Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams

We demonstrate depth profiling of polymer materials by using large argon (Ar) cluster ion beams. In general, depth profiling with secondary ion mass spectrometry (SIMS) presents serious problems in organic materials, because the primary keV atomic ion beams often damage them and the molecular ion yields decrease with increasing incident ion fluence. Recently, we have found reduced damage of organic materials during sputtering with large gas cluster ions, and reported on the unique secondary ion emission of organic materials. Secondary ions from the polymer films were measured with a linear type time‐of‐flight (TOF) technique; the films were also etched with large Ar cluster ion beams. The mean cluster size of the primary ion beams was Ar₇₀₀ and incident energy was 5.5 keV. Although the primary ion fluence exceeded the static SIMS limit, the molecular ion intensities from the polymer films remained constant, indicating that irradiation with large Ar cluster ion beams rarely leads to damage accumulation on the surface of the films, and this characteristic is excellently suitable for SIMS depth profiling of organic materials. Copyright © 2009 John Wiley & Sons, Ltd.     

Cluster ion beam profiling of organics by secondary ion mass spectrometry – does sodium affect the molecular ion intensity at interfaces?

The use of cluster ion beam sputtering for depth profiling organic materials is of growing technological importance and is a very active area of research. At the 44th IUVSTA Workshop on “Sputtering and Ion Emission by Cluster Ion Beams”, recent results were presented of a cluster ion beam depth profile of a thin organic molecular layer on a silicon wafer substrate. Those data showed that the intensity of molecular secondary ions is observed to increase at the interface and this was explained in terms of the higher stopping power in the substrate and a consequently higher sputtering yield and even higher secondary ion molecular sputtering yield. An alternative hypothesis was postulated in the workshop discussion which may be paraphrased as: “under primary ion bombardment of an organic layer, mobile ions such as sodium may migrate to the interface with the inorganic substrate and this enhancement of the sodium concentration increases the ionisation probability, so increasing the molecular ion yield observed at the interface”. It is important to understand if measurement artefacts occur at interfaces for quantification as these are of great technological relevance – for example, the concentration of drug in a drug delivery system. Here, we evaluate the above hypothesis using a sample that exhibits regions of high and low sodium concentration at both the organic surface and the interface with the silicon wafer substrate. There is no evidence to support the hypothesis that the probability of molecular secondary ion ionisation is related to the sodium concentration at these levels. © Crown copyright 2008. Reproduced with the permission of Her Majesty's Stationery Office. Published by John Wiley & Sons, Ltd.     

Analysis of thin films and molecular orientation using cluster SIMS

A study of phenylalanine films of different thicknesses from submonolayer to 55 nm on Si wafers has been made using Bi_n⁺ and C₆₀⁺ cluster primary ions in static SIMS. This shows that the effect of film thickness on ion yield is very similar for all primary ions, with an enhanced molecular yield at approximately 1 monolayer attributed to substrate backscattering. The static SIMS ion yields of phenylalanine at different thicknesses are, in principle, the equivalent of a static SIMS depth profile, without the complication of ion beam damage and roughness resulting from sputtering to the relevant thickness. Analyzing thin films of phenylalanine of different thicknesses allows an interpretation of molecular bonding to, and orientation on, the silicon substrate that is confirmed by XPS. The large crater size for cluster ions has interesting effects on the secondary ion intensities of both the overlayer and the substrate for monolayer and submonolayer quantities. This study expands the capability of SIMS for identification of the chemical structure of molecules at surfaces. © Crown copyright 2010.     

