Efficiency enhancement of InGaN based blue light emitting diodes with InGaN/GaN multilayer barriers

The advantages of InGaN based light-emitting diodes with InGaN/GaN multilayer barriers are studied.It is found that the structure with InGaN/GaN multilayer barriers shows improved light output power,lower current leakage,and less efficiency droop over its conventional InGaN/GaN counterparts.Based on the numerical simulation and analysis,these improvements on the electrical and the optical characteristics are mainly attributed to the alleviation of the electrostatic field in the quantum wells(QWs) when the InGaN/GaN multilayer barriers are used.     

Properties of InGaN/GaN quantum wells and blue light emitting diodes

We have reported the effects of growth interruption time on the optical and structural properties of high indium content In_xGa_1−xN/GaN (x>0.2) multilayer quantum wells (QWs). The InGaN/GaN QWs were grown on c-plane sapphire by metal organic chemical vapor deposition. The interruption was carried out by closing the group-III metal organic sources before and after the growth of the InGaN QW layers. The transmission electron microscopy (TEM) images show that with increasing interruption time, the quantum-dot-like region and well thickness decreases due to indium reevaporation or the thermal etching effect. As a result the photoluminescence (PL) peak position was blue-shifted and the intensity was reduced. The sizes and number of V-defects did not differ with the interruption time. The interruption time is not directly related to the formation of defects. The V-defect originates at threading dislocations and inversion domain boundaries due to higher misfit strain. Temperature dependent PL spectra support the results of TEM measurements. Also, the electroluminescence spectra of light-emitting diode show that dominant mechanism in InGaN/GaN QWs is a localized effect in the quantum-dot-like regions.     

Strain Effect on Photoluminescences from InGaN MQWs with Different Barriers Grown by MOCVD

InGaN/GaN MQWs, InGaN/AlGaN MQWs and InGaN/AlInGaN MQWs are grown on （0001） sapphire substrates by MOCVD. Membrane samples are fabricated by laser lift-off technology. The photoluminescence spec-ra of membranes show a blue shift of peak positions in InGaN/GaN MQWs, a red shift of peak positions in InGaN/AlGaN MQWs and no shift of peak positions in InGaN/AIlnGaN MQWs from those of samples with substrates. Different changes in Raman scattering spectra and HR-XRD （0002） profile of InGaN/AlInGaN MQWs, from those of InGaN/GaN MQWs and InGaN/AlGaN MQWs, are observed. The fact that the strain changes differently among InGaN MQWs with different barriers is confirmed. The AIlnGaN barrier could adjust the residual stress for the least strain-induced electric field in InGaN/AIlnGaN quantum wells.     

Low-energy electron-excited nanoluminescence studies of GaN and related materials

We have used low-energy electron-excited nanoluminescence (LEEN) spectroscopy combined with ultrahigh vacuum surface analysis techniques to obtain electronic bandgap, confined state and deep-level trap information from III nitride compound semiconductor surfaces and their buried interfaces on a nanometer scale. Localized states are evident at GaN/InGaN quantum wells, GaN ultrathin films, AlGaN/GaN pseudomorphic heterostructures, and GaN/Al₂O₃ interfaces that are sensitive to the chemical composition, bonding and atomic structure near interfaces, and in turn to the specifics of the epitaxial growth process. Identification of electrically active defects in these multilayer nanostructures provides information to optimize interface growth and control local electronic properties.     

结构参数对p-i-n结构InGaN太阳能电池性能的影响及机理

研究了器件结构参数对p-i-n结构InGaN单结太阳能电池性能的影响及物理机制. 模拟结果发现: 随着InGaN禁带宽度的增加, InGaN电池的短路电流减小, 但同时开路电压增加, 当InGaN层的禁带宽度为1.5 eV左右时, 同质p-i-n结InGaN电池的效率最高, 并计算了不同厚度的i层对InGaN电池效率的影响. 进一步的计算表明, 适当采用带宽更大的p-InGaN层形成异质p-i-n结InGaN电池可以获得更高效率, 但是p-InGaN层带宽过大也会导致电池的效率急剧下降. 研究还发现, 采用禁带宽度更大的n-InGaN层可以形成背电场, 从而增加p-i-n结InGaN太阳电池的效率. 研究结果表明, 适当选择p-InGaN和n-InGaN禁带宽度形成异质p-i-n结可以提高InGaN太阳能电池效率.     

