Influence of storage time on laser cleaning of SiO<Subscript>2</Subscript> on Si

The influence of the ‘storage time’ τ_s on the threshold fluence φ_cl and the efficiency in dry laser cleaning is investigated. τ_s denotes the time between the deposition of particles and the cleaning. As a model system we employed silica spheres with diameters of 500 nm and 1500 nm on commercial silicon wafers and single-pulse KrF excimer laser radiation (τ_FWHM=28 ns). For the 1500-nm silica spheres, φ_cl was found to increase from about 65 mJ/cm² to 125 mJ/cm² for storage times of 4 h and 362 h, respectively. For 500-nm silica spheres the increase in the threshold fluence was less than 20% for storage times up to 386 h. Received: 12 July 2002 / Accepted: 12 July 2002 / Published online: 29 January 2003 RID="*" ID="*"Corresponding author. E-mail:dieter.baeurle@jku.at     

Laser-induced thermal effects on Si/SiO<Subscript>2</Subscript> free-standing superlattices

The thermal effects produced by continuous-wave laser radiation on free-standing Si/SiO₂ superlattices are studied. We compare two samples with different SiO₂ layer thicknesses (2 and 6 nm) and the same Si layer thickness (2 nm). The as-prepared free-standing superlattices contain some amount of Si nanocrystals (Si-nc). Intense laser irradiation at 488 nm of the as-prepared samples enhances the Raman scattering of Si-nc by two orders of magnitude. This laser-induced crystallization originates from melting of Si nanostructures in silica, which makes Si-nc better ordered and better isolated from the oxide surrounding. Continuous-wave laser control of Si-nc stress was achieved in these samples. In the proposed model, intense laser radiation melts Si-nc, and Si crystallization upon cooling down from the liquid phase in a silica matrix leads to compressive stress. The Si-nc stress can be tuned in the ∼3 GPa range using laser annealing below the Si melting temperature. The high laser-induced temperatures were verified with Raman spectroscopy. The laser-induced heat leads to a strongly nonlinear rise of light emission. The light emission is also observed in the anti-Stokes region, and its temperature dependence is practically the same for the two studied samples. The laser-induced temperature is essentially controlled by the absorbed laser power. PACS 78.55.-m; 78.20.-e; 68.55.-a; 78.30.-j     

Si/SiO<Subscript>2</Subscript> superlattice based optical planar microcavity

Si/SiO₂ Fabry–Pérot microcavities with a silicon nanocrystal (Si-nc) active spacer have been realized using a novel process based on a reactive magnetron sputtering of a pure silica target. Spectral, spatial and temporal behaviours of the quantum dots confined inside the resonator are detailed. Compared with a reference sample, the spectral and spatial emission distributions are significantly narrowed and the forward emission intensity is enhanced. Time resolved photoluminescence measurements also revealed an increase of the spontaneous emission rate. PACS 42.70.Qs; 78.55.-m; 78.66.-w     

Fabrication and structural characterization of Mg<Subscript>2</Subscript>SiO<Subscript>4</Subscript> nanowires

This article demonstrates the first reported successful synthesis of Mg₂SiO₄ nanowires. We have thermally heated Au-coated Si substrates, using a quartz tube with its inner surface pre-coated with MgO nanostructures. We have characterized the sample morphologies by using scanning electron microscopy and transmission electron microscopy (TEM). X-ray diffraction analysis and high-resolution TEM observation coincidentally revealed that the nanowires were crystalline with an orthorhombic Mg₂SiO₄ structure. We have discussed the possible growth mechanism of Mg₂SiO₄ nanowires. PACS 81.07.-b; 81.05.Zx; 61.10.Nz; 68.37.Hk; 68.37.Lp     

Growth of amorphous SiO<Subscript>2</Subscript> nanowires on Si using a Pd/Au thin film as a catalyst

Nanowires of amorphous SiO₂ were synthesized by thermal processing of a Si(100) substrate at 1100 °C in the presence of a nitrogen flow, and using a 15 nm thick high silicon-solubility Pd/Au film as a catalyst. The substrate itself was the only source of silicon for the nanowire growth. The nanostructures produced were characterized by high resolution transmission and scanning electron microscopy and by X-ray diffraction. The nanowire growth is consistent with the vapor-liquid-solid (VLS) mechanism, with particles of Pd₂Si and Au(Pd) being observed to form from the reaction between silicon and the catalytic film, and to remain at the tip of the wires. The synthesized nanowires showed a well defined morphology which could be very interesting for lasing applications. PACS 81.05.Ys; 81.10.Bk; 85.40.Ux     

