辉光放电质谱法测定高纯铟中痕量元素

采用辉光放电质谱法(GDMS)对高纯铟中铁、铜、铅、锌、铊、镉、锡等14种元素进行了测定,对仪器工作参数进行了优化,对预溅射过程时间的确定和质谱干扰的排除进行了讨论,结果表明,GDMS是目前具有足够灵敏度对高纯导电材料进行直接分析的有效手段。     

Direct analysis of glass powder samples by radio frequency glow discharge atomic emission spectrometry (rf-GD-AES)

A method is described for the elemental analysis of glass powder samples by rf-GD-AES. Glass powder samples were pressed without binder to form sample disks. A brass sample holder was designed to hold the pellet onto the source and provide a good vacuum seal. Sample preparation conditions and particle sizes are shown to influence spectral characteristics and plasma stabilization times. The discharge operating parameters were optimized based on both raw analyte signal intensity (S) and signal-to-background ratio (S/B), the latter was found more useful in terms of sample-to-sample precision and quantification. A NIST Standard Reference Material (SRM 89 Lead-Barium Glass) was used to evaluate the method. The limits of detection for trace components ranged from 1–10 g/g for several elements, depending on the concentrations of the analytes in the SRM. Sample-to-sample reproducibilities were better than 10% RSD and linear calibration curves were obtained using either the Si (I) optical emission as an internal standard or the individual analyte's S/B characteristics.     

辉光放电质谱法测定钨钛合金中的微量杂质元素EI北大核心CSCD

采用辉光放电质谱法直接测定钨钛合金中的杂质元素。对放电电流、气体流量和预溅射时间等条件进行优化,用仪器内置的标准相对灵敏度因子(RSFstd)进行半定量分析。同时用已定值的钨钛合金作为标样校正仪器,获得校正后的相对灵敏度因子(RSFWTi),再应用于定量分析。结果表明,未校正测量值与参考值比值在0.5~1.6之间,相对标准偏差(RSDs)小于5%,满足半定量分析要求。经RSFWTi校正的测量值与电感耦合等离子体质谱法(ICP-MS)测得的结果比较,相对偏差(RD)小于20%,该方法适用于合金中杂质元素定量分析。     

Lithium-fusion sample preparation method for radio frequency glow discharge optical emission spectroscopy (rf-GD-OES): analysis of coal ash specimens

The use of lithium-fusion sample preparation methods for the analysis of powder-form specimens by radio frequency glow discharge optical emission spectroscopy (rf-GD-OES) has been evaluated for the test case of coal ash samples. The development of an elemental analysis technique for chemically complex coal ashes presents a challenge in terms of having simple sample preparation, providing accurate results, and minimizing analysis time. The adopted sample preparation procedure for the coal specimens involved a standard lithium fusion methodology. This procedure circumvents many problems associated with the common compaction methods employed for GD analysis of inorganic powders. It was found that coal ashes prepared as glass disks using a mixture of lithium compounds as the host matrix and analyzed by rf-GD-OES provide good plasma stabilization, with analyte optical emission signals stabilizing in ∼1 min and exhibiting ∼2% RSD variations for sputtering times of up to 10 min thereafter. The evaluation of discharge operating parameters and the assessment of approaches to quantitative analysis were also investigated. Discharge parameters of an rf power of 30 W and an Ar discharge gas pressure of 4 Torr yielded rapid signal stabilization and optimized S/B ratios. Sample-to-sample precision of better than 7% RSD was achieved for repetitive samplings (in the same sample locations) for species present at the parts-per-million level in the sample. Limits of quantification could not be adequately evaluated as the levels of the target analytes in the fusion components (i.e. lithium compounds) were above the method detection limit. It is believed that the general methodology holds promise for rf-GD analysis of a range of inorganic solids in powder form.     

