Silicide formation in bilayer ultrathin iron and cobalt films on silicon

The processes that occur in ultrathin (up to 1 nm) Fe and Co layers during deposition onto the Si(100)2 × 1 surface in various sequences and during annealing of the formed structures to a temperature of 400°C are studied. The elemental and chemical compositions of the films are analyzed by in situ high-resolution X-ray photoelectron spectroscopy using synchrotron radiation, and their magnetic properties are determined using the magnetic linear dichroism effect in the angular distribution of Fe 3p and Co 3p electrons. It is shown that, when iron is first deposited, the formed structure consists of the layers of FeSi, Fe₃Si, Co-Si solid solution, and metallic cobalt with segregated silicon. The structure formed in the alternative case consists of the layers of CoSi, Co-Si solid solution, Co, Fe-Si solid solution, and Fe partly covered by silicon. All layers (apart from FeSi, CoSi) form general magnetic systems characterized by ferromagnetic ordering. Annealing of the structures at temperatures above 130dgC (for the Co/Fe/Si system) and ～200°C (for Fe/Co/Si) leads to the formation of nonmagnetic binary and ternary silicides (Fe _x Co_{1 ? x} Si, Fe _x Co_{2 ? x} Si).     

Growth of magnetic materials and structures on Si(0 0 1) substrates using Co2Si as a template layer

We report in this paper the use of Co₂Si silicide as a template layer for the integration of magnetic materials and structures on silicon substrate. By undertaking Co deposition on silicon at a temperature of about 300 °C, we show that it is possible to obtain a smooth and epitaxial Co₂Si layer, which can act as a template layer preventing the reaction between Co and other transition metals with silicon. Two examples of over-growth of magnetic materials and structures on this template layer will be presented: growth of ferromagnetic Co layers and of magnetic tunnel junctions (Co(Fe)/AlO_x/NiFe).     

Photoelectron Si 2<Emphasis Type="Italic">p</Emphasis> spectra of ultrathin CoSi<Subscript>2</Subscript> layers formed on Si(100)2×1

Solid-phase formation of ultrathin CoSi₂ layers on Si(100)2×1 was studied using high-resolution (～140 meV) photoelectron spectroscopy with synchrotron radiation (hν=130 eV). The evolution of Si 2p spectra was recorded both under deposition of cobalt on the surface of samples maintained at room temperature and in the course of their subsequent annealing. It was shown that Co adsorption on Si(100)2×1 is accompanied by a loss of reconstruction of the original silicon surface while not bringing about the formation of a stable CoSi₂-like phase. As the amount of deposited cobalt continues to increase (up to six monolayers), a discontinuous film of the Co-Si solid solution begins to grow on the silicon surface coated by chemisorbed cobalt. The solid-phase reaction of CoSi₂ formation starts at a temperature close to 250°C and ends after the samples have been annealed to ～350°C.     

Formation of the Co/Si(110) interface: Phase composition and magnetic properties

The formation of the Co/Si(110)16 × 2 interface and its magnetic properties are studied by high-energy-resolution photoelectron spectroscopy using synchrotron radiation and magnetic linear dichroism in the photoemission of core electrons. It is shown that a cobalt coating less than 7 Å thick deposited on the silicon surface at room temperature results in the formation of an ultrathin (1.7 Å) interfacial cobalt silicide layer and a layer of silicon-cobalt solid solution. The ferromagnetic ordering of the interface is observed at an evaporation dose corresponding to 6–7 Å in which case a cobalt metal film begins to grow on the solid solution layer. During 300°C-annealing of the sample covered by a nanometer-thick cobalt layer, the metal film gradually disappears and four silicide phases arise: metastable ferromagnetic silicide Co₃Si and three stable nonmagnetic silicides (Co₂Si, CoSi, and CoSi₂).     

Morphology and the magnetic and conducting properties of heterogeneous layered magnetic structures [(Co45Fe45Zr10)35(Al2O3)65/a-Si:H]36

The morphology and the magnetic and conducting properties of an amorphous multilayer nanosystem [(Co₄₅Fe₄₅Zr₁₀)₃₅(Al₂O₃)₆₅/a-Si:H]₃₆ consisting of (Co₄₅Fe₄₅Zr₁₀)₃₅(Al₂O₃)₆₅ magnetic layers and semiconducting hydrogenated amorphous silicon (a-Si:H) layers of various thicknesses have been studied. Using a combination of methods (including polarized neutron reflectometry and grazing incidence small-angle X-ray scattering), it is shown that the magnetic and electrical properties of these multilayer structures are determined by their morphology. It is established that the magnetization and electric resistance of a sample is a nonmonotonic function of the a-Si:H layer thickness. Both characteristics are at a minimum for a structure with a semiconductor layer thickness of 0.4 nm. Samples with silicon layer thicknesses below 0.4 nm represent a three-dimensional structure of Co₄₅Fe₄₅Zr₁₀ grains weakly ordered in space, while in samples with silicon layer thicknesses above 0.4 nm, these grains are packed in layers alternating in the vertical direction. The average lateral distance between nanoparticles in the layer plane has been determined, from which the dimensions of metal grains in each sample have been estimated.     

