共查询到19条相似文献,搜索用时 62 毫秒
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采用纳米球刻蚀(nanosphere lithography)技术,以自组装的聚苯乙烯纳米小球(polystyrene,PS小球)的单层膜为掩模,制备出二维有序的CdS纳米阵列.利用扫描电子显微镜(SEM)对样品结构进行了表征,用紫外—可见分光光度计对样品光学性质进行了分析.结果表明:制备的二维CdS纳米阵列是高度有序的,且与作为掩模的纳米小球的原始尺寸及排布结构一致;禁带宽度为2.60eV,相对于体材料的2.42eV,向短波长蓝移了0.18eV,表现出CdS材料在纳米结构点阵中的量子尺寸效应;CdS纳米
关键词:
纳米球刻蚀
二维CdS纳米有序阵列 相似文献
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利用胶体小球掩蔽刻蚀技术,制备了单晶硅纳米阵列,利用原子力显微镜观察了硅阵列的表面形貌,实验结果表明,硅柱阵列具有高密度和较好的均匀性。同时研究了单晶硅纳米阵列的场电子发射特性。为了提高样品的场发射性能,在所制备的单晶硅有序纳米阵列上生长了一层非晶碳薄膜。与单晶纳米硅柱阵列相比,覆盖有非晶碳膜的样品的场电子发射特性有了明显的改善,表现在场发射的开启电场下降,同时场发射增强因子得到增加。结果表明非晶碳膜确实能够降低电子发射的表面有效势垒,从而增强了场电子发射特性。 相似文献
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采用纳米球刻蚀技术中漂移法在玻璃基片上制备较大 面积不同直径的聚苯乙烯小球掩模板, 采用磁控溅射技术在掩模板上沉积不同厚度的金薄膜, 去除聚苯乙烯小球后, 通过扫描电子显微镜观察到周期排列的三角状金纳米颗粒点阵. 通过紫外-可见分光光度计测试所制备样品的光吸收特性, 发现表面等离子体共振峰随粒径增大发生红移, 随金纳米颗粒高度增加发生蓝移. 基于Mie理论, 利用Matlab软件编程对不同粒径的金阵列光吸收特性进行理论模拟, 并与实验结果进行对比.
关键词:
纳米球刻蚀
金纳米颗粒阵列
表面等离子体共振 相似文献
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针对氢基硅倍半氧烷(hydrogen silsesquioxane,HSQ)作为深反应离子刻蚀(DRIE)掩膜形成大高宽比纳米硅立柱的工艺进行了系统研究。优化了刻蚀工艺中线圈功率、极板功率和气体流量参数,减小了横向刻蚀,使形貌垂直性得到了更好的控制,并实现了13.3 m高度和低侧壁粗糙度的垂直硅纳米柱阵列,其高宽比(高度/半高宽)达到了36。利用不同的刻蚀工艺条件得到了不同侧壁形貌以及不同尺寸、高度的硅纳米柱结构。 相似文献
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Wei Li Wei-Ming Zhao Ping Sun Xin-Fan Huang Kun-Ji Chen 《Applied Surface Science》2007,253(22):9035-9038
We present a fabrication procedure that can form large-scale periodic silicon nanopillar arrays for 2D nanomold which determines the feature size of nanoimprint lithography, using modified nanosphere lithography. The size of silicon nanopillars can be easily controlled by an etching and oxidation process. The period and density of nanopillar arrays are determined by the initial diameter of polystyrene (PS) spheres. In our experiment, the smallest nanopillar has a full width half maximum (FWHM) of approximately 50 nm, and the density of silicon pillar is ∼109/cm2. Using this approach, it is possible to fabricate 2D nanoimprint lithography mask with 50 nm resolution. 相似文献
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Morphology control and electron field emission properties of high-ordered Si nanoarrays fabricated by modified nanosphere lithography 总被引:2,自引:0,他引:2
High-ordered silicon nanoarrays were prepared using direct nanosphere lithography combined with thermal oxidation. Atomic force microscope (AFM) images of the silicon arrays show that the patterns of polystyrene (PS) template are well transferred to the silicon surface. The size and morphology of the nanoarrays can be controlled effectively by varying the plasma-therm reactive ion etching (RIE) or thermal oxidation parameters. The field emission studies revealed that the typical turn-on field was about 7-8 V/μm with emission current reached 1 μA/cm2. It is also found that the field emission current is highly dependent on the morphology of these Si nanoarrays. 相似文献
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Shengli Huang Lingqi Kong Chunjing Zhang Yan Wu Xianfang Zhu 《Physics letters. A》2011,375(33):3012-3016
