Young's modulus of ZnO microwires determined by various mechanical measurement methods

The mechanical properties of ZnO microwires have been studied using three different methods: quasi-static flexural measurements using atomic force microscopy, static measurements using a nano indenter, and dynamic flexural measurements using optical interferometry. ZnO microwires were synthesized by chemical vapor deposition method, and the crystal structure and quality were examined using x-ray diffraction and photoluminescence spectroscopy. The Young's moduli were estimated using the measurement results from the three methods, and they showed consistent values in the range 67.5–79.4 GPa for microwires with diameters of 1.8 μm ± 100 nm.     

一种减小GaN基肖特基结构紫外探测器暗电流的方法

提出了一种减小GaN肖特基结构紫外探测器暗电流的方法.该方法是在普通的GaN肖特基结构的表面增加一层薄的p-GaN.模拟计算结果表明,该层p-GaN能增加肖特基势垒高度,从而减小了器件的暗电流,提高了器件性能.进一步的计算还发现,对于p型载流子浓度较高的情况下,只需要很薄的一层p-GaN就能显著增加肖特基势垒高度,对于p型载流子浓度较低的情况下,则需要较厚的一层p-GaN才能有较好的肖特基势垒高度增加效果. 关键词： GaN 肖特基结构 紫外探测器 暗电流     

Effect of surface oxygen vacancy defects on the performance of ZnO quantum dots ultraviolet photodetector

The slower response speed is the main problem in the application of ZnO quantum dots (QDs) photodetector, which has been commonly attributed to the presence of excess oxygen vacancy defects and oxygen adsorption/desorption processes. However, the detailed mechanism is still not very clear. Herein, the properties of ZnO QDs and their photodetectors with different amounts of oxygen vacancy (V_O) defects controlled by hydrogen peroxide (H₂O₂) solution treatment have been investigated. After H₂O₂ solution treatment, V_O concentration of ZnO QDs decreased. The H₂O₂ solution-treated device has a higher photocurrent and a lower dark current. Meanwhile, with the increase in V_O concentration of ZnO QDs, the response speed of the device has been improved due to the increase of oxygen adsorption/desorption rate. More interestingly, the response speed of the device became less sensitive to temperature and oxygen concentration with the increase of V_O defects. The findings in this work clarify that the surface V_O defects of ZnO QDs could enhance the photoresponse speed, which is helpful for sensor designing.     

Binary response Se/ZnO p‐n heterojunction UV photodetector with high on/off ratio and fast speed

A high‐performance UV photodetector (PD) based on a p‐Se/n‐ZnO hybrid structure with large area (more than 1×1 cm) is presented in this study. The device is theoretically equivalent to a parallel‐connection circuit for its special structure and shows multifunction at different voltage bias, which means the output signal can be tailored by an applied voltage. The Se/ZnO PD shows binary response (positive and negative current output under on/off periodical light illumination) under small reverse bias (–0.05 V and –0.1 V) which efficiently reduces the negative effect of noise signal in weak‐signal detection applications. At zero bias, with the aid of a p‐n heterojunction, a high on/off ratio of nearly 10⁴ is achieved by this device at zero set bias under 370 nm (∼0.85 mW cm⁻²) illumination and this on/off ratio can be achieved in 0.5 s. The device also shows a fast speed with rise time of 0.69 ms and decay time of 13.5 ms measured by a pulse laser, much faster than that of a pure ZnO film. The Se/ZnO PD in this research provides a new pathway to fabricate multifunctional high‐speed, high signal‐to‐noise ratio, high detectivity and high selectivity UV photodetectors.

     

Improving the performance of a far-infrared quantum-ring-based photodetector utilizing asymmetric multi-barrier resonant tunneling

In this paper, a novel structure for quantum ring inter-subband photodetectors (QRIP) is proposed to reduce its dark current. Some additional layers including asymmetric multi-barrier resonant tunneling (AMBRT) in absorption region layers are exploited to provide near unity tunneling probability for generated photocurrents and completely reject thermally generated electrons. AMBRT structure consists of three asymmetric AlGaAs barriers and two InGaAs wells which are designed for operation wavelength of generated photocurrents by absorption of 20 μm. Simulation results show that AMBRT can considerably reduce the dark current compared to previously proposed resonant tunneling structure about three orders of magnitude. As a consequent, higher specific detectivity for AMBRT-QRIP is obtained in the order of ∼10¹¹ cm Hz^1/2/W at 100 K.     