Intercalation synthesis of cobalt silicide under a graphene layer

The silicon intercalation under single-layer graphene formed on the surface of an epitaxial Co(0001) film was investigated. The experiments were performed under conditions of ultra-high vacuum. The thickness of silicon films was varied within the range of up to 1 nm, and the temperature of their annealing was 500°C. The characterization of the samples was carried out in situ by the methods of low-energy electron diffraction, high-energy-resolution photoelectron spectroscopy using synchrotron radiation, and magnetic linear dichroism in photoemission of Co 3p electrons. New data were obtained on the evolution of the atomic and electronic structure, as well as on the magnetic properties of the system with an increase in the amount of intercalated silicon. It was shown that the intercalation under a graphene layer is accompanied by the synthesis of surface silicide Co₂Si and a solid solution of silicon in cobalt.     

Reactive sputtering of (Co,Fe) nitride thin films on TiN-bufferd Si

Epitaxial (Co,Fe) nitride films were prepared on TiN buffered Si(001) substrates by dual-target reactive co-sputtering method. With lower Co content, thin films mainly consist of (Co _x Fe_1?x )₄N phase. With higher Co content, STEM EELS found no N signal in the thin film, and, combined with XRD results, shows that fcc Co is the main phase of the thin films instead of Co₄N. The N₂ atmosphere is helpful to induce the fcc Co phase formation during dual-target reactive co-sputtering deposition. For the films with less Co content, the RT magnetization measurements show similar magnetic properties as epitaxial Fe₄N(001) films, while increasing the Co content, the resulting fcc Co thin films show biaxial anisotropy with the [110] in-plane easy axis.     

Kinetics of oxidation of subsurface layers of 29Si-enriched silicon in a magnetic field

It has been found that, in a magnetic field of ～0.1 T, the kinetics of oxidation of the silicon surface has a different behavior. The rate of formation of SiO _x complexes containing ²⁹Si nuclei with spin 1/2 (72.76%) at the initial stage of oxidation is two times higher than the rate of reaction involving complexes containing ²⁸Si and ³⁰Si nuclei with zero spins.     

Formation and lithium doping of graphene on the surface of cobalt silicide

The intercalation of silicon under graphene on the Co(0001) surface, which is accompanied by the formation of a silicon solid solution in cobalt and by the formation of a surface crystalline Co₂Si phase, has been investigated using photoelectron spectroscopy. It has been shown that the formation of cobalt silicide leads to a substantial weakening of the hybridization of electronic states of graphene and cobalt and to the recovery of the Dirac spectrum of electronic states of graphene near the Fermi level. This has made it possible to investigate the electron doping of graphene on the cobalt silicide substrate upon deposition of lithium on its surface. It has been found that doping with lithium leads to a significant charge transfer onto graphene, and the electron concentration reaches 3.1 × 10¹⁴ cm^?2. Moreover, the specific form of the Fermi surface creates favorable conditions for the enhancement of the electron-phonon coupling. As a result, the formed system can be considered as a candidate for the creation of superconductivity in single-layer graphene.     

Effect of Nb addition on the structure and soft magnetic properties of melt-spun Co69Fe7Si14B10 alloy

Melt-spun ribbons of Co₆₉Fe₇Si_14−xNb_xB₁₀ alloys with x=0, 2 and 4 have been prepared and characterized for structure and soft magnetic properties. Ribbons with x=0 and x=2 are found to be completely amorphous whereas the ribbon with x=4 contains irregular shaped faulted Co₂Si orthorhombic phase with grain size of about 100 nm. Nb addition is found to decrease the degree of amorphicity and induce perpendicular anisotropy, deteriorating the soft magnetic and magnetoimpedance properties.     

