硫钒铜矿化合物电子结构和电致变色特性的第一原理研究

基于密度泛函的第一原理赝势平面波方法,计算晶体结构、电子结构和光学性质,研究硫钒铜矿化合物Cu₃VS₄、Cu₃NbS₄和Cu₃TaS₄的电子输运及电致变色特性,探讨作为透明半导体材料应用于太阳能电池和电致变色器件的可能性.电子结构的计算表明这类化合物是间接带隙半导体,其电子能带的导带底和价带顶分别位于布里渊区的X点和R点.价带顶的电子本征态主要来自于Cu原子的d电子轨道,而导带底电子态主要来源于VB族元素原子的d电子轨道.能带结构、电荷布居分析、电子局域化函数和光吸收及反射谱的计算表明这些硫钒铜矿化合物属于极性共价半导体,具有较高的电荷迁移率和优良的电致变色特性,可应用于高效电致变色器件.     

Identification of the double and single acceptor state of isolated NiGa in GaAs

The question of the exact energy positions of isolated Ni_Ga as well as their optical and electrical properties have not yet been fully clarified in GaAs. We present a systematic study by deep-level transient spectroscopy, deep-level optical spectroscopy and optical absorption performed on several Ni-doped GaAs materials: n- and p-type LEC (liquid-encapsulated Czochralski) grown and p-type layers grown by liquid-phase epitaxy (LPE). All the electrical and optical results are up to now relatively coherent with the following identifications: (i) the double-acceptor charge state (Ni⁺ /Ni²⁺) is at E_c - 0.4 eV, (ii) the single-acceptor charge state (Ni²⁺ / Ni³⁺) is at E_v + 0.2 eV. However, when Ni is introduced during LPE in p-type materials we do not detect the Ni²⁺ /Ni³⁺ level which suggest a very low solubility of Ni in the LPE growth conditions.     

内在缺陷与Cu掺杂共存对ZnO电磁光学性质影响的第一性原理研究

采用基于自旋密度泛函理论的平面波超软赝势方法,研究了Cu掺杂ZnO (简称Cu_(Zn))与内在缺陷共存对ZnO电磁光性质的影响.结果表明,Cu是以替位受主的形式掺入的;制备条件对Cu_(Zn)及内在缺陷的形成起至关重要的作用,富氧条件下Cu掺杂有利于内在缺陷的形成,且Cu_(Zn)-O_i最易形成;相反在缺氧条件下,Cu掺杂不利于内在缺陷的形成.替位Cu的3d电子在价带顶形成未占据受主能级,产生p导电类型.与Cu_(Zn)体系相比,Cu_(Zn)-V_O体系中载流子浓度降低,导电性变差;Cu_(Zn)-V_(Zn)体系中载流子浓度几乎不变,对导电性没影响;Cu_(Zn)-O_i体系中载流子浓度升高,导电性增强.纯ZnO体系无磁性;而Cu掺杂ZnO体系,与Cu原子相连的O原子,电负性越小,键长越短,对磁矩贡献越大;Cu_(Zn)与Cu_(Zn)-O_i体系中的磁矩主要是Cu的3d电子与Z轴上O的2p电子耦合产生的;Cu_(Zn)中存在空位缺陷(V_O,V_(Zn))时,磁矩主要是Cu 3d电子与XY平面内O的2p电子强烈耦合所致;Cu_(Zn)中存在V_(Zn)时,磁性还包含V_(Zn)周围0(5, 6)号原子2p轨道自旋极化的贡献;所有体系中Zn原子自旋对称,不产生磁性.Cu_(Zn)-V_(Zn)和Cu_(Zn)-O_i缺陷能态中,深能级中产生的诱导态是0-0 2s电子相互作用产生的.Cu_(Zn)模型的光学带隙减小,导致吸收边红移;Cu_(Zn)-V_(Zn)模型中吸收和反射都增强,使得透射率降低.     

