硅功率管芯片背面金属化结构研究

本文分析了硅功率管管芯背面金属处理的结构设计原则,介绍了用多层金焊薄膜(Au/Ni/Cr)作为新的金属化处理方案及实际使用效果,以有助于国产管芯背面处理方案的改进     

多层印制板金属化槽孔孔壁剥离探析及改善

孔壁剥离是影响印制板可靠性的系统问题之一。作为一类特殊的金属化孔-金属化槽孔,相对于普通金属化圆孔来讲,其孔壁剥离问题显得更为突出和棘手。文章在金属化圆孔孔壁剥离的原因分析基础上,从残余应力及孔壁结合力两方面出发,进一步对金属化槽孔的孔壁剥离问题进行探析,介绍了残余应力去除方法和分析了金属化槽孔的机械加工方式、凹蚀参数对孔壁结合力的影响,为改善金属化槽孔孔壁剥离提供了建议。     

均匀沉淀法制备陶瓷金属化层的微观结构研究

利用均匀沉淀法制备了混合均匀并且钼粉粒度达到纳米级的陶瓷金属化粉末,使用该粉末进行了陶瓷金属化层制备,获得了比较理想的陶瓷金属化层显微结构。同时研究了Mo的含量及烧结温度对陶瓷金属化层显微结构的影响,并将该工艺生产的制品与国内现有制品的微观结构进行了对比。     

回流加固结构金属化系统的可靠性测试

结合器件具体结构和工艺,在回流效应理论和实验研究的基础上优化设计了回流加固结构。产一套和地回流加固结构样管进行了电热加速应力试验,考核了不同结构的加固效果及抗热电迁徒性能,优选了最佳回流结构。     

微波功率器件金属化布线回流加固结构

在回流动力学理论和实验研究的基础上,将回流加固结构应用于实际微波功率器件.结合器件具体结构和制备工艺,对金属化布线电流分布和最佳回流长度进行了模拟计算和分析,结合实际工艺优化设计了回流加固结构,制备了六种结构样管,电热应力试验结果表明:采用一个缝隙、缝隙宽度为3μm的结构回流加固效果最好,抗热电徙动能力最强.利用回流效应可有效降低微波管中的纵向(Al-Si界面)电迁徙失效,提高器件可靠性     

AIN陶瓷厚膜金属化研究进展

简要论述了AIN陶瓷由于自身结构特点而导致的其厚膜金属化的困难、提出了解决的主要方法。阐述了AIN陶瓷厚膜金属化的三种主要结合剂（玻璃结合系；反应结合系；混合结合系）的结合机理，综述了三种主要结合剂以及AIN陶瓷厚膜金属化用金属体系的研究现状及最新进展。     

微波功率器件金属化布线回流加固结构

在回流动力学理论和实验研究的基础上,将回流加固结构应用于实际微波功率器件.结合器件具体结构和制备工艺,对金属化布线电流分布和最佳回流长度进行了模拟计算和分析,结合实际工艺优化设计了回流加固结构,制备了六种结构样管,电热应力试验结果表明:采用一个缝隙、缝隙宽度为3μm的结构回流加固效果最好,抗热电徙动能力最强.利用回流效应可有效降低微波管中的纵向(Al-Si界面)电迁徙失效,提高器件可靠性.     

提高金属化电容器喷金质量探讨

金属化电容器端面喷金质量对电容器主要电性能指标——tg,起着决定性的影响。分析了影响金属化电容器端面喷金质量的因素,介绍了提高金属化电容器端面喷金质量的方法及如何检查金属化电容器端面喷金质量。     

The microstructure of eutectic Au-Sn solder bumps on Cu/electroless Ni/Au

In this work we studied the initial microstructure and microstructural evolution of eutectic Au-Sn solder bumps on Cu/electroless Ni/Au. The solder bumps were 150–160 m in diameter and 45–50 m tall, reflowed on Cu/electroless Ni/Au, and then aged at 200°C for up to 365 days. In addition, Au-Ni-Sn-alloys were made and analyzed to help identify the phases that appear at the interface during aging. The detailed interfacial microstructure was observed using a transmission electron microscope (TEM). The results show that the introduction of Au from the substrate produces large islands of-phase in the bulk microstructure during reflow. Two Au-Ni-Sn compounds are formed at the solder/substrate interface and grow slowly during aging. The maximum solubility of Ni in the—phase was measured to be about 1 at.% at 200°C, while Ni in the-phase is more than 20 at.%. The electroless Ni layer is made of several sublayers with slightly different compositions and microstructures. There is, in addition, an amorphous interaction layer at the solder/electroless Ni interface.     

