Eine neue Methode zur Bestimmung der Rauhigkeitsautokorrelationsfunktion von optischen Oberflächen

A New Method of Determining the Autocorrelation Function of Polished Optical Surfaces Starting with a general theory of light scattering a measuring procedure for determining the autocorrelation function of surface roughness of well polished substrates is deduced. In this method light intensity scattered into a fixed direction has to be measured in dependence on the dimensions of the scattering area. The results are tested for a glass surface polished by different methods.     

A non-fused fiber coupler for side-pumping of double-clad fiber lasers

A non-fused fiber coupler is demonstrated for side-pumping of the double-clad fiber (DCF) lasers by adhesive techniques. The fiber coupler is fabricated by adhering an angularly polished single-clad fiber (SCF) to the inner cladding of the DCF. The pumping light is launched from the SCF by total inner reflection. Coupling coefficient as a function of coupling angle, bend distance, and backward scattering is investigated. The field distribution in DCF is also discussed.     

电极表面光滑程度对水介质高电压击穿的影响

 采用水介质同轴实验装置,改变电极表面的光滑程度,在μs级充电时进行水介质击穿实验,并对实验结果进行了分析和解释。结果表明：抛光电极表面可有效提高水介质耐高电压击穿能力;表面粗糙度为0.4～0.8 μm的抛光电极表面的击穿场强比表面粗糙度为1.6～3.2 μm的粗糙抛光电极表面,更符合Martin公式。电极表面光滑程度的改善,使阴极场致发射电流减弱进而击穿延迟时间变长,气泡也更难以附着在光滑的电极表面,从而可以提高水介质耐高电压击穿能力。     

The microstructure of polished optical surfaces

The autocovariance function of an optical surface is often assumed to be described by a gaussian. This letter reports measurements on polished optical surfaces that are more accurately modeled by an exponential autocovariance function than by a gaussian.     

抛光区域几何特征与流场创成关键参数关系

磁流变抛光在其实际工作过程中,抛光区域几何特征的不同将会对流场创成的关键参数产生很大的影响。针对此问题建立三维模型与实验仿真展开研究。在研究抛光区域几何特征与流场创成关键参数的关系时,先改变抛光区域形状,观察其对流场创成中剪切应力、压力产生的影响;再控制抛光区域的形状相同时,通过改变抛光区域尺寸大小,观察对流场创成中剪切应力、压力产生的影响。结果表明:当抛光区域形状不同时,抛光区域为凹面时剪切应力最大,抛光区域为凸面时剪切应力最小。当抛光区域形状为凸面时,抛光区域两边的剪切应力随着抛光区域曲率大小增大而增大;当抛光区域形状为凹面,抛光区域两边的剪切应力随着抛光区域曲率大小增大而减小。当抛光区域形状不同时,抛光区域为凹面时压力最大,抛光区域为凸面时压力最小。当抛光区域形状为凸面时,抛光区域处的压力随着抛光区域曲率增大而增大;当抛光区域形状为凹面时,抛光区域处的压力随着抛光区域曲率增大而减小。     

纳米级面形精度光学平面镜加工

为实现纳米级面形精度光学平面镜的高效精密抛光,提出了一种由传统环带抛光技术和先进离子束抛光技术相结合的组合式加工方法。介绍了环带抛光技术和离子束抛光技术的原理,通过实验研究了离子束抛光的材料去除函数,并采用这种组合抛光方法对口径为150 mm的平面镜进行抛光,抛光后平面镜的面形误差和表面粗糙度分别达到1.217 nm RMS和0.506 nm RMS。实验结果表明,这种组合抛光技术适合纳米级面形精度光学平面镜的加工。     

基于光纤侧边抛磨技术的醋酸浓度光纤传感器

演示了两种利用光纤侧边抛磨技术制备的用于醋酸浓度检测的光纤传感器.其中一种光纤传感器采用轮式抛磨法对光纤光栅的光栅区包层进行侧边抛磨加工而成,将醋酸溶液覆盖于光纤光栅的抛磨区,利用侧边抛磨光纤光栅反射峰波长的变化对醋酸浓度进行测量;另一种光纤传感器采用轮式抛磨法对普通单模光纤包层进行侧边抛磨加工而成,将醋酸溶液覆盖于光纤抛磨区,利用抛磨光纤插入损耗的变化对醋酸浓度进行测量.两种光纤传感器的实验都表明:光纤包层抛磨表面与纤芯的距离越小,测量分辨率越高.剩余包层厚度为 0 μm 的侧边抛磨光纤光栅传感器测量醋酸溶液浓度分辨率为6.67%;剩余包层厚度为O.5μm 的侧边抛磨光纤传感器测量醋酸溶液浓度分辨率为0.55%.     