Anomalous disorder-related phenomena in InGaN/GaN multiple quantum well heterosystems

The influences of InGaN/GaN multiple quantum well (MQW) heterostructures with InGaN/GaN and GaN barriers on carrier confinement were investigated. The degree of disordering over a broad range of temperatures from 20 to 300 K was considered. The optical and electrical properties were strongly influenced by structural and compositional disordering of the InGaN/GaN MQW heterostructures. To compare the degree of disordering we examined the temperature dependence of the luminescence spectra and electrical conductance contingent on the Berthelot-type mechanisms in the InGaN/GaN MQW heterostructures. We further considered carrier transport in the InGaN/GaN disordered systems, probability of carrier tunneling, and activation energy of the transport mechanism for devices with InGaN/GaN and GaN barriers. The optical properties of InGaN/GaN disordered heterosystems can be interpreted from the features of the absorption spectra. The anomalous temperature-dependent characteristics of the disordered InGaN/GaN MQW structures were attributable to the enhancement of the exciton confinement.     

Growth and characterization of InGaN nanodots hybrid with InGaN/GaN quantum wells

Uniform InGaN nanodots were successfully grown on SiO₂ pretreated GaN surface. It was found that the InGaN nanodots were 20?nm in diameter and 5?nm in height, approximately. After the growth of two periods of InGaN/GaN quantum wells on the surface of InGaN nanodots, nanodot structure still formed in the InGaN well layer caused by the enhanced phase separation phenomenon. Dual-color emissions with different behavior were observed from photoluminescence (PL) spectrum of InGaN nanodots hybrid with InGaN/GaN quantum wells. A significant blueshift and a linewidth broadening were measured for the low-energy peak as the increase of PL excitation power, while a slight blueshift and a linewidth narrowing occurred for the high-energy peak. Accordingly, these two peaks were assigned to be from the In-rich nanodots and quantized state transition from the InGaN/GaN quantum wells with indium content, respectively.     

引入n型InGaN/GaN超晶格层提高量子阱特性研究

利用金属有机物化学气相淀积技术在蓝宝石衬底上生长了InGaN/GaN量子阱结构. 研究了引入n型InGaN薄层或InGaN/GaN超晶格层的量子阱特性,结果表明通过引入n型InGaN薄层或InGaN/GaN超晶格层缓解了量子阱有源区中的应力,改善了多量子阱表面形貌,减少了V型缺陷密度,而且提高了多量子阱的光致发光强度,从而也改进了LED的发光效率. 关键词： InGaN/GaN多量子阱 原子力显微镜 X射线双晶衍射 光致发光     

Influence of Si doping on the structural and optical properties of InGaN epilayers

Influences of the Si doping on the structural and optical properties of the InGaN epilayers are investigated in detail by means of high-resolution X-ray diffraction （HRXRD）, photolumimescence （PL）, scanning electron microscope （SEM）, and atomic force microscopy （AFM）. It is found that the Si doping may improve the surface morphology and crystal quality of the InGaN film and meanwhile it can also enhance the emission efficiency by increasing the electron concentration in the InGaN and suppressing tile formation of V-defects, which act as nonradiative recombination centers in the InGaN, and it is proposed that the former plays a more important role in enhancing the emission efficiency in the InGaN.     

Two dimensional electron gas in a hybrid GaN/InGaN/ZnO heterostructure with ultrathin InGaN channel layer

We investigated the influence of an ultrathin InGaN channel layer on two-dimensional electron gas (2DEG) properties in a newly proposed hybrid GaN/In_xGa_1−xN/ZnO heterostructure using numerical methods. We found that 2DEG carriers were confined at InGaN/ZnO and GaN/InGaN interfaces. Our calculations show that the probability densities of 2DEG carriers at these interfaces are highly influenced by the In mole fraction of the InGaN channel layer. Therefore, 2DEG carrier confinement can be adjustable by using the In mole fraction of the InGaN channel layer. The influence of an ultrathin InGaN channel layer on 2DEG carrier mobility is also discussed. Usage of an ultrathin InGaN channel layer with a low indium mole fraction in these heterostructures can help to reduce the short-channel effects by improvements such as providing 2DEG with higher sheet carrier density which is close to the surface and has better carrier confinement.     

