Plasma deposition of thin films from a fluorine-containing cyclosiloxane

Thin films have been deposited from radio-frequency glow discharges fed with vapors of a silicon- and fluorine-containing organic compound, namely 2,4,6-tris[(3,3,3-trifluoropropyl) (methyl)] cyclotrisiloxane, in mixture with argon. 2,4,6-tris[(3,3,3-trifluoropropyl)(methyl)]cyclotrisiloxane A triode reactor has been utilized to deposit films by independently changing substrate temperature and bias-induced ion-bombardment. Laser interferometry, electron spectroscopy for chemical analysis and Fourier-transform infrared spectroscopy have been used to monitor film growth rate and composition. Results unambiguously show an activating effect of the ion-bombardment, which confirm the validity of the ion-assisted deposition model utilized for the plasma deposition of both teflon- and silicone-like films. In our experiments, low substrate temperature and bias conditions results in films with a “monomer-like” stoichiometry, while drastic conditions give origin to materials with a completely different composition and a markedly increased hardness. © 1994 John Wiley & Sons, Inc.     

Substrate temperature effects on film chemistry in plasma depositions of organics. II. Polymerizable precursors

The influence of substrate temperature during plasma deposition on the chemistry of the organic films formed was examined. Plasma ionization of precursor gases that are polymerizable by conventional mechanisms was studied. Film chemistry was analyzed by x-ray photoelectron spectroscopy (XPS). Monomers that polymerize by a free radical mechanism [2-hydroxyethyl methacrylate (HEMA) and hexafluorobutadiene (HFB)] form more regular polymers (i.e. with less molecular rearrangement) by plasma deposition at low substrate temperatures than monomers that polymerize by ionic mechanisms [ethylene oxide (EO) and tetrahydrofuran (THF)]. In all cases, lowering the substrate temperature during deposition produces films with elemental composition virtually identical to that of the precursor gas. Comparison of high-resolution XPS spectra of the deposited films with those for model polymers suggests that functional groups in the monomers used to generate the plasma are incorporated to a greater extent at low substrate temperatures. The effect of plasma power on the degree of precursor structure retention obtained when reduced substrate temperatures are employed was also examined. Plasma deposition of HEMA at low substrate temperatures and low plasma power produces thin films which are, by core level XPS, indistinguishable from HEMA polymerized by conventional methods. EO and THF films coated at low substrate temperatures on glass, polyethylene, or polytetrafluoroethylene varied widely in surface chemistry due to differences in film uniformity. Film quality (uniformity) is enhanced for these low reactivity precursors by pretreating substrates with an argon plasma. © 1992 John Wiley & Sons, Inc.     

ESR Study of the Plasma Polymerizations of Trimethylsilane and Methane

Electron Spin Resonance (ESR) was used to study, at the molecular level, the plasma polymerization of trimethylsilane (TMS) and methane. Direct ESR analysis of the plasma coated Al substrate required the use of a novel ESR technique. TMS plasma deposit on Al showed a single broad resonance line near g = 2.003. The signal was stable in vacuum and decayed on exposure to air, with a significant fraction persisting for days. Results show that this signal arises from silicon dangling bonds. Identical TMS signals were observed from films prepared by the DC cathodic or the AF glow discharge method but their decay rates were different. In contrast, the deposition of methane produced two distinct types of carbon-based signals depending upon the method of deposition. TMS or CH₄ films deposited by the DC cathodic method showed slow signals decay and high refractive indices value. While the use of Al as the substrate showed plasma-coating radicals, only substrate radicals were observed when PE was used as the substrate. The nature of radicals formed depends not only on the deposition method used but also on the substrate type.     