Experimental investigation of enhancing the subsurface damage threshold of Nd-doped phosphate glass

Experimental investigation was performed with a 1064-nm, 10-ns Nd:YAG laser to determine the effects of the surface hydrogen acid etching on laser damage, compared with damage of conventionally polished surface. The investigation was helpful for us to understand the negative effects of Nd-doped phosphate glass surface and subsurface damage (SSD) on laser induced damage threshold (LIDT). A set of samples was polished, and then chemically etched in a cool buffered 10%HF 20%H2SO4 solution at different times. Another set of samples was ground and etched in the hot-buffered solution, and then polished. All the samples were irradiated with Nd: YAG laser and characterized by optical microscopy. Results of LIDT were obtained according to International standard ISO/DIS 11254-1.2. Chemical treatment can remove the contaminants in the polished re-deposition layer and the SSD for improving the laser damage resistance of Nd-doped phosphate glass surfaces. The method of using hot solution was more effective than that ofusing cool solution.     

Dielectric response of a crystal with a damaged surface layer in the longitudinal-transverse splitting region

A model of the dielectric function of a surface layer formed under the mechanical treatment of the crystal surface is considered in the range of the lattice optical vibrations. An approach is proposed based on the continuous distribution of the dipole-active modes in order to take into account the dislocation effect. It is demonstrated that the model used allows one to describe satisfactorily the decrease in the reflectivity of polished SiC6H samples in the vicinity of the frequency of the transverse optical phonon.     

Ultra-smooth platinum surfaces for nanoscale devices fabricated using chemical mechanical polishing

A technique involving two steps of chemical mechanical polishing (CMP) has been developed to produce ultra-smooth metal surfaces with an RMS roughness better than 0.1 nm. A figure of merit termed degree of smoothness (DOS) is proposed for the purpose of quantifying the extent of smoothness of a polished metal surface. A post CMP metal slurry cleaning solution was used for cleaning Pt slurry for the first time and by applying special techniques, a very high quality clean surface was attained. Applications of the polished Pt electrodes in interfacing molecular switching devices with self-assembled monolayers of molecules have been found to dramatically improve the packing and orientation of the molecular monolayer with a huge improvement in the molecular electronics device yields. These smooth metal surfaces may open doors for new opportunities in future nanoscale devices. PACS 81.05.Bx; 81.16.Rf; 81.65.Ps     

碳化硅表面硅改性层的磁介质辅助抛光

为了实现碳化硅表面硅改性层的精密抛光,获得高质量光学表面,对磁介质辅助抛光技术进行研究。设计了适合碳化硅表面硅改性层抛光的磁介质辅助抛光工具,并对抛光工具的材料去除函数进行研究。针对材料去除函数的特性,对数控磁介质辅助抛光的驻留时间算法进行了研究。采用磁介质辅助抛光技术对碳化硅表面硅改性层平面样片进行了抛光实验。经过一次抛光迭代,碳化硅样片表面硅改性层的面形精度(均方根)由0.049λ收敛到0.015λ（λ=0.6328 μm）,表面粗糙度从2 nm改善至0.64 nm。实验结果表明基于矩阵代数的驻留时间算法有效,磁介质辅助抛光适合碳化硅表面硅改性层加工。     

Modification of spontaneous emission from CdSe/CdS quantum dots in the presence of a semiconductor interface

The spontaneous-emission lifetime of CdSe/CdS core-shell quantum dots was studied as a function of the distance between the dots and a polished Si surface. The experimental results reveal a significant modification of the spontaneous-emission rate of the quantum dots by the Si surface.     

侧边抛磨区材料折射率对光纤光栅波长的影响

针对轮式光纤侧边抛磨法,研究了在侧边抛磨光纤光栅抛磨区覆盖不同折射率的材料时,侧边抛磨光纤光栅Bragg波长随外界折射率的改变而变化的特性.理论计算与实验结果都表明,侧边抛磨光纤光栅Bragg波长会随抛磨区覆盖材料折射率的增大向长波长方向偏移;侧边抛磨面离光栅区纤芯表面越近,覆盖材料折射率对波长偏移的影响越大.实验指出,当侧边抛磨区覆盖材料的折射率从1.389 7变到1.447 9时,Bragg波长将会发生1.402 nm的偏移.用轮式光纤侧边抛磨法制备的侧边抛磨光纤光栅可应用于光纤光栅的波长调谐或传感器.     

