Direct observation of surface-profile effects on X-ray-photoelectron angular distributions

The first direct observations of surface-profile effects on X-ray-photoelectron angular distributions are reported. Ratios of Al 2p (oxide) and Al 2p (metal) peak intensities were measured at various electron emission angles for two different types of specimens consisting of an aluminum substrate with a surface oxide layer. For triangular-periodic diffraction grating surfaces with 10°, 20°, and 43° blaze angles, pronounced structure was observed in the ratio angular distributions; theoretical calculations based upon the ideal grating geometries furthermore reproduce all of the features found experimentally. For unidirectionally-polished aluminum specimens, ratio angular distributions measured perpendicular and parallel to the polishing grooves were found to be markedly different, with more oxide enhancement being possible at low electron emission angles for the parallel orientation; this finding is also qualitatively consistent with theory.     

Effective attenuation lengths for photoelectrons in thin films of silicon oxynitride and hafnium oxynitride on silicon

We have used the National Institute of Standards and Technology Database for the Simulation of Electron Spectra for Surface Analysis (SESSA) to simulate photoelectron intensities for thin films of SiO_1.6N_0.4 and HfO_1.9N_0.1 on silicon with excitation by Al Kα X‐rays. We considered Si 2p_3/2 photoelectrons from SiO_1.6N_0.4 and the substrate and Hf 4f_7/2 photoelectrons from HfO_1.9N_0.1. The simulations were performed for ranges of film thicknesses and photoelectron emission angles and for two common configurations for X‐ray photoelectron spectroscopy (XPS), the sample‐tilting configuration and the Theta Probe configuration. We determined photoelectron effective attenuation lengths (EALs) by two methods, one by analyzing photoelectron intensities as a function of film thickness for each emission angle (Method 1) and the other by analyzing photoelectron intensities as a function of emission angle for each film thickness (Method 2). Our analyses were made with simple expressions that had been derived with the assumption that elastic‐scattering effects were negligible. We found that EALs from both methods were systematically larger for the Theta Probe configuration, by amounts varying between 1% and 5%, than those for the sample‐tilting configuration. These differences were attributed to anisotropy effects in the photoionization cross section that are expected to occur in the former configuration. Generally, similar EALs were found by each method for each film material although larger EALs were found from Method 2 for film thicknesses less than 1.5 nm. SESSA is a useful tool for showing how elastic scattering of photoelectrons modifies EALs for particular materials, film thicknesses, and XPS configurations. Copyright © 2012 John Wiley & Sons, Ltd.     

Morphology,surface roughness,electron inelastic and quasielastic scattering in elastic peak electron spectroscopy of polymers

In elastic peak electron spectroscopy (EPES), the nearest vicinity of elastic peak in the low kinetic energy region reflects electron inelastic and quasielastic processes. Incident electrons produce surface excitations, inducing surface plasmons, with the corresponding loss peaks separated by 1–20 eV energy from the elastic peak. In this work, X‐ray photoelectron spectroscopy (XPS) and helium pycnometry are applied for determining surface atomic composition and bulk density, whereas atomic force microscopy (AFM) is applied for determining surface morphology and roughness. The component due to electron recoil on hydrogen atoms can be observed in EPES spectra for selected primary electron energies. Simulations of EPES predict a larger contribution of the hydrogen component than observed experimentally, where hydrogen deficiency is observed. Elastic peak intensity is influenced more strongly by surface morphology (roughness and porosity) than by surface excitations and quasielastic scattering of electrons by hydrogen atoms. Copyright © 2007 John Wiley & Sons, Ltd.     

Monte‐Carlo simulation of x‐ray photoelectron emission from silver

Silver 3d x‐ray photoelectron spectroscopy (XPS) spectra were simulated with the Monte‐Carlo method using an effective energy‐loss function that was derived from a reflected electron energy‐loss spectroscopy (REELS) analysis based on an extended Landau approach. After confirming that Monte‐Carlo simulation based on the use of the effective energy‐loss function can successfully describe the experimental REELS spectrum and Ag 3d XPS spectrum, we applied Monte‐Carlo simulation to predict the angular distribution of Ag 3d x‐ray photoelectrons for different x‐ray incidence angles and different photoelectron take‐off angles. The experimental photoelectron emission microscope that we are constructing was confirmed as being close to the optimum configuration, in which the x‐ray incident angle as measured from the surface normal direction is 74° and the photoelectron take‐off angle is set normal to the surface. The depth distribution functions of the Ag 3d X‐ray photoelectrons for different energy windows suggest that the photoelectron emission microscope will exhibit greater surface sensitivity for narrower photoelectron energy windows. Copyright © 2003 John Wiley & Sons, Ltd.     