Atmospheric Pressure Plasma Deposition of Polyfuran

The atmospheric pressure radiofrequency (RF) plasma polymerization of furan was carried out with the objective of synthesizing polyfuran thin film. The structure, compositions and morphology of the plasma deposited polyfuran film were investigated by Fourier transform infrared (FTIR), atomic force microscopy (AFM), ultraviolet‐visible absorption spectroscopy (UV‐vis) and thermogravimetric analysis (TGA). The formation of polyfuran was confirmed using FTIR and UV‐visible analysis. The properties of plasma‐deposited polyfuran were compared with those of chemically synthesized polyfuran. Although the plasma deposited thin film polyfuran shows lower thermal stability than that of chemically synthesized polyfuran. It has better solubility in CHCl₃, also. Thin uniform polyfuran films are obtained in plasma assisted polyfuran deposition, while particles are obtained in chemical polyfuran polymerization.     

Substrate temperature effects on film chemistry in plasma deposition of organics. III. Analysis by static secondary ion mass spectrometry

Static secondary ion mass spectrometry (SIMS) was used to examine the effect of reducing the substrate temperature during the radio frequency plasma deposition of organic films. Studies of two polymerizable plasma precursors (2-hydroxyethyl methacrylate and acrylic acid) and one nonpolymerizable precursor (acetone) deposited without substrate cooling and with liquid nitrogen cooling are presented. Acetone deposited with methanol/dry ice cooling was also investigated. Spectra of polymerizable precursors were analyzed by comparison to spectra for the corresponding conventionally-polymerized polymer films [i.e., poly(hydroxyethyl methacrylate) and poly(acrylic acid)]. Acetone spectra were interpreted by reference to SIMS analysis of plasma-deposited films prepared from isotopically-labelled acetone and to reference homopolymers. Comparison of the SIMS spectra of films deposited at different substrate temperatures indicates that a reduction in substrate temperature generally results in higher intensity of peaks characteristic of oxygenated ion structures. SIMS also suggests that the reduction of substrate temperature results in less polymer unsaturation and fewer structures which form by hydrogen redistribution during the deposition process. These results support the hypothesis that deposition at low substrate temperatures leads to an increase in the proportion of precursor incorporated into the film without substantial fragmentation. Corroborative results from high resolution x-ray photoelectron spectroscopy (XPS) and assays for precursor functional groups by chemical derivatization reactions in conjunction with XPS are also presented. © 1992 John Wiley & Sons, Inc.     

Fundamental aspect and behavior of saturated fluorocarbons in glow discharge in absence of potential source of hydrogen

The glow discharge of a series of saturated fluorocarbons, C_nF_2n+2 (n = 1, 2, 4, 6, and 8), was studied with glass substrates which do not contain any hydrogen. It was found that the deposition rate was a function of the F/C ratio of the starting fluorocarbons. That is, fluorocarbons with higher F/C ratio, such as CF₄ and C₂F₆, hardly polymerized, while fluorocarbons with lower F/C ratio, such as C₈F₁₈, polymerized as well as C₂F₄. After plasma exposure, the surface of glass substrate was characterized by measurements of water contact angle, water droplet rolling-off angle, and ESCA. Although all saturated fluorocarbon plasmas could alter the surface more hydrophobic than before, the deposited materials from fluorocarbons with higher F/C were not stable. Also, in plasmas with high F/C fluorocarbons, i.e., CF₄ and C₂F₆, sputtering of the electrode material was observed. © 1992 John Wiley & Sons, Inc.     

Characterization of plasma polymerized hydrocarbons using CP–MAS 13C-NMR

Plasma polymerized hydrocarbons made from ethane and methane were produced under different reactor conditions and probed by solid-state carbon-13 nuclear magnetic resonance (¹³C-NMR) with cross-polarization and magic-angle sample spinning. NMR experiments provided structural information about the plasma polymers. The conditions of low power, high hydrocarbon gas flow rate, and no added hydrogen gas appeared to give the highest amount of nonprotonated sp³ hybridized carbons in the films for the reactor design used. The use of methane or ethane as reactor gas did not affect plasma polymer structure significantly.     

