Electroluminescence of Boron and Nitrogen Doped Diamond Thin Films

An electroluminescence (EL) device is investigated by using boron and nitrogen double-doped diamond films.The characteristics of the EL spectrum and the dependence of EL intensity on boron and nitrogen impurity are investigated.The experiment indicated that the intensity of EL increases obviously and the threshold voltage decreases with increasing nitrogen impurity within our doped level.Meanwhile the highest emission line changes from the blue region (peaks at 470nm) to the yellow region (peaks at 584nm).     

Growth-Parameter Spaces and Optical Properties of Cubic Boron Nitride Films on Si（001）

Cubic boron nitride （c-BN） films were deposited on Si（001） substrates in an ion beam assisted deposition （IBAD） system under various conditions, and the growth parameter spaces and optical properties of c-BN films have been investigated systematically. The results indicate that suitable ion bombardment is necessary for the growth of c-BN films, and a well defined parameter space can be established by using the P/a-parameter. The refractive index of BN films keeps a constant of 1.8 for the c-BN content lower than 50%, while for c-BN films with higher cubic phase the refractive index increases with the c-BN content from 1.8 at χc =50% to 2.1 at χc = 90%. Furthermore, the relationship between n and p for BN films can be described by the Anderson-Schreiber equation, and the overlap field parameter γ is determined to be 2.05.     

Growth Feature of Cubic Boron Nitride on c-BN Crystal Substrates

Cubic boron nitride （c-BN） films were deposited on highly-oriented （111） bulk c-BN crystal by using the rf magnetron sputtering method. The growth films are characterized by micro-Raman spectroscopy （μ-RS） and scanning electron microscopy （SEM）, The results show that the high crystallization electron transparent c-BN films in thickness of about 10μm are obtained, Island and step growth models are clearly shown.     

Oxygen Pressure Dependence of Properties of Epitaxial LaAlO3 Films Grown on Si （100）

Heteroepitaxial LaAlO3 films were grown on a SrTiO3/Si (100) substrate by laser molecular beam epitaxy under different oxygen pressures, and their properties such as crystallinity and electrical characteristics were experimentally investigated using the various measurement methods. The results show that most properties depend mainly on the deposition oxygen pressure. The crystallinity and the C-V and I-V characteristics can be greatly improved with the increasing oxygen deposition pressure. Moreover, after annealed at 1050~C in N2 ambient, the C-V and I-V characteristics of LAO films deposited at the lower oxygen pressure are also improved due to the decrease of oxygen vacancies in LAO films.     

Effects of Substrate Temperature and Nitrogen Pressure on Growth of AIN Films by Pulsed Laser Deposition

Highly oriented aluminium nitride （AIN） films are grown on p-Si （100） substrates by pulsed laser deposition, and their characteristics of structure and composition are studied by x-ray diffraction, Fourier transform infrared spectroscopy and scanning electron microscopy. The results show that the deposited films exhibit good crystalline properties with a sharp x-ray diffraction peak at 2θ= 33.15 ° corresponding to AIN h （100） crystalline orientation. The influences of substrate temperature and ambient nitrogen （N2） pressure on the crystallinity of A1N films are remarkable. At room temperature, when the ambient N2 pressure arises from 5 × 10^-6 Pa to 5 Pa, the crystallinity of the film becomes better. When the substrate temperature is 600℃, the film has the best crystallinity at 0.05 Pa. Furthermore, the effects of substrate temperature and ambient N2 pressure on the combination of A1-N bonds and surface morphology of AIN films are also studied.     

Structure,Electrical,and Optical Properties of Nb-doped BaTiO3 Thin Films Grown by Laser Molecular Beam Epitaxy

Structure,electrical,and optical properties of Nb-doped BaTiO3 (Nb:BTO) thin films on MgO substrates grownby laser molecular beam epitaxy with increasing Nb content were investigated.The Nb:BTO thin films with high crystallinity are epitaxially grown on MgO substrates.With more Nb-doped content,the impurity phases are found in Nb:BTO thin films.Hall measurement at room temperature confirms that the charge carriers of the Nb:BTO thin films are n-type.When the Nb-doped content increases,the carrier concentration and carrier mobility increase.Meanwhile the optical transmittance decreases with the increase of the Nb-doping,and the width of the forbidden band in each group is not affected by the presence of Nb in the samples.Raman spectra show that the structural phase transition may occur with the increase of the Nb-doping content,in the meantime more defects and impurities exist in the Nb:BTO thin films.     