Matrix/analyte ratio influencing polymer molecular weight distribution in matrix‐assisted laser desorption/ionization time‐of‐flight mass spectrometry

Matrix‐assisted laser desorption/ionization time‐of‐flight mass spectrometry (MALDI‐TOF‐MS) has been used to characterize poly(L‐lysine) polymers and unique oligomer peptides, like 10‐, 15‐ and 25‐mer [Lys]_n oligolysine peptides. Several matrices have been tried in order to find optimal conditions, but only α‐cyano‐4‐hydroxycinnamic acid gave analytically useful spectra. The synthetic oligomers and their mixtures gave good quality spectra, showing protonated and cationized molecules, including doubly charged species. The polymers, analogously, gave a wide distribution of single‐ and double‐cationized peak series. The polymer distributions observed indicate the presence of significant suppression effects. The concentration (matrix/analyte ratio) was found to influence the results significantly; distributions shifting to higher masses when higher polymer concentrations were used. This effect was studied in detail using the synthetic (‘monodisperse’) oligolysine peptides. It was found that the relative intensities change by over an order of magnitude in the 0.1–10 pmol/µL concentration range (typical for most proteomic analyses). The results indicate that concentration effects need to be considered when MALDI‐MS is used for quantitative purposes. Copyright © 2009 John Wiley & Sons, Ltd.     

Quantitative analysis of styrene‐pentafluorostyrene random copolymers by ToF‐SIMS and XPS

Poly(styrene) (PS), poly(2,3,4,5,6‐pentafluorostyrene) (5FPS) and their random copolymers were prepared by bulk radical polymerization. The spin‐cast polymer films of these polymers were analyzed using X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). The surface and bulk compositions of these copolymers were found to be same, implying that surface segregation did not occur. The detailed analysis of ToF‐SIMS spectra indicated that the ion fragmentation mechanism is similar for both PS and 5FPS. ToF‐SIMS quantitative analysis using absolute peak intensity showed that the SIMS intensities of positive styrene fragments, particularly C₇H₇⁺, in the copolymers are higher than the intensities expected from a linear combination of PS and 5FPS, while the SIMS intensities of positive pentafluorostyrene fragments are smaller than expected. These results indicated the presence of matrix effects in ion formation process. However, the quantitative approach using relative peak intensity showed that ion intensity ratios are linearly proportional to the copolymer mole ratio when the characteristic ions of PS and 5FPS are selected. This suggests that quantitative analysis is still possible in this copolymer system. Copyright © 2005 John Wiley & Sons, Ltd.     

Focused ion beam implantation of Ga in Si and Ge: fluence‐dependent retention and surface morphology

Focused ion beam implantation of 30‐keV Ga⁺ ions in single‐crystalline Si and Ge was investigated by SIMS, using Cs⁺ primary ions for sputtering. Nine different implantation fluences ranging from 1 × 10¹³ to 1 × 10¹⁷ Ga⁺‐ions/cm² were used, with implanted areas of 40 × 40 µm². The Ga concentration distributions of these implants were determined by SIMS depth profiling. Such 30‐keV Ga implantations were also simulated by a dynamic Monte‐Carlo code that takes into account the gradual change of the near‐surface composition due to the Ga incorporation. In both approaches, an essentially linear increase of the Ga peak concentrations with fluence is found up to ～1 × 10¹⁶cm^?2; for higher fluences, the Ga content approaches a saturation level which is reached at about (1–2) × 10¹⁷cm^?2. The measured and simulated peak concentrations of the Ga distributions are in good agreement. The most probable ranges obtained from the experiments correspond closely with the respective values from the simulations. The surface morphology caused by Ga⁺ implantation was investigated by atomic force microscopy (AFM). The AFM data indicate that for low fluences (<3 × 10¹⁵cm^?2) the surface within the implanted areas is growing outward (i.e. is swelling). For increasingly higher fluences, sputter‐induced erosion of the surface becomes dominant and distinct craters are formed for fluences above ～1 × 10¹⁶cm^?2. At the boundary of the implanted region a wall‐like structure is found to form upon Ga implantation; its height is growing with increasing fluence, reaching a value of ～15 nm at 1 × 10¹⁷ Ga⁺‐ions/cm². Copyright © 2008 John Wiley & Sons, Ltd.     