轻质碳化硅反射镜抛光过程镜面变形影响的研究

轻量化的碳化硅反射镜有自己独特的结构特点,加工中的变形与传统实体反射镜不同,对加工后的面形结果有独特的影响。对一直径为318mm的轻量化碳化硅反射镜进行了传统的研磨抛光,由于镜面变形对抛光结果带来了很大的影响,其面形误差的RMS值在0.048λ(λ=0.6328μma)左右就不再收敛。对抛光状态的镜体进行了有限元分析,探讨了减轻镜面变形对抛光结果影响的方法。采用计算机控制小磨头对该反射镜进行了确定性抛光,有效地降低了镜面形变的影响,使面形满足了精度的要求。     

高精度中小11径非球面修抛技术研究

为实现高精度中小口径非球面的加工，介绍了一种非球面修抛技术。基于Preston假设，将抛光过程描述成一个线性方程，计算得到材料的去除量与抛光时间、抛光压力和零件转速之间的函数关系。设计了整体修抛法和环带修抛法两种方法，在数控抛光的基础上，对口径为Ф117mm的凹抛物面和口径为Ф17mm凸双曲面进行修抛，修抛后非球面的面形精度PV值为0．184μm，RMS均小于0．032μm，达到了工程化应用要求，实现了中小口径非球面的高精度加工。     

Simulation and experimental research on polymer fiber mode selection polished coupler

Multimode dispersion is the main obstacle for high bandwidth in multimode optical fiber （MMF） communication system. Mode selection is an effective method to oppress multimode dispersion. We propose and investigate a kind of polymer optical fiber polished coupler. Beam propagation method （BPM） is employed to calculate the coupling coefficient of transmission modes in MMF coupler, and an output pattern from coupling branch is obtained. Analysis and experiment show that this coupler can select certain modes by changing polished depth, contact area, and intersection angle of two branches, which means that the device can be employed both as a mode selector and a sensor. In addition, simulation shows that five times bandwidth enhancement may be realized by selecting modes with the polymer fiber polished coupler.     

Determination of the Li/Nb ratio in lithium niobate by means of birefringence and Raman measurements

Two optical methods for the determination of the Li/Nb ratio in lithium niobate (LiNbO₃) are discussed. Data for the optical birefringence method are presented, they cover the entire composition range in which LiNbO₃ can be fabricated and a wide spectral region. The line-widths of lattice modes have been measured by means of Raman scattering as a function of the Li/Nb ratio for single crystals with polished and rough surfaces.     

Ion-beam studies of synthetic single-crystal diamonds

A surface layer of polished single-crystal diamond plates with the (100) orientation, which can be applied to planar high-frequency high-power microstructures, is investigated by means of ion-beam and X-ray methods. It is demonstrated that the diamond plates are characterized by a high degree of structural perfection and a low level of surface roughness.     

Electropolishing for the formation of anodic nanotubular TiO2 with uniform length and density

Electropolishing of Ti was carried out in alcohol-based electrolyte and subsequently the polished Ti was anodized in ethylene glycol containing 0.25 wt% NH₄F. Anodization of polished and non-polished Ti, respectively, showed no big difference in the degree of local arrangement of the nanotubes, whereas the surface roughness on a large area was dramatically improved in the anodized polished Ti. Anodization of polished Ti leads to the formation of nanotubular TiO₂ structures with more uniform length and relatively time-independent density of nanotubes compared to that prepared with anodization of non-polished Ti, meaning that electropolishing is indispensable for the formation of uniform nanotubular TiO₂ structures.     

侧边抛磨光纤波导传输特性的理论分析

在建立侧边抛磨光纤D型光纤边界条件的基础上,用三维有限差分光束传输法计算和分析了侧边抛磨光纤器件的光功率衰减随光纤的侧边抛磨长度、光纤侧边抛磨后剩余包层的厚度、以及填充聚合物材料折射率三个参量变化的特性.结果表明,侧边抛磨光纤器件的光功率衰减随着抛磨长度的增加而增大;当抛磨长度等于9 mm时,光功率衰减随着剩余包层厚度的增大而单调递减.而当抛磨长度大于9 mm时,剩余包层厚度小于3 μm的范围内,光衰减随着剩余包层厚度的增加出现振荡;当聚合物折射率与纤芯折射率相同时,光功率衰减最大.