Stability and optoelectronic property of lead-free halide double perovskite Cs2B'BiI6 (B' = Li,Na and K)

Although lead-based perovskite solar cells have achieved more than 25% power conversion efficiency, the toxicity of lead and instability are still urgent problems faced in industrial application. Lead-free halide double perovskite (DP) materials are promising candidates to resolve these issues. Based on the density functional theory, we explore the geometric stability, thermodynamic stability, mechanical stability, electronic structures, and optical properties of the Cs₂B'BiI₆ (B' =m Li, Na and K) DP materials. By analyzing the tolerance factor and octahedral factor, we find the geometric stabilities of Cs₂NaBiI₆ and Cs₂KBiI₆ DPs are better than Cs₂LiBiI₆. By calculating the total energy, formation energy and decomposition energy, we propose that the most favorable structure of Cs₂B'BiI₆ is the orthorhombic phase, and Cs₂LiBiI₆ is less stable relative to the other two counterparts from an energetic viewpoint. Mechanical stability evaluations reveal that the orthorhombic Cs₂LiBiI₆ material is less stable relative to the isostructural Cs₂NaBiI₆ and Cs₂KBiI₆ DPs. The mechanical property calculations indicate that the Cs₂B'BiI₆ DPs possess good ductility, which can be used as flexible materials. Electronic structures and optical property calculations show that the orthorhombic Cs₂B'BiI₆ DPs have suitable band gap values, weaker exciton binding energies, and excellent optical absorption performance in the visible-light range. Based on the above comprehensive assessments, we can conclude that the orthorhombic Cs₂NaBiI₆ and Cs₂KBiI₆ DPs with good stability are promising candidates for solar cell applications.     

Stability,electronic structure,and optical properties of lead-free perovskite monolayer Cs3B2X9(B=Sb,Bi;X=Cl,Br,I)and bilayer vertical heterostructure Cs3B2X9/Cs3B’2X9(B,B’=Sb,Bi;X=Cl,Br,I)

The lead-free perovskites Cs₃B₂X₉(B=Sb,Bi;X=Cl,Br,I)as the popular photoelectric materials have excellent optical properties with lower toxicity.In this study,we systematically investigate the stable monolayer Cs₃B₂X₉and bilayer vertical heterostructure Cs₃B₂X₉/Cs3B02X9(B,B0=Sb,Bi;X=Cl,Br,I)via first-principles simulations.By exploring the electrical structures and band edge positions,we find the band gap reduction and the band type transition in the heterostructure Cs₃B₂X₉/Cs3B02X9 due to the charge transfer between layers.Furthermore,the results of optical properties reveal light absorption from the visible light to UV region,especially monolayer Cs3Sb2I9 and heterostructure Cs3Sb2I9/Cs3Bi2I9,which have absorption peaks in the visible light region,leading to the possibility of photocatalytic water splitting.These results provide insights for more two-dimensional semiconductors applied in the optoelectronic and photocatalytic fields.     

碳纳米管/二硒化钼有机玻璃的非线性吸收、非线性散射和光限幅特性

MoSe₂的禁带宽度较窄（1.1–1.5 eV）,且具有可调谐的激子光电效应,这样使其在光致发光、光电晶体管、太阳能电池和光学非线性等方面具有潜在的应用价值.然而,纯的MoSe₂的光生电子空穴复合率较高,限制了其在某些光学领域中的应用.通过设计MoSe₂的复合材料,可以降低材料的光生电子空穴复合率,从而扩展其应用领域.首先,通过热溶剂法合成CNT/MoSe₂复合材料;然后,通过浇铸法将其分散在甲基丙烯酸甲酯（MMA）中制备成有机玻璃,其中MMA会聚合成聚甲基丙烯酸甲酯（PMMA）,并利用改进的Z-扫描技术首次对CNT/MoSe₂/PMMA有机玻璃的非线性吸收、非线性散射和光限幅特性进行了研究.研究表明,随着输入能量的变化,通过调节输入能量,CNT/MoSe₂/PMMA有机玻璃表现出饱和吸收（SA）和从SA到反饱和吸收的转变.结合材料特性及应用条件要求,可以得到CNT/MoSe₂/PMMA有机玻璃在光学设备,如光学限制器和锁模/调Q激光器等方向具有较好的应用前景.     