团簇离子枪对CH3NH3PbI3钙钛矿薄膜的影响研究

以氩离子团簇为溅射源,对采用一步旋涂法制备的CH₃NH₃PbI₃钙钛矿薄膜进行溅射实验,通过XPS分析检测样品表面Pb元素的价态变化。结果表明,新制备的钙钛矿薄膜材料表面没有检测出Pb⁰,而经过团簇离子枪溅射的样品中部分Pb²⁺还原成Pb⁰,证明了氩离子团簇刻蚀对钙钛矿材料具有破坏作用。一方面,溅射时间的增加以及团簇离子枪能量的增大均会加大钙钛矿材料的损伤程度;另一方面,离子枪团簇规模大小与溅射损伤程度呈近抛物线关系。因此,在进行此类样品表面清洁时,应尽量减小离子枪能量和溅射时间,选择较小或较大的团簇规模以减少对样品的损伤。该研究对于钙钛矿样品在进行XPS检测和数据分析时具有参考价值。     

Is proton cationization promoted by polyatomic primary ion bombardment during time-of-flight secondary ion mass spectrometry analysis of frozen aqueous solutions?

Ion bombardment of pure water ice by Au+ monoatomic and Au3 + and C60 + polyatomic projectiles results in the emission of two series of water cluster ions-(H2O)n + and (H2O)nH+-with n ranging from 1 to >40. The cluster ion yields are very significantly higher under polyatomic ion bombardment than when using an Au+ primary ion. The yield of the protonated water species (H2O)nH+ is found to be enhanced by increasing ion fluence. C60 + bombardment results in a very dramatic increase in the (H2O)nH+ yield and decrease in the yield of (H2O)n +. Au3 + also significantly increased the yield of protonated species relative to the non-protonated but to a lesser extent than C60 +. Bombardment by Au+ also increased the yield of protonated species but to a very much smaller extent. The hypothesis that the protonated species may enhance the yield of [M+H]+ from solute molecules in solution has been investigated using two amino acids, alanine and arginine, and a nucleic base, adenine. The data suggest that the protons produced by the sputtering of water ice are depleted in the presence of these solutes and concurrently the yields of solute-related [M+H]+ and immonium secondary ions are greatly enhanced. These yield enhancements are analysed in the light of other possible contributors such as increased rates of sputtering under polyatomic beams and increased secondary ion yields as a consequence of solute dispersion. It is concluded that enhanced proton attachment is occurring in polyatomic sputtered frozen aqueous solutions.     

Sensitivity enhancement using chemically reactive gas cluster ion beams in secondary ion mass spectrometry (SIMS)

We report for the first time on significant molecular secondary ion yield increases by modifying the chemistry of a water cluster primary ion beam. This was demonstrated using 70-keV ion beams of 0.15 eV/amu. For the neutral drug Bezafibrate, secondary ion yield enhancements ×5–10 were observed when replacing the Ar carrier gas in a water gas cluster ion beam (GCIB) source with a mixture containing 12% CO₂ and 2% O₂ in Ar. For the cationic drug Ranitidine, the ion yield enhancements using the CO₂-containing carrier gas were up to ×20–50 in positive mode and ×2–4 in negative mode. The extent of molecular fragmentation was very similar from both cluster beams. We conclude that additional chemically reactive species are present in the impact zone using the (H₂O/CO₂)_n projectile, which promote the formation of secondary ions of both polarity through projectile impact-induced chemical reactions. This methodology can be applied to further extend the capabilities of high-resolution 3-dimensional mass spectral imaging using reactive GCIB-SIMS.     

Sputtering of bismuth thin films under MeV Cu heavy ion irradiation: Experimental data and inelastic thermal spike model interpretation.

The sputtering of bismuth (Bi/Si) thin films deposited onto silicon substrates and irradiated by swift Cu^q+ heavy ions (q = +4 to +7) was investigated by varying both the ion energy over the 10 to 26‐MeV range and the ion fluence ϕ from 5.1 × 10¹³ cm⁻² to 3.4 × 10¹⁵ cm⁻². The sputtering yields were determined experimentally via the Rutherford backscattering spectrometry technique using a 2‐MeV He⁺ ion beam. The measured sputtering yields versus Cu⁷⁺ ion fluence for a fixed incident energy of 26 MeV exhibit a significant depression at very low ϕ‐values flowed by a steady‐state regime above ~1.6 × 10¹⁴ cm⁻², similarly to those previously pointed out for Bi thin films irradiated by MeV heavy ions. By fixing the incident ion fluence to a mean value of ~2.6 × 10¹⁵ cm⁻² in the upper part of the yield saturation regime, the measured sputtering yield data versus ion energy were found to increase with increasing the electronic stopping power in the Bi target material. Their comparison to theoretical predicted models is discussed. A good agreement is observed between the measured sputtering yields and the predicted ones when considering the contribution of 2 competitive processes of nuclear and electronic energy losses via, respectively, the SRIM simulation code and the inelastic thermal spike model using refined parameters of the ion slowing down with reduced thermophysical proprieties of the Bi thin films.     