片上制备横向结构ZnO纳米线阵列紫外探测器件

将纳米技术与传统的微电子工艺相结合, 片上制备了横向结构氧化锌(ZnO)纳米线阵列紫外探测器件, 纳米线由水热法直接自组织横向生长于叉指电极之间, 再除去斜向的多余纳米线, 其余工艺步骤与传统工艺相同. 分别尝试了铬(Cr)和金(Au)两种金属电极的器件结构: 由于Cr电极对其上纵向生长的纳米线有抑制作用, 导致横向生长纳米线长度可到达对侧电极, 光电响应方式为受表面氧离子吸附控制的光电导效应, 光电流大但增益低, 响应速度慢, 经二次电极加固, 纳米线根部与电极金属直接形成肖特基接触, 光电响应方式变为光伏效应, 增益和速度得到了极大改善; 由于Au电极对其上纵向生长的纳米线有催化作用, 导致溶质资源的竞争, 相同时间内横向生长的纳米线不能到达对侧, 而是交叉桥接, 但却形成了紫外光诱导的纳米线间势垒结高度调控机理, 得到的器件特性为最优, 在波长为365 nm的20 mW/cm²紫外光照下, 1 V电压时暗电流为10^-9 A, 光增益可达8×10⁵, 响应时间和恢复时间分别为1.1 s和1.3 s.     

UV photodetector behavior of 2D ZnO plates prepared by electrochemical deposition

Zinc oxide (ZnO) with 2D hexagonal structure was successfully prepared using electrochemical deposition (ECD) method on a quartz substrate pre-coated with indium-doped ZnO layer. The X-ray diffraction of the prepared sample confirmed that the hexagonal structure had a dominant c-axis orientation. The scanning electron microscopy revealed the 2D hexagonal structure of the prepared ZnO.     

The mechanism of photocurrent enhancement of ZnO ultraviolet photodetector by reduced graphene oxide

An ultraviolet (UV) photodetector based on ZnO-reduced graphene oxide (ZnO-rGO) composites have been successfully fabricated. A pure ZnO photodetector was also fabricated by similar method. In comparison with the pure ZnO UV photodetector, the ZnO-rGO photodetector exhibits a much larger photocurrent and a better light-to-dark-current-ratio. The mechanism of photocurrent enhancement was investigated using I-V characteristics, photoluminescence (PL) spectra, transmittance spectra and time-dependent photocurrent analysis. Results show that the photocurrent enhancement of the ultraviolet photodetector is due to the improvement of the carrier lifetime, because the carrier recombination of ZnO were reduced by rGO. It provides a potential way to fabricate high-response UV photodetectors.     

ZnO nanorod-based UV photodetection and the role of persistent photoconductivity

We report on the substantial persistent photoconductivity (PPC) response exhibited by the zinc oxide (ZnO) nanorod-based ultraviolet (UV) photodetection system. An increase in photocurrent and, hence, rise in PPC was observed for larger UV exposure times at regular intervals. Triggered by quantum efficiency, the increment in sustained conduction band electrons is proposed as the main reason behind the increased photocurrent response. In contrast, the trap centers located below the conduction band are expected to slow down the recombination rate, which accounts for the rise in PPC. The lowering of PPC upon annealing suggests the surface dependent nature of the PPC. The growth and decay mechanism of PPC has a direct relevance while assessing figure of merit of prototype nanostructure-based optical sensor and UV photodetectors.     

Effects of electrolyte on ZnO nanostructures synthesized by galvanostatic electrochemical deposition and their UV sensing properties

In this study, ZnO nanorods (NRs) and nanocombs (NCs) are synthesized by simple galvanostatic electrochemical deposition technique, without prepared any ZnO seed-layer or catalyst. The effect of the different morphologies on the UV sensing characteristics has been studied under ambient conditions. The photoluminescence (PL) spectra and time-dependent photoresponse of the ZnO nanostructures exhibited good optical properties. At room temperature, NCs showed superior response with 9% change of its resistance, few seconds response time and fully recovery. Inversely, in high temperature ZnO NRs indicated better response than NCs with the variation of 25% of its resistance. The dependence photoresponse on temperature demonstrated clearly how surface-defects affect on UV response of ZnO nanostructures. Our approach is to provide a simple and cost-effective way to fabricate UV detectors.     