第一性原理研究Mn和Cu掺杂六钛酸钾(K_2Ti_6O_(13))的电子结构和光学性质

六钛酸钾(K_2Ti_6O_(13))是宽带隙半导体光催化材料,只能响应波长较短的紫外光.为了使K_2Ti_6O_(13)对可见光响应,本文采用第一性原理方法,研究过渡金属Mn和Cu掺杂改性后K_2Ti_6O_(13)的电子结构和光学性质.计算结果表明:Mn,Cu掺杂后K_2Ti_6O_(13)禁带中出现了杂质能级,这些杂质能级由O 2p和Ti 3d与Mn 3d或Cu 3d态杂化而成.对于Mn掺杂的K_2Ti_6O_(13),其带隙值变小,位于能带中间的杂质能级可作为电子跃迁的桥梁,从而实现了对可见光的吸收.对于Cu掺杂的K_2Ti_6O_(13),其带隙值虽略有增大,但是若考虑将与价带相连的杂质能级,带隙值将大大减小,且此杂质能级可抑制光生载流子的复合,使得掺杂后K_2Ti_6O_(13)吸收带边红移至可见光区并在可见光范围内吸收强度明显增强.总的而言,Mn,Cu的掺杂实现了钛酸钾对可见光的吸收,同时Cu掺杂的效果要优于Mn掺杂的效果.研究结果对K_2Ti_6O_(13)在光催化领域上的应用具有重要的意义.     

(Cu,N)共掺杂TiO2/MoS2异质结的电子和光学性能:杂化泛函HSE06

在密度泛函理论的基础上,系统地研究了Cu/N（共）掺杂的TiO₂/MoS₂异质结体系的几何结构、电子结构和光学性质.计算发现,TiO₂/MoS₂异质结的带隙相比于纯的TiO₂（101）表面明显变小,Cu/N（共）掺杂TiO₂/MoS₂异质结体系的禁带宽度也明显地减小,这导致光子激发能量的降低和光吸收能力的提高.通过计算Cu/N（共）掺杂TiO₂/MoS₂的差分电荷密度,发现光生电子与空穴积累在掺杂后的TiO₂（101）表面和单层MoS₂之间,这表明掺杂杂质体系可以有效地抑制光生电子-空穴对的复合.此外,我们计算了在不同压力下TiO₂/MoS₂异质结的几何、电子和光学性质,发现适当增加压力可以有效提高异质结的光吸收性能.本文结果表明,Cu/N（共）掺杂TiO₂/MoS₂异质结和对TiO₂/MoS₂异质结加压都能有效地提高材料的光学性能.     

Bi_xBa_(1-x)TiO_3电子及能带结构的第一性原理研究

采用基于第一性原理的赝势平面波方法,研究了ABO_3钙钛矿复合氧化物BaTiO_3中A位离子被Bi原子取代后对其构型、电子及能带结构的影响.计算结果表明,Bi取代Ba之后会降低BaTiO_3的对称性,空间点群随着取代量的变化而变化,结合能逐渐降低.通过能带结构的计算发现Bi_xBa_(1-x)TiO_3为直接带隙型半导体.Bi的取代可调节Bi_xBa_(1-x)TiO_3的禁带宽度,从x=0.125到x=0.625时,Bi的取代量越大,其带隙越宽,吸收光谱蓝移.x0.625时,禁带宽度又逐渐减小,吸收光谱红移.由态密度图可看出,其价带顶主要是O-2p与Bi-6s态杂化而成,导带底主要由Ti-3d态构成.     