Controlled Growth of Carbon Nanotubes and its Field Emission Properties

Uniform films of aligned carbon nanotubes were grown on a patterned Ni coated ceramic substrate by microwaveplasma chemical vapour deposition (MWPCVD). A laser writing technique was used to make some patterns onthe substrate. The controlled selective growth of nanotubes on the patterned substrate can be obtained directlyduring the reaction process in the MWPCVD chamber. The Raman spectrum shows a good graphitization of thecarbon nanotubes. In the field emission test, turn-on field of 1 V/μm and emission current density of 5 mA/cm^2 at 3.3 V/μm were achieved.     

Effect of Incident Intensity on Films Growth in Pulsed Laser Deposition

Incident intensity, defined by the amount of particles deposited per pulse, is an important parameter in the film growth process of pulsed laser deposition （PLD）. Different from previous models, we investigate the irreversible and reversible growth processes by using a kinetic Monte Carlo method and find that island density and film morphology strongly depend on pulse intensity. At higher pulse intensities, lots of adatoms instantaneously diffuse on the substrate surface, and then nucleation easily occurs between the moving adatoms resulting in more smaller-size islands. In contrast, at the lower pulse intensities, nucleation event occurs preferentially between the single adatom and existing islands rather than forming new islands, and therefore the average island size becomes larger in this case. Additionally, our results show that substrate temperature plays an important role in film growth. In particular, it can determine the films shape and weaken the effect of pulse intensity on film growth at the lower temperatures by controlling the mobility rate of atoms. Our results can match the related theoretical and experimental results.     

Growth and Optical Properties of Double Heterostructure GaN／InGaN／GaN Films with Large Composition

The double heterostructure GaN/InGaN/GaN films with different thicknesses of the InGaN layer were grown at 780℃ or 800℃ by metal-organic chemical vapour deposition.The samples were investigated using x-ray diffraction (XRD),room-temperature photoluminescence (PL) and Raman scattering.The dependences of the samples on both the growth temperature and the thickness of the InGaN layer were studied.The composition of InGaN was determined by the results of XRD,and the bowing parameter of InGaN was calculated in terms of the PL spectra.When the thickness of the InGaN layer was reduced,the phase separation of InGaN was found in some samples.The raman frequency of the A1(LO) and E2(low) modes in all the samples shifted and did not agree with Vegard‘s law.     

Substrate Dependence of Properties of Sputtered ITO Films

High-quality indium-tin-oxide (ITO) films are deposited on p-type Czochralski silicon and 7059 Coming glass by direct-current magnetron sputtering at various temperatures. The structural, electrical and optical properties of the ITO films are investigated as functions of the substrate temperature. A comparison between the characteristics of the ITO films on silicon and Coming glass is presented. The results show that for the ITO film on silicon,the nucleation begins from room temperature; the resistivity reaches a maximum value at 75℃; the reflectivity increases with increasing temperature; when temperature is above 125℃, the ITO grows in a three-dimensional manner and forms a granular structure. However, for the ITO film on glass, it is still in an amorphous state at 75℃. Moreover, both the resistivity and the reflectivity decrease with increasing temperature. Above 125℃, the ITO grows in a two-dimensional manner and forms a domain structure.     

Experimental Studies on Thermal and Electrical Properties of Platinum Nanofilms

We experimentally studied the in-plane thermal and electrical properties of a suspended platinum nanofilm in thickness of 15 nm. The measured results show that the in-plane thermal conductivity, the electrical conductivity and the resistance-temperature coefficient of the studied nanofilm are much less than those of the bulk material, while the Lorenz number is greater than the bulk value. Comparing with the results reported previously for the platinum nanofilm in thickness of 28 nm, we further find that the in-plane thermal conductivity, the electrical conductivity and the resistance-temperature coefficient decrease with the decreasing thickness of the nanotilm, while the Lorenz number increases with the decreasing thickness of the nanofilm. These results indicate that strong size effects exist on the in-plane thermal and electrical properties of platinum nanofilms.     

