Partial dewetting of polyethylene thin films on rough silicon dioxide surfaces

The effect of roughness on the dewetting behavior of polyethylene thin films on silicon dioxide substrates is presented. Smooth and rough silicon dioxide substrates of 0.3 and 3.2-3.9 nm root-mean-square roughness were prepared by thermal oxidation of silicon wafers and plasma-enhanced chemical vapor deposition on silicon wafers, respectively. Polymer thin films of approximately 80 nm thickness were deposited by spin-coating on these substrates. Subsequent dewetting and crystallization of the polyethylene were observed by hot-stage optical microscopy in reflection mode. During heating, the polymer films melt and dewet on both substrates. Further observations after cooling indicate that, whereas complete dewetting occurs on the smooth substrate surface, partial dewetting occurs for the polymer film on the rough surface. The average thickness of the residual film on the rough surface was determined by ellipsometry to be a few nanometers, and the spatial distribution of the polymer in the cavities of the rough surface could be obtained by X-ray reflectometry. The residual film originates from the impregnation of the porous surface by the polymer fluid, leading to the observed partial dewetting behavior. This new type of partial dewetting should have important practical consequences, as most real surfaces exhibit significant roughness.     

Dense passivating poly(ethylene glycol) films on indium tin oxide substrates

We describe the formation and characterization of surface-passivating poly(ethylene glycol) (PEG) films on indium tin oxide (ITO) glass substrates. PEG chains with a molecular weight of 2000 and 5000 D were covalently attached to the substrates in a systematic approach using different coupling schemes. The coupling strategies included the direct grafting with PEG-silane, PEG-methacrylate, and PEG-bis(amine), as well as the two-step functionalization with aldehyde-bearing silane films and subsequent coupling with PEG-bis(amine). Elemental analysis by X-ray photoelectron spectroscopy (XPS) confirmed the successful surface modification, and XPS and ellipsometry provided values for film thicknesses. XPS and ellipsometry thickness values were almost identical for PEG-silane films but differed by up to 400% for the other PEG layers, suggesting a homogeneous layer for PEG-silane but an inhomogeneous distribution for other PEG coatings on the molecularly rough ITO substrates. Atomic force microscopy (AFM) and water contact angle goniometry confirmed the different degrees of surface homogeneity of the polymer films, with PEG-silane reducing the AFM rms surface roughness by 50% and the water contact angle hysteresis by 75% compared to uncoated ITO. The ability of the PEG layers to passivate the substrate against the nonspecific adsorption of biopolymers was tested using fluorescence-labeled immunoglobulin G and DNA oligonucleotides in combination with fluorescence microscopy. The results indicate a positive relationship between film density and homogeneity on one hand and the ability to passivate against biopolymer adhesion on the other hand. The most homogeneous layers prepared with PEG-silane reduced the nonspecific adsorption of fluorescence-labeled DNA by a factor of 300 compared to uncoated ITO. In addition, the study finds that the ratio of film thicknesses derived by ellipsometry and XPS is a useful parameter to quantify the structural integrity of PEG layers on molecularly rough ITO surfaces. The findings may be applied to characterize PEG or other polymeric films on similarly coarse substrates.     

Roughness assessment and wetting behavior of fluorocarbon surfaces

The wetting behavior of fluorocarbon materials has been studied with the aim of assessing the influence of the surface chemical composition and surface roughness on the water advancing and receding contact angles. Diamond like carbon and two fluorocarbon materials with different fluorine content have been prepared by plasma enhanced chemical vapor deposition and characterized by X-ray photoemission, Raman and FT-IR spectroscopies. Very rough surfaces have been obtained by deposition of thin films of these materials on polymer substrates previously subjected to plasma etching to increase their roughness. A direct correlation has been found between roughness and water contact angles while a superhydrophobic behavior (i.e., water contact angles higher than 150° and relatively low adhesion energy) was found for the films with the highest fluorine content deposited on very rough substrates. A critical evaluation of the methods currently used to assess the roughness of these surfaces by atomic force microscopy (AFM) has evidenced that calculated RMS roughness values and actual surface areas are quite dependent on both the scale of observation and image resolution. A critical discussion is carried out about the application of the Wenzel model to account for the wetting behavior of this type of surfaces.     