Simulation design of P–I–N-type all-perovskite solar cells with high efficiency

According to the good charge transporting property of perovskite, we design and simulate a p–i–n-type all-perovskite solar cell by using one-dimensional device simulator. The perovskite charge transporting layers and the perovskite absorber constitute the all-perovskite cell. By modulating the cell parameters, such as layer thickness values, doping concentrations and energy bands of n-, i-, and p-type perovskite layers, the all-perovskite solar cell obtains a high power conversion efficiency of 25.84%. The band matched cell shows appreciably improved performance with widen absorption spectrum and lowered recombination rate, so weobtain a high J_(sc) of 32.47 m A/cm~2. The small series resistance of the all-perovskite solar cell also benefits the high J_(sc). The simulation provides a novel thought of designing perovskite solar cells with simple producing process, low production cost and high efficient structure to solve the energy problem.     

GGA+U方法研究ZnO孪晶界对V_(Zn)-N_O-H复合体对p型导电性的影响

采用基于密度泛函理论的广义梯度近似平面波赝势方法,探究四种ZnO-Σ7(1230)孪晶界中V_(Zn)-N_O-H复合体的电子结构和p型导电机理.计算结果表明,在ZnO-Σ7(1230)孪晶界中,N掺杂后会与锌空位(V_(Zn))、氢填隙(Hi)等点缺陷结合,进而形成V_(Zn)-N_O-H复合体,并出现在孪晶中的晶格应变集中区.此外,四种孪晶界中孪晶GB7a有利于V_(Zn)-N_O-H离化能降低,从而使其表现出浅受主特征.分析显示特殊的孪晶结构导致了氮替位(N_O)与近邻的O原子间距离缩短,阴离子之间发生相互作用,导致禁带中的空带能级下降,降低了电子跃迁所需能量.这一结果也说明GB7a孪晶界中的V_(Zn)-N_O-H可能成为N掺杂ZnO材料的p型导电的来源之一.     

多元半导体光伏材料中晶格缺陷的计算预测

半导体光伏材料的发展在过去60多年中表现出了清晰的多元化趋势. 从20世纪50年代的一元Si太阳能电池, 到20世纪60年代的GaAs和CdTe电池、70年代的CuInSe₂电池、80年代的Cu(In, Ga) Se₂、90年代的Cu₂ZnSnS₄电池, 再到最近的Cu₂ZnSn(S, Se)₄和CH₃NH₃PbI₃电池, 组成光伏半导体的元素种类从一元逐渐增多到五元. 元素种类的增多使得半导体物性调控的自由度增多, 物性更加丰富, 因而能满足光伏等器件应用的需要. 但是, 组分元素种类的增多也导致半导体中晶格点缺陷的种类大幅增加, 可能对其光学、电学性质和光伏性能产生显著影响. 近20年来, 第一性原理计算被广泛应用于半导体中晶格点缺陷的理论预测, 相对于间接的实验手段, 第一性原理计算具有更加直接的、明确的优势, 并且能对各种点缺陷进行快速的研究. 对于缺陷种类众多的多元半导体体系, 第一性原理计算能预测各种点缺陷的微观构型、浓度和跃迁(离化)能级位置, 从而揭示其对光电性质的影响, 发现影响器件性能的关键缺陷. 因而, 相关的计算结果对于实验研究有直接、重要的指导意义. 本文将首先介绍半导体点缺陷研究的第一性原理计算模型和计算流程; 然后, 总结近5年来两类新型光伏半导体材料, 类似闪锌矿结构的Cu₂ZnSn(S, Se)₄半导体和有机-无机杂化的钙钛矿结构CH₃NH₃PbI₃半导体的点缺陷性质; 以这两类体系为例, 介绍多元半导体缺陷性质的独特特征及其对太阳能电池器件性能的影响.     