Comparison between Si/SiO<Subscript>2</Subscript> and InP/Al<Subscript>2</Subscript>O<Subscript>3</Subscript> based MOSFETs

The discrete breathers in graphane in thermodynamic equilibrium in the temperature range 50–600 K are studied by molecular dynamics simulation. A discrete breather is a hydrogen atom vibrating along the normal to a sheet of graphane at a high amplitude. As was found earlier, the lifetime of a discrete breather at zero temperature corresponds to several tens of thousands of vibrations. The effect of temperature on the decay time of discrete breathers and the probability of their detachment from a sheet of graphane are studied in this work. It is shown that closely spaced breathers can exchange energy with each other at zero temperature. The data obtained suggest that thermally activated discrete breathers can be involved in the dehydrogenation of graphane, which is important for hydrogen energetics.     

Si/SiO<Subscript>2</Subscript> core shell clusters probed by Raman spectroscopy

Using a pulsed microplasma source, clusters were produced through the ablation of a Si cathode and successive supersonic expansion. The Si cluster beam was deposited onto different substrates and the partial oxidation of the cluster surface avoided the growth of large agglomerates, preserving their nanocrystalline morphology. Micro-Raman spectroscopy was used for an accurate size diagnosis of the deposited nanoparticles. The size of the Si dots ranges between 2 and about 15 nm. The Si dots appear to have a Si oxide shell, as confirmed also by structural and compositional analysis through transmission electron microscopy and atomic force microscopy. Double Raman peaks were attributed to small Si agglomerates having a thin substoichiometric Si-O interface.     

Properties of an Al<Subscript>2</Subscript>O<Subscript>3</Subscript>/Si interface

The phase chemical composition of an Al₂O₃/Si interface formed upon molecular deposition of a 100-nm-thick Al₂O₃ layer on the Si(100) (c-Si) surface is investigated by depth-resolved ultrasoft x-ray emission spectroscopy. Analysis is performed using Al and Si L_{2, 3} emission bands. It is found that the thickness of the interface separating the c-Si substrate and the Al₂O₃ layer is approximately equal to 60 nm and the interface has a complex structure. The upper layer of the interface contains Al₂O₃ molecules and Al atoms, whose coordination is characteristic of metallic aluminum (most likely, these atoms form sufficiently large-sized Al clusters). The shape of the Si bands indicates that the interface layer (no more than 10-nm thick) adjacent to the substrate involves Si atoms in an unusual chemical state. This state is not typical of amorphous Si, c-Si, SiO₂, or SiO_x (it is assumed that these Si atoms form small-sized Si clusters). It is revealed that SiO₂ is contained in the vicinity of the substrate. The properties of thicker coatings are similar to those of the 100-nm-thick Al₂O₃ layer and differ significantly from the properties of the interfaces of Al₂O₃ thin layers.     

Theoretical studies on intervalley splittings in Si/SiO<Subscript>2</Subscript> quantum dot structures