A Surface Femtosecond Two-Photon Photoemission Spectrometer for Excited Electron Dynamics and Time-Dependent Photochemical Kinetics

A surface femtosecond two-photon photoemission (2PPE) spectrometer devoted to the study of ultrafast excited electron dynamics and photochemical kinetics on metal and metal oxide surfaces has been constructed. Low energy photoelectrons are measured using a hemispheri-cal electron energy analyzer with an imaging detector that allows us to detect the energy and the angular distributions of the photoelectrons simultaneously. A Mach-Zehnder interferom-eter was built for the time-resolved 2PPE (TR-2PPE) measurement to study ultrafast surface excited electron dynamics, which was demonstrated on the Cu(111) surface. A scheme for measuring time-dependent 2PPE (TD-2PPE) spectra has also been developed for studies of surface photochemistry. This technique has been applied to a preliminary study on the photochemical kinetics on ethanol/TiO₂(110). We have also shown that the ultrafast dy-namics of photoinduced surface excited resonances can be investigated in a reliable way by combining the TR-2PPE and TD-2PPE techniques.     

Monte Carlo simulation of full energy spectrum of electrons emitted from silicon in Auger electron spectroscopy

A Monte Carlo simulation including surface excitation, Auger electron‐ and secondary electron production has been performed to calculate the energy spectrum of electrons emitted from silicon in Auger electron spectroscopy (AES), covering the full energy range from the elastic peak down to the true‐secondary‐electron peak. The work aims to provide a more comprehensive understanding of the experimental AES spectrum by integrating the up‐to‐date knowledge of electron scattering and electronic excitation near the solid surface region. The Monte Carlo simulation model of beam–sample interaction includes the atomic ionization and relaxation for Auger electron production with Casnati's ionization cross section, surface plasmon excitation and bulk plasmon excitation as well as other bulk electronic excitation for inelastic scattering of electrons (including primary electrons, Auger electrons and secondary electrons) through a dielectric functional approach, cascade secondary electron production in electron inelastic scattering events, and electron elastic scattering with use of Mott's cross section. The simulated energy spectrum for Si sample describes very well the experimental AES EN(E) spectrum measured with a cylindrical mirror analyzer for primary energies ranging from 500 eV to 3000 eV. Surface excitation is found to affect strongly the loss peak shape and the intensities of the elastic peak and Auger peak, and weakly the low energy backscattering background, but it has less effect to high energy backscattering background and the Auger electron peak shape. Copyright © 2014 John Wiley & Sons, Ltd.     

Quantitative analysis of angle‐resolved XPS spectra recorded in parallel data acquisition mode

The effects of anisotropy of the photoionization cross‐section and elastic scattering of photoelectrons in solids are investigated for angle‐resolved XPS spectra (ARXPS) recorded from α–Al₂O₃ substrate in parallel data acquisition mode. It is shown that for quantitative analysis of ARXPS spectra recorded in parallel data acquisition mode it is essential to account for the anisotropies of the photoionization cross‐sections of the detected photoelectrons for the concerned elements in the solid due to variation of the angle between the incident x‐rays and the detected photoelectrons. Neglecting the effect of elastic scattering only leads to minor errors in quantitative analysis of the ARXPS spectra. By adopting experimentally determined values for the relative sensitivity factors of the concerned photoelectrons in the solid as a function of the detection angle, cumbersome corrections for the effects of anisotropy of the photoionization cross‐section and elastic scattering can be avoided. Copyright © 2004 John Wiley & Sons, Ltd.     