硅锗量子阱结构在硅异质结太阳电池中应用的数值模拟

利用半导体工艺和器件仿真软件silvaco TCAD(Technology Computer Aided Design),模拟研究了采用硅/硅锗合金(silicon/silicon germanium alloy,Si/Si_(1-x)Ge_x)量子阱结构作为吸收层的薄膜晶体硅异质结太阳电池各项性能.模拟结果显示,长波波段光学吸收随锗含量的增加而增加,而开路电压则因Si_(1-x)Ge_x)层带隙的降低而下降.锗含量为0.25时,短路电流密度的增加补偿了开路电压的衰减,效率提升0.2%.氢化非晶硅/晶体硅(a-Si:H/c-Si)界面空穴密度以及Si_(1-x)Ge_x)量子阱的体空穴载流子浓度制约着空穴费米能级的位置,进而影响到开路电压的大小.随着锗含量增加,a-Si:H/c-Si界面缺陷对开压的影响降低,Si_(1-x)Ge_x)量子阱的体缺陷对开压的影响则相应增加.高效率含Si_(1-x)Ge_x)量子阱结构的硅异质结太阳电池的制备需要a-Si:H/c-Si界面缺陷的良好钝化以及高质量Si_(1-x)Ge_x)量子阱的生长.     

Impurity levels of iron-group ions in TiO2(II)

Photocurrent measurements on oxidized, single-crystal TiO₂ undoped and doped with V, Cr, Mn or Fe were made both before and after exposure to white light from a tungsten lamp; they revealed a band of states centered at 2.0 eV below the conduction-band edge E_c that appears to be the band of surface states active in the photoelectrolysis of water. They also revealed a band of bulk states extending from near the valence-band edge E_v to about 1.9 eV below E_c. The ESR signals from V⁴⁺, Cr³⁺ and Fe³⁺ ions in oxidized samples and from Mn³⁺ ions in reduced samples were measured before and after exposure to white and monochromatic light; changes in the ESR signal intensities allow placement of the V⁴⁺: d¹ level about 2.1 eV below E_c, the Cr³⁺: d³ level about 2.7 eV belo E_c, the Fe³⁺ level at or just below the valence band edge E_v which is 3.0 eV below E_c, the Fe²⁺ level approximately at E_c, the Mn³⁺ level about 1.9 eV below E_c. Comparison of experiments on oxidized and reduced samples suggests that the bulk states are associated with cation vacancies, and measurements with polarized light gave anisotropies that are qualitatively interpretable with a cation-vacancy model for the oxidized samples.     

Stimulated recombination from the defect level in doped lead telluride

The relaxation processes of the photoexcited carriers from the defect level in the band gap to the valence band states were investigated in Na and Tl doped p-type PbTe single crystals at T = 77 K. The observed photosignal oscillations were proved to be induced by stimulated recombination of photoexcited carriers from the defect level E_d ≈ 50 meV above the top of the valence band. Non-equilibrium carrier inversion population was produced by impulses of a TEA CO₂-laser. The observed stimulated recombination may presumably be used for designing IR semiconductor lasers operating in the wavelength range of λ ∼ 25 μm at T = 77 K.     

Ce和O空位共掺杂TiO_2的电子结构与光学性质

采用基于密度泛函理论加U的计算方法,研究了Ce和O空位单(共)掺杂锐钛矿相TiO_2的电子结构和光吸收性质.计算结果表明,Ce和O空位共掺杂TiO_2的带隙中出现了杂质能级,且带隙窄化为2.67 eV,明显比纯TiO_2和Ce,O空位单掺杂TiO_2的要小,因而可提高TiO_2对可见光的响应能力,使TiO_2的光吸收范围增加.光吸收谱显示,掺杂后TiO_2的光吸收边发生了显著红移;在400.0—677.1 nm的可见光区,共掺杂体系的光吸收强度显著高于纯TiO_2和Ce单掺杂TiO_2,而略低于O空位单掺杂TiO_2.此外,Ce掺杂TiO_2中引入O空位后,TiO_2的导带边从-0.27 eV变化为-0.32 eV,这表明TiO_2的导带边的还原能力得到了加强.计算结果为Ce和O空位共掺杂TiO_2在可见光光解水方面的进一步研究提供了有力的理论依据.     