Surface patterned graft copolymerization of hydrophilic monomers onto hydrophobic polymer film upon UV irradiation

A random copolymer [p(MMA/DMAB)] composed of methyl methacrylate (MMA) and 2,2‐dimethoxy‐1,2‐di(4‐methacryloyloxy)phenylethane‐1‐one (DMAB), which can simultaneously act as a photoradical initiator and crosslinkable monomer, was prepared by free radical random copolymerization. A hydrophobic film on quartz glass was prepared using p(MMA/DMAB) by a spin‐coating technique. Hydrophilic methacrylic acid (MA) and 2‐methacryloyloxyethyl phosphorylcholine (MPC) were graft‐copolymerized from the hydrophobic p(MMA/DMAB) film in water by photo‐cleavage of the DMAB unit. The graft copolymer of MA and MPC was characterized by infrared and X‐ray photoelectron spectroscopies and contact angle measurements. To confirm that MPC can be grafted onto the surface of the film selectively at only UV‐irradiated sites, photoinduced graft copolymerization of MPC using a photomask was performed to prepare a pMPC patterned p(MMA/DMAB) film. The film was stained using a rhodamine 6G dye that can absorb specifically to pMPC to confirm the pMPC pattern. The p(MMA/DMAB) film can be applied to various fields including photolithography and biomedical applications, because the film surface properties can be controlled using various vinyl monomers selectively on UV‐irradiated sites. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2014 , 52, 2822–2829     

Synthesis by plasma and characterization of bilayer aniline–pyrrole thin films doped with iodine

The synthesis by plasma and characterization of aniline–pyrrole bilayer polymers doped in situ with iodine were studied. The objective was to study the electrical conductivity of thin films composed of alternating layers of different polymers. The results indicated that the plasma technique is capable of forming chemically bonded layered polymers with several possible combinations. The electric conductivity was studied during heating–cooling cycles so the dependence of the bilayer polymers on temperature could be observed. The behavior was related with the Arrhenius model, with average activation energies of 0.4 ± 0.1 eV in the heating steps and 0.5 ± 0.1 eV in the cooling steps. The difference in both steps shows the influence of the aniline in the bilayer polymer network because polyaniline presents changes in the structure during heating processes. The bilayer aniline–pyrrole polymers had greater electric conductivity at room temperature than that shown by the separate homopolymers. © 2002 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 40: 1850–1856, 2002     

SuFEx Click: New Materials from SOxF and Silyl Ethers

New forms of click chemistry present new opportunities in materials science. Sulfur(VI) fluoride exchange (SuFEx) is a recently discovered click reaction between molecules containing SO_xF groups and silyl ethers, two functionalities that are orthogonal to all other known click chemistries, that generates sulfate or sulfonate connections upon the addition of certain organobases or fluoride sources. SuFEx also has several important advantages over other click reactions in that it is insensitive to ambient oxygen and water, and its precursor materials, especially SO_xF, are chemically, UV, and thermally inert. This Concept article focuses on the unique reactivity of SuFEx and its relation to building high molecular weight polymers and surface coatings, both of which make it a powerful new tool for materials science.     

Plasma polymerization of styrene with controlled particle energy

A new type of reactor for plasma polymerization was developed in order to achieve an effective control of styrene polymerization process. Electrons and ions were extracted from the radio frequency (rf) glow discharge region to the downstream region to generate plasma polymerization. The energy of extracted ionized particles was controlled by the bias voltage of a screen grid unit. Deposited polymer thin films were analyzed by X-ray photoelectron spectroscopy (XPS) and infrared (IR) spectroscopy. The result showed that the polarity and energy of the extracted particles had considerable effect on the deposition rate and structure of the deposited films. At each bias polarity there was a maximum deposition rate vs. voltage magnitude, and the maximum at the positive voltage was higher. In addition, the bulk aromaticity of the film deposited at the negative bias was lower than at the positive bias; the surface aromaticity of the films was much higher than that of the films prepared by usual rf discharge. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 1265–1270, 1998     

A versatile and rapid coating method via a combination of plasma polymerization and surface‐initiated SET‐LRP for the fabrication of low‐fouling surfaces

