MC computer simulations of the preferential sputtering of Si-Ge alloys

Abstract

The ability of MC codes to predict the preferential sputtering of compound targets is investigated. The DYNA and TRIDYN codes are run for 3 keV Ar ⁺ bombardment of a SiGe binary target. The preferential sputtering of Si and Ge, the depth dependence of the sputter cross-section and the relocation operators are calculated. Difficulties arise in trying to reproduce the experimentally reported absence of preferentiality in the sputtered flux. The models used for the surface barriers, as well as the barrier heights, influences strongly the predicted quantities. A spherical surface barrier predicts much closer to stoichiometric fluxes than a planar barrier. Different codes give different collisional diffusivities for the target species in the bulk. The need for further experiments is stressed if some guidance in the choice of input parameters in the codes is desired.     

Evaluation of carbon stripper foils produced by a nitrogen ion beam sputtering method

Carbon stripper foils having thicknesses in the range of 5–40 μg/cm² have been prepared by a nitrogen ion beam sputtering method and their lifetimes have been tested in the Van de Graaff accelerator facility with 3.2 MeV, Ne⁺ ions. The foils of 21 μg/cm² thickness had the longest mean lifetime of 1350.0 mC/cm² (irradiation dose of 8.4×10¹⁸ atoms/cm²) which was 50 times longer than that of commercial foils. However, foils with other thicknesses had extremely short lifetimes similar to commercial foils. The nitrogen content of the foils of both long and short lifetimes has been determined using elastic scattering of 3 MeV α-particles.     

溅射功率对Mo薄膜微结构和性能的影响

实验采用直流磁控溅射沉积技术在不同溅射功率下制备Mo膜,研究了不同溅射功率下Mo膜的沉积速率、表面形貌及晶型结构,并对其晶粒尺寸和应力进行了研究。利用原子力显微镜观察样品的表面形貌发现随着溅射功率的增加,薄膜表面粗糙度逐渐增大。X射线衍射分析表明薄膜呈立方多晶结构,晶粒尺寸为14.1～17.9 nm;应力先随溅射功率的增大而增大,在40 W时达到最大值(2.383 GPa),后随溅射功率的增大有所减小。     

The energy dependence and depth distribution of lattice disorder in ion-implanted silicon

Silicon single crystals were implanted at room temperature with Xe and I ions in the energy range 20 to 150 keV and with 20 to 50 keV P ions. The lattice disorder induced by these implants was measured by a combination of the channeling and Rutherford backscattering techniques. The disorder produced by implanting I and Xe ions exhibited a similar relationship with implantation energy to that previously established for bismuth implants. The P ion implants induced less lattice disorder per incident ion in the energy range studied. Integral depth distributions of the implanted ions and of the lattice disorder were obtained by combining a layer removal technique with radiotracer implants of 110 keV ¹³³Xe and 40 keV ³²P. The depth distributions showed that in both cases the ions penetrate deeper into the crystal than the damage they produce but that the separation is significantly greater for the P implant than for the Xe implant.     

溅射功率对Mo薄膜微结构和性能的影响

 实验采用直流磁控溅射沉积技术在不同溅射功率下制备Mo膜,研究了不同溅射功率下Mo膜的沉积速率、表面形貌及晶型结构,并对其晶粒尺寸和应力进行了研究。利用原子力显微镜观察样品的表面形貌发现随着溅射功率的增加,薄膜表面粗糙度逐渐增大。X射线衍射分析表明薄膜呈立方多晶结构,晶粒尺寸为14.1～17.9 nm;应力先随溅射功率的增大而增大,在40 W时达到最大值(2.383 GPa),后随溅射功率的增大有所减小。     

Some of the current trends in the studies of sputtering

Abstract

The main directions in experimental, theoretical and computer studies of sputtering of solids under ion bombardment are analyzed. It is emphasized that there is a close relation between these studies and practical applications of sputtering.     

Axial energy distributions of Li and F desorbed from LiF surfaces by fast ion impact

Initial axial kinetic energy (E_z) distributions of Li⁺ and F⁻ secondary ions desorbed from LiF surfaces, bombarded by low current (500 particles/s) N³⁺ beams in the 0.075–7.5 MeV primary ion energy (E_PI) range, were measured by using the time-of-flight technique. In this energy range, the electronic energy loss, S_e, increases from 25 to 160 eV/Å, while the nuclear stopping power, S_n, decreases from 8.0 to 0.25 eV/Å. The observed F⁻ initial axial kinetic energy distribution can be described by the linear collision cascade theory and no other contribution was found. The F⁻ total yield decreases proportionally to S_n. The Li⁺ distribution presents a remarkable deviation from the cascade prediction, indicating the existence of additional mechanisms related to the electronic energy-loss process. For the range of E_PI studied, these mechanisms produce a Li⁺ energy distribution with a Maxwell-Boltzman-like shape, which vanishes above E_z 10 eV and presents a maximum at E_z 1.2 eV. The Li⁺ yield is nonlinear with the electronic energy loss, S_e. A simple desorption model, based on the spatial distribution of the energy deposited by the projectile and on the effective energy-loss concept, is presented. This spatial distribution of the deposited energy is due to secondary electron cascades and is connected with a ESD-like mechanism on the surface.     

