Vapor-phase synthesis of mesoporous SiO2-P2O5 thin films

Mesoporous SiO2-P2O5 films were synthesized from the vapor phase onto a silicon substrate. First, a precursor solution of cetyltrimethylammonium bromide (C16TAB), H3PO4, ethanol, and water was deposited on a silicon substrate by a spin-coating method. Then, the C16TAB-H3PO4 composite film was treated with tetraethoxysilane (TEOS) vapor at 90-180 degrees C for 2.5 h. The H3PO4-C16TAB composite formed a hexagonal structure on the silicon substrate before vapor treatment. The TEOS molecules penetrated into the film without a phase transition. The periodic mesostructure of the SiO2-P2O5 films was retained after calcination. The calcined films showed a high proton conductivity of about 0.55 S/cm at room temperature. The molar ratio of P/Si in the SiO2-P2O5 film was as high as 0.43, a level that was not attained by a premixing sol-gel method. The high phosphate group content and the ordered periodic mesostructure contributed to the high proton conductivity.     

Incorporation of organic groups within the channel wall of spin-on mesostructured silica films by a vapor infiltration technique

Organically functionalized mesoporous silica films have been prepared by a novel synthetic procedure that involves spin-coating of mesostructured silica films and a vapor infiltration (VI) technique, using organosiloxanes, before the removal of surfactant. The VI-treated mesostructured films were characterized using X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), and a field emission scanning electron microscope (FE-SEM). Nitrogen adsorption/desorption measurements were performed using films attached with a silicon substrate. The XRD and FE-SEM measurements show that the mesochannel wall, densified and modified with organosilyl groups by the VI treatment, hardly contracts under calcination. FE-SEM observations for the films' cross section support the view that organosiloxane vapor is not deposited on the surface of the film. These results show that organosiloxane molecules penetrate the film and are selectively incorporated into the silica wall. Thus, hydrophobic mesoporous silica films can be synthesized without a reduction in pore size, a result that cannot be attained by conventional grafting and co-condensation methods. The excellent high porosity and hydrophobicity of the mesostructured composite films may be of advantage for next-generation low-k dielectric films.     

Functionalisation of the template-free and template-structured silica films synthesised on glass substrates by sol–gel technique

Possibility of the post-synthesis functionalisation of the template-free and template-structured silica films of ca. 200 nm thickness on glass slides was evaluated. The films were prepared by dip-coating from TEOS sol–gel precursor in the absence or presence of CTAB template. It has been found out that the template-structured silica films can be functionalised with Ag nanoparticles via [Ag(NH₃)₂]NO₃ ion-exchange or with adsorbed Methylene Blue (MB) cationic dye due to the presence of the well-organised mesopores after template removal. In contrast, only the external geometric surface of the template-free silica films appeared to be accessible for modifier molecules. Possibility of functionalisation of the multi-layered template-structured silica film depends on the sequence of dip-coating and calcination steps upon their preparation. When preparation includes reiteration of dip-coating and calcination steps, only the latest top silica film appears to be accessible to modifier molecules. When preparation includes successive dip-coating cycles accomplished by calcination of the final multi-layered film, all pores appear to be accessible since their formation occurs via simultaneous removal of the template molecules over the whole thickness of the multi-layered template-structured silica film.     

Effect of Annealing on the Electrical Properties of CuxS Thin Films

Copper sulphide CuS was deposited on three substrates; glass, Indium Tin Oxide (ITO) and Ti by using spray pyrolysis deposition (SPD). After depositing CuS thin films on the substrates at 200 °C, they were annealed at 50, 100, 150, and 200 °C for 1 hour. Structural measurements revealed covellite CuS and chalcocite Cu₂S phases for thin films before and after annealing at 200 °C with changes in intensities, and only covellite CuS phase for thin films after annealing at 50, 100, and 150 °C. Morphological characteristics show hexagonal-cubic crystals for the CuS thin film deposited on glass substrate and plates structures for films deposited on ITO and Ti substrates before annealing, these crystals became bigger in size and there were be oxidation and some agglomerations in some regions with formation of plates for CuS on glass substrate after annealing at 200 °C. For Hall Effect measurements, thin films sheet resistivity and mobility increased after annealing while the carrier concentration decreased. Generally, the thin film deposited on ITO substrate had the lowest resistivity and the highest carrier concentration before and after annealing. The thin film deposited on Ti substrate had the highest mobility before and after annealing, which makes it the best thin film for device performance. The objective of this research is to show the improvement of thin films electrical properties especially the mobility after annealing those thin films.     