Facile measurement of polymer film thickness ranging from nanometer to micrometer scale using atomic force microscopy

As many properties of polymer thin films critically depend on their thickness, a convenient and cost‐effective method for precise measurement of film thickness in a wide range is highly desirable. Here, we present a method which enables polymer film thickness, ranging from nanometer to micrometer scale, to be facilely determined by measuring the height of an artificially created film step on smooth substrates with atomic force microscopy (AFM). Three polymeric films (polystyrene, poly(methyl methacrylate) and poly(styrene–ethylene/butylene–styrene) films), spin‐coated on either mica or quartz substrate with thickness ranging from 5.7 nm to 4.4 µm, were employed to demonstrate the procedure and feasibility of our method. The proposed method is particularly suitable for thicker polymer films, thus complementing the traditional AFM ‘tip‐scratch’ method which is generally limited to polymer films of no more than 100 nm thickness. Copyright © 2010 John Wiley & Sons, Ltd.     

Characteristics of thin cellulose ester films spin-coated from acetone and ethyl acetate solutions

Spin-coated films of cellulose acetate (CA), cellulose acetate propionate (CAP), cellulose acetate butyrate (CAB) and carboxymethylcellulose acetate butyrate (CMCAB) have been characterized by ellipsometry, atomic force microscopy (AFM) and contact angle measurements. The films were spin-coated onto silicon wafers, a polar surface. Mean thickness values were determined by means of ellipsometry and AFM as a function of polymer concentration in solutions prepared either in acetone or in ethyl acetate (EA), both are good solvents for the cellulose esters. The results were discussed in the light of solvent evaporation rate and interaction energy between substrate and solvent. The effects of annealing and type of cellulose ester on film thickness, film morphology, surface roughness and surface wettability were also investigated. Electronic supplementary material  The online version of this article (doi:) contains supplementary material, which is available to authorized users.     

ω-substituted long chain alkylphosphonic acids – their synthesis and deposition on metal oxides and subsequent functional group conversion of the deposited compounds

The crystal structure and the surface of alumina layers on silicon wafers were investigated by means of GIWAXS, WAXS, and AFM. Self-assembled monolayers of ω-substituted long-chain alkylphosphonic acids were deposited on alumina and the layer thickness and homogeneity were determined by ellipsometry revealing a dependency of thickness and homogeneity on the nature of the substituent. During the adsorption process surface etching by the phosphonic acid was observed causing an increase in surface roughness. Furthermore, ex post functional group conversions were carried out yielding surface bound azides and rhodanides.     

Polymers grafted from solid surfaces

Monolayers of polymer molecules were generated at the surface of a solid substrate in situ by using self-assembled monolayers of initiator molecules. The layers were characterized by IR-spectroscopy, surface plasmon resonance measurements, ellipsometry, X-ray reflectometry, AFM and neutron reflectometry. Several novel techniques for the photolithographic patterning of the attached films are described. As a potential application for the attached layers the control of adhesion of biological cells to solid substrates is studied.     

Extremely superhydrophobic surfaces with micro- and nanostructures fabricated by copper catalytic etching

We demonstrate a simple method for the fabrication of rough silicon surfaces with micro- and nanostructures, which exhibited superhydrophobic behaviors. Hierarchically rough silicon surfaces were prepared by copper (Cu)-assisted chemical etching process where Cu nanoparticles having particle size of 10-30 nm were deposited on silicon surface, depending on the period of time of electroless Cu plating. Surface roughness was controlled by both the size of Cu nanoparticles and etching conditions. As-synthesized rough silicon surfaces showed water contact angles ranging from 93° to 149°. Moreover, the hierarchically rough silicon surfaces were chemically modified by spin-coating of a thin layer of Teflon precursor with low surface energy. And thus it exhibited nonsticky and enhanced hydrophobic properties with extremely high contact angle of nearly 180°.     

Preparation and characterization of thin films of SiO(x) on gold substrates for surface plasmon resonance studies

We report here on the fabrication and characterization of stable thin films of amorphous silica (SiO(x)) deposited on glass slides coated with a 5 nm adhesion layer of titanium and 50 nm of gold, using the plasma-enhanced chemical vapor deposition (PECVD) technique. The resulting surfaces were characterized using atomic force microscopy (AFM), ellipsometry, contact angle measurements, and surface plasmon resonance (SPR). AFM analysis indicates that homogeneous films of silica with low roughness were formed on the gold surface. The deposited silica films showed excellent stability in different solvents and in piranha solution. There was no significant variation in the thickness or in the SPR signal after these harsh treatments. The Au/SiO(x) interfaces were investigated for their potential applications as new surface plasmon resonance sensor chips. Silica films with thicknesses up to 40 nm allowed visualization of the surface plasmon effect, while thicker films resulted in the loss of the SPR characteristics. SPR allowed further the determination of the silica thickness and was compared to ellipsometric results. Chemical treatment of the SiO(x) film with piranha solution led to the generation of silanol surface groups that have been coupled with a trichlorosilane.     