Correlation between pit formation and phase separation in thick InGaN film on a Si substrate

We demonstrate improved surface pit and phase separation in thick InGaN grown on a GaN/Si (111) substrate, using plasma-assisted molecular beam epitaxy with an indium modulation technique. The formation of surface pit and compositional inhomogeneity in the InGaN epilayer are investigated using atomic force microscopy, scanning electron microscopy and temperature-dependent photoluminescence. Indium elemental mapping directly reveals that poor compositional homogeneity occurs near the pits. The indium-modulation epitaxy of InGaN minimizes the surface indium segregation, leading to the reduction in pit density and size. The phase separation in InGaN with a higher pit density is significantly suppressed, suggesting that the pit formation and the phase separation are correlated. We propose an indium migration model for the correlation between surface pit and phase separation in InGaN.     

GaN基激光器多量子阱垒材料的研究

在(0001)蓝宝石衬底上分别用金属有机化学气相沉积技术外延生长了InGaN/GaN, InGaN/InGaN, InGaN/AlInGaN多量子阱激光器结构, 并分别制作了脊形波导GaN基激光器。同步辐射X射线衍射,电注入受激发射光谱测试及光功率-电流(L-I)测试证明,相对于GaN垒材料,InGaN垒材料,AlInGaN四元合金垒材料更能改善多量子阱的晶体质量,提高量子阱的量子效率及降低激光器阈值电流。相关的机制为：组分调节合适的四元合金垒层中Al的掺入使得量子阱势垒高度增加,阱区收集载流子的能力增强;In的掺入能更多地补偿应力,减少了由于缺陷和位错所产生的非辐射复合中心密度;In的掺入还减小了量子阱中应力引致的压电场,电子空穴波函数空间交叠得以加强,使得辐射复合增加。     

Enhancement of light-emission efficiency of ultraviolet InGaN/GaN multiple quantum well light emitting diode with InGaN underlying layer

Two ultraviolet InGaN/GaN light emitting diodes (LEDs) with and without InGaN underlying layer beneath the multiple quantum wells (MQWs) were grown by metal-organic vapor phase epitaxy. Based on the photoluminescence excitation measurements, it was found that the Stokes shift of the sample with a 10-nm-thick In_0.1Ga_0.9N underlying layer was about 64 meV, which was smaller than that of the reference sample without InGaN underlying layer, indicating a reduced quantum-confined Stark effect (QCSE) due to the decrease of the piezoelectric polarization field in the MQWs. In addition, by fitting the photon energy dependence of carrier lifetime values, the radiative recombination lifetime of the sample with and without InGaN underlying layer were obtained about 1.22 and 1.58 ns at 10?K, respectively. The shorter carrier lifetime also confirmed that the QCSE in the MQWs was weakened after inserting the InGaN underlying layer. In addition, although the depth of carrier localization in the sample with InGaN underlying layer became smaller, the nonradiative recombination centers (NRCs) inside it decreased, and thus suppressed the nonradiative recombination process significantly according to the electroluminescence measurement results. Compared to the reference sample, the efficiency droop behavior was delayed in the sample with InGaN underlying layer and the droop effect was also effectively alleviated. Therefore, the enhanced light-emission efficiency of ultraviolet InGaN/GaN MQW LEDs could be attributed to the decrease of QCSE and NRCs.     

High-efficiency InGaN/AlInGaN multiple quantum wells with lattice-matched AlInGaN superlattices barrier

A new approach to fabricating high-quality AlInGaN film as a lattice-matched barrier layer in multiple quantum wells(MQWs) is presented. The high-quality AlInGaN film is realized by growing the AlGaN/InGaN short period superlattices through metalorganic chemical vapor deposition, and then being used as a barrier in the MQWs. The crystalline quality of the MQWs with the lattice-matched AlInGaN barrier and that of the conventional InGaN/GaN MQWs are characterized by x-ray diffraction and scanning electron microscopy. The photoluminescence(PL) properties of the InGaN/AlInGa N MQWs are investigated by varying the excitation power density and temperature through comparing with those of the InGaN/GaN MQWs. The integral PL intensity of InGaN/AlInGaN MQWs is over 3 times higher than that of InGaN/GaN MQWs at room temperature under the highest excitation power. Temperature-dependent PL further demonstrates that the internal quantum efficiency of InGaN/AlInGaN MQWs(76.1%) is much higher than that of InGaN/GaN MQWs(21%).The improved luminescence performance of InGaN/AlInGaN MQWs can be attributed to the distinct reduction of the barrier-well lattice mismatch and the strain-induced non-radiative recombination centers.     

