄漏到阱外连续态,同时温度的上升也会降低激光输出功率.增加量子阱势垒高度能抑制电子泄漏,并且有源区量子阱结构中存在一个最优量子阱势垒高度. THz QCL经过最优量子阱势垒高度优化后,工作温度得到提升,其输出功率相比于以往的结果也有所提高.研究结果对优化THz QCL有源区结构、抑制电子泄漏和改善激光器输出特性有指导作用.     

利用W形空穴阻挡层降低AlGaN基深紫外激光二极管的空穴泄露

本文设计了V形和W形的空穴阻挡层(HBL)结构,改善空穴在AlGaN基深紫外激光二极管(DUV-LD)n型区的泄露问题.使用Crosslight软件,将参考型矩形、V形和W形三种空穴阻挡层结构进行仿真研究,分别比较了三种不同结构的DUV-LD能带、n区空穴浓度、辐射复合率、电光转换效率、有源区载流子浓度等特性,结果表明,具有W形空穴阻挡层的DUV-LD拥有更高的空穴有效势垒高度、更高的辐射复合率、更低的空穴泄露以及更好的斜率效率,可以有效降低深紫外激光二极管在n型区的空穴泄露,提升其光学和电学性能.     

Ce、Ga、La掺杂二维SnO2电子结构及光电性质的第一性原理研究

二维材料具有优异的光学、力学、热学、磁学等性质,成为研究的热点之一. SnO₂薄膜中的电子迁移率非常高,兼具透明和良好的导电性能,是一种性能绝佳的半导体材料.本文用密度泛函理论框架下的第一性原理研究了二维SnO₂及其掺杂体系的电子结构、电子态密度、导电性能及光学性质,计算结果表明：相比较于三维SnO₂,二维SnO₂的费米能级附近产生很多杂质能级,提高了载流子浓度,带隙明显变窄,电子的局域性增强,导带中电子的有效质量增加了,电子跃迁更容易发生,增加了材料的导电性能;二维SnO₂比三维SnO₂材料的电极化能力强,在红外区、可见光区、紫外区域的光子吸收性能更优异,光电导率更高,更有利于光生电子-空穴对的分离和迁移,即可以有效地提高其光电转换效率,其中掺杂La元素能更好地提高在红外区、可见光区及紫外区吸收光子的能力,更有利于光电转换的效率,提高导电性.     

三明治结构电子阻挡层中势阱深度对LED性能的影响

在LED中引入了Al0.1Ga0.9N-Al x Ga1-x N-Al0.1Ga0.9N多层电子阻挡层,并讨论结构中插入的势阱深度(即中间层Al x Ga1-x N的Al组分"x")的变化对LED性能带来的影响。研究发现,具有三明治结构电子阻挡层(EBL)的LED比传统LED具有更好的发光特性,并且其性能与电子阻挡层中的势阱深度密切相关。究其原因,一是由于电子阻挡层内部不同程度的晶格失配而引入的极化电场引起了电子阻挡层的有效势垒高度的不同;二是在于电子阻挡层中的势阱所产生的空穴聚集效应也会随着势阱深度的变化而变化。故而使得空穴注入效率和电子阻挡层对电子的限制作用在不同势阱深度的LED样品中有所不同。     

氧化锌锡作为电子传输层的量子点发光二极管

本文研究了以胶状量子点作为发光层和有机/无机混合材料作 为电子-空穴传输层的电致发光二极管器件. CdSe 量子点以薄膜的形式夹在无机氧化锌锡电子传输层和有机TPD空穴传输层中间构成三明治结构. 氧化锌锡电子传输层采用磁控溅射实现, 有机TPD空穴传输层和量子点发光层则采用旋涂的方法制备, 得到的QD-LEDs器件结构界面陡峭、表面平整. 光电特性表征结果显示器件的电致发光具有良好的单色性、低的开启电压, 利 用具有高电子迁移率和低载流子浓度的无机氧化锌锡薄膜作为电子传输层可 以实现器件在大气环境下稳定、明亮的电致发光. 本文分析了器件的工作机理并通过改变氧化锌锡的电导率达到控制器件中电子和空穴的注入比的目的, 优化了器件的光电性能. 关键词： 量子点 氧化锌锡 电致发光 电子传输层     

Improvement of radiative recombination rate in deep ultraviolet laser diodes with step-like quantum barrier and aluminum-content graded electron blocking layer

The design of the active region structures, including the modifications of structures of the quantum barrier(QB) and electron blocking layer(EBL), in the deep ultraviolet(DUV) Al Ga N laser diode(LD) is investigated numerically with the Crosslight software. The analyses focus on electron and hole injection efficiency, electron leakage, hole diffusion,and radiative recombination rate. Compared with the reference QB structure, the step-like QB structure provides high radiative recombination and maximum output power. Subsequently, a comparative study is conducted on the performance characteristics with four different EBLs. For the EBL with different Al mole fraction layers, the higher Al-content Al Ga N EBL layer is located closely to the active region, leading the electron current leakage to lower, the carrier injection efficiency to increase, and the radiative recombination rate to improve.     