Surface structure and photoluminescence properties of AZO thin films on polymer substrates

Al‐doped zinc oxide (AZO) thin films were deposited on indium tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by radio frequency (RF) magnetron sputtering method at room temperature. The effects of film thickness on the surface structure and the photoluminescence properties of the films were investigated by atomic force microscopy (AFM), secondary ion mass spectroscopy (SIMS) and room temperature photoluminescence (PL). AFM analysis showed that the surface of all films was extremely flat and uniform at nanoscale. Root mean square (RMS) value of the surface roughness which scanned the surface area of 3 µm by 3 µm and grain size increased with increasing the film thickness. Thus, the surface morphology of the films became rough because of the coarse grains. The depth profile of AZO layers was analyzed by SIMS. It was found that the thickness of the AZO layer is almost same with the desired film thickness. The PL intensity of the dominant peak decreased and shifted slightly towards the shorter wavelengths with increasing the film thickness. According to the relationships between luminescence intensity and crystalline characteristics, it was observed that the intensity of the peak decreased by the increased surface area of the grains. Copyright © 2014 John Wiley & Sons, Ltd.     

Hydrogel characteristics of electron-beam-immobilized poly(vinylpyrrolidone) films on poly(ethylene terephthalate) supports

A novel strategy for the preparation of thin hydrogel coatings on top of polymer bulk materials was elaborated for the example of poly(ethylene terephthalate) (PET) surfaces layered with poly(vinylpyrrolidone) (PVP). PVP layers were deposited on PET foils or SiO2 surfaces (silicon wafer or glass coverslips) precoated with PET and subsequently cross-linked by electron beam treatment. The obtained films were characterized by ellipsometry, X-ray photoelectron spectroscopy, infrared spectroscopy in attenuated total reflection, atomic force microscopy (AFM), and electrokinetic measurements. Ellipsometric experiments and AFM force-distance measurements showed that the cross-linked layers swell in aqueous solutions by a factor of about 7. Electrokinetic experiments indicated a strong hydrodynamic shielding of the charge of the underlying PET layer by the hydrogel coatings and further proved that the swollen films were stable against shear stress and variation of pH. In conclusion, electron beam cross-linking ofpreadsorbed hydrophilic polymers permits a durable fixation of swellable polymer networks on polymer supports which can be adapted to materials in a wide variety of shapes.     

Fabrication and characterization of plasma processed surfaces with tuned wettability

Engineered surfaces with controlled hydrophilic/ hydrophobic character have been fabricated by tailoring the substrate topography and chemistry. In this method, the substrate to be treated was first coated by a photoresist, which was then surface-roughened using SF6 plasma etching. The resulting rough texture was then transferred to the underlying silicon surface by over-etching of the photoresist. At this point, the topographically modified surface was modified chemically by controlled deposition of a thin polymer layer using plasma processing. In this way, both the surface texture and the surface chemistry could be varied independently, producing surfaces with variable wetting character, including super-hydrophilicity and super-hydrophobicity, depending on the choice of plasma polymer deposited. Chemical characterization demonstrates a correlation between the surface chemistry and the wettability of the samples after etching. The surface elementary composition contained more C-F groups as the measured contact angle increased, indicating that the change of wettability is due to both the roughness and the surface energy of the deposited photoresist. In the case of materials deposited on the plasma-treated rough surfaces, the strengthening of the wetting character is only due to the created surface roughness, as XPS analyses showed no significant chemical difference as compared to the flat polymer.     

Covalent immobilization of chitosan on surfaces with anchoring layers of poly(glycidyl methacrylate) and maleic anhydride copolymers

The method for producing chitosan coatings on solid surfaces with anchoring layers of poly(glycidyl methacrylate) and maleic anhydride copolymers has been proposed. It is shown that, owing to a high reactivity of epoxy and anhydride groups, the efficiency of immobilization and the stability of the coatings are considerably higher than those prepared by the conventional method of chitosan grafting onto the surface modified by poly(acrylic acid). The properties of chitosan coatings are examined via atomic force microscopy, X-ray photoelectron spectroscopy, ellipsometry, and electrokinetic measurements. Depending on the anchoring layer used, the total thickness of the coatings is 6–16 nm with an rms roughness less than 1.2 nm, while the isoelectric points of the surfaces modified with chitosan are located in the pH range 5–6.     