Using the coupled cluster method we investigatespin-s J ₁-J′ ₂ Heisenberg antiferromagnets (HAFs) on an infinite, anisotropic, two-dimensional triangular lattice for the two cases where the spin quantum number s = 1 and s = $\frac{3} {2}$\frac{3} {2}. With respect to an underlying square-lattice geometry the model has antiferromagnetic (J ₁ > 0) bonds between nearest neighbours and competing (J′ ₂ > 0) bonds between next-nearest neighbours across only one of the diagonals of each square plaquette, the same diagonal in each square. In a topologically equivalent triangular-lattice geometry, the model has two types of nearest-neighbour bonds: namely the J′ ₂ ≡ κJ ₁ bonds along parallel chains and the J ₁ bonds producing an interchain coupling. The model thus interpolates between an isotropic HAF on the square lattice at one limit (κ = 0) and a set of decoupled chains at the other limit (κ → ∞), with the isotropic HAF on the triangular lattice in between at κ = 1. For both the spin-1 model and the spin-$\frac{3} {2}$\frac{3} {2} model we find a second-order type of quantum phase transition at κ _c = 0.615 ± 0.010 and κ _c = 0.575 ± 0.005 respectively, between a Néel antiferromagnetic state and a helically ordered state. In both cases the ground-state energy E and its first derivative dE/dκ are continuous at κ = κ _c , while the order parameter for the transition (viz., the average ground-state on-site magnetization) does not go to zero there on either side of the transition. The phase transition at κ = κ _c between the Néel antiferromagnetic phase and the helical phase for both the s = 1 and s = $\frac{3} {2}$\frac{3} {2} cases is analogous to that also observed in our previous work for the s = $\frac{1} {2}$\frac{1} {2} case at a value κ _c = 0.80 ± 0.01. However, for the higher spin values the transition appears to be of continuous (second-order) type, exactly as in the classical case, whereas for the s = $\frac{1} {2}$\frac{1} {2} case it appears to be weakly first-order in nature (although a second-order transition could not be ruled out entirely).     

Impedance of Si/SiO<Subscript>2</Subscript> composites in the vicinity of the percolation threshold

The Si/SiO₂ composites, in which the concentration of the conducting silicon phase is close to the percolation threshold, have been prepared using the ceramic technology and studied at an alternating current. It has been found that an increase in the potential difference in a direct-current electric field leads to a decrease in the dispersion of time constants of dielectric spacers in the “Si grain-SiO₂ spacer-Si grain” structures forming a conducting cluster in the composite.     

Quantum chemical study of the properties of an SiO<Subscript>2</Subscript>/Si(100) interface implanted with boron ions

Quantum-chemical calculations of the properties of a B⁺ ion-implanted SiO₂/Si(100) interface are presented. Dependencies of the total energy of a B⁺ ion cluster system on the location of B⁺ ions in oxygen and silicon vacancies are calculated, along with the geometric and electronic characteristics of the equilibrium cluster states with implanted boron ions.     

First-principles calculations of SO<Subscript>2</Subscript> sensing with Si nanowires

High chemical reactivity and large surface-to-volume ratio have recently led to growinginterest in the employment of silicon nanowires (SiNWs) in sensing applications forchemical species detection. The working principle of SiNWs sensors resides in thepossibility to induce modifications in their electronic properties via molecularinteraction. A detailed analysis of the interaction of Si with molecular compounds is thenrequired to design and optimize NW-based sensors. Here we study the mechanisms ofadsorption on SiNWs of SO₂, an air pollutant with pernicious effects on humans.First-principles density-functional calculations are performed to calculate the electronicstructure of a SO₂molecule adsorbed at a silicon surface in case of undoped substrate and in presence ofsubstitutional subsurface and deep boron impurities. Comparing the results with the caseof NO₂ adsorption –a similar molecule that, nonetheless has a very different interaction with a Si surface –,we show the specific traits of SO₂ interaction: formation of localized states in theband-gap and absence of reactivation of pre-existing and passivated sub-surfaceimpurities. A connection between the modifications in the system electronic structure andthe strength of the molecular interaction is discussed.     

Nanostructures of Si/SiO<Subscript>2</Subscript>/metal systems with tracks of fast heavy ions

Structures based on the SiO₂/n-Si and SiO₂/p-Si systems, with nanopores in silicon dioxide layers filled with Cu and Ni nanoparticles, have been prepared and investigated using the fast heavy ion technology, which includes irradiation with ¹⁹⁷Au²⁶⁺ ions, chemical etching of ion tracks, and subpotential electrochemical deposition. The selectivity of filling nanopores with metals and cluster character of their formation in tracks is shown.     

Structure of Ultrathin Polycrystalline Iron Films Grown on SiO<Subscript>2</Subscript>/Si(001)

The structure of polycrystalline Fe films grown on an oxidized Si(001) surface at room temperature has been studied by the technique of high-energy electron diffraction. It has been found that the grain orientation in the films depends of the amount of deposited iron. In Fe films less than 5 nm thick, grains have been found to be randomly oriented. Fe films more than 5 nm in thickness exhibit the (111) texture with an axis coinciding with the surface normal. The angular dispersion of the [111] direction in the Fe lattice from the surface normal is ±25°. It has been found that as the Fe films become thicker, the (111) texture changes to the (110) texture.     