CdSe:Nd纳米晶及CdSe:Nd@SiO2核壳结构的合成及发光性能

利用有机相法合成Nd³⁺掺杂CdSe纳米晶（CdSe∶Nd）,通过X射线粉末衍射（XRD）、透射电镜（TEM）、紫外吸收光光谱及荧光光谱表征,证明Nd³⁺已经成功掺入到CdSe的晶格中。与纯CdSe纳米晶相比,CdSe∶Nd纳米晶的结构仍为立方晶型,且形貌近似球形,均匀分散,粒径约为2~4 nm。紫外吸收峰和荧光发射峰都发生红移,而且掺杂后的CdSe∶Nd纳米晶量子产率也提高,这可能是由于掺杂Nd³⁺引入了新的杂质能级,带隙减小。为了实现CdSe∶Nd纳米晶的可加工性和功能性,通过微乳法合成SiO₂壳包覆的CdSe∶Nd纳米球（CdSe∶Nd@SiO₂纳米球）,CdSe∶Nd@SiO₂纳米球呈均匀球形,直径约为100~115 nm,并且包壳后的CdSe∶Nd@SiO₂纳米球发射峰（581 nm）与CdSe∶Nd纳米晶（598 nm）相比,发光强度提高且发射峰蓝移,蓝移约为17 nm,可能是因为SiO₂壳可以减少纳米晶表面的非辐射跃迁以及改善表面缺陷导致的。     

有机金属卤化物钙钛矿薄膜中的光诱导载流子动力学和动态带重整效应

近年来有机-无机金属卤化物钙钛矿太阳能电池因具有光电能量转换效率高、制备工艺简单等优点,引起了学术界和产业界的广泛关注,其优异的光电特性逐渐在能源领域展现出独特的优越特性.在短短几年内,有机-无机混合物钙钛矿太阳能电池的能量转换效率已经高达23%,发展速度逐步赶上甚至超越了成熟的硅太阳能电池.本文利用飞秒瞬态吸收光谱,对二步法制备的(5-AVA)_(0.05)(MA)_(0.95)PbI_3和(5-AVA)_(0.05)(MA)_(0.95)PbI_3/Spiro-OMeTAD有机-无机卤化物钙钛矿薄膜材料的激发态动力学进行了对比研究,详细讨论了两种薄膜样品中的电荷载流子产生与复合机制.通过紫外-可见吸收光谱测得钙钛矿薄膜(5-AVA)_(0.05)(MA)_(0.95)PbI_3和(5-AVA)_(0.05)(MA)_(0.95)PbI_3/Spiro-OMeTAD的吸收光谱与CH_3NH_3PbI_3钙钛矿薄膜材料的双价带结构相对应.从瞬态吸收光谱中,观察到760 nm附近的光致漂白信号,此时的载流子复合过程符合二阶动力学过程,而在约550—700 nm光谱范围内则是光诱导激发态吸收信号.实验结果表明,(5-AVA)_(0.05)(MA)_(0.95)PbI_3钙钛矿薄膜样品中光生载流子主要的弛豫途径是自由电子和空穴的复合.抽运光激发样品使价带中的电子跃迁到导带,随着延迟时间的增加,电子和空穴复合,光谱发生红移现象.所观察到的带重整效应可以根据Moss-Burstein效应解释.相比较而言,(5-AVA)_(0.05)(MA)_(0.95)PbI_3/Spiro-OMeTAD钙钛矿薄膜样品在光激发后电子和空穴分离,空穴迅速转移到空穴传输层,这将导致样品吸收度增加,漂白信号快速恢复,电子-空穴的复合不再对漂白信号的弛豫动力学起主导作用,同时也削弱了带重整现象.本文的实验结果对半导体有机-无机金属卤化物钙钛矿薄膜在光伏领域的应用具有重要意义,为今后高效、稳定的钙钛矿太阳电池的研究提供了参考.     