Electrical and optical characteristics of a radio frequency glow discharge atomic emission source with dielectric sample atomization

A parametric study has been conducted on a radio frequency powered glow discharge atomic emission spectrometry (rf-GD-AES) source to evaluate its performance in the direct analysis of non-conducting solid materials. These experiments include both the emission and electrical characterization of this system with respect to discharge power, pressure, limiting anode orifice diameter, and sample size. The rf-GD-AES source has been demonstrated to operate interchangeably between conducting and non-conducting sample materials; however, the energy dissipated within the plasma appears to be reduced with the dielectric samples, resulting in lower emission intensities and sputtering rates. The power losses have also been found to be a function of the size, or thickness, of the sample materials. Despite these limitations of the system, preliminary emission data demonstrate that the rf-GD-AES system can be successfully employed in the direct, trace analysis of non-conducting sample materials.     

高纯钛的辉光放电质谱法多元素分析

采用辉光放电质谱法(GD-MS)测定高纯钛中Mg、Al、Cr、Fe、V、Mn、Co、Ni、Cu、Zn、As、Sn、Sb、Ta、W、Pb、Bi等痕量杂质元素,并对GD-MS工作参数及条件进行了优化。主要元素与内标校正ICP-MS法定量分析的结果一致,对结果差异的原因进行分析,论述了Element GD辉光放电质谱仪在痕量杂质元素分析方面的优势。     

ICP-MS法测定高纯钛中痕量元素

建立了ICP-MS直接测定高纯钛中Be,V,Co,Ni,Ga,Mo,Nb,Cd,Sb,TI,Pb的分析方法,并对ICP-MS工作参数及条件进行了优化和选择.高纯钛用HF与HNO3溶解后加入Sc、Cs、Re内标,用ICP-MS直接检测.方法的检出限为0.03～0.1 ng/mL,测定下限为0.2～0.5 ng/mL,各元...     

GD-MS法和ICP-MS法测定高纯铌中痕量元素

采用辉光放电质谱法(GD-MS)对高纯铌中Ta,Mo,W等痕量杂质元素进行了测试,并对GD-MS工作参数进行了优化,部分元素与采用电感耦合等离子体质谱法(ICP-MS)定量分析的结果进行比较,对某些元素含量差别较大的原因进行了分析,论述了Element GD辉光放电质谱仪的特点及其在痕量杂质分析上的优势。     

电感耦合等离子体质谱法测定高纯金中铝、砷、铋、铬、铁、铅、锑、硒、碲、铱痕量元素

建立了微波消解-内标法-标准加入-ICP-MS法测定高纯黄金中铝、砷、铋、铬、铁、铅、锑、硒、碲、铱等痕量元素的分析方法.从试样溶解方式、内标元素及同位素的选择、仪器检测模式的优化及降低基体抑制效应等方面进行优化.实验加标回收率为99.5％ ～110％,相对标准偏差(RSD)为0.050％ ～6.5％.实验的准确度和精...     

Rotational temperature of nitrogen glow discharge obtained by optical emission spectroscopy

Measurements of rotational temperature as low as several hundred Kelvin have been measured using optical emission spectroscopy (OES) in nitrogen direct current (DC) glow discharge. The strongest band of the first negative system of nitrogen was chosen to deduce the rotational temperature at four different positions in nitrogen DC glow discharge, the back of cathode; cathode sheath; positive column; and anode glow. In positive column the rotational temperature increased apparently with the increasing discharge voltage from 500 to 1000 V when the pressure was 10 Pa. But with pressure of 20 Pa the rotational temperature in positive column increased slightly with the increase of discharge voltage. On the contrary, the rotational temperature in cathode sheath took reverse tendencies when the discharge voltage varies from 500 to 1000 V. As regard the anode glow, the rotational temperature at 10 Pa decreased with the increase of discharge voltage, but that at pressure of 20 Pa increased. We attribute the different tendencies of the rotational temperature to the different discharge statues at different pressures. When the discharge voltage varies from 500 to 1100 V, the discharge with pressure of 10 Pa is normal glow and that with 20 Pa is abnormal glow.     