Influence of substrate nature and growth conditions on the morphology of thin DMOAP films

We report some preliminary results on the morphology of thin N,N -dimethyl- n -octadecyl-3-aminopropyltrimethoxysilyl chloride (DMOAP) films. When deposited on a glass substrate, DMOAP forms a mono- or multi-layer structure parallel to the substrate. The surface topography of the film is probed by atomic force microscopy. In general, the free surface of such a film is not flat and smooth. Islands and holes are formed on the free surface of the films when a sufficiently flat substrate is used. The thin film surface topography depends strongly on the nature of the bare substrate, the curing conditions, and the immersion time of the substrate in the DMOAP solution. The film is always rougher than the bare substrate used. Annealing roughens the surface of the alkoxysilane thin films deposited on a glass substrate. For films on glass plates covered with an indium tin oxide layer, annealing has minor effects. The surface topography affects the microstructure of homeotropic smectic samples.     

Improved conversion efficiency in dye-sensitized solar cells based on electrospun Al-doped ZnO nanofiber electrodes prepared by seed layer treatment

The application of electrospun nanofibers in electronic devices is limited due to their poor adhesion to conductive substrates. To improve this, a seed layer (SD) is introduced on the FTO substrate before the deposition of the electrospun composite nanofibers. This facilitates the release of interfacial tensile stress during calcination and enhances the interfacial adhesion of the AZO nanofiber films with the FTO substrate. Dye-sensitized solar cells (DSSC) based on these AZO nanofiber photoelectrodes have been fabricated and investigated. An energy conversion efficiency (η) of 0.54-0.55% has been obtained under irradiation of AM 1.5 simulated sunlight (100 mW/cm²), indicating a massive improvement of η in the AZO nanofiber film DSSCs after SD-treatment of the FTO substrate as compared to those with no treatment. The SD-treatment has been demonstrated to be a simple and facile method to solve the problem of poor adhesion between electrospun nanofibers and the conductive substrate.     

Influence of substrate nature and growth conditions on the morphology of thin DMOAP films

We report some preliminary results on the morphology of thin N,N -dimethyl-n-octadecyl-3-aminopropyltrimethoxysilyl chloride (DMOAP) films. When deposited on a glass substrate, DMOAP forms a mono- or multi-layer structure parallel to the substrate. The surface topography of the film is probed by atomic force microscopy. In general, the free surface of such a film is not flat and smooth. Islands and holes are formed on the free surface of the films when a sufficiently flat substrate is used. The thin film surface topography depends strongly on the nature of the bare substrate, the curing conditions, and the immersion time of the substrate in the DMOAP solution. The film is always rougher than the bare substrate used. Annealing roughens the surface of the alkoxysilane thin films deposited on a glass substrate. For films on glass plates covered with an indium tin oxide layer, annealing has minor effects. The surface topography affects the microstructure of homeotropic smectic samples.     

Preparation and Characterization of Bismuth Doped TiO2 Thin Films

A series of Bismuth-doped titanium oxide (Bi-doped TiO₂) thin films on glass substrates have been prepared by sol-gel dip coating process. The prepared catalysts were characterized by XRD and XPS. The photocatlytic activity of the thin film catalysts was evaluated through the photodegradation of aqueous methyl orange under UV illumination. The experiments demonstrated that the Bi-doped TiO₂ prepared was anatase phase. The doped bismuth was in the 3⁺ oxidation state. The presence of Bi significantly enhanced the photocatalytic activity of TiO₂ films. At calcination temperature of 500°C, with doping concentration of 2 wt %, Bi-doped TiO₂ thin film showed the highest photocatalyic activity.     