Carrier transport mechanisms in the ZnO based heterojunctions grown by MBE

This paper presents a review of models of the current transport in different kind of heterojunctions (HJs) and their characteristics. In order to effectively deduce the dominant electron transport for the HJs based on ZnO or Zn_1?xMg_xO layers grown on Si substrate by MBE a comparison is performed – which type of the HJ exhibits better electrical properties. The current–voltage characteristics for the studied HJs were measured within 280–300 K. The transport properties of the HJs are explained in terms of Anderson model with reference to aforementioned current transport models. It is found, that the mechanisms of current transport for all of the studied HJs are similar. At a low forward voltage bias the tunneling current dominates while at medium voltage bias (0.5–1 V) multitunneling capture-emission prevails with the electron trap located at 0.1–0.25 eV below the bottom of a ZnO (Zn_1?xMg_xO) conduction band. Beyond this voltage bias space charge limited current governs the current transport.     

铝-金刚石界面电子特性与界面肖特基势垒的杂化密度泛函理论HSE06的研究

宽带隙半导体金刚石具有突出的电学与热学特性,近年来,基于金刚石的高频大功率器件受到广泛关注,对于金属-金刚石肖特基结而言,具有较高的击穿电压和较小的串联电阻,所以金属-金刚石这种金半结具有非常好的发展前景.本文通过第一性原理方法去研究金属铝-金刚石界面电子特性与肖特基势垒的高度.界面附近原子轨道的投影态密度的计算表明:金属诱导带隙态会在金刚石一侧产生,并且具有典型的局域化特征,同时可以发现电子电荷转移使得Fermi能级在金刚石一侧有所提升.电子电荷在界面的重新分布促使界面形成新的化学键,使得金属铝-氢化金刚石形成稳定的金半结.特别地,我们通过计算平均静电势的方法得到金属铝-氢化金刚石界面的势垒高度为1.03 eV,该值与金属诱导带隙态唯像模型计算的结果非常接近,也与实验值符合得很好.本文的研究可为金属-金刚石肖特基结二极管的研究奠定理论基础,也可为金刚石基金半结大功率器件的研究提供理论参考.     

High UV absorption efficiency of nanocrystalline ZnO synthesized by ultrasound assisted wet chemical method

Ultrasound assisted wet-chemical method has been carried out to incorporate different metal and non-metal ions such as; Li, S and Ag into ZnO. Characteristic studies on the structural and optical properties of the samples especially; the ultra-violet (UV) light absorption have been carried out. X-ray diffraction (XRD) analysis shows the formation of hexagonal crystal structure of ZnO along with changes in crystallinity and micro-strain with impurity doping. The morphology of the doped samples changes from particle like structure to flower and rod like structures showing the influence of dopant ions on nano ZnO growth. Infra-red (IR) transmittance spectra give information about the presence of metal–oxygen bond along with other stretching and bending modes. UV–visible absorption studies show the narrowing and sharpening of UV absorption band along with a blue shift for the doped samples. This shows the intensification in the excitonic absorption in ZnO after doping specific elements which will find application in UV blocking agents. Photoluminescence (PL) measurement shows the presence of excitonic emission and emissions due to intrinsic defects and external impurities in UV and visible regions respectively. These emission bands show a change in their position and intensity which has been explained on the basis of the existence of impurity levels in the band gap of ZnO.     

Co掺杂纳米ZnO微结构的正电子湮没研究

利用正电子湮没技术研究了10 at.% Co掺杂的Co₃O₄/ZnO纳米复合物中退火对缺陷的影响. 利用X射线衍射(XRD)测量了Co₃O₄/ZnO纳米复合物的结构和晶粒尺寸. 随着退火温度升高,Co₃O₄相逐步消失,ZnO晶粒尺寸也有显著增加. 经过1000 ℃以上退火后,Co₃O₄相完全消失,并出现了CoO的岩盐结构. 正电子湮没寿命测量显示出Co₃O₄ /ZnO纳米复合物中存在大量的Zn空位和空位团. 这些空位缺陷可能存在于纳米复合物的界面区域. 当退火温度达到700 ℃后Zn空位开始恢复,空位团也开始收缩. 900 ℃以上退火后,所有空位缺陷基本消失,正电子寿命接近ZnO完整晶格中的体态寿命值. 符合多普勒展宽谱测量也显示Co₃O₄ /ZnO纳米复合物经过900 ℃以上退火后电子动量分布与单晶ZnO基本一致,表明界面缺陷经过退火后得到消除. 关键词： ZnO 界面缺陷 正电子湮没     