Effect of Interface Roughness and Dislocation Density on Electroluminescence Intensity of InGaN Multiple Quantum Wells

Effects of interface roughness and dislocation density on the electroluminescence (EL) intensity of InGaN multiple quantum wells (MQWs) are investigated. It is found that the EL intensity increases with the number of satellite peaks in the x-ray diffraction experiments of InGaN MQW samples. It is indicated that the rough interface will lead the reduction of EL intensity of InGaN MQW samples. It is also found that the EL intensity increases with the decrease of dislocation density which is characterized by the x-ray diffraction measurements. It is suggested that the EL intensity of InGaN MQWs can be improved by decreasing the interface roughness and dislocation density.     

具有超晶格应力调制结构的绿光InGaN/GaN多量子阱的发光特性

研究了具有InGaN/GaN超晶格(SL)插入结构的绿光InGaN/GaN多量子阱(MQW)的发光特性。结构测试表明,SL插入结构并没有引起MQW中平均In组份的增加,而是改变了In组份的分布,形成了高In组份的量子点和低In组份量子阱。其电致发光(EL)谱和光致发光(PL)谱均出现了双发光峰。我们认为这两个 峰分别来自于量子点和量子阱,且存在着载流子从阱向点转移的输运机制。最后变温PL积分强度的Arrhenius 拟合表明,SL插入结构并没有在MQW中引入新的缺陷,使其发光效率下降。     

In-situ monitoring of optical near-field material processing by electron microscopes

A GaN-to-InGaN interface modification by predeposition of an ultrathin In-rich InGaN incomplete layer followed by a thin triangular InGaN well layer was employed to overcome the negative effects of polarization field on light emission efficiency of InGaN/GaN quantum wells as well as to improve the crystalline quality by avoidance of a significant strain generation and enhanced surfactant effect. Further, the interface modification induced energy band structure engineering reduces the spatial separation of electrons and holes, and thus increases the carrier recombination rate. The improvement in crystalline quality, localized potential fluctuation, and energy band engineering contribute to the significant increase of green emission of the InGaN/GaN quantum wells.     

Self-organized InGaN nanodots grown by metal-organic chemical vapor deposition system

It has been demonstrated that self-organized InGaN nanodots can be vertically grown by utilizing metal-organic chemical vapor deposition epitaxy (MOCVD). We report the investigation of the characteristics of InGaN with various indium contents and the fabrication of self-organized InGaN nanodots will also be discussed. Using a temperature ramping growth method, self-organized InGaN nanodots were formed vertically protruding above the sample. It was found that typical height of these nanodots is around 45 nm with an average width of 5 nm. It was also found that the local density of the vertically grown self-organized InGaN nanodots could reach 8.2 × 10¹² cm⁻². These self-organized InGaN nanodots will result in a red shift in PL spectrum indicating that In droplets act as an indium source to form an InGaN intermediate layer near the heterointerface.     

Effect of the thickness of InGaN interlayer on a-plane GaN epilayer

In this paper,we use the a-plane InGaN interlayer to improve the property of a-plane GaN.Based on the a-InGaN interlayer,a template exhibits that a regular,porous structure,which acts as a compliant effect,can be obtained to release the strain caused by the lattice and thermal mismatch between a-GaN and r-sapphire.We find that the thickness of InGaN has a great influence on the growth of a-GaN.The surface morphology and crystalline quality both are first improved and then deteriorated with increasing the thickness of the InGaN interlayer.When the InGaN thickness exceeds a critical point,the a-GaN epilayer peels off in the process of cooling down to room temperature.This is an attractive way of lifting off a-GaN films from the sapphire substrate.     

InN分凝的InGaN薄膜的光致发光与吸收谱

我们用低压MOCVD在蓝宝石衬底生长了InGaN/GaN外延层.用X射线衍射(XRD),光致发光谱(PL),光吸收谱等测量手段,研究了InGaN的辐射发光机制.In组分利用Vegard定理和XRD测量得到.我们发现随着In组分的增加,在光吸收谱上发现吸收边的红移和较宽的Urbach带尾;PL谱中低能端的发射渐渐成为主导,并且在PL激发谱中InGaN峰也变宽.我们认为压电效应改变了InGaN的能带结构,从而影响了光学吸收特性.而在InN量子点中的辐射复合则是InGaN层发光的起源.