可见光响应Bi2WO6薄膜的制备与光电化学性能

采用非晶态配合物-提拉法在ITO导电玻璃基底上制备得到Bi2WO6薄膜. 采用FE-SEM、XRD、Raman、DRS、光电流响应谱、IPCE等手段, 研究了Bi2WO6薄膜的形貌、结构、光电性能以及薄膜结构与光电性能的关系. 结果表明, 450 ℃以上煅烧可以得到Bi2WO6结晶薄膜, 薄膜由沿(131)晶面趋向生长的Bi2WO6纳米颗粒组成, 颗粒的粒度随煅烧温度的升高而增大, 同时颗粒之间的间距也相应增大. ITO/Bi2WO6薄膜电极在可见光(λ>400 nm)照射下可以产生光电流, 光电流强度与光强度线性相关; 光电流强度和光电转换量子效率受Bi2WO6薄膜结构的影响, 通过控制薄膜的煅烧温度等制备条件, 可以提高薄膜光电极的光电转换量子效率.     

铝基板的界面扩散对薄膜型TiO2光催化活性的影响

以钛酸四丁酯为前驱体, 采用溶胶-凝胶法在铝基板表面制备了纳米晶TiO2薄膜. 运用XRD、SEM和XPS对制得的薄膜进行表征, 并测试了薄膜光催化降解亚甲基蓝(MB)的活性. 结果表明, TiO2薄膜样品在450 ℃焙烧30 min后, 晶粒排列比较致密, 粒径为10-20 nm, 并与铝基板紧密结合; 薄膜与铝基板发生了明显的界面扩散, 薄膜中的Al元素来自铝基板的界面扩散, 且界面层很宽, 扩散层厚度约为75 nm; 界面扩散的发生直接导致了TiO2薄膜的光催化活性下降. 但随着薄膜厚度增加, 铝基板对TiO2薄膜降解亚甲基蓝催化活性的影响不断减小.     

不同基材上TiO2膜的表征和光催化活性评价

 采用溶胶-凝胶法在平行条件下制备了负载于钛、铝、不锈钢和玻璃等不同基材上的TiO2浸渍提拉膜,利用原子力显微镜、俄歇电子能谱、X射线衍射、漫反射紫外-可见光谱和苯甲酰胺光催化降解等手段对TiO2膜进行了表征和催化活性评价. 实验结果表明,基材的种类对TiO2膜的性能有较大影响,各膜样品虽均为锐钛矿晶型,但表面形貌显著不同. TiO2/Ti, TiO2/steel, TiO2/Al和TiO2/glass上TiO2的平均粒径分别是152, 205, 241和477 nm,且前两者的粒径分布较为集中. TiO2/Ti和TiO2/Al样品表面仅有Ti和O元素存在,而TiO2/steel和TiO2/glass表面则分别检测到有Fe和Na,Ca及Si等基材元素渗出. 各膜样品对苯甲酰胺光催化降解的活性次序是:TiO2/Ti＞TiO2/Al＞TiO2/glass＞TiO2/steel. 根据实验结果可以推测,在焙烧阶段各基材上前驱体膜烧结行为的不同以及基材元素的渗出是造成不同基材上的TiO2膜在表面形貌、化学组成、光吸收性能以及光催化活性方面存在明显差异的主要原因.     

PET表面锐钛矿-板钛矿相TiO2薄膜的制备及表征

利用改进的溶胶-凝胶法在经表面改性的PET(聚对苯二甲酸乙二醇酯)表面制备得到TiO2薄膜. 利用X射线衍射(XRD)、原子力显微镜(AFM)、UV-Vis 透光率曲线、接触角测试仪等测试手段对TiO2样品的性能进行表征.结果表明, PET表面过渡层的引入有效地改善了有机基底与无机薄膜之间的界面相容性, 在其表面形成透明、均一、附着力良好且具有光催化活性的TiO2薄膜.通过控制实验过程, 在低温下成功制备了不同锐钛矿/板钛矿比的TiO2薄膜,同时发现适量板钛矿相的存在能有效提高薄膜的光致亲水性.     