碲化铋薄膜载能粒子相互作用的超快研究

碲化铋禁带宽度非常窄而具有高电导率和塞贝克系数,同时具有低热导率,成为已知室温下优值系数最高的热电材料。已有研究表明,纳米薄膜和超晶格是进一步提高材料热电性能的可行途径。因此超快研究碲化铋纳米薄膜中载能子间的相互作用过程对开发高性能热电材料有重要意义。本文采用飞秒激光泵浦-探测技术,实验研究了沉积在硅基底上厚度为100 nm碲化铋薄膜中各载能粒子的相互作用过程。通过改变延迟时间步长,分别观察到价带电子被光子激发跃迁至导带,激发电子在导带内与声子的能量弛豫及导带电子与空穴复合跃迁至价带,并将能量传递给声子导致声子温度升高的过程。此外,还观察到热应力产生的声波,并据此得到了碲化铋薄膜中纵波声速为2649 m s^-1。     

Hydrogen diffusion in crystalline semiconductors

The diffusion of hydrogen in semiconductors is complicated by the existence of several charge states (notably H⁺ in p-type material and H^- or H⁰ in n-type material, at least for Si) and also that hydrogen is present in a number of different forms, namely atomic, molecular or bound to a defect or impurity. Since the probability of formation of these different states is dependent on the defect or impurity type and concentration in the material and on the hydrogen concentration itself, then the apparent hydrogen diffusivity is a function of the sample conductivity and type and of the method of hydrogen insertion. Under conditions of low H⁺ concentration in p-type Si, for example, the diffusivity is of the order of 10^-10 cm² · s^-1 at 300 K and is consistent with the value expected from an extrapolation of the Van Wieringen and Warmoltz expression D_H = 9.4 × 10^-3 exp[-0.48 eV/kT] cm² · s^-1. The characteristics of hydrogen diffusion in n- and p-type Si and GaAs are reviewed in this paper, and the retardation of hydrogen permeation by molecular formation and impurity trapping is discussed. The measurement of several key parameters, including the energy levels for the hydrogen donor and acceptor in Si and the diffusivity of the H⁰ and H^- species, would allow a more quantitative treatment of hydrogen diffusion in semiconductors.     

基于氧化镍背接触缓冲层碲化镉薄膜太阳电池的研究

采用电子束蒸发法制备了NiO薄膜,并对其作为碲化镉薄膜太阳电池背接触缓冲层材料进行了相关研究.NiO缓冲层的加入使得碲化镉太阳电池开路电压显著增大.通过X射线光电子能谱测试得到的NiO/CdTe界面能带图表明NiO和CdTe的能带匹配度很好.NiO是宽禁带P型半导体材料,在电池背接触处形成背场,减少了电子在背表面处的复合,从而提高电池开路电压.通过优化NiO薄膜厚度,制备得到转换效率为12.2%、开路电压为789 mV的碲化镉太阳电池.研究证实NiO是用来制备高转换效率、高稳定性碲化镉薄膜太阳电池的一种极有前景的缓冲层材料.     