Strong diffuse scattering and lamellar morphologies of syndiotactic polystyrene: Polymorphic effects

Syndiotactic polystyrene (sPS) samples melt‐crystallized into neat α″‐ hexagonal and β′‐orthorhombic modifications were prepared at various temperatures thoroughly for extensive morphological studies. The lamellar morphologies of the as‐prepared sPS samples were investigated with small‐angle X‐ray scattering (SAXS) and transmission electron microscopy (TEM). For SAXS measured at 25°C, a barely observed scattering hump was detected for β′‐form sPS, whereas no discernible scattering feature was found for α″‐form sPS because of a small difference in the electron density between the crystalline and amorphous phases. For increased scattering contrast and strength, SAXS was carried out at 150°C so that more reliable morphological parameters would be obtained. In addition to the enhanced scattering peak relevant to the lamellar features, strong diffuse scattering near the beam stop was observed for both α″‐ and β′‐form sPS samples. The contribution of the diffuse scattering at low q regions (where q is the scattering vector) was rather prominent, obscuring the precise position of the scattering peak. On the basis of the Debye–Bueche theory, the strength and inhomogeneity length were derived to render the diffuse scattering. After the subtraction of the diffuse scattering from the observed intensities, scattering intensities exclusively associated with the lamellar features were obtained. Lamellar thicknesses were further derived from the one‐dimensional correlation function of the modified intensities, and a good agreement was reached in comparison with TEM results. From exhaustive TEM observations on the RuO₄‐stained samples, long and parallel lamellae were readily observed in β′‐form sPS. However, relatively irregular packing of lamellar stacks with short lateral dimensions was detected in the as‐prepared α″‐form sPS, leading to the absence of spherulitic birefringence under polarized optical microscopy. © 2003 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 41: 2457–2469, 2003     

Obtaining quantitative information on surface excitations from reflection electron energy‐loss spectroscopy (REELS)

A new analysis of reflection electron energy‐loss spectroscopy (REELS) spectra is presented. Assuming inelastic scattering in the bulk to be quantitatively understood, this method provides the distribution of energy losses in a single surface excitation in absolute units without the use of any fitting parameters. For this purpose, REELS spectra are decomposed into contributions corresponding to surface and volume excitations in two steps: first the contribution of multiple volume excitations is eliminated from the spectra and subsequently the distribution of energy losses in a single surface scattering event is retrieved. This decomposition is possible if surface and bulk excitations are uncorrelated, a condition that is fulfilled for medium‐energy electrons because the thickness of the surface scattering layer is small compared with the electron elastic mean free path. The developed method is successfully applied to REELS spectra of several materials. The resulting distributions of energy losses in an individual surface excitation are in good agreement with theory. In particular, the so‐called begrenzungs effect, i.e. the reduction of the intensity of bulk losses due to coupling with surface excitations near the boundary of a solid‐state plasma, becomes clearly observable in this way. Copyright © 2003 John Wiley & Sons, Ltd.     

Peptide peak intensities enhanced by cysteine modifiers and MALDI TOF MS

Two cysteine‐specific modifiers we reported previously, N‐ethyl maleimide (NEM) and iodoacetanilide (IAA), have been applied to the labeling of cysteine residues of peptides for the purpose of examining the enhancement of ionization efficiencies in combination with matrix‐assisted laser desorption/ionization time‐of‐flight mass spectrometry (MALDI TOF MS). The peak intensities of the peptides as a result of modification with these modifiers were compared with the peak intensities of peptides modified with a commercially available cysteine‐specific modifier, iodoacetamide (IA). Our experiments show significant enhancement in the peak intensities of three cysteine‐containing synthetic peptides modified with IAA compared to those modified with IA. The results showed a 4.5–6‐fold increase as a result of modification with IAA compared to modification with IA. Furthermore, it was found that IAA modification also significantly enhanced the peak intensities of many peptides of a commercially available proteins, bovine serum albumin (BSA), compared to those modified with IA. This significant enhancement helped identify a greater number of peptides of these proteins, leading to a higher sequence coverage with greater confidence scores in identification of proteins with the use of IAA. Copyright © 2012 John Wiley & Sons, Ltd.     

Photofield emission spectroscopy and surface density of states

A novel procedure for the investigation of optical excitations on the metal surface by the photofield emission method is reviewed. A separation procedure of thermocurrent, accompanying the measured photocurrent, induced by the chopped light beam, is described. A differentiation of the true photocurrent curve allows one to obtain an energy distribution of photoelectrons. For the (0 0 0 1) face of Ti, it exhibits very small and densely spaced maxima, confirmed by theory as surface resonances. The dependence of the density on the thickness of the Ti crystal, grown by evaporation of Ti on the W field emitter surface, was verified experimentally. The possibility of observing surface resonances on a microcrystal of a homogeneous field emitter is discussed.     