Raman spectroscopy of dip-coated and spin-coated sol–gel TiO2 thin films on different types of glass substrate

The photoinduced self-cleaning and super-hydrophilic properties of titania (TiO₂) coated glasses are considered to be utilized in many applications. The photocatalytic activity of titania is inherent to the glass composition and to the deposition method. Particularly sodium ions diffused to the titania film from the substrate have tremendous impact on its crystallinity. The deposition method influences surface, structure, and the density of the film. This study aims to provide new findings regarding the mechanism of crystallization of sol?Cgel synthesized titania and its thin films deposited by means of two different methods (dip-coating and spin-coating) onto the glass substrate with a high content of sodium ions (soda-lime glass) and without sodium ions (quartz glass). The main attention is devoted to Raman spectroscopy and Raman point-to-point mapping of the films. The content and the chemical state of the sodium ions were judged using the XPS. It is shown that the dip-coating method led to dense compact material. In this case the crystallization is localized in randomly distributed centers of nucleation. Contrary the spin-coated samples embodied a web-like pattern of cracks, from which the crystallization proceeds throughout the film. Additionally SEM, AFM, XRD, GDS, UV?CVIS methods were performed to support the results.     

Preparation of supported mesoporous thin films concerning template removal by supercritical fluid extraction

Thin films of silicate MCM-41 and silicate MCM-48 have been prepared on porous ceramic supports by the hydrothermal method. A comparative study of template removal has been made on supported thin films and on powder. By supercritical fluid extraction (SFE) with CH(3)OH-modified CO(2), at least 78% of the template can be removed from as-synthesized materials at 85 degrees C. X-ray diffraction (XRD) observations indicate that the resulting supported thin films after SFE are structurally stable and ordered with a weak pore contraction. The advantages of SFE over calcination in template removal are presented with a series of results obtained on supported thin films and on powder by XRD and N(2) adsorption-desorption.     

Preparation of Water-Repellent Glass by Sol-Gel Process Using Perfluoroalkylsilane and Tetraethoxysilane

Coating films on glass substrate were prepared by sol-gel process using alkoxide solutions containing perfluoroalkylsilane (PFAS) and tetraethoxysilane (TEOS). The physical properties of the coating films were characterized by SEM, FT-IR, and XRD. And their surface properties were investigated by measuring contact angles and atomic compositions. Transparent coating films with smooth surface and uniform thickness could be obtained. The contact angles of the coating films for water and methylene iodide are extremely high, at 118 degrees and 97 degrees, respectively, and their surface free energies are about 9.7 dyn/cm. It was found that the water-repellent glass prepared is very hydrophobic and exhibits excellent water-repellency. Hydrophobic perfluoroalkyl groups are preferentially enriched to the outermost layer at the coating film-air interface, and two layers probably exist in the coating film. The upper layer oriented toward the air is composed of mainly perfluoroalkyl groups originating from PFAS, and the lower layer is composed of mainly -OSiO- groups originating from TEOS. The heat treatment after drying step cannot influence the surface enrichment of the perfluoroalkyl group. The hydrolysis reaction should be more completely done before the dip coating step to obtain lower surface free energy. The burning temperature should be less than 300 degrees C because the perfluoroalkyl group begins to decompose from this temperature. Copyright 2001 Academic Press.     

二氧化钛纳米膜电极的形貌和光电化学性质

采用两种不同粒度的国产TiO2纳米材料和进口TiO2P25粉末,以涂覆法分别在导电玻璃基底上制备出TiO2纳米膜电极.通过循环伏安、瞬态光电流时间谱,结合SEM、DRS、XRD等实验手段,分析比较了三种TiO2膜电极的形貌和光电化学性质,探讨了提高和改善电极性能的途径.     