具有氧空位Bi_xWO_6(1.81≤x≤2.01)的第一性原理计算和光催化性能研究

为了探索影响Bi_2WO_6光催化性能的内在机制,采用密度泛函理论(DFT)计算和实验研究了非化学计量和氧空位对Bi_2WO_6晶体结构、电子结构和显微结构的影响.采用溶剂热法合成了具有氧空位的非化学计量Bi_xWO_6(x=1.81,1.87,1.89,1.92,2.01)光催化剂.DFT计算结果表明,氧空位的存在可显著减小Bi_2WO_6的带隙,有利于光生电子的生成.实验结果表明,当Bi元素的含量小于化学计量比时,Bi_2WO_6的晶体结构发生了微小变形,Bi元素含量对Bi_2WO_6的显微结构影响不大,但会影响产品氧空位的含量和光吸收性能,并有效抑制电子空穴的复合.Bi_(1.89)WO_6产品的光催化性能最佳,可见光照射180 min后,可降解98%的罗丹明B.采用适当方法,使产品具有氧空位和非化学计量是获得高光催化活性材料的一种有效方法.     

The 3ν3 overtone bands of UF6 and UF6

The absorption specta of CO laser radiation by 3ν₃ overtone bands of ²³⁸UF₆ and ²³⁵UF₆ has been measured using photoacoustic spectroscopic techniques. For the two temperatures 250 K and 290 K, measured absorption coefficients and cross-sections of the 3ν₃ band of ²³⁵UF₆ are reported for the first time.     

双波长自由载流子吸收技术测量半导体载流子体寿命和表面复合速率

提出了采用双波长自由载流子吸收技术同时测量半导体材料载流子体寿命和前表面复合速率的方法.通过数值模拟,定性分析了不同载流子体寿命和前表面复合速率对信号的影响,同时对测量参数的可接受范围和不确定度进行计算并与传统频率扫描自由载流子吸收方法测量结果进行比较.结果表明：提出的双波长自由载流子吸收方法可明显减小载流子体寿命和前表面复合速率的测量不确定度,提高参数测量精度;表面杂质和缺陷越多的样品,其前表面复合速率测量不确定度越小.进一步分析表明,此现象与不同波长激光抽运产生的过剩载流子浓度分布不同有关.     

A new method to determine Si/SiO2 interface recombination parameters using a gate-controlled point-junction diode under illumination

A new method is presented to determine Si/SiO₂ interface recombination parameters. The device employed is constituted by a polysilicon-oxide-semiconductor capacitor with a microscale central junction (a gate-controlled point-junction diode). The excess minority carriers are photo-generated rather than being injected, which results in a one-dimensional current flow normal to the Si/SiO₂interface. The minority carrier quasi-Fermi level is probed at the Si/SiO₂ interface by means of the point junction. The one-dimensionality of the current flow and the exact knowledge of the minority carrier quasi-Fermi level permit an accurate measurement of the recombination rate. The method has been applied to characterize p-type 100 Si/SiO₂ interfaces with boron dopant concentrations ranging from 2.2×10¹⁵ to 2.0×10¹⁷ cm^-3. Data analysis has been performed using a numerical scheme to find a quasi-exact solution for the current recombining at the interface. It was found that the interface recombination parameters (trap density and capture cross-sections) depend only weakly on trap energy in a wide range around midgap. The cross-section for capturing electrons (σ_n) was found to greatly exceed (by a factor of 10² to 10³) the cross-section for capturing holes (σ_p).     