Molecular depth profiling with cluster ion beams

Peptide-doped trehalose thin films have been characterized by bombardment with energetic cluster ion beams of C60+ and Aux+ (x = 1, 2, 3). The aim of these studies is to acquire information about the molecular sputtering process of the peptide and trehalose by measurement of secondary ion mass spectra during erosion. This system is important since uniform thin films of approximately 300 nm thickness can be reproducibly prepared on a Si substrate, allowing detailed characterization of the resulting depth profile with different projectiles. The basic form of the molecular ion intensity as a function of ion dose is described by a simple analytical model. The model includes parameters such as the molecular sputtering yield, the damage cross section of the trehalose or the peptide, and the thickness of a surface layer altered by the projectile. The results show that favorable conditions for successful molecular depth profiling are achieved when the total sputtering yield is high and the altered layer thickness is low. Successful molecular depth profiles are achieved with all of the cluster projectiles, although the degree of chemical damage accumulation was slightly lower with C60. With C60 bombardment, the altered layer thickness of about 20 nm and the damage cross section of about 5 nm2 are physically consistent with predictions of molecular dynamics calculations available for similar chemical systems. In general, the model presented should provide guidance in optimizing experimental parameters for maximizing the information content of molecular depth profiling experiments with complex molecular thin film substrates.     

Guest‐Directed Supramolecular Architectures of {W36} Polyoxometalate Crowns

The {W₃₆} isopolyoxotungstate cluster provides a stable inorganic molecular platform for the binding of inorganic and organic guest molecules. This is achieved by a binding pocket formed by six terminal oxo ligands located in the central cavity of the all‐inorganic cation binding host. Previously it was shown that the cluster can specifically bind primary amines and importantly, functionalized diamines through a combination of electrostatic and hydrogen bonding interactions. Here we transform this assembly strategy to utilize the binding of long‐chain alkyldiammonium guest cations to physically define the supramolecular structure of the clusters with respect to each other and demonstrate the structure direction as a function of alkyl chain length. The systematic variation of the chain length gives access to five supramolecular assemblies which were all fully characterized using single crystal XRD, TGA, ¹H NMR, and elemental analysis. In compound 1 , diprotonated 1,8‐diaminooctane molecules link the {W₃₆} clusters into infinite 1D zigzag chains, whereas compounds 2 and 3 feature trimeric {W₃₆} assemblies directly connected through protonated 1,9‐diaminononane ( 2 ) or 1,10‐diaminodecane ( 3 ) linkers . Compound 4 contains dumb‐bell shaped dimeric units as a result of direct center‐to‐center linkages between the {W₃₆} clusters formed by protonated 1,12‐diaminododecane. In compound 5 , triply protonated bis(hexamethylene)triamine was employed to obtain linear 1D chains of directly connected {W₃₆} cluster units.     

Secondary ion emission from glycerol under continuous and pulsed primary ion current

Secondary ion intensity from glycerol is measured as a function of 5 keV primary ion current density and is found to be linear over the range 0.1–1 μA cm^?2. The possibility that protonated glycerol, or some other condensed-phase precursor to secondary protonated glycerol, exists in solution and enhances secondary ion emission from glycerol is investigated. Kinetics for formation of such precursors by the primary ion beam are described and evaluated by pulsed primary ion beam experiments. Depletion rates are calculated assuming diffusion from the surface as the major loss mechanism Results of this analysis indicate that the mechanism for secondary emission of protonated glycerol does not involve formation of precursors, e.g. solution-phase protonated glycerol, directly or indirectly by the primary ion beam.     

