Polymers with temperature dependent degrees of swelling, especially polymers which exhibit lower critical solution temperature (LCST) behaviour in aqueous solutions, are of interest for applications in microsystems. For these applications it is necessary to form and pattern thin films in the μm-range. This has been achieved through photocrosslinking of linear prepolymers. Copolymers based on N-isopropylacrylamide (NIPAAm) were modified with a stilbazolium salt chromophore to yield photocrosslinkable temperature sensitive polymers. The chromophore reacts via a [2+2]-cycloaddition under irradiation, this can be used to crosslink the polymer. The photocrosslinking properties were studied by UV irradiation of thin films and measuring the changes in UV absorption spectra. Through irradiation of thin films through a mask it was possible to obtain patterned networks in the μm-range (20 μm space width and > 50 μm line width). The polymers exhibited LCST behaviour, which was measured using DSC. The resulting patterned networks had temperature dependent swelling properties in aqueous media. 相似文献
The miscibility of poly(N-isopropylacrylamide) (PNIPA) with poly(vinyl pyrrolidone) (PVP) and a cross-linked poly(acrylic acid) (Carbopol® 971P) was evaluated from the rheological data of aqueous dispersions and the temperature of glass transitions of films made of binary mixtures. PNIPA has a low critical solubility temperature (LCST) of about 33°C, below which 1% dispersion behaves as a viscous system. At temperatures above LCST, the hydrophobic interactions among the isopropyl groups initially provide transient networks of greater elasticity. The LCST of PNIPA as well as its Tg (144°C, estimated by DSC and MTDSC of films) were not modified by the presence of PVP. The immiscibility of PNIPA and PVP was confirmed by the absence of interaction between both polymers as shown by FTIR analysis of the films. In contrast, PNIPA and carbopol were miscible and the behaviour of their mixtures differed significantly from that of the parent polymers; i.e. a strong synergistic effect on the viscoelasticity of the dispersions was observed below the LCST. As temperature increased, the blends showed a decrease in the loss and storage moduli, especially those with greater PNIPA proportions. The fall was smoother as the PNIPA proportion decreased. This behaviour may be explained as the result of the balance between PNIPA/carbopol hydrogen bonding interactions (as shown in the shift of C=O stretch in FTIR spectra) and PNIPA/PNIPA hydrophobic interactions. The Tg values of the films of the blends showed a positive deviation from the additivity rule; the mixtures containing more than 1:1 amide:carboxylic acid groups have a notably high Tg (up to 181°C). This increase is related to the stiffness induced in the films by the PNIPA/carbopol interactions. 相似文献
Cross‐linked liquid‐crystalline (LC) polymers with a mesomorphic diarylethene were prepared to demonstrate a versatile strategy for cross‐linked photochromic LC polymers as photomobile materials. Upon exposure to UV light to cause photocyclization of the diarylethene chromophore, the cross‐linked polymer films bend toward an actinic light source. By irradiation with visible light to cause a closed‐ring to open‐ring isomerization, the bent films revert to the initial flat state. Without visible‐light irradiation, the bent films remain bent even at 120 °C, indicating high thermal stability of the cross‐linked diarylethene LC polymers. 相似文献
Partial modification of the nonionic polymer poly(N‐2‐hydroxy‐propylmethacrylamide) by cinnamate produces stimuli‐responsive copolymers. The hydrophobic character of the cinnamate chromophore induces not only a lower critical solution temperature (LCST) in water, but renders additionally the polymers photoresponsive. For moderate cinnamate contents of 9 mol‐%, the photoisomerization of the trans‐cinnamate to cis‐cinnamate groups allows to switch the LCST by irradiation, whereas for higher cinnamate contents of 21 mol‐%, irradiation leads to intra‐ and intermolecular photocrosslinking. 相似文献
A new methodology for creating patterned fluorescence images was developed based on acrylate polymers that have pendant triphenylmethane derivatives as precursor fluorophores. Photoinduced oxidation of the substituted nonfluorescent triphenylmethane substituents on the polymers results in the generation of fluorescent cationic species. Patterned fluorescence images were obtained when the polymer film was subjected to photomasked UV‐irradiation. The rate of formation and quality of the patterned images were found to be dependent on the nature of substituents on the methane carbon of the triphenylmethane group. Inefficient image formation takes place with the polymer derived from the H‐substituted derivative owing to the inefficient oxidation of the triphenylmethane group. In contrast, photomasked UV‐irradiation of a thin polymer film derived from the CN‐substituted triphenylmethane derivative leads to fast (1 s irradiation, 12 mW · cm−2) and finely resolved patterned fluorescence images.