Color and optical characteristics of carbon coatings produced by magnetron sputtering

The color parameters of carbon coatings deposited by magnetron sputtering of a graphite target onto substrates of stainless steel without a sublayer and with a titanium sublayer are calculated. By numerical modeling, the refractive indices and extinction coefficients for the titanium sublayer and carboniferous film as well as the volume content of titanium dioxide in the sublayer are determined. Physico-Technical Institute of the Academy of Sciences of Belarus, 4, Zhodinskaya St., Minsk, 220141, Belarus. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 64, No. 3, pp. 374–385, May–June, 1997.     

Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency(VHF) magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp~3 contents.These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp~3 contents.     

非平衡磁控溅射制备类石墨碳膜及性能研究

利用中频非平衡磁控溅射技术在单晶硅基底上沉积了类石墨碳膜, 采用Raman光谱、高分辨透射电子显微镜、原子力显微镜分析了薄膜微观结构和表面形貌; 采用纳米压痕仪和CSM摩擦磨损试验机测试了碳膜力学性能和摩擦学性能. 结果表明: 利用中频非平衡磁控溅射技术沉积的碳膜是一种以sp²键合碳为主、结构非晶、硬度适中、应力较低、表面粗糙度较大、摩擦性能优异的薄膜. 脉冲占空比对薄膜微观结构和性能有显著影响, 随着脉冲占空比的增大, Raman光谱D峰和G峰的强度比I_D/I_G先减小后增大, 而硬度随脉冲占空比的增大却呈现出相反的变化趋势, 即先增大后减小; 大气氛围中的摩擦性能测试表明, 本实验制备的薄膜具有优异的抗磨性能(～10^-11 cm³/N^-1. m^-1)和承载能力(～2.5 GPa). 随脉冲占空比的增大, 薄膜摩擦系数变化甚微而磨损率却呈现先显著减小后轻微增大的变化趋势. 类石墨碳膜优异的摩擦学性能主要归因于其独特的结构、较低的内应力及良好的结构稳定性.     

Preparation of boron carbon nitride thin films by radio frequency magnetron sputtering

Boron carbon nitride films were deposited by radio frequency magnetron sputtering using a composite target consisting of h-BN and graphite in an Ar-N₂ gas mixture. The samples were characterized by X-ray diffraction, Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. The results suggest that the films are atomic-level hybrids composed of B, C and N atoms. The boron carbon nitride films prepared in the present experiment have a disordered structure. The sputtering power varied from 80 W to 130 W. This sputtering power was shown to have regular effect on the composition of boron carbon nitride films. The samples deposited at 80 W and 130 W are close to the stoichiometry of BC₃N. The sample deposited at 110 W is close to the stoichiometry of BCN. The samples deposited at 100 W and 120 W approach to BC₂N. It is very significant for us to synthesize boron carbon nitride compound with controllable composition by changing the sputtering power.     

磁控溅射辉光放电特性的模拟研究

采用二维、自洽的PIC/MCC (particle-in-cell with Monte Carlo collision) 方法,模拟了磁控溅射辉光放电过程, 重点讨论了工作参数对放电模式和放电电流的影响. 模拟结果表明, 当工作气压由小到大或空间磁场从强到弱变化时, 放电模式会从阴极空间电荷主导的放电模式过渡到阳极空间电荷主导 的放电模式.在过渡状态,对应的工作气压与磁通密度分别为0.67 Pa和0.05 T; 随着工作气压的增大,放电电流先增大后趋向平衡,当工作气压超过2.5 Pa时,电流开始随工作气压的增大而减小; 而阴极电压增大时,放电电流近似线性增加.     

Optical emission spectroscopy by Ar ion sputtering of Ti surface under O2 environment

Visible light emission from atoms and ions sputtered on a polycrystalline Ti surface was observed under irradiation of 30 keV Ar³⁺ ions. A number of atomic lines of Ti I and II were observed in the wavelength of 250-850 nm. The intensity of Ti II emission increased 1.3-5.6 times by introducing oxygen molecules at a pressure of 5.8 × 10⁻⁵ Pa, whereas that of Ti I decreased 0.5-0.8 times. Factors enhancing or reducing photon intensities were plotted as a function of energy of the corresponding electrons in the excited states for Ti atoms and Ti⁺ ions.     