VAMAS interlaboratory study on organic depth profiling

We present the results of a VAMAS (Versailles project on Advanced Materials and Standards) interlaboratory study on organic depth profiling, in which twenty laboratories submitted data from a multilayer organic reference material. Individual layers were identified using a range of different sputtering species (C₆₀ⁿ⁺, Cs⁺, SF₅⁺ and Xe⁺), but in this study only the C₆₀ⁿ⁺ ions were able to provide truly ‘molecular’ depth profiles from the reference samples. The repeatability of profiles carried out on three separate days by participants was shown to be excellent, with a number of laboratories obtaining better than 5% RSD (relative standard deviation) in depth resolution and sputtering yield, and better than 10% RSD in relative secondary ion intensities. Comparability between laboratories was also good in terms of depth resolution and sputtering yield, allowing useful relationships to be found between ion energy, sputtering yield and depth resolution. The study has shown that organic depth profiling results can, with care, be compared on a day‐to‐day basis and between laboratories. The study has also validated three approaches that significantly improve the quality of organic depth profiling: sample cooling, sample rotation and grazing angles of ion incidence. © Crown copyright 2010.     

Argon cluster size‐dependence of sputtering yields of polymers: molecular weights and the universal equation

An analysis is provided of the data of Cristaudo et al. for the sputtering yields of polystyrene and polymethylmethacrylate by argon cluster ion beams as a function of their molecular weight. This analysis is made using the universal sputtering equation of Seah to evaluate the effect of the end‐group density on the parameter A. This parameter is thought to be related to the average energy per atom (excluding hydrogen) to liberate fragments and it is shown that A decreases as the end‐group density rises in the manner expected. Equations are provided relating A to the molecular weight or the end‐group density that are obeyed for both materials. Copyright © 2014 Crown Copyright.     

Enhancement of the positive secondary ion yield during low‐energy,dual‐beam depth profiling of polytetrafluoroethylene with 1‐keV Cs+

This work documents the behaviour of the positive secondary ion yield of bulk polytetrafluoroethylene (PTFE) under dual‐beam depth profiling conditions employing 1 keV Ar⁺, Cs⁺ and SF₅⁺. A unique chemical interaction is observed in the form of a dramatic enhancement of the positive secondary ion yield when PTFE is dual‐beam profiled with 1 keV Cs⁺. The distinct absence of such an enhancement is noted for comparison on two non‐fluorinated polymers, polyethylene terephthalate (PET) and polydimethylsiloxane (PDMS). The bulk PTFE was probed using 15‐keV, ⁶⁹Ga⁺ primary ions in dual beam mode under static conditions; 1‐keV Ar⁺ (a non‐reactive, light, noble element), Cs⁺ (a heavier metallic ion known to form clusters) and SF₅⁺ (a polyatomic species) served as the sputter ion species. The total accumulated primary ion dose was of the order of 10¹⁵ ions/cm², which is well beyond the static limit. The enhancement of the positive secondary yield obtained when profiling with 1‐keV Cs⁺ far exceeds that obtained when SF₅⁺ is employed. An explanation of this apparent reactive ion effect in PTFE is offered in terms of polarisation of C? F bonds by Cs⁺ in the vicinity of the implantation site thereby predisposing them to facile scission. The formation of peculiar, periodic Cs_xF_y⁺ (where y = x ? 1) and Cs_xC_yF_z⁺ clusters that can extend to masses approaching 2000 amu are also observed. Such species may serve as useful fingerprints for fluorocarbons that can be initiated via pre‐dosing a sample with low‐energy Cs⁺ prior to static 15‐keV Ga⁺ analysis. Copyright © 2005 John Wiley & Sons, Ltd.     

Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials

The International Standard ISO 22415 provides methods to measure sputtering yield volumes of organic test materials using argon cluster ions. The test materials should consist of thin films of known thicknesses between 50 and 1000 nm. The format of the test materials, the measurement of sputtering ion dose, sputtered depth, and reporting requirements for sputtering yield volumes are described.     