Three kinds of photoresponsive copolymers with azobenzene side chains were synthesized by radical polymerization of N‐4‐phenylazophenylacrylamide (PAPA) with N‐isopropylacrylamide (NIPAM), N,N‐diethylacrylamide (DEAM) or N,N‐dimethylacrylamide (DMAM) respectively. Their structures were characterized by FT‐IR, 1H‐NMR and UV/Vis spectroscopy. Their reversible photoresponses were studied with or without α‐cyclodextrin (α‐CD), which showed that both the copolymers and their inclusion complexes with α‐CD underwent rapid photoisomerization. The lower critical solution temperature (LCST) of the copolymers and their inclusion complexes with α‐CD were investigated by cloud point measurement, which showed that the LCST of three kinds of copolymers increased largely after adding α‐CD. After UV irradiation on the solutions of copolymers and their inclusion complexes, the LCST of the copolymers increased slightly with the absence of α‐CD, while decreased largely with the presence of α‐CD. Furthermore, the LCST reverted to its originality after visible light irradiation. This change of LCST could be reversibly controlled by UV and visible light irradiation alternately. In particular, in the copolymer of PAPA and DMAM, the reversible water solubility of the inclusion complexes could be triggered by alternating UV and visible light irradiation. 相似文献
The thermal behavior of a poly(styrene-b-N-isopropyl acrylamide) diblock copolymer was studied in aqueous solution as well as in thick and in thin films. The polymer was synthesized using reversible addition–fragmentation chain transfer. The critical micelle concentration in aqueous solution was determined using fluorescence correlation spectroscopy. The lower critical solution temperature (LCST) of micellar solutions was detected using microcalorimetry and turbidimetry at 31 °C. Using dynamic light scattering, the collapse of the micelles at the LCST as well as their clustering above was observed. These findings were corroborated with small-angle X-ray scattering. In thick films immersed in water, similar findings were made. In a thin film, however, the LCST is depressed and is found at 26–27 °C. 相似文献
Summary: Photobleachable deep UV resists were designed by introducing diazoketo groups in polymer side chains. The diazoketo groups undergo the Wolff rearrangement upon irradiation in the deep UV, affording ketenes that react with water to provide base‐soluble photoproducts. The polymers were synthesized by radical copolymerization of 2‐(2‐diazo‐3‐oxo‐butyryloxy)‐ethyl methacrylate, 2‐hydroxyethyl methacrylate, and γ‐butyrolacton‐2‐yl methacrylate. The single component resist showed 0.7 µm line and space patterns using a mercury‐xenon lamp in a contact printing mode.
Scanning electron micrograph of 0.7 µm line and space patterns printed with polymer B at a dose of 70 mJ · cm−2. 相似文献
Finely patterned transparent, conductive SnO2 thin films have been prepared. UV-light from a high-pressure mercury lamp was irradiated through a mask on the precursor films prepared from SnCl2 with acetyl acetone in the ambient atmosphere, and this irradiation led to the change of solubility of the films in alkaline solution. Patterns with a width of about 3 to 50 m and thickness of about 0.1 m were formed with a pitch of about 2 to 20 m. The resistivity of the films heat-treated at 500°C after UV irradiation was about 1 × 10–2 cm, which was almost the same resisitivity for the films heat-treated at 500°C without UV irradiation. 相似文献