In-plane magnetic anisotropy and coercive field dependence upon thickness of CoFeB

The structural and magnetic properties of as-grown 5–50 nm thin ion-beam sputter deposited transition metal–metalloid Co₂₀Fe₆₀B₂₀ (CFB) films are reported in this communication. A broad peak observed at 2θ∼45° in the glancing angle X-ray diffraction pattern revealed the formation of very fine nano-sized grains embedded in majority amorphous CFB matrix. Although no magnetic field is applied during deposition, the longitudinal magneto-optic Kerr effect measurements performed at 300 K in these as-grown films clearly established the presence of in-plane uniaxial magnetic anisotropy (K_u). It is argued that this observed anisotropy is strain-induced. This is supported by the observed dependence of direction of K_u on the angle between applied magnetic field and crystallographic orientation of the underlying Si(100) substrate, and increase in the coercivity with the increase of the film thickness.     

Compatibility of glass textures with E-beam evaporated polycrystalline silicon thin-film solar cells

For polycrystalline silicon thin films on glass, E-beam evaporation capable of high-rate deposition of amorphous silicon (a-Si) film precursor up to 1 μm/minute is a potentially low-cost solution to replace the main stream a-Si deposition method—plasma enhanced chemical vapour deposition (PECVD). Due to weak absorption of near infrared light and a target of 2 μm Si absorber thickness, glass substrate texturing as a general way of light trapping is vital to make E-beam evaporation commercially viable. As a result, the compatibility of e-beam evaporation with glass textures becomes essential. In this paper, glass textures with feature size ranging from ～200 nm to ～1.5 micron and root-mean-square roughness (Rms) ranging from ～10 nm to 200 nm are prepared and their compatibility with e-beam evaporation is investigated. This work indicates that e-beam evaporation is only compatible with small smooth submicron sized textures, which enhances J _sc by 21 % without degrading V _oc of the cells. Such textures improve absorption-based J _sc up to 45 % with only 90 nm SiN _x as the antireflection and barrier layer; however, the enhancement degrades to ～10 % with 100 nm SiO _x +90 nm SiN _x as the barrier layer. The absorption-based J _sc is abbreviated by J _sc(A), which is deduced by integrating the multiplication product of the measured absorption and the AM1.5G spectrum in the wavelength range 300–1050 nm assuming unity internal quantum efficiency at each wavelength. This investigation is also relevant to other thin-film solar cell technologies which require evaporating the absorber onto textured substrate/superstrate.     

用脉冲激光方法在Si(100)上沉积的Cox-C1-x颗粒膜及其磁电阻效 应

利用脉冲激光沉积方法在Si(100)上制备了Co_x-C_1-x颗粒膜，并研 究了其正磁电阻 效应.实验结果表明，样品在室温下的正磁电阻效应要远远高于低温下的正磁电阻效应；Co _0.02-C_0.98样品具有最大的室温正磁电阻效应，在外加磁场B=1T时 ，其磁电阻 率MR=22%；随着Co含量的增加，Co_x-C_1-x颗粒膜的正磁电阻效应呈 减小趋势.样品 的MR-B的曲线与传统的多 关键词： 正磁电阻效应 x-C_1-x颗粒膜')" href="#">Co_x-C_1-x颗粒膜 脉冲激光沉积     

Formation and investigation of cobalt silicide ultrathin layers in Ti/Co/Ti-, TiN/Ti/Co-, and TiN/Co-on-silicon structures

The formation of ultrathin CoSi₂ layers in Ti(8 nm)/Co(10 nm)/Ti(5 nm), TiN(18 nm)/Ti(2 nm)/Co(8 nm), and TiN(18 nm)/Co(8 nm) systems magnetron-sputtered on the Si(100) surface is studied. The systems are subjected to two-step rapid thermal annealing. In between the annealing steps, the “sacrificial” layer is chemically removed and the second and third systems are additionally covered by a 17-nm-thick amorphous silicon (α-Si) layer. In the course of the fabrication process, the structures are examined using time-of-flight secondary-ion (cation) mass spectrometry, Auger electron spectroscopy, and scanning electron microscopy combined with X-ray energy dispersion microanalysis. It is shown that the above complex of analytical investigation provides efficient physical control of ultrathin silicide layer formation.     

Positron beam studies of cobalt silicides

Silicide formation in Co/Si thin structures synthesized using thermal evaporation, sputter deposition and ion implantation, has been investigated using depth-resolved positron annihilation spectroscopy (PAS) together with other corroborative experimental techniques. S vs. E_p curves and S-W correlation plots have revealed important processes such as defect annealing, interdiffusion, silicide formation and recrystallization of amorphous Si. These studies have shown that there exist differences in the formation temperature of the silicide phases, the sequence of silicide phase formation and defect generation owing to the nature of the deposition methods employed.     