Stability of monomolecular films of archaebacterial tetraether lipids on silicon wafers: a comparison of physisorbed and chemisorbed monolayers

The monomolecular organisation of symmetric, chemically modified tetraether lipids caldarchaeol-PO(4) was studied using Langmuir film balance, ellipsometry, and atomic force microscopy (AFM). Solid silicon wafer substrates were modified to hydrophobic, hydrophilic, and amino-silanised surfaces; and Langmuir-Blodgett (LB)-films were transferred onto each. LB-caldarchaeol-PO(4) films were subjected to further rinsing with organic solvent and additional physical treatments, to compare their resistance and stability on chemisorbed (amino-silanised) and physisorbed (hydrophobic and hydrophilic) surfaces. The resistance and stability of these monolayer films was characterized by ellipsometry and AFM, and film thickness was determined using ellipsometry. AFM was also employed to observe surface morphology. Monolayer films on hydrophobic surfaces were found to be more resistant to rinsing with organic solvent and additional physical treatments than monolayer films on either amino-silanised or hydrophilic surfaces. The hydrophobic effect with hydrophobic surfaces appears to support the formation of stronger caldarchaeol-PO(4) films on silicon wafer substrates, with increased resistance and stability.     

Probing structural changes of spin-coated polystyrene film after swelling and precipitation by synchrotron GIUSAXS and AFM

Polystyrene film of about 50 nm in thickness on silicon wafer was obtained by spin-coating in tetrahydrofuran solution. The film exhibits a rough surface as shown by atomic force microscopy images and ellipsometry data. Furthermore, such surface roughness produced a characteristic lateral correlation peak in an “out-ofplane” scan in the synchrotron grazing incidence ultra-small angle X-ray scattering pattern. The film was treated with liquids of solvent and non-solvent sequentially, resulting in a process of swelling and precipitation of the polystyrene film. Such a solvent/non-solvent treatment completely changed the original surface structure of the film. Aggregates of polystyrene of different sizes were observed both in atomic force microscopy and synchrotron grazing incidence ultra-small angle X-ray scattering measurements. The results demonstrate that synchrotron grazing incidence ultra-small angle X-ray scattering is a unique means to investigate large area micro-structural features of thin films supported on smooth surfaces.     

Characterization of Ultrathin Films of Cellulose Esters

The adsorption of cellulose acetate (CA), cellulose acetate propionate (CAP) and cellulose acetate butyrate (CAB) from solutions prepared in acetone onto silicon wafers led to ultrathin films, which were characterized by ellipsometry, atomic force microscopy (AFM) and contact angle measurements. The polysaccharides films were characterized in the air just after their formation and after annealing at temperatures higher than their glass transition temperature or melt temperature. The films thickness close to 2 nm and surface roughness did not vary significantly upon annealing. AFM images revealed the presence of small clumps dispersed on a homogeneous layer, which covered completely the Si wafers. Such topographic details were also observed after annealing. However, upon annealing the films surfaces changed from hydrophilic to hydrophobic, evidencing molecular re-orientation at the solid–air interface. The adhesion of bovine serum albumin (BSA) and lipase onto the cellulose esters films was quantified in order to evaluate the possibility of applying such films as selective support for biomolecules.     

Preparation of Poly(acrylic acid) Nano-films by In-situ Polymerization of Acrylic Acid Macroclusters on Silicon Oxide Surfaces

A new method for preparing poly(acrylic acid) (PAA) films on silicon oxide surfaces with smooth morphology has been developed. Acrylic acid (AA) was preferably adsorbed on silicon oxide surfaces in AA/ chloroform binary liquids and formed a hydrogen-bonded organized structure, which was called molecular macrocluster. AA macroclusters on silicon oxide surfaces were in-situ polymerized to obtain molecularly flat polymer films with thickness up to 10 nm. In-situ polymerizations were conducted by photo-irradiation in the presence of a photo initiator, 2,2-dimethoxy-2-phenylacetophenone (DPA). As a reference, the adsorption of PAA polymerized in the bulk solution was examined on silicon oxide surfaces. A series of techniques such as attenuated total reflection–FTIR (ATR-FTIR) spectroscopy, ellipsometry and atomic force microscopy (AFM) was utilized for characterizing two types of films. It was found that flat PAA films with linear hydrogen-bonded COOH could only be obtained by in-situ polymerization, which demonstrated this method was an effective way for preparing molecularly uniform polymer films. The surface morphology and thickness of obtained PAA films were found to be dependent on the monomer concentration, initiator amount and photoirradiation time. Molecularly uniform and flat PAA films were obtained after 5 min irradiation at 0.8 mol% AA in the presence of 5 wt% DPA.     