In this work, we demonstrate the potential of surface‐initiated single electron transfer living radical polymerization for surface modification applications that confer low‐fouling properties. The versatility of the technique, which can be applied to a wide variety of substrates, has been displayed by the successful grafting of a range of monomers after immobilizing a bromine initiator on the surface via plasma polymerization. The thickness of the grafted surfaces can be controlled through variation of reaction parameters such as monomer concentration, reaction time, and the ratio between catalyst and ligand. Furthermore, the low‐fouling properties of the resulting surfaces were demonstrated against fully concentrated serum proteins and adhesive fibroblast cells, via grafting of N‐hydroxyethyl acrylamide (N‐HEA) or [2‐(methacryloyloxy)ethyl]dimethyl‐(3‐sulfopropyl) ammonium hydroxide (SBMA). This rapid and versatile coating technique, which has the ability to be applied to a wide range of substrates, can be performed in aqueous conditions without the exclusion of atmospheric oxygen, and shows excellent potential for the surface modification of biomaterial surfaces that require low‐fouling properties. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2017 , 55, 2527–2536     

Plasma Copolymerization of Acrylic Acid with Hexamethyldisilazane

Polymerization of acrylic acid with hexamethyldisilazane (HMSZ) was carried out in a mixture by use of pulsed and continuous wave plasmas. The polymer deposition rate and the chemical structures of product films were investigated with regard to the power effects of the plasmas. A copolymer-like structure was formed in general, but the products were not necessarily composed of the simple agglomeration of the polymer components. The power consumed in plasma polymerization influenced the chemical structure, and oxide, in the form of Si—O, was produced more densely in the polymers at higher rather than lower powers. The polymer structure was related to the chemical properties, and the surface wetting was also changed by the power used in the plasma copolymerization. The films were moderately hydrophilic in the polymers produced at lower wattages, but became as hydrophobic as those from HMSZ when prepared at high wattages.     

Surface Modification and Characterization of Dichloromethane Plasma Treated Polypropylene Film

Surface of polypropylene (PP) film was modified in plasma of dichloromethane (CH₂Cl₂). The nature of surface modifications and formation of cross-linked layer due to plasma polymerization was studied by surface energy measurements and solubility test. Surface modification achieved by CH₂Cl₂ plasma was compared with the reported work on chloroform (CHCl₃) and carbontetrachloride (CCl₄) plasma modifications. Modified surface characterized by ATR-FTIR technique indicated formation of saturated and unsaturated cross-linked product. On the basis of relative intensity change of the specific bands, the site of attachment of chlorine on PP surface was investigated. Adhesive strength of modified film was measured by T-peel test method. Stability of modified surface was studied by measuring surface energy and peel strength after two months.     

Plasma Treatment of Polymers to Generate Stable,Hydrophobic Surfaces

Tailoring of polymers for multifaceted applications is an increasing field, whereby most often the surface properties must be adjusted. Therefore, the coating of common polymers by plasma polymerization is a promising way to modify the surface and meet the demands. Beside the tuning of the required surface properties, good adhesion and stability of the films is essential. This work investigates the plasma deposition of pp-HMDSO films on PC and PC/ABS to generate stable, hydrophobic surfaces. By examining the plasma conditions—deposition rate, energy range, and surface topography—ultrathin, stable films with advancing contact angles up to 110° and receding angles exceeding 90° can be designed. Storage of the siloxane films for 1 year in air at ambient conditions exhibits almost no aging. Thus, these films are superior to fluorocarbon films deposited for comparison.     

Wettability of plasma-polymerized vinyltriethoxysilane film

Plasma-polymerized films of vinyltriethoxysilane were surface characterized using the sessile drop technique. The surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method, Wu harmonic mean method, and van Oss, Chaudhury, and Good acid-base theory. Influence of deposition conditions on the surface free energy was demonstrated in the study. Improved wettability of the films was related to the diminished concentration of apolar methyl groups in plasma polymers. An increased concentration of carbonyl and hydroxyl groups resulted in a very small improvement of the polar component.