ZnO压敏陶瓷介电损耗的温度谱研究

利用Novocontrol宽频介电谱仪在-100—20 ℃温度范围内测量了ZnO-Bi₂O₃系压敏陶瓷的介电频谱,其频率范围为10^-2—10⁶ Hz. 研究表明： ZnO压敏陶瓷特征损耗峰的活化能分别为0.26和0.36 eV,结合实验条件、理论计算结果及其他现象的分析排除了特征损耗峰源于阴极电子注入、夹层极化和偶极子转向极化的可能.热刺激电流（TSC）谱共出现三个峰,其中高温峰对应于TSC实验加压过程引入的热离子极化,而中温峰和低温峰对应于介电损耗峰. 在分析的基础上,提出了ZnO压敏陶瓷的特征损耗峰起源于耗尽层内本征缺陷的电子弛豫过程. 关键词： ZnO压敏陶瓷 本征缺陷 介电谱 热刺激电流     

Characteristics and electrochemical performance of Ni-coated ZnO prepared by an electroless plating process

ZnO was coated homogeneously with amorphous Ni film by an electroless plating process. After electroless Ni plating, transmission electron microscope (TEM) images and energy dispersive spectrometry spectra (EDS) of ZnO clearly indicated that Ni was coated on the surface of ZnO, the coatings and ZnO contacted enough. X-ray diffraction and high-resolution TEM showed that the Ni film on ZnO was amorphous. Electrochemical performance of Ni-coated ZnO was investigated by the galvanostatic charge/discharge cycling test. Compared to that of uncoated ZnO, the charging–discharging performance of Ni-coated ZnO was obviously improved, e.g. the average discharge capacity of the Ni-coated ZnO increased 71.5% at the stage of stable cycling test.     

Effect of ZnO film thickness on the performance of organic light emitting diodes

The electrical and optical properties of the ZnO layers and of the ITO/ZnO bilayers are investigated. We show that a ZnO layer of about 120 nm is the best compromise to obtain simultaneously a high transmittance and conductivity. Moreover an X-ray diffraction analysis underscores that an amorphous ITO deposited on a polycrystalline ZnO could change into a polycrystalline ITO. The modifications of the ITO layer by a preliminary deposition of a 120 nm thick ZnO underlayer enables us to decrease the threshold voltage of organic light emitting diodes.     

Process and performance of hot dip zinc coatings containing ZnO and Ni-P under layers as barrier protection

A new coating system of under layer for hot dip zinc coating was explored as an effective coating for steel especially for application in relatively high aggressive environments. The influence of different barrier layers formed prior to hot dip galvanization was investigated to optimize high performance protective galvanic coatings. The deposition of ZnO and Ni-P inner layers and characteristics of hotdip zinc coatings were explored in this study. The coating morphology was characterized by scanning electron microscope (SEM) analysis. The hot dip zinc coatings containing under layer showed substantial improvement in their properties such as good adhesion, and high hardness. In addition, a decrease in the thickness of the coating layer and an enhancement of the corrosion resistance were found. Open circuit potential (OCP) of different galvanized layers in different corrosive media viz. 5% NaCl and 0.5 M H₂SO₄ solutions at 25 ± 1 °C was measured as a function of time. A nobler OCP was exhibited for samples treated with ZnO and Ni than sample of pure Zn; this indicates a dissolution process followed by passivation due to the surface oxide formation. The high negative OCP can be attributed to the better alloying reaction between Zn and Fe and to the sacrificial nature of the top pure zinc layer.     

溅射气氛对RF反应磁控溅射制备ZnO薄膜微结构及光致发光特性的影响

用射频反应磁控溅射法在不同溅射压强和氩氧比下制备了ZnO薄膜,通过X射线衍射(XRD)、扫描电镜(SEM)和光致发光(PL)谱等研究了溅射压强和氩氧比对ZnO薄膜结构和光学性质的影响。测量结果显示,所制备的ZnO薄膜为六角纤锌矿结构,具有沿c轴的择优取向;溅射压强P=0.6Pa,氩氧比Ar/O2=20/5.5sccm时,(002)晶面衍射峰强度和平均晶粒尺寸较大,(O02)XRD峰半峰全宽(FWHM)最小,光致发光紫外峰强度最强。     

Physical model for the exotic ultraviolet photo-conductivity of ZnO nanowire films

Employing a simple and efficient method of electro-chemical anodization,ZnO nanowire films are fabricated on Zn foil,and an ultraviolet(UV)sensor prototype is formed for investigating the electronic transport through back-to-back double junctions.The UV(365 nm)responses of surface-contacted ZnO film are provided by I–V measurement,along with the current evolution process by on/off of UV illumination.In this paper,the back-to-back metal–seconductor–metal(M–S–M)model is used to explain the electronic transport of a ZnO nanowire film based structure.A thermionic-field electron emission mechanism is employed to fit and explain the as-observed UV sensitive electronic transport properties of ZnO film with surface-modulation by oxygen and water molecular coverage.