Improvements in quantification accuracy of inorganic time‐of‐flight secondary ion mass spectrometric analysis of silicate materials by using C60 primary ions

Time‐of‐flight secondary ion mass spectrometry is a very useful tool for the comprehensive characterization of samples by in situ measurements. A pulsed primary ion beam is used to sputter secondary ions from the surface of a sample and these are then recorded by a time‐of‐flight mass spectrometer. The parallel detection of all elements leads to very efficient sample usage allowing the comprehensive analysis of sub‐micrometre sized samples. An inherent problem is accurate quantification of elemental abundances which mainly stems from the so‐called matrix effect. This effect consists of changes in the sputtering and ionization efficiencies of the secondary neutrals and ions due to different sample compositions, different crystal structure or even different crystallographic orientations. Here we present results obtained using C₆₀ molecules as a new primary ion species for inorganic analyses. The results show an improvement in quantification accuracy of elemental abundances, achieving relative errors as small as the certified uncertainties for the analyzed silicate standards. This improvement is probably due to the different sputter mechanism for C primary ions from that for single atomic primary ions such as Ga⁺, Cs⁺ or Ar⁺. The C cluster breaks up on impact, distributing the energy between its constituent carbon atoms. In this way it excavates nano‐craters, rather than knocking out single atoms or molecules from the surface via a collision cascade, leading to a more reproducible sputter process and much improved quantification. Copyright © 2009 John Wiley & Sons, Ltd.     

Time-of-flight secondary ion mass spectrometry (TOF-SIMS) of polyisoprenes

Polyisoprenes (PIPs) with average molecular weights from 650 to 800,000 Da have been studied by time-of-flight secondary ion mass Spectrometry (TOF-SIMS) in the static mode. Polymer samples were bombarded by argon primary ions, and positive SIMS spectra were collected. Effects of branching and unsaturation in the polymer structure on ion formation were studied. The pendant methyl group showed little tendency to fracture as a cation. In the low mass region, C_nH _2n–1 ⁺ appeared to be more intense than C_nH _2n+1 ⁺ , attributed to the double bond structure of polyisoprene. Additionally, ion formation varied as a function of polymer molecular weight. Cationized intact oligomers and fragments dominate the high mass region. Oligomer distributions were used to calculate average molecular weights for polyisoprenes. A statistical chain scission mechanism was used to qualitatively explain the formation of five clusters within a unique fragmentation pattern. Detailed studies of the cluster structure pointed out that each cluster contained several species having varied degrees of unsaturation. It is believed that double bond rearrangements occur.     

Secondary ion formation of low molecular weight organic dyes in time-of-flight static secondary ion mass spectrometry

Time-of-flight static secondary ion mass spectrometry (TOF-S-SIMS) was used to characterize thin layers of oxy- and thiocarbocyanine dyes on Ag and Si. Apart from adduct ions a variety of structural fragment ions were detected for which a fragmentation pattern is proposed. Peak assignments were confirmed by comparing spectra of dyes with very similar structures. All secondary ions were assigned with a mass accuracy better than 50 ppm. The intensity of molecular ions as well as fragment ions has been studied as a function of the type of organic dye, the substrate, the layer thickness and the type of primary ion. A large yield difference of two orders of magnitude was observed between the precursor ions of cationic carbocyanine dyes and the protonated molecules of the anionic dyes. Fragment ions, on the other hand, yielded similar intensities for both types of dye. As the dye layers deposited on an Ag substrate yielded higher secondary ion intensities than those deposited on a Si substrate, the Ag metal clearly acts as a promoting agent for secondary ion formation. The effect was more pronounced for precursor signals than for fragment ions. The promoting effect decreased as the deposited layer thickness of the organic dye layer was increased.     