Lectins and/or xyloglucans/alginate layers as supports for immobilization of dengue virus particles

Formation of stable thin films of mixed xyloglucan (XG) and alginate (ALG) onto Si/SiO(2) wafers was achieved under pH 11.6, 50mM CaCl(2), and at 70 degrees C. XG-ALG films presented mean thickness of (16+/-2)nm and globules rich surface, as evidenced by means of ellipsometry and atomic force microscopy (AFM), respectively. The adsorption of two glucose/mannose-binding seed (Canavalia ensiformis and Dioclea altissima) lectins, coded here as ConA and DAlt, onto XG-ALG surfaces took place under pH 5. Under this condition both lectins present positive net charge. ConA and DAlt adsorbed irreversibly onto XG-ALG forming homogenous monolayers approximately (4+/-1)nm thick. Lectins adsorption was mainly driven by electrostatic interaction between lectins positively charged residues and carboxylated (negatively charged) ALG groups. Adhesion of four serotypes of dengue virus, DENV (1-4), particles to XG-ALG surfaces were observed by ellipsometry and AFM. The attachment of dengue particles onto XG-ALG films might be mediated by (i) H bonding between E protein (located at virus particle surface) polar residues and hydroxyl groups present on XG-ALG surfaces and (ii) electrostatic interaction between E protein positively charged residues and ALG carboxylic groups. DENV-4 serotype presented the weakest adsorption onto XG-ALG surfaces, indicating that E protein on DENV-4 surface presents net charge (amino acid sequence) different from E proteins of other serotypes. All four DENV particles serotypes adsorbed similarly onto lectin films adsorbed. Nevertheless, the addition of 0.005mol/L of mannose prevented dengue particles from adsorbing onto lectin films. XG-ALG and lectin layers serve as potential materials for the development of diagnostic methods for dengue.     

Preparation, structure, and optical properties of nanoporous gold thin films

Thin nanoporous gold (np-Au) films, ranging in thickness from approximately 40 to 1600 nm, have been prepared by selective chemical etching of Ag from Ag/Au alloy films supported on planar substrates. A combination of scanning electron microscopy (SEM) imaging, synchrotron grazing incidence small angle X-ray scattering, and N2 adsorption surface area measurements shows the films to exhibit a porous structure with intertwined gold fibrils exhibiting a spectrum of feature sizes and spacings ranging from several to hundreds of nanometers. Spectroscopic ellipsometry measurements (300-800 nm) reveal the onset of surface plasmon types of features with increase of film thicknesses into the approximately 200 nm film thickness range. Raman scattering measurements for films functionalized with a self-assembled monolayer formed from 4-fluorobenzenethiol show significant enhancements which vary sharply with film thickness and etching times. The maximum enhancement factors reach approximately 10(4) for 632.8 nm excitation, peak sharply in the approximately 200 nm thickness range for films prepared at optimum etching times, and show high spot to spot reproducibility with approximately 1 microm laser spot sizes, an indication that these films could be useful as durable, highly reproducible surface-enhanced Raman substrates.     

Molecular orientation and film morphology of pentacene on native silicon oxide surface

The growth morphology and mechanism of pentacene films on native Si oxide surface have been studied by using high-resolution electron energy loss spectroscopy (HREELS), X-ray diffraction (XRD), and atomic force microscopy (AFM). Despite the good agreement between our own and the reported XRD results, the previous XRD interpretation that the pentacene molecules are tilt-standing on the substrate cannot explain our HREELS data. The HREELS results show that a substantial portion of the first two layers of pentacene molecules are tilted-standing or randomly oriented, whereas the upper-layer molecules are mostly lying flat to the substrate. AFM reveals that the first two layers of molecules form a flat and smooth surface, but the upper layers show a rough terrace structure with a mean-square roughness equal to the average thickness (without counting the first two layers). This relationship is explained by a theoretical model which assumes the pentacene molecules to remain on a particular molecule layer after arrival. The observed film growth morphology may have significant implication on the performance of electronic devices based on pentacene thin films. A plausible explanation was proposed for the discrepancy between the HREELS-indicated and the XRD-derived molecular orientations.