Ag-N共掺p型ZnO的第一性原理研究

采用基于密度泛函理论的第一性原理赝势法对Ag-N共掺杂ZnO体 系以及间隙N和间隙H掺杂p型ZnO: (Ag, N)体系的缺陷形成能和离化能进行了研究. 结果表明, 在Ag_Zn和N_O所形成的众多受主复合体中, Ag_Zn-N_O受主对不仅具有较低的缺陷形成能同时其离化能也相对较小, 因此, Ag_Zn-N_O受主对的形成是Ag-N共掺ZnO体系实现p型导电的主要原因. 研究发现, 当ZnO: (Ag, N)体系有额外间隙N原子存在时, Ag_Zn-N_O受主对容易与N_i形成Ag_Zn-(N₂)_{m O}施主型缺陷, 该施主缺陷的形成降低了Ag-N共掺ZnO的掺杂效率因而不利于p型导电. 当间隙H引入到ZnO: (Ag, N)体系时, H_i易与Ag_Zn-N_O受主对形成 受主-施主-受主复合结构(Ag_Zn-H_i-N_O), 此复合体的形成不仅提高了Ag_Zn-N_O受主对在ZnO中的固溶度, 同时还能使其受主能级变得更浅而有利于p型导电. 因此, H辅助Ag-N共掺ZnO可能是一种有效的p型掺杂手段. 关键词： p型ZnO 缺陷形成能 受主离化能 第一性原理     

利用晶体结构工程提升GeSe化合物热电性能的研究

在热电研究领域, Ge Se是一种二维层状结构具有较大带隙的半导体,本征载流子浓度低,热电性能差.在本工作中,采用熔融淬火结合放电等离子活化烧结工艺制备了一系列的Ge Se_1–x Te_x (x=0, 0.05, 0.15, 0.25,0.35, 0.45)多晶样品,研究了Te含量对Ge Se化合物物相结构和热电输运性能的影响规律.结果表明:随着Te含量的增加, Ge Se的晶体结构逐渐由正交相向菱方相转变,使得材料的带隙降低,载流子浓度和迁移率同步增加;同时,晶体对称性的提高增加了化合物的能带简并度,有效提高了载流子有效质量.在这些因素的共同作用下,菱方相Ge Se的功率因子比正交相Ge Se提高约2—3个数量级.此外,菱方相Ge Se具有丰富的阳离子空位缺陷以及铁电特性所导致的声子软化现象,这导致其晶格热导率比正交相Ge Se降低近60%.当Te含量为0.45时,样品在573 K取得最大热电优值ZT为0.75,是本征Ge Se样品的19倍.晶体结构工程是提升Ge Se化合物热电性能的有效途径.     

The role of CdCl2 treatments and annealing in the formation of sintered CdTe nanocrystal solar cells

Solution processing of CdTe nanocrystals is a promising approach for the fabrication of low cost photovoltaic devices at low process temperatures. However despite the inherent advantages of this approach, the nanoscale physical mechanisms underlying the fabrication process are not well understood. Here we demonstrate that chemical treatment of CdTe nanoparticles leads to the production of a deep valence band edge. However, the removal of ligands also introduces sizable quantities of excess oxygen into the films in the form of TeO₂, as proved by XPS. Thermal annealing of the CdTe films in air removes this excess oxygen and the TeO₂ signal. Annealing further increases the energy of the valence band edge, decreases the energy of the conduction band edge, and is responsible for the p-type conductivity observed in NC CdTe films resulting in enhanced photovoltaic performance. Importantly, the presence of oxygen during the annealing step is crucial because it leads to an increase in hole concentrations needed for high performance devices.     

B掺杂ZnO透明导电薄膜的实验及理论研究

采用脉冲直流磁控溅射技术与基于密度泛函理论的平面波赝势方法对B掺杂ZnO （BZO）薄膜进行了研究. 以B₂O₃：ZnO陶瓷靶为溅射靶材,制备了低电阻率、可见和近红外光区高透过率的BZO薄膜. 系统地研究了衬底温度对BZO薄膜的结构、光电特性的影响. 结果表明：适当的增加衬底温度可以促进BZO薄膜结晶质量改善,晶粒尺寸增加,迁移率增大,电阻率降低. 在200 ℃时制备了电阻率为7.03×10^-4 Ω·cm,400–1100 nm平均透过率为89%的BZO薄膜. 理论模拟结果表明：在BZO薄膜中,以替位方式掺入的B （B_Zn）的形成能最低,B主要以替位形式掺入ZnO,其次分别为八面体间隙（B_IO）和四面体间隙（B_IT）的掺杂方式. B 掺入后,费米能级穿过导带,材料表现出n型半导体特性,光学带隙展宽,导电电子主要来源于B 2p,O 2p及Zn 4s电子轨道. 关键词： BZO薄膜 第一性原理计算 磁控溅射 太阳电池     