Charge referencing issues in XPS of insulators as evidenced in the case of Al‐Si‐N thin films

Accurate charge referencing in XPS of insulating specimens is a delicate issue. This difficulty is illustrated in the case of Al‐Si‐N composite thin films deposited by reactive magnetron sputtering with variable composition from pure aluminum nitride to pure silicon nitride. The samples were mounted with Au‐coated metallic clamps. Argon sputter cleaning was required to remove a surface native oxide before analysis. For charge referencing implanted argon atoms from the sputter gas and a small amount of gold re‐deposited from the metallic clamps onto the specimen surface during sputter cleaning were evaluated. For the argon atoms, a surprisingly large chemical shift (～1 eV) and a significant peak broadening (0.6 eV) of the Ar 2p_3/2 photoelectron line were found with varying the Si content of the films. This could be related to chemical and structural changes of the Al‐Si‐N films. Hence implanted argon could not be used for charge referencing of Al‐Si‐N samples. In contrast to the implanted argon, the Au 4f_7/2 line width of the gold re‐deposited onto the sample surface did not depend on the Si content of Al‐Si‐N films. A constant energy shift (～1.2 eV) of the Au 4f_7/2 line as compared with bulk gold was, however, found, which was related to the size of gold particles formed on the insulating films. Therefore gold could be reliably used to study chemical shifts of sample‐relevant species in Al‐Si‐N films, but the absolute binding energies of Al 2p, Si 2p and N 1s photoelectrons could not be determined. Copyright © 2011 John Wiley & Sons, Ltd.     

Quantitative measurement of the polydispersity in the extent of functionalization of glass‐forming calix[4]resorcinarenes

The polydispersity in the degree of functionalization for two calix[4]resorcinarenes was determined by measuring quantitatively their molecular mass distribution with matrix‐assisted laser desorption/ionization time‐of‐flight mass spectrometry. A mathematical method for polydisperse materials is described that creates a calibration curve to correct the ion signal intensities in the mass spectrum to give a more reliable molecular mass distribution. Correction is required due to various sample preparation and instrumental effects that may produce a systematic mass bias in the number of oligomers measured. This method employs gravimetric mixtures of analytes with different degrees of functionalization. One calix[4]resorcinarene was found to give accurate molecular mass distributions with little correction, while another, having a very similar molecular structure, was found to exhibit strong over‐counting of the oligomers having a high degree of functionalization. Copyright © 2009 John Wiley & Sons, Ltd.     

Measurement of the surface excitation parameter of Kapton,polyethylene (PE), polymethyl methacrylate (PMMA), polystyrene (PS) and polytetrafluoroethylene (PTFE)

Reflection electron energy loss spectra (REELS) were measured for five insulating organic compounds: Kapton, polyethylene (PE), poly(methyl methacrylate) (PMMA), polystyrene (PS) and polytetrafluoroethylene (PTFE), as well as for Ni and Si, in the energy range between 200 and 1600 eV. The average number of surface excitations for a single surface crossing were determined from the experimental data and were found to be considerably smaller than for earlier studied materials, which mainly consisted of elemental metals [Surf. Sci. 486(2001)L461]. The surface excitation parameter, a material parameter used to quantify the relative intensity of surface losses in (photo)electron spectroscopy, was extracted from the data and compared with values found in the literature. The results indicate that surface excitations only have a minor influence on quantification of XPS spectra of polymers. On the other hand, a correction for surface excitations turns out to be essential for measurements of the electron inelastic mean free path of polymers when a metal is used as reference material.     