Magnli相亚氧化钛Ti8O15的电子结构和光学性能的第一性原理研究

采用基于密度泛函理论的平面波超软赝势法研究了Magneli相亚氧化钛Ti8O15的电子结构和光学性能.计算出的能带结构显示Ti₈O₁₅相比锐钛型TiO₂禁带宽度大幅度降低.态密度分析表明,其原因在于Ti₈O₁₅的O原子的2p轨道以及Ti原子的3p,3d轨道相对于TiO₂的相应轨道向左产生了偏移,同时由于O原子的缺失使得Ti原子的3d,3p轨道多余电子在Fermi能级附近聚集形成新的电子能级.态密度分析结果还显示,相对于TiO₂,Ti₈O₁₅Fermi能级附近电子格局发生了如下变化:O原子的2p轨道电子贡献减少,Ti原子的3d轨道的电子对Fermi能级贡献增大.光吸收计算图谱表明,TiO₂仅在紫外光区有较高的光吸收能力,而Ti₈O₁₅由于禁带宽度变窄引起光吸收范围红移到可见光区,从而在紫外光区和可见光区都有较高的光吸收能力,计算结果与实验得到的紫外-可见漫反射吸收光谱结果一致.     

VO_2薄膜Vis-NIR及NIR-MIR椭圆偏振光谱分析

采用射频磁控溅射在石英玻璃基底上反应溅射制备单斜相(M相)VO_2薄膜.利用V-VASE和IR-VASE椭圆偏振仪及变温附件分别在0.5—3.5 eV(350—2500 nm)和0.083—0.87 eV(1400—15000 nm)入射光能量范围内对相变前后的VO_2薄膜进行光谱测试,运用逐点拟合的方式,并通过薄膜的吸收峰的特征,在0.5—3.5 eV范围内添加3个Lorentz谐振子色散模型和0.083—0.87 eV范围内添加4个Gaussion振子模型对低温态半导体态的薄膜椭偏参数进行拟合,再对高温金属态的薄膜添加7个Lorentz谐振子色散模型对进行椭偏参数的拟合,得到了较为理想的拟合结果.结果发现:半导体态的VO_2薄膜的折射率在近红外-中红外基本保持在最大值3.27不变,且消光系数k在此波段接近于零,这是由于半导体态薄膜在可见光-近红外光范围内的吸收主要是自由载流子吸收,而半导体态薄膜的d//轨道内的电子态密度较小.高温金属态的VO_2薄膜的折射率n在近红外-中红外波段具有明显的增大趋势,且在入射光能量为0.45 eV时大于半导体态的折射率;消光系数k在近红外波段迅速增大,原因是在0.5—1.62 eV范围内,能带内的自由载流子浓度增加及电子在V_(3d)能带内发生带内的跃迁吸收,使k值迅速增加;当能量小于0.5 eV时k值变化平缓,是由于薄膜内自由载流子浓度和电子跃迁率趋于稳定所致.     

Pr高掺杂浓度对锐钛矿TiO_2的带隙和吸收光谱影响的研究

目前,Pr掺杂对锐钛矿TiO2带隙和吸收光谱研究结果存在相反的结论,红移和蓝移两种实验结果都有文献报道.为解决这个矛盾,本文基于密度泛函理论框架下的第一性原理平面波超软赝势方法,对纯的和不同浓度Pr高掺杂锐钛矿TiO2的电子结构和吸收光谱进行了计算.计算结果表明,与纯锐钛矿TiO2相比较,Pr掺杂后,掺杂量越增加,掺杂体系各原子电荷量越减小,掺杂体系总能量越高,形成能越大,稳定性越下降,带隙越窄,吸收光谱红移现象越显著,吸收强度越强.计算结果与实验结果相一致.     

蓝光激光器结构中InGaN/GaN多量子阱界面效应的精细光致发光光谱研究

金属有机化学气相沉积(MOCVD)方法制备InGaN/GaN多量子阱结构时,在GaN势垒层生长的N2载气中引入适量H2,能够有效改善阱/垒界面质量从而提升发光效率.本工作利用光致发光(PL)光谱技术,对蓝光激光器结构中的InGaN/GaN多量子阱的发光性能进行了精细的光谱学测量与表征,研究了通H2生长对量子阱界面的调控...     