Effect of chromium interlayer deposition on 2-dimensional, periodic silver nanoparticle array structure was systematically investigated. The silver nanoparticle array was fabricated by nanosphere lithography with assembled polystyrene nanospheres being as a deposition mask. The chromium interlayer was deposited by thermal evaporation either on the nanosphere mask or directly on the silicon substrate. The structures of the achieved silver nanoparticle arrays were characterized by scanning electron microscope and were compared with that of silver nanoparticle array without the interlayer. With analysis of the anomalies among the structures the critical role of the interlayer in the periodic nanoparticle array fabrication was revealed. 相似文献
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利用纳米球刻蚀法制备了二维六角密排三角形银纳米阵列, 通过加入铬过渡层并改变其位置和改变金属沉积角度, 研究它们对点阵结构的影响. 实验发现, 加入铬过渡层所形成的银纳米点阵结构较无铬层有很大改善, 三角形角部更加尖锐, 更能满足传感器对信号检测的要求. 同时, 该过渡层应蒸镀在模板球排列之后, 才能获取更大面积的二维银纳米点阵结构. 在沉积角度对制备二维银纳米点阵的实验中, 基片没有旋转, 采用垂直镀膜方式更容易得到结构完整、结合较牢固、且面积较大、角部尖锐的二维银纳米点阵. 吸收光谱测量进一步验证了铬过渡层对二维银纳米点阵形貌结构的改善作用. 这些为下一步的生物修饰以及生物化学传感器的制备提供了先决条件. 相似文献
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Aqueous phase Ag nanoparticles with controlled shapes fabricated by a modified nanosphere lithography and their optical properties 总被引:1,自引:0,他引:1
We have developed a modified nanosphere lithography (NSL) process to fabricate surface-confined Ag nanoparticles (NPs) with controlled shapes. NPs with different shapes, such as triangular, quadrilateral, pentagon or trapezoidal with rounded tips or edges, can be fabricated by this process. These Ag NPs can be dislodged into water forming NPs in an aqueous environment. The developed process results in better NP shape retaining than those obtained using the routine NSL process. The UV-vis absorption of the surface-confined Ag NPs show distinct blue shift and reduced intensity after surface modification. The NPs produced by the modified NSL and dislodged in water have significantly less density of debris as observed by transmission electron microscopy and UV-vis absorption spectrum. 相似文献
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Nanosphere lithography (NSL) is a successful technique for fabricating highly ordered arrays of ZnO nanowires typically on sapphire and GaN substrates. In this work, we investigate the use of thin ZnO films deposited on Si by pulsed laser deposition (PLD) as the substrate. This has a number of advantages over the alternatives above, including cost and potential scalability of production and it removes any issue of inadvertent n-type doping of nanowires by diffusion from the substrate. We demonstrate ordered arrays of ZnO nanowires, on ZnO-coated substrates by PLD, using a conventional NSL technique with gold as the catalyst. The nanowires were produced by vapor phase transport (VPT) growth in a tube furnace system and grew only on the areas pre-patterned by Au. We have also investigated the growth of ZnO nanowires using ZnO catalyst points deposited by PLD through an NSL mask on a bare silicon substrate. 相似文献