The luminescence of ZnO film grown on GaAs interlayer by PA-MOCVD

ZnO film was firstly prepared by PA-MOCVD method on the substrate pre-coated with GaAs interlayer. Hall measurement found that the GaAs interlayer had important effects on the electrical behavior of the ZnO film. It could make the ZnO film convert to p-type conductivity. The XPS results confirmed that the acceptor was arsenic. And the acceptor level was 130 meV above the ZnO valence band maximum. Low-temperature PL measurement was introduced to investigate the optical properties of both as-grown n-type and arsenic doped p-type ZnO films. Then, based on this technology, ZnO homojunction light emitting device (LED) was fabricated with arsenic doped p-type ZnO and unintentionally doped n-type ZnO on GaAs/p⁺-Si substrate. Its current-voltage (I-V) character showed a typical rectification behavior, which was different from the n-ZnO/p⁺-Si structure. The UV-visible (385-580 nm) electroluminescence was detected under relatively low current injection condition from the n-ZnO/p-ZnO/p⁺-Si LED.     

First-principles studies of electronic,optical,and mechanical properties of γ-Bi_2Sn_2O_7

The detailed theoretical studies of electronic,optical,and mechanical properties of γ-Bi_2Sn_2O_7 are carried out by using first-principle density functional theory calculations.Our calculated results indicate that γ-Bi_2Sn_2O_7 is the p-type semiconductor with an indirect band gap of about 2.72 e V.The flat electronic bands close to the valence band maximum are mainly composed of Bi-6s and O-2p states and play a key role in determining the electrical properties of γ-Bi_2Sn_2O_7.The calculated complex dielectric function and macroscopic optical constants including refractive index,extinction coefficient,absorption coefficients,reflectivity,and electron energy-loss function show that γ-Bi_2Sn_2O_7 is an excellent light absorbing material.The analysis on mechanical properties shows that γ-Bi_2Sn_2O_7 is mechanically stable and highly isotropic.     

Cu_2O/ZnO氧化物异质结太阳电池的研究进展

介绍了近年来低成本Cu_2O/ZnO氧化物异质结太阳电池方面的研究进展.应用于光伏器件的吸收层材料Cu_2O是直接带隙半导体材料,天然呈现p型;其原材料丰富,且对环境友好.Cu_2O/ZnO异质结太阳电池结构主要有平面结构和纳米线/纳米棒结构.纳米结构的Cu_2O太阳电池提高了器件的电荷收集作用;通过热氧化Cu片技术获得的具有大晶粒尺寸平面结构Cu_2O吸收层在Cu_2O/ZnO太阳电池应用中展现出了高质量特性.界面缓冲层(如i-ZnO,a-ZTO,Ga_2O_3等)和背表面电场(如p~+-Cu_2O层等)可有效地提高界面处能级匹配和增强载流子输运.10 nm厚度的Ga_2O_3提供了近理想的导带失配,减少了界面复合;Ga_2O_3非常适合作为界面层,其能够有效地提高Cu_2O基太阳电池的开路电压V_(oc)(可达到1.2 V)和光电转换效率.p~+-Cu_2O(如Cu_2O:N和Cu_2O:Na)能够减少器件中背接触电阻和形成电子反射的背表面电场(抑制电子在界面处复合).利用p型Na掺杂Cu_2O(Cu_2O:Na)作为吸收层和Zn_(1-x)Ge_x-O作为n型缓冲层,Cu_2O异质结太阳电池(器件结构:MgF_2/ZnO:Al/Zn_(0.38)Ge_(0.62)-O/Cu_2O:Na)光电转换效率达8.1%.氧化物异质结太阳电池在光伏领域展现出极大的发展潜力.