Determination of trace elements in plant materials by inductively coupled plasma optical emission spectrometry

The use of inductively coupled plasmas as spectrometric emission sources for the determination of Fe, Mn, Cu, Al, B and Zn in orchard leaves is investigated. The plasma is shown to be sufficiently sensitive for the direct determination of all of the above elements in solutions of the plant materials after a dry ashing procedure. Comparative values for the trace element concentrations by other analytical methods are given.     

Determination of trace elements and correction of mass spectral interferences in superalloy analyzed by glow discharge mass spectrometry

Mass spectral interference was investigated systematically during the determination of trace elements in superalloy by glow discharge mass spectrometry (GD-MS); moreover the main mass spectral interference and interference level of isotopes were provided in detail. According to the mass spectral interference of elements, different methods were selected for interference correction. The effects of mass spectral interference were removed efficiently by using correction methods such as selecting isotopes without interference, matching sample matrices and deducing interference with multivariable linear regression. The determination results of three superalloy samples show that trace elements such as B, Mg, Ga, As, Ag, In, Sn, Sb, Te, Tl, Pb and Bi were determined successfully after interference correction.     

Determination of trace elements in high purity copper by INAA, GFAAS and ICP/AES

Trace impurity elements in high purity copper metal (4 mine class) put on the market were analyzed by Instrumental Neutron Activation Analysis (INAA) and the results compared with those from Graphite Furnace Atomic Absorption Spectrophotometry (GFAAS) and Inductively Coupled Plasma Atomic Emission Spectrophotometry (ICP-AES). The sample irradiation was done at the irradiation facilities (thermal neutron flux, 5·10¹² n·cm⁻²·s⁻¹) of the TRIGA Mark-III research reactor in the Korea Atomic Energy Research Institute. Four unalloyed copper standards (NIST SRM # 393, 394, 395 and 398) were used to identify the accuracy and precision of the analytical procedure. The homogeneity of samples was assessed by means of the elements such as Ag, As, Co, Sb, Se and Zn. The analytical results of INAA, GFAAS and ICP-AES were in good agreement within expected uncertainties each other and showed the possibility of using them for the analytical quality control.     

Wavelength table of chromium emission lines in argon glow discharge optical emission spectrometry

A wavelength table of chromium lines emitted from an argon glow discharge plasma, which comprises 2049 atomic and ionic emission lines in the wavelength range of 200–440 nm, is presented. The relative intensities are rather different from the data of published wavelength tables based on arc-excited and spark-excited spectra. Emission lines of Ar, Ti, V, Fe, Ni, and Cu in the neighborhood of the prominent Cr emission lines are also compiled as a table. These tables could be employed for the analytical applications in glow discharge optical emission spectrometry. All of the data are presented as Supplementary Electronic Material.     

Radio frequency glow discharge optical emission spectroscopy: a new weapon in the depth profiling arsenal

While the array of analytical methods routinely applied for depth profile analysis was fairly static over the decades of the 1980s and 1990s, there appears to be an emerging technique that has a number of very positive and complementary attributes, and warrants serious consideration by the thin film community. Radio frequency glow discharge optical emission spectroscopy (rf-GD-OES) is a technique that provides depth-resolved elemental composition information on a wide variety of sample types. In a manner very much like most depth profiling methods, the rf-GD plasma utilizes an ion sputtering step to ablate sample material in a layer-by-layer fashion. Different from the more commonly applied methods, the device operates at elevated pressures [2-10 Torr Ar (266-1,330 Pa)] and has the inherent capability of sputtering electrically insulating materials directly, without any auxiliary means of charge compensation. In addition, sputtering rates on the order of 1 micro m/min provide rapid analysis, with depth resolving powers that are comparable to high-vacuum sputtering methods. Three examples of the use of the rf-GD-OES method are presented as examples of its analytical potential: (1) boron-implanted silicon wafer, (2) a barrier-type alumina film, and (3) a porous-type alumina film. It is believed that the method holds a great deal of promise as part of the arsenal of weapons in the thin films laboratory.     