Polyaniline thin film optical waveguides for integrated optics and VLSI prepared by vacuum evaporation technique

Polyaniline is emerging as an important polymer material which offers challenging opportunities for both fundamental research and new technological applications in waveguides. Metal doped polyaniline has been prepared initially in the form of powder by a solution growth technique. The emeraldine salt with doped metal was also prepared by solution growth technique. This powder was used for vacuum evaporation on optically flat glass substrate. The dark green doped (Fe, Al) polyaniline thin films were prepared by vacuum evaporation technique (10^?4 torr). Deposited waveguide thin films have been characterized structurally, using X‐ray diffraction (XRD), optically etc. Effective refractive index of the thin film waveguide was also calculated theoretically and experimentally. Waveguide parameters, namely refractive index, propagation loss and depth of vacuum deposited polyaniline thin films optical waveguide have been determined. The optical spectra and structure and waveguide parameters of vacuum deposited polyaniline thin films are strongly affected by the type of doping. It is possible to reduce the losses by addition of Fe to the vacuum deposited polyanine thin film and modify the effective refractive index (O_eff) according to particular requirements. Results are compared with the results in the literature. Copyright © 2002 John Wiley & Sons, Ltd.     

Electrophoretic deposition of titanate nanotube films with extremely large wetting contrast

A facile electrophoretic deposition (EPD) process has been developed to prepare thin films consisting of titanate nanotubes (TNTs) that were synthesized by a hydrothermal approach. Such an EPD process offers easy control in the film thickness and the adhesion to the substrate was found to be strong. The chemical composition and structure of the products have been characterized by XRD, HRTEM, and FESEM. It was found that the functionalization of TNTs plays a key role on the electrolyte stability and the formation of a uniform TNT film with good adhesion. The as-prepared TNT films show exceptional superhydrophilic behavior with ultra-fast spreading, while it converts to superhydrophobicity yet with strong adhesion after 1H,1H,2H,2H-perfluorooctyl-triethoxysilane modification. This study provides an interesting method to prepare films with extremely high wettability contrast that are useful for producing different types of functional materials.     

作为表面增强拉曼光谱基底的高度均匀Au纳米棒的构筑及对福美双的检测

采用种子生长法制备Au纳米棒(GNRs),随后进行组装和煅烧得到单层致密堆积的GNRs薄膜。在煅烧过程中,组装所需有机物在煅烧过程中分解,从而使得GNRs表面具有较高的清洁度。研究中发现,煅烧前后金纳米棒表面的间隙进一步提高,增强了其SERS(表面增强拉曼光谱)活性。为了研究其SERS活性,选择了2种探针分子以研究其灵敏度和均匀性,发现其具有较高的灵敏度和高的信号稳定性。随后将所制备的SERS基底成功用于检测超低浓度的农药分子。     

Phase separation of polymer blends in thin films

Films of polystyrene-poly(vinylmethyl ether) blends of various compositions are formed by a dip-coating procedure, the thickness of the film being controlled by the concentration of the solution. The substrates used are glass and gold. The phase separation process is followed by a laser light scattering experiment in which the total forward scattering intensity is monitored as a function of temperature. Morphological examination shows that phase separation occurs by a spinodal decomposition mechanism. A thickness effect on the phase separation temperature is noticeable when film thickness is smaller than 1 μm. This effect is substrate dependent. In all films formed on gold the spinodal temperature increases as film thickness decreases. Films formed on glass exhibit a destabilizing effect on decreasing film thickness. This effect is slight in films of composition poorer in polystyrene than the critical composition, and is enhanced in films richer in polystyrene. The stabilizing effect of decreasing the thickness of films formed on the gold substrate is considered to reflect mainly a purely geometrical effect. The decreasing dimensionality is shown by simple theoretical considerations to increase the phase-separation temperature. However, the phase separation behavior of thin films on glass appears to be the result of two kinds of substrate-polymer interactions in addition to the geometrical effect: (a) electrostatic interaction of the charged glass surface (a destabilizing effect at all film compositions) and (b) selective adsorption of polystyrene on glass.