Suppression of electron and hole overflow in GaN-based near-ultraviolet laser diodes

In order to suppress the electron leakage to p-type region of near-ultraviolet GaN/In_xGa_(1-x )N/GaN multiple-quantumwell(MQW) laser diode(LD), the Al composition of inserted p-type AlxGa_(1-x)N electron blocking layer(EBL) is optimized in an effective way, but which could only partially enhance the performance of LD. Here, due to the relatively shallow GaN/In_(0.04)Ga_(0.96)N/GaN quantum well, the hole leakage to n-type region is considered in the ultraviolet LD. To reduce the hole leakage, a 10-nm n-type Al_xGa_(1-x)N hole blocking layer(HBL) is inserted between n-type waveguide and the first quantum barrier, and the effect of Al composition of Al_xGa_(1-x)N HBL on LD performance is studied. Numerical simulations by the LASTIP reveal that when an appropriate Al composition of Al_xGa_(1-x)N HBL is chosen, both electron leakage and hole leakage can be reduced dramatically, leading to a lower threshold current and higher output power of LD.     

Numerical study of performance characteristics of deep violet InGaN DQW laser diodes with AlInGaN quaternary multi quantum barrier electron blocking layer

The performance characteristics of deep violet In_0.082Ga_0.918N/GaN double quantum well (DQW) laser diodes (LDs) with different electron blocking layer (EBL) including a ternary AlGaN bulk EBL, a quaternary AlInGaN bulk EBL and ternary AlGaN multi quantum barrier (MQB) EBL has been numerically investigated. Inspired by the abovementioned structures, a new LD structure with a quaternary AlInGaN MQB EBL has been proposed to improve the performance characteristics of the deep violet InGaN DQW LDs. Simulation results indicated that the LD structure with the quaternary AlInGaN MQB EBL present the highest output power, slope efficiency and differential quantum efficiency (DQE) and lowest threshold current compared with the above mentioned structures. They also indicated that choosing an appropriate aluminum (Al) and indium (In) composition in the quaternary AlInGaN MQB layers could control both piezoelectric and spontaneous polarizations. It will decrease the electron overflow from the active region to p-side and increased the contribution of electron and hole carriers to the radiative recombination effectively. Enhancing radiative recombination in the well using the quaternary AlInGaN MQB EBL also increased the optical output power and optical intensity.     

Performance improvement of blue InGaN light-emitting diodes with a specially designed n-AlGaN hole blocking layer

Blue InGaN light-emitting diodes (LEDs) with a conventional electron blocking layer (EBL), a common n-AlGaN hole blocking layer (HBL), and an n-AlGaN HBL with gradual Al composition are investigated numerically, which involves analyses of the carrier concentration in the active region, energy band diagram, electrostatic field, and internal quantum efficiency (IQE). The results indicate that LEDs with an n-AlGaN HBL with gradual Al composition exhibit better hole injection efficiency, lower electron leakage, and a smaller electrostatic field in the active region than LEDs with a conventional p-AlGaN EBL or a common n-AlGaN HBL. Meanwhile, the efficiency droop is alleviated when an n-AlGaN HBL with gradual Al composition is used.     

Enhanced carrier injection in InGaN/GaN multiple quantum wells LED with polarization-induced electron blocking barrier

In this report, we designed a light emitting diode (LED) structure in which an N-polar p-GaN layer is grown on top of Ga-polar In_0.1Ga_0.9N/GaN quantum wells (QWs) on an n-GaN layer. Numerical simulation reveals that the large polarization field at the polarity inversion interface induces a potential barrier in the conduction band, which can block electron overflow out of the QWs. Compared with a conventional LED structure with an Al_0.2Ga_0.8N electron blocking layer (EBL), the proposed LED structure shows much lower electron current leakage, higher hole injection, and a significant improvement in the internal quantum efficiency (IQE). These results suggest that the polarization induced barrier (PIB) is more effective than the AlGaN EBL in suppressing electron overflow and improving hole transport in GaN-based LEDs.     

Performance improvement of blue light-emitting diodes with an AlInN/GaN superlattice electron-blocking layer

The characteristics of a blue light-emitting diode (LED) with an AlInN/GaN superlattice (SL) electron-blocking layer (EBL) are analyzed numerically. The carrier concentrations in the quantum wells, energy band diagrams, electrostatic fields, and internal quantum efficiency are investigated. The results suggest that the LED with an AlInN/GaN SL EBL has better hole injection efficiency, lower electron leakage, and smaller electrostatic fields in the active region than the LED with a conventional rectangular AlGaN EBL or a AlGaN/ GaN SL EBL. The results also indicate that the efficiency droop is markedly improved when an AlInN/GaN SL EBL is used.     

Experimental determination of critical threshold in electron transport on Tore Supra

In Tore Supra plasmas with fast wave electron heating, a critical threshold in the electron temperature gradient (inverted DeltaT(e)) is clearly observed, i.e., a finite value of inverted DeltaT(e) for which the turbulent heat diffusivity vanishes. The radial profile of this critical gradient is experimentally determined from a set of discharges characterized by similar plasma parameters with fast wave powers ranging from 0.75 to 7.4 MW. The dependence of the electron heat flux on the gradient length is found to be offset linearly. The offset term increases linearly with the ratio of the local magnetic shear to the safety factor.     

Reduction of Electron Leakage in a Deep Ultraviolet Nitride Laser Diode with a Double-Tapered Electron Blocking Layer

A double-tapered AlGaN electron blocking layer (EBL) is proposed to apply in a deep ultraviolet semiconductor laser diode. Compared with the inverse double-tapered EBL, the laser with the double-tapered EBL shows a higher slope efficiency, which indicates that effective enhancement in the transportation of electrons and holes is achieved. Particularly, comparisons among the double-tapered EBL, the inverse double-tapered EBL, the singletapered EBL and the inverse single-tapered EBL show that the double-tapered EBL has the best performance in terms of current leakage.