Electronic, magnetic and transport properties of Co2TiZ (Z=Si, Ge and Sn): A first-principle study

We have studied the electronic structure, magnetic and transport properties of some Co based full Heusler alloys, namely Co₂TiZ (Z=Si, Ge and Sn), in the frame work of first-principle calculations. The calculations show that Co₂TiZ (X=Si, Ge and Sn) are to be half-metallic compounds with a magnetic moment of 2 μ_B, well consistent with the Slater-Pauling rule. The electronic structure results reveal that Co₂TiZ has the high density of states at the Fermi energy in the majority-spin state and show 100% spin polarization. Our results also suggest that both the electronic and magnetic properties in these compounds are intrinsically related to the appearance of the minority-spin gap. The origin of energy gap in the minority-spin states is discussed in terms of the electron splitting of Z (Z=Si, Ge and Sn) and 3d Co atoms and also the d-d hybridization between the Co and Ti atoms. The transport properties of these materials are discussed on the basis of Seebeck coefficients, electrical conductivity coefficients and thermal conductivity coefficients.     

Processes of silicide formation in the Fe/Si(111)7 × 7 system

The initial stages of the formation of iron silicides in the Fe/Si(111)7 × 7 system in the course of solid-phase epitaxy are investigated using high-resolution photoelectron spectroscopy (～100 meV) with synchrotron radiation. The spectra of the Si 2p core and valence-band electrons obtained after deposition of iron coverages of up to 28 monolayers on the surface of the sample and subsequent isochronous annealings at 650°C are measured and analyzed. It is shown that the first to form under Fe deposition is an ultrathin film of the metastable silicide FeSi with a CsCl-type structure, on which a layer of the Fe-Si solid solution with segregated silicon grows. At coverages in excess of 10 monolayers, an iron film grows on the surface of the sample. Annealing of a silicon crystal coated with a Fe layer leads to the sequential formation of two stable silicide phases, namely, the ?-FeSi and β-FeSi₂ phases, in the near-surface region of the sample. It is found that the process of solid-phase synthesis of the ?-FeSi phase passes through the stage of transformation of the iron film into the Fe-Si solid solution.     

Pulse electrodeposition of Co1−xZnx nanowire arrays: Magnetic improvement through electrolyte concentration,off-time between pulses and annealing

Using different electrolyte compositions and varying the off-time between pulses, Co_1xZn_x nanowire arrays were fabricated by ac pulse electrodeposition. The effect of deposition parameters on alloy contents was investigated by studying the microstructures and magnetic properties of as-deposited and annealed Co_1xZn_x nanowires. It is shown that Zn content in CoZn nanowires exponentially increases by increasing the zinc ions in the electrolyte. The Zn content initially increases to a maximum by increase in off-time between pulses and then falls off. Adding a certain amount of Zn to Co led to form amorphous CoZn nanowires. A significant increase in magnetization, coercivity and squareness of CoZn nanowires was observed after annealing. The rate of increase in magnetization of annealed samples was seen to be inversely proportional to their initial magnetization. Improvement of magnetic properties of annealed samples may be caused by magnetic cluster formation and pinning effect.     

Luminescence and structure of nanosized inclusions formed in SiO2 layers under double implantation of silicon and carbon ions

Luminescent and structural characteristics of SiO₂ layers exposed to double implantation by Si⁺ and C⁺ ions in order to synthesize nanosized silicon carbide inclusions have been investigated by the photoluminescence, electron spin resonance, transmission electron microscopy, and electron spectroscopy methods. It is shown that the irradiation of SiO₂ layers containing preliminary synthesized silicon nanocrystals by carbon ions is accompanied by quenching the nanocrystal-related photoluminescence at 700–750 nm and by the enhancement of light emission from oxygen-deficient centers in oxide in the range of 350–700 nm. Subsequent annealing at 1000 or 1100°C results in the healing of defects and, correspondingly, in the weakening of the related photoluminescence peaks and also recovers in part the photoluminescence of silicon nanocrystals if the carbon dose is less than the silicon dose and results in the intensive white luminescence if the carbon and silicon doses are equal. This luminescence is characterized by three bands at ～400, ～500, and ～625 nm, which are related to the SiC, C, and Si phase inclusions, respectively. The presence of these phases has been confirmed by electron spectroscopy, the carbon precipitates have the sp ³ bond hybridization. The nanosized amorphous inclusions in the Si⁺ + C⁺ implanted and annealed SiO₂ layer have been revealed by high-resolution transmission electron microscopy.