The effect of packing density on luminescence of amorphous SiO<Subscript>2</Subscript> nanoparticles

Photoluminescence of amorphous SiO₂ nanoparticles compressed in the form of tablets is studied under exposure to UV radiation. The observed luminescence spectrum is a broad band extending from the excitation wavelength to 700 nm and with a maximum at ~470 nm. The spectrum can be decomposed into two Gaussian components with maxima at ~460 and ~530 nm. As the pressure applied for sample preparation increases, the integrated intensities of these bands change in opposite directions—the intensity of the short-wavelength band increases, while that of the long-wavelength band decreases. It is concluded that these bands are due to different luminescence centers of silicon dioxide located on the surface and in the bulk of SiO₂ nanoparticles.     

Casimir friction force between a SiO<Subscript>2</Subscript> probe and a graphene-coated SiO<Subscript>2</Subscript> substrate

The possibility of mechanical detection of Casimir friction with the use of a noncontact atomic force microscope is discussed. A SiO₂ probe tip located above a graphene-coated SiO₂ substrate is subjected to the frictional force caused by a fluctuating electromagnetic field produced by a current in graphene. This frictional force will create the bend of a cantilever, which can be measured by a modern noncontact atomic force microscope. Both the quantum and thermal contributions to the Casimir frictional force can be measured using this experimental setup. This result can also be used to mechanically detect Casimir friction in micro- and nanoelectromechanical systems.     

Enhanced photoluminescence of Ca<Subscript>2</Subscript>Al<Subscript>2</Subscript>SiO<Subscript>7</Subscript>:Eu<Superscript>3+</Superscript> by charge compensation method

The effect of compensator on optical properties of Ca₂Al₂SiO₇:Eu³⁺ is systematically investigated by the X-ray powder diffraction, photo-luminescence (PL) properties and lifetime. It is obviously observed that the PL intensity of Eu³⁺ under 394 nm excitation increases in the order of Ca_1.86Eu_0.14Al₂SiO₇ (CAS), Ca_1.72Na_0.14Eu_0.14Al₂SiO₇ (CASNa) and Ca_1.86Eu_0.14Al_2.14Si_0.86O₇ (CASAl), the intensity of Eu³⁺ are 100%, 134%, 184%, and the lifetime of Eu³⁺ are 0.75 ms, 1.28 ms and 1.39 ms, respectively. A charge compensation model is proposed to explain the changes in the emission intensity and lifetime of Eu³⁺ in Ca₂Al₂SiO₇ with different compensation methods. PACS 78.55.-m; 61.72.Ji; 61.43.Gt; 42.70.-a; 74.62.Dh     

Friction and wear properties of ZrO<Subscript>2</Subscript>/SiO<Subscript>2</Subscript> composite nanoparticles

In this article, the lubrication properties of ZrO₂/SiO₂ composite nanoparticles modified with aluminum zirconium coupling agent as additives in lubricating oil under variable applied load and concentration fraction were reported. It was demonstrated that the modified nanoparticles as additives in lubrication can effectively improve the lubricating properties. Under an optimized concentration of 0.1 wt%, the average friction coefficient was reduced by 16.24%. This was because the nanoparticles go into the friction zone with the flow of lubricant, and then the sliding friction changed to rolling friction with a result of the reduction of the friction coefficient.     

Features of high-power ion beam irradiation of nanoporous Si and SiO<Subscript>2</Subscript>

Nanoporous Si and SiO₂ melting observed under high-power ion beam irradiation of nanosecond duration was investigated. The sizes of ellipsoidal particles formed in Si and those of holes formed in SiO₂ under irradiation were determined. The possible origin of these morphology features was discussed.     

Facile growth of monolayer MoS<Subscript>2</Subscript> film areas on SiO<Subscript>2</Subscript>

Areas of single-layer MoS₂ film can be prepared in a tube furnace without the need for temperature control. The films were characterized by means of Raman spectroscopy, photoluminescence, low-energy electron diffraction and microscopy, and X-ray photoelectron spectroscopy and mapping. Transport measurements show n-doped material with a mobility of 0.26 cm² V^-1 s^-1.