Quantification of surface roughness effect on elastically backscattered electrons

Electron inelastic mean free path can be obtained from a measured elastic peak electron spectroscopy spectrum combined with a Monte Carlo simulation. It is thus necessary to know the influence of various experimental factors to the measured and calculated results. This work investigates the effect of the surface roughness or the surface topography on the intensity of the elastic peak. A Monte Carlo simulation, by taking into account of realistic surface roughness for both Gaussian and non‐Gaussian type rough surfaces experimentally prepared, has been employed to study the surface topography effect. The simulations of elastic peak electron spectroscopy were performed for both planar and rough Al and Cu surfaces and for varied primary energies ranging from 200 to 2000 eV. To quantify the surface roughness effect, the surface roughness parameter is introduced according to the ratio of elastic peak intensities between a rough surface and an ideal planar surface. Simulation results have shown that surface roughness parameter is important in a certain range of emission angle and particularly for large emission angles. For grazing emission, the elastic peak intensity can be largely enhanced by roughness even at nanometer scale. Copyright © 2014 John Wiley & Sons, Ltd.     

Evaluation of uncertainties in X‐ray photoelectron spectroscopy intensities associated with different methods and procedures for background subtraction. II. Spectra for unmonochromated Al and Mg X‐rays

We report uncertainties in X‐ray photoelectron spectroscopy (XPS) intensities arising from commonly used methods and procedures for subtraction of the spectral background. These uncertainties were determined from a comparison of XPS intensities reported by volunteer analysts and the corresponding intensities expected for a set of simulated XPS spectra. We analyzed peak intensities from 16 sets of data (submitted from 15 institutions) for a group of 12 spectra that had been simulated for an unmonochromated Al‐Kα source and similar intensities from 20 sets of data (submitted from 17 institutions) that had been simulated for an unmonochromated Mg‐Kα source. Each reported intensity was compared with an expected intensity for the particular integration limits chosen by each analyst and known from the simulation design. We present ratios of the reported intensities to the expected intensities for the background‐subtraction methods chosen by the analysts. These ratios were close to unity in most cases, as expected, but deviations were found in the results from some analysts, particularly if shakeup was present. We showed that better results for the Shirley and Tougaard backgrounds were obtained when analysts determined peak intensities over certain energy ranges or integration limits. We then were able to suggest integration limits that should be a useful guide in the determination of peak intensities for other XPS spectra. The use of relatively narrow integration limits with the Shirley and linear backgrounds, however, will lead to measures of peak intensity that are less than the total intensities. Although these measures may be satisfactory for some quantitative analyses, errors in quantitative XPS analyses can occur if there are changes in XPS lineshapes or shakeup fractions with change of chemical state. The use of curve‐fitting equations to fit an entire spectrum will generally exclude the shakeup contribution to the intensity of the main peak, and any variation in the shakeup fraction with change of chemical state will not be taken into account. Published in 2009 by John Wiley & Sons, Ltd.     

Dependence of calculated electron effective attenuation lengths on transport mean free paths obtained from two atomic potentials

We report changes in electron effective attenuation lengths (EALs) resulting from use of transport mean free paths (TMFPs) obtained from the Dirac–Hartree–Fock (DHF) potential instead of the Thomas–Fermi–Dirac (TFD) potential in an algorithm used in the National Institute of Standards and Technology (NIST) Electron Effective‐Attenuation‐Length Database (SRD 82). TMFPs from the former potential are believed to be more reliable than those obtained from the latter potential. We investigated changes in the EALs for selected photoelectron and Auger‐electron lines in four elemental solids (Si, Cu, Ag, and W), for Si 2p photoelectrons of varying energy in SiO₂, and for photoelectrons excited by Al Kα X rays in four candidate gate‐dielectric materials (HfO₂, ZrO₂, HfSiO₄, and ZrSiO₄). For each material, we computed the change in the average EAL for a range of overlayer‐film thicknesses from zero to a maximum value corresponding to attenuation of the substrate signal to 10% of its original value. This EAL change was a maximum for electrons emitted normally from the surface and decreased monotonically with increasing emission angle. The maximum EAL change varied between ?4.4% and 2.6% for the three groups of materials. We found that the maximum EAL change correlated mainly with the TMFP change. We found that TMFP changes in other solids could generally lead to maximum EAL changes between ?2.6% and 1.9% for electron energies between 500 and 2000 eV. For lower energies, the maximum EAL changes could be larger for some solids. Our revised EALs for Si 2p photoelectrons in SiO₂ excited by Mg and Al Kα X rays agree within 0.5% with values reported by Seah and Spencer from a detailed analysis of SiO₂ film‐thickness measurements by XPS and other techniques. Copyright © 2006 John Wiley & Sons, Ltd.