The interfacial reaction between Sn-Zn-Ag-Ga-Al solders and metallized Cu substrates

The interfacial interaction between the Sn-8.55Zn-0.5Ag-0.5Ga-0.1Al solder and three kinds of metallized substrates (Cu, Cu/Au, and Cu/Ni-P/Au) does not form the Cu-Sn intermetallic compound (IMC). Continuous Cu-Zn and discontinuous Ag-Zn interfacial IMC layers formed between the Cu and Sn-Zn-Ag-Ga-Al solder, while Cu-Zn and Au-Al-Zn IMCs formed on the Cu/Au substrate. Only the Au-Al-Zn IMC formed at the interface when the electroless Ni-P deposit was the diffusion barrier between Cu and the Au surface layer.     

Interfacial reactions between a Pb-Free solder and die backside metallizations

The interfacial reactions between Sn-3.0 Ag-0.7 Cu solder and backside metallizations on two semiconductor devices, field-effect transistors (FET) and diode, are studied. The metallizations on both devices were vacuum evaporated Ti/Ni/Ag. The intermetallic compounds (IMC) formed near the diode/solder and FET/solder joints during reflow, and the interdiffusion processes during solid state aging are characterized by the quantitative energy dispersive x-ray analysis and the x-ray mapping technique in a scanning electron microscope. Two different intermetallic compounds are found near the diode/solder interface. Both are in the form of particles, not a continuous layer, and are referred to as IMC-I and IMC-II. IMC-I corresponds to Ni₃Sn₄, with Cu atoms residing on the Ni sublattice. It is uncertain whether IMC-II is Cu₆Sn₅ or a Cu-Ni-Sn ternary phase. Near the as-reflowed FET/solder interface, both isolated scallops and a skeleton-like layer of Ni₃Sn₄ are observed. The primary microstructural dynamics during solid-state aging are the coarsening of IMCs and the reactions involving the Ni-and Ti-layer with Sn and Au. While the reaction with the Ni-layer yields only Ni₃Sn₄ intermetallic, the reaction involving the Ti-layer suggests the formation of Ti-Sn and Au-Sn-Ti intermetallics. The latter is due to the diffusion of Au from the substrate side to the die side. It is postulated that the kinetics of the Au-Sn-Ti layer is primarily governed by the diffusion of Au through the Ni₃Sn₄ layer by a grain boundary mechanism.     

采用Ti/TiW/Au栅制作Si衬底上CaAs MESFET与集成电路

本文从制备硅集成电路(SiIc)与砷化镓集成电路(GaAs IC)单片兼容电路的要求出发,提出了Ti/TiW/Au肖特基金属化结构,制备出了性能良好的Ti/TiW/Au栅Si衬底上分子束外延(MBE)的GaAsMESFET与GaAs IC。     

Study on the failure temperature of Ti/Pt/Au and Pt5Si2-Ti/Pt/Au metallization systems

The Ti/Pt/Au metallization system has an advantage of resisting KOH or TMAH solution etching. To form a good ohmic contact, the Ti/Pt/Au metallization system must be alloyed at 400℃. However, the process temperatures of typical MEMS packaging technologies, such as anodic bonding, glass solder bonding and eutectic bonding, generally exceed 400℃. It is puzzling if the Ti/Pt/Au system is destroyed during the subsequent packaging process. In the present work, the resistance of doped polysilicon resistors contacted by the Ti/Pt/Au metallization system that have undergone different temperatures and time are measured. The experimental results show that the ohmic contacts will be destroyed if heated to 500℃. But if a 20 nm Pt film is sputtered on heavily doped polysilicon and alloyed at 700℃ before sputtering Ti/Pt/Au films, the Pt₅Si₂-Ti/Pt/Au metallization system has a higher service temperature of 500℃, which exceeds process temperatures of most typical MEMS packaging technologies.     

用于半导体激光器热沉的金刚石膜/Ti/Ni/Au金属化体系的研究

提出了一种用于半导体激光器热沉的金刚石膜/ Ti/ Ni/ Au金属化体系.采用金属化前期预处理、电子束蒸镀技术和后续低温真空热处理,金属层和金刚石膜之间获得了良好的结合强度.AES分析表明Ti/ Ni/ Au金刚石膜金属化体系中,Ni层起到了良好的阻挡效果;XRD显示预处理过的金刚石膜,镀膜后经过6 73K,2 h低温真空热处理,Ti/金刚石膜界面形成Ti O和Ti C;RBS分析进一步证实该金属化体系在6 73K,1h真空加热条件下具有良好的热稳定性.采用完全相同的半导体激光器结构,金刚石膜热沉的热阻仅为氮化铝热沉的4 0 % .     