Mechanisms of secondary ion emission from self‐assembled monolayers and multilayers

Alkanethiol self‐assembled monolayers/multilayers (SAMs) have been applied as model organic systems with which to investigate secondary ion formation and emission processes during kiloelectronvolt ion bombardment. Self‐assembled monolayer and multilayer films of 11‐mercaptoundecanoic acid capped with 1‐dodecanethiol were prepared on gold‐coated substrates. Samples with varying number of thiolate layers were studied using static secondary ion mass spectrometry to investigate the origin of molecular secondary ions and the influence of surface chemistry and structure. The nature of the thiolate bonding affects the type and abundance of the observed ions. The intensity of atomic and cluster ions derived from the substrate decreases exponentially with increasing number of thiolate overlayers because of losses in transmission through the organic overlayers. Intact molecular and cluster ions can escape from >100 Å below the surface of these structures. The variation of molecular‐ion yields with multilayer thickness suggests that a significant proportion of molecular ions originate from subsurface thiolate layers. The detection of ions comprised species from the substrate or bottom of the multilayer associated with species from the top layer supports the view that chemical association at or near the surface is a viable mechanism of formation for molecular secondary ions. Copyright © 2005 John Wiley & Sons, Ltd.     

Incident angle and energy dependences of low‐energy Ar+ ion sputtering of GaAs/AlAs multilayered system

Dependences of the depth resolution in Auger electron spectroscopy sputter‐depth profiling of a GaAs/AlAs superlattice reference material on the incident angle and energy of primary Ar⁺ ions were investigated. The results revealed that the depth resolution is improved for the lower primary energy as a square root of the primary energy of ions at both the incident angles of 50° and 70° , except for 100 eV at 50° , where the significant deterioration of the depth resolution is induced by the preferential sputtering of As in AlAs, and the difference in the etching rate between GaAs and AlAs. The deterioration of the depth resolution, i.e. the difference in the etching rate and the preferential sputtering, observed for 100 eV at 50° was suppressed by changing the incident angle of ions from 50° to 70° , resulting in the high‐depth resolution of ～1.3 nm. The present results revealed that the glancing incidence of primary ions is effective to not only reducing the atomic mixing but also suppressing the difference in the etching rates between GaAs and AlAs and the preferential sputtering in the GaAs/AlAs multilayered system. The results also suggest that careful attention is required for the optimization of conditions of sputter‐depth profiling using GaAs/AlAs superlattice materials under low‐energy ion irradiation. Copyright © 2009 John Wiley & Sons, Ltd.     

Second hydrogen atom abstraction by molecular ions

We report the observation of a new physical phenomenon of the addition of 2 hydrogen atoms to molecular ions thus forming [M + 2H]⁺ ions. We demonstrate such second hydrogen atom abstraction onto the molecular ions of pentaerythritol and trinitrotoluene (TNT). We used both gas chromatography mass spectrometry (GC‐MS) with supersonic molecular beam (SMB) with methanol added into its make‐up gas and electron ionization (EI) liquid chromatography mass spectrometry (LC‐MS) with SMB with methanol as the LC solvent. We found that the formation of methanol clusters resulted upon EI in the formation of dominant protonated pentaerythritol ion at m/z = 137 plus about 70% relative abundance of pentaerythritol molecular ion with 2 additional hydrogen atoms at m/z = 138 which is well above the 5.7% natural C¹³ isotope abundance of protonated pentaerythritol. Similarly, we found an abundant protonated TNT ion at m/z = 228 and a similar abundance of TNT molecular ion with 2 additional hydrogen atoms at m/z = 229. Upon the use of deuterated methanol (CD₃OD) as the solvent, we observed an abundant m/z = 231 (M + 2D)⁺ of TNT with 2 deuterium atoms. We found such abundant second hydrogen atom abstraction with butylglycolate and at low abundances in dioctylphthalate, Vitamin K3, phenazine, and RDX. At this time, we are unable to report the magnitude and frequency of occurrence of this phenomenon in standard electrospray LC‐MS. This observation could have important implications on the provision of elemental formula from mass spectra that are involved with protonated molecules. Accordingly, while accurate mass measurements can serve for the generation of elemental formula, their further support and improvement via isotope abundance analysis are questionable. Consequently, if a given compound can be analyzed by both GC‐MS and LC‐MS, its GC‐MS analysis can be superior for the provision of accurate elemental formulae if its EI mass spectrum exhibits abundant molecular ions such as with GC‐MS with SMB (also known as cold EI).