Structural Characterization and Photoluminescent Properties of Zn1—xMgxO Films on Silicon

Zn1-xMgxO films have been grown on silicon at various substrate temperatures by pulsed laser deposition.The structural and photoluminescent properties of films as a function of substrate temperature have been studied.The optimized substrate temperature is 650℃.The x-ray diffraction spectra indicate that the films are highly C-axis oriented,and no phase separation is observed.The crystal grain size of the films is about 100nm as examined by atomic force microscopy.The cross-sectional transmission electron microscopy verified the C-axis orientation of the Zn1-xMgxO.Thesr films showed ultraviolet photoluminescence at room temperature.The near-band-edge emission peak of the Zn1-xMgxO film deposited at 600℃ has a blueshift (0.40eV) larger than that of the film deposited at 500℃ (0.33eV).The ratio of the near-band-edge to defect level peak intensity is as large as 159.     

Effect of Post-Annealing on Microstructural and Electrical Properties of N^＋Ion-Implanted into ZnO：In Films

We fabricate p-type conductive ZnO thin films on quartz glass substrates by codoping of In-N using radio frequency magnetron sputtering technique together with the direct implantation of acceptor dopants （nitrogen）. The effects of thermal annealing on the structure and electrical properties of the ZnO films are investigated by an x-ray diffractometer （XRD） and a Hall measurement system. It is found that the best p-type ZnO film subjected to annealed exhibits excellent electrical properties with a hole concentration of 1.22 × 10^18 cm^-3, a Hall mobility of 2.19 cm^2 V^-1 s^- 1, and a low resistivity of about 2.33 Ωcm, indicating that the presence of In may facilitates the incorporation of N into ZnO thin films.     

Effects of Sm Substitution on Magnetic and Magneto—Optical Properties of TbCo／Cr Films

The effects of Sm substitution on magnetic and magneto-optical properties of TbCo/Cr films have been investigated. It was found that partial Tb substituted by Sm will directly affect the magnitude of saturation magnetization Ms and the Kerr rotation angle. These results are explained by the ferri-magnetical structure of the rare earth-transition metal alloy. When the magnetic layer composition was (Sm0.343Tb0.657)31 Co69, values of magnetization as high as 385emu/cm^3 and coercivity above 4.7kOe at room temperature were obtained.     

Investigation of Oxygen Vacancy and Interstitial Oxygen Defects in ZnO Films by Photoluminescence and X-Ray Photoelectron Spectroscopy

ZnO films prepared at different temperatures and annealed at 900^o C in oxygen are studied by photoluminescence （PL） and x-ray photoelectron spectroscopy （XPS）. It is observed that in the PL of the as-grown films the green luminescence （GL） and the yellow luminescence （YL） are related, and after annealing the GL is restrained and the YL is enhanced. The 0 ls XPS results also show the coexistence of oxygen vacancy （Vo） and interstitial oxygen （Oi） before annealing and the quenching of the Vo after annealing. By combining the two results it is deduced that the GL and YL are related to the Vo and Oi defects, respectively.     

MOCVD Growth and Characterization of Epitaxial AlxGa1-xN Films

We study the growth of AlxGa1-x N epilayers on （0001） sapphire by low-pressure MOCVD, using a lowtemperature AIN buffer. By varying the input flow rates of trimethylgallium （TMGa）, we obtain crack-free AlGaN films in the whole range of composition. A linear relationship between gas and solid Al content is observed. The structural properties of the layers （x =0- 1） are investigated by x-ray diffraction, atomic force microscopy （AFM） and scanning electron microscopy （SEM）. It is found that a two-direction growth appears along the c-axis and the （1011） directions for x ≥ 0.45. From the results of Raman spectroscopy, we suggest that the compressive stain and the lack of mobility orAl adatoms can induce the formation of （1011） grains.     

Growth and Characterization of InN Thin Films on Sapphire by MOCVD

Indium nitride thin films are grown on sapphire substrates by metal-organic chemical vapour deposition （MOCVD） By employing three-step layer buffers, the mirror-like layers on two-inch sapphire wafers have been obtained. The structural, optical and electrical characteristics of InN are investigated by x-ray diffraction, scanning electron microscopy, atomic force microscopy, photoluminescence and infrared optical absorption. The photoluminescence and the absorption studies of the materials reveal a marked energy bandgap structure around 0.70eV at room temperature. The room-temperature Hall mobility and carrier concentration of the film are typically 939 cm^2 /Vs, and 3.9 × 1018cm^-3, respectively.