半导体晶圆化学镍/金UBM工艺与设备

介绍了半导体晶圆化学镍金UBM的工艺流程及其自动控制生产线,包括设备材料的要求及设备内部结构。在200mm的半导体晶圆上成功制作5μm化学镍/金UBM和18μm化学镍金凸点。在光学显微镜、表面轮廓仪和SEM下检测了化学镍/金镀层的表面形貌。通过EDX分析化学镍/金UBM中的镍磷含量。3D自动光学检测了200mm晶圆上化学镍/金凸点的高度和共面性,讨论了镍/金凸点的剪切强度和失效模式,分析了生产中化学镍/金UBM的两种常见缺陷及成因。     

The optimization of the double mask system to minimize the contact resistance of a Ti/Pt/Au contact

The fabrication of Ti/Pt/Au ohmic contacts on diamond using two transmission line model masks during the photolithography step was modified as a result of the adverse effects on the resistance from the rectifying lip created by the overlap of the two masks, and the possible inhibition of carbide formation due to the presence of oxygen on the diamond surface before metallization. The first modification consisted of decreasing the rectifying lip by diffusing a small amount of Ti from beneath the contact defined by the first mask, and decreasing the overlap of the two masks from 5 to 2 μm, which is close to the minimum allowable by our photolithography techniques. The second modification consisted of the desorption of oxygen from the diamond surface using a heat treatment in vacuum and cool down in purified hydrogen. As a result of these changes, the contact resistance was decreased by more than two orders of magnitude from 8.1 × 10^-2 Ω-cm² to 1.2 × 10^-4 Ω-cm².     

The Shear Strength and Fracture Behavior of Sn-Ag-<Emphasis Type="Italic">x</Emphasis>Sb Solder Joints with Au/Ni-P/Cu UBM

This study investigates the effects of Sb addition on the shear strength and fracture behavior of Sn-Ag-based solders with Au/Ni-P/Cu underbump metallization (UBM) substrates. Sn-3Ag-xSb ternary alloy solder joints were prepared by adding 0 wt.% to 10 wt.% Sb to a Sn-3.5Ag alloy and joining them with Au/Ni-P/Cu UBM substrates. The solder joints were isothermally stored at 150°C for up to 625 h to study their microstructure and interfacial reaction with the UBM. Single-lap shear tests were conducted to evaluate the mechanical properties, thermal resistance, and failure behavior. The results show that UBM effectively suppressed intermetallic compound (IMC) formation and growth during isothermal storage. The Sb addition helped to refine the Ag₃Sn compounds, further improving the shear strength and thermal resistance of the solders. The fracture behavior evolved from solder mode toward the mixed mode and finally to the IMC mode with increasing added Sb and isothermal storage time. However, SnSb compounds were found in the solder with 10 wt.% Sb; they may cause mechanical degradation of the solder after long-term isothermal storage.     

Inhibiting the formation of (Au1−xNix)Sn4 and reducing the consumption of Ni metallization in solder joints

The effects of adding a small amount of Cu into eutectic PbSn solder on the interfacial reaction between the solder and the Au/Ni/Cu metallization were studied. Solder balls of two different compositions, 37Pb-63Sn (wt.%) and 36.8Pb-62.7Sn-0.5Cu, were used. The Au layer (1 ± 0.2 μm) and Ni layer (7 ± 1 μm) in the Au/Ni/Cu metallization were deposited by electroplating. After reflow, the solder joints were aged at 160°C for times ranging from 0 h to 2,000 h. For solder joints without Cu added (37Pb-63Sn), a thick layer of (Au_1−xNi_x)Sn₄ was deposited over the Ni₃Sn₄ layer after the aging. This thick layer of (Au_1−xNi_x)Sn₄ can severely weaken the solder joints. However, the addition of 0.5wt.%Cu (36.8Pb-62.7Sn-0.5Cu) completely inhibited the deposition of the (Au_1−xNi_x)Sn₄ layer. Only a layer of (Cu_1-p-qAu_pNi_q)₆Sn₅ formed at the interface of the Cu-doped solder joints. Moreover, it was discovered that the formation of (Cu_1-p-qAu_pNi_q)₆Sn₅ significantly reduced the consumption rate of the Ni layer. This reduction in Ni consumption suggests that a thinner Ni layer can be used in Cu-doped solder joints. Rationalizations for these effects are presented in this paper.