硅锗量子阱结构在硅异质结太阳电池中应用的数值模拟

利用半导体工艺和器件仿真软件silvaco TCAD(Technology Computer Aided Design),模拟研究了采用硅/硅锗合金(silicon/silicon germanium alloy,Si/Si_(1-x)Ge_x)量子阱结构作为吸收层的薄膜晶体硅异质结太阳电池各项性能.模拟结果显示,长波波段光学吸收随锗含量的增加而增加,而开路电压则因Si_(1-x)Ge_x)层带隙的降低而下降.锗含量为0.25时,短路电流密度的增加补偿了开路电压的衰减,效率提升0.2%.氢化非晶硅/晶体硅(a-Si:H/c-Si)界面空穴密度以及Si_(1-x)Ge_x)量子阱的体空穴载流子浓度制约着空穴费米能级的位置,进而影响到开路电压的大小.随着锗含量增加,a-Si:H/c-Si界面缺陷对开压的影响降低,Si_(1-x)Ge_x)量子阱的体缺陷对开压的影响则相应增加.高效率含Si_(1-x)Ge_x)量子阱结构的硅异质结太阳电池的制备需要a-Si:H/c-Si界面缺陷的良好钝化以及高质量Si_(1-x)Ge_x)量子阱的生长.     

Intrinsic luminescence centers in γ- and θ-alumina nanoparticles

In this study, we investigate the photoluminescence(PL) properties of γ and θ-alumina nanoparticles synthesized by the chemical wet method followed by annealing. The obtained experimental results indicate the presence of some favorable near ultraviolet(NUV)-orange luminescent centers for usage in various luminescence applications, such as oxygen vacancies(F, F~+_2, F~(2+)_2, and F_2centers), OH related defects, cation interstitial centers, and some new luminescence bands attributed to trapped-hole centers or donor–acceptor centers. The energy states of each defect are discussed in detail. The defects mentioned could alter the electronic structure by producing some energy states in the band gap that result in the optical absorption in the middle ultraviolet(MUV) region. Spectra show that photoionazation of F and F_2 centers plays a crucial role in providing either free electrons for the conduction band, or the photoconversions of aggregated oxygen vacancies into each other, or mobile electrons for electrons-holes recombination process by the Shockley–Read–Hall(SRH)mechanism.     

Mn掺杂Zn-In-S量子点的制备及发光性质研究

制备了Mn掺杂Zn-In-S量子点并研究了Zn/In的量比和反应温度对其发光性质的影响。在Mn掺杂的Zn-In-S量子点的发光谱中观测到一个600 nm发光带。通过改变Zn/In的量比,掺杂量子点的吸收带隙可从3.76 e V(330 nm)调谐到2.82 e V(440 nm),但600 nm发光峰的波长只有略微移动。这些掺杂量子点的最长荧光寿命为2.14 ms。当反应温度从200℃增加到230℃时,掺杂量子点的发光强度增加并达到最大值;而继续升高温度至260℃时,发光强度迅速减弱。此外,测量了Mn掺杂Zn-In-S量子点的变温发光光谱。发现随着温度的升高,发光峰位发生蓝移,发光强度明显下降。分析认为,Mn掺杂Zn-In-S量子点的600 nm发光来自于Mn2+离子的4T1和6A1之间的辐射复合。     

Optical properties and electronic transitions of SnO2 thin films by reflection electron energy loss spectroscopy

Optical properties of SnO₂ thin films in the 4–60 eV energy range are determined by reflection electron energy loss spectroscopy. Bulk and surface electron loss functions, real and imaginary parts of the dielectric function, refraction index, extinction and absorption coefficients are obtained from the analysis of the electron energy loss spectra. Electronic transitions are identified through the interpretation of the optical data. The samples (250–500 nm thick) were produced by ion beam-induced chemical vapor deposition. It is found that the compacity of the SnO₂ thin films affects their optical properties and therefore the relative intensity of the observed electronic transitions. The advantages of this method to determine optical properties of thin films are discussed. Inelastic mean free paths (6.2, 17 and 41 Å for electrons traveling in SnO₂ with kinetic energies of 300, 800 and 2000 eV, respectively) are obtained from the corresponding inelastic electron scattering cross-sections.