Carbon fractals grown from carbon nanotips by plasma-enhanced hot filament chemical vapor deposition

Carbon nanomaterials with different structures were prepared in a custom-designed plasma-enhanced hot filament chemical vapor deposition system using methane, hydrogen and nitrogen. They were investigated by scanning electron microscopy (SEM) and micro-Raman spectroscopy. The SEM images show that the smooth carbon nanotips are formed under a high bias current and the carbon fractals can grow from the tips of the carbon nanotips under a low bias current. The results of micro-Raman spectroscopy indicate that the graphitization of the carbon nanomaterials was improved by ion bombardment. Combined the ion bombardment, electric field enhancement and electron emission mechanisms, the formation model of the carbon fractals was suggested.     

Formation of neutral clusters during sputtering of gold

Polycrystalline Au was bombarded with 15 keV Ar⁺, and the resulting secondary neutral cluster yield distribution was measured by laser postionisation mass spectrometry. Neutral Au_n clusters containing up to 20 atoms were observed. The yield of Au_n clusters, Y_n, was found to follow a power in n, Y_n ∝ n^−3.4, but the yield of individual clusters depended on whether n was even or odd. This odd-even yield variation was caused by fragmentation of the cluster photoions. Simulation of photoion trajectories within the TOF spectrometer shows that the fragmentation dominantly occurs before the photoions enter the reflectron part of the spectrometer.     

平面靶直流溅射制备YBCO高温超导薄膜研究

开展了平面靶溅射法制备YBa2Cu3O7-δ(YBCO)高温超导薄膜工艺研究,以达到提高沉积速率的目的。通过增加工作气体总压(Pt),采用基片旋转达到离轴溅射模式,有效地克服了传统平面靶直流溅射法中高能粒子轰击和负离子反溅射现象。在两英寸LaA lO3(LAO)基片上成功外延生长得到了微观结构良好、电学性能优越(临界电流密度Jc=2.3/2.0mA/cm2)的双面YBCO高温超导薄膜。     

负偏压对磁控溅射Ti膜沉积速率和表面形貌的影响

采用直流磁控溅射加负偏压的方法制备了Ti膜,研究了不同偏压条件对Ti膜沉积速率、密度、生长方式及表面形貌的影响。随着偏压逐渐增大,Ti膜沉积速率分三个阶段变化:0~ -40 V之间沉积速率基本不变; -40~ -80 V之间沉积速率迅速降低;超过-80 V后沉积速率随偏压的下降速度又放缓。Ti膜密度随偏压增加而增大,负偏压为-119.1 V时开始饱和并趋于块体Ti材密度。加负偏压能够抑制Ti膜的柱状生长方式;偏压可以改善Ti膜的表面形貌,对于40 W和100 W的溅射功率,负偏压分别在-100 V和-80 V左右时制备出表面光洁性能较佳的Ti膜。     

Contact angle hysteresis on nano-structured surfaces

We present results from an experimental study on the phenomenon of contact angle hysteresis on solid surfaces decorated by a random array of nanometric hollows. For weak values of the areal density of defects φ_d, the hysteresis H increases linearly with φ_d. This evolution is described by a pinning–depinning process of the contact line by individual defects. At higher values of φ_d, a collective pinning effect appears and H decreases with increasing φ_d. In the linear regime, our experimental results are compared to theoretical predictions for contact angle hysteresis induced by a single isolated defect on the solid surface. We suggest that the crossover from the individual to the collective pinning effects could be interpreted in terms of an overlapping of wetting cross sections. Finally, we analyse the influence of both the size and the morphology (hollows/hillocks) of defects on the anchorage of the contact line.     

Energy and size effects in sputtering of surface metal nanoclusters under low energy ion bombardment

Molecular dynamics simulations of sputtering of copper clusters, which consisted of 13, 27, 39, 75 and 195 Cu atoms on a (0 0 0 1) graphite surface by 100-400 eV Ar and Xe ions have been performed. Some of the results have been published previously [Nucl. Instru. Meth. B 227 (2005) 261 and Nucl. Instru. Meth. B 228 (2005) 41], but are again discussed here together with additional results. Energy and size effects of ion backscattering from and sputtering of isolated surface clusters are discussed.     

射频反应磁控溅射法制备的氟化类金刚石薄膜摩擦特性研究

以高纯石墨做靶,CHF3和Ar气为源气体,采用射频反应磁控溅射法在不同流量比条件下制备了氟化类金刚石(F-DLC)薄膜.利用原子力显微镜、纳米压痕仪、拉曼光谱和红外光谱、摩擦磨损测试仪对薄膜的表面形貌、硬度、键结构以及摩擦性能做了具体分析.表面形貌测试结果表明,制备的薄膜整体均匀致密,表现出了良好的减摩性能.当CHF3与Ar气流量比r为1:6时,所得薄膜的摩擦系数减小至0.42,而纳米压痕结果显示,此时薄膜的硬度也最高.拉曼和红外光谱显示,随着r的增加,薄膜中的F浓度呈上升趋势,薄膜中的芳香环比例减小.研究表明,F原子的键入方式是影响F-DLC薄膜摩擦系数的一个重要因素,CF2反对称伸缩振动强度的减弱和CC中适量碳氢氟键的形成都能导致薄膜具有相对较低的摩擦系数.