Wavelength table of chromium emission lines in argon glow discharge optical emission spectrometry

A wavelength table of chromium lines emitted from an argon glow discharge plasma, which comprises 2049 atomic and ionic emission lines in the wavelength range of 200–440 nm, is presented. The relative intensities are rather different from the data of published wavelength tables based on arc-excited and spark-excited spectra. Emission lines of Ar, Ti, V, Fe, Ni, and Cu in the neighborhood of the prominent Cr emission lines are also compiled as a table. These tables could be employed for the analytical applications in glow discharge optical emission spectrometry. All of the data are presented as Supplementary Electronic Material. Recieved: 22 December 1999 / Revised: 25 February 2000 / Accepted: 25 February 2000     

辉光放电质谱法测定核级石墨粉中痕量杂质

建立了直流辉光放电质谱法(DC-GDMS)测定核级石墨粉中痕量杂质元素的方法。用一定的压力将石墨粉镶嵌在高纯铟片上,形成一个直径约为5 mm的圆形石墨薄层,用铟片辅助石墨粉放电,实现了粉状样品直接检测。优化的实验条件为放电电流0.8 mA,放电电压1.2 kV,放电气体流速0.437 mL/min。用石墨粉标准样品(19J T61029)单点校准了仪器相对灵敏度因子,消除基体效应,实现15个关键杂质元素定量分析。方法检出限为5.0 ng/g,在单侧0.05显著性水平下,利用Student’s t检验,方法测定结果 t值均小于临界值,与标准值无显著性差异。相对标准偏差(RSD)均小于10%。本方法与电感耦合等离子体光谱法测定结果比较,相对误差在2.4%～17.4%之间。     

Determination of trace metals in high purity gold

The possibility of using ETAAS or ICP-AES for the determination of trace amounts of Ag, Bi, Cd, Co, Cr, Cu, Fe, Mn, Ni, Pb, Pd, Pt and Sb in pure gold is investigated. The influence of the matrix element on the atomization of the trace analytes is studied and optimal instrumental parameters are defined. An analytical method based on matrix element reductive separation followed by spectrometric determination of trace analytes is proposed as an alternative for the analysis of high purity gold. Advantages and disadvantages of proposed analytical procedures from the viewpoint of achieved repeatability, reproducibility and detection limits and of the duration of analysis are discussed. Received: 16 August 1999 / Revised: 23 November 1999 / Accepted: 27 November 1999     

Determination of trace metals in high purity gold

The possibility of using ETAAS or ICP-AES for the determination of trace amounts of Ag, Bi, Cd, Co, Cr, Cu, Fe, Mn, Ni, Pb, Pd, Pt and Sb in pure gold is investigated. The influence of the matrix element on the atomization of the trace analytes is studied and optimal instrumental parameters are defined. An analytical method based on matrix element reductive separation followed by spectrometric determination of trace analytes is proposed as an alternative for the analysis of high purity gold. Advantages and disadvantages of proposed analytical procedures from the viewpoint of achieved repeatability, reproducibility and detection limits and of the duration of analysis are discussed.     

辉光放电质谱法测定高纯材料中痕量硫杂质

准确测定并控制材料中杂质元素含量是发挥高纯材料性能不可或缺的环节。辉光放电质谱法(GDMS)是准确、快速、高灵敏分析高纯材料中痕量及超痕量硫的理想方法。对GDMS分析高纯铜和镍基高温合金中痕量硫的质谱干扰进行了讨论,优化了放电电流和放电电压,采用多种标准物质对硫的相对灵敏度因子(RSF)进行了校准和验证,并与二次离子质谱法(SIMS)进行分析结果比对,验证了GDMS定量分析结果的准确性和可靠性。