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1.
《Surface and interface analysis : SIA》2006,38(7):1173-1175
ISO Technical Report 18392 provides the guidance for determining backgrounds in X‐ray photoelectron spectra. The methods of background determination described in this report are applicable for the quantitative evaluation of the spectra of photoelectrons and Auger electrons excited by X‐rays from solid surfaces and surface nanostructures. Copyright © 2006 John Wiley & Sons, Ltd. 相似文献
2.
《Surface and interface analysis : SIA》2004,36(7):666-667
ISO Technical Report 19319:2003 contains information on the determination of lateral resolution, analysis area and sample area viewed by the analyser in surface analyses by Auger electron spectroscopy and x‐ray photoelectron spectroscopy. This article provides a brief summary of this information. Copyright © 2004 John Wiley & Sons, Ltd. 相似文献
3.
C. J. Powell 《Surface and interface analysis : SIA》2007,39(5):464-466
This article is a brief summary of the ISO Standard 20903. This standard provides information on methods for the measurement of peak intensities in Auger electron and X‐ray photoelectron spectra and on uncertainties of the derived peak areas. It also specifies the necessary information required in a report of analytical results based on such measurements. Published in 2007 by John Wiley & Sons, Ltd. 相似文献
4.
《Surface and interface analysis : SIA》2005,37(5):524-526
International Standard ISO 19318 specifies the minimum amount of information describing the methods of charge control and charge correction in measurements of core‐level binding energies for insulating specimens by x‐ray photoelectron spectroscopy, which is to be reported with the analytical results. Information is also provided on methods that have been found useful for charge control and charge correction in the measurement of binding energies. Copyright © 2005 John Wiley & Sons, Ltd. 相似文献
5.
J. Wolstenholme 《Surface and interface analysis : SIA》2008,40(5):966-968
This International Standard describes three methods for measuring the lateral resolution achievable in Auger electron spectrometers and X‐ray photoelectron spectrometers under defined settings. The straight‐edge method is suitable for instruments where the lateral resolution is expected to be larger than 1 µm. The grid method is suitable if the lateral resolution is expected to be less than 1 µm but more than 20 nm. The gold‐island method is suitable for instruments where the lateral resolution is expected to be less than 50 nm. The standard contains three informative annexes that provide illustrative examples of measurements of lateral resolution. Copyright © 2008 John Wiley & Sons, Ltd. 相似文献
6.
《Surface and interface analysis : SIA》2006,38(3):178-180
ISO 18118 provides guidance on the measurement and use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials by Auger electron spectroscopy (AES) and X‐ray photoelectron spectroscopy (XPS). This article provides a brief summary of this International Standard. Copyright © 2005 John Wiley & Sons, Ltd. 相似文献
7.
M. P. Seah 《Surface and interface analysis : SIA》2007,39(1):86-88
This International Standard specifies a method for evaluating the constancy and repeatability of the intensity scale of Auger electron spectrometers, for general analytical purposes, using an electron gun with a beam energy of 2 keV or greater. It is only applicable to instruments that incorporate an ion gun for sputter cleaning. It is not intended to be a calibration of the intensity/energy response function. 1 , 2 That calibration may be made by the instrument manufacturer or other organization. The present procedure provides data to evaluate and confirm the accuracy with which the intensity/energy response function remains constant with instrument usage. Guidance is given to some of the instrumental settings that may affect this constancy. © Crown Copyright 2006. Reproduced with the permission of the Controller of HMSO. 相似文献
8.
《Surface and interface analysis : SIA》2004,36(13):1645-1646
This International Standard specifies two methods for determining the maximum count rate for an acceptable limit of divergence from linearity of the intensity scale of Auger and x‐ray photoelectron spectrometers. It also includes methods to correct for intensity non‐linearities so that a higher maximum count rate can be employed for those spectrometers for which the relevant correction equations have been shown to be valid. Copyright © 2004 John Wiley & Sons, Ltd. 相似文献
9.
《Surface and interface analysis : SIA》2003,35(3):329-330
This International Standard specifies a method for calibrating the kinetic energy scale of Auger electron spectrometers with an uncertainty of 3 eV for general analytical use for identifying elements at surfaces. It is suitable for instruments used in either the direct mode or the differential mode where the resolution is equal to or less than 0.5% and the modulation amplitude for the differential mode, if used, is 2 eV peak to peak. The spectrometer shall be equipped with an inert gas ion gun or other method for sample cleaning and with an electron gun capable of operating at 4 keV or higher beam energy. This International Standard further specifies a calibration schedule. Crown Copyright © 2003. Published by John Wiley & Sons, Ltd. 相似文献
10.
《Surface and interface analysis : SIA》2003,35(3):327-328
This International Standard specifies a method for calibrating the kinetic energy scales of Auger electron spectrometers for elemental and chemical‐state analysis at surfaces. It is only applicable to instruments that incorporate an ion gun for sputter cleaning. This International Standard further specifies a method to establish a calibration schedule, to test for the kinetic energy scale linearity at one intermediate energy, to confirm the uncertainty of the scale calibration at one low and one high kinetic energy value, to correct for small drifts of that scale and to define the expanded uncertainty of the calibration of the kinetic energy scale for a confidence level of 95%. This uncertainty includes contributions for behaviours observed in interlaboratory studies but does not cover all of the defects that could occur. This International Standard is not applicable to instruments with kinetic energy scale errors that are significantly non‐linear with energy, to instruments operated at relative resolutions poorer than 0.2% in the constant ΔE/E mode or poorer than 1.5 eV in the constant ΔE mode, to instruments requiring tolerance limits of ±0.05 eV or less or to instruments equipped with an electron gun that cannot be operated in the energy range 5–10 keV. This standard does not provide a full calibration check, which would confirm the energy measured at each addressable point on the energy scale and should be performed according to the manufacturer's recommended procedures. Crown Copyright © 2003. Published by John Wiley & Sons, Ltd. 相似文献
11.
D. R. Baer 《Surface and interface analysis : SIA》2011,43(11):1444-1447
This international standard specifies the minimum amount of information required for describing the methods of charge control and charge correction in measurements of Auger electron transitions from insulating specimens by electron‐stimulated AES to be reported with the analytical results. Information is provided in an Annex on methods that have been found useful for charge control prior to or during AES analysis. The Annex also includes a summary table of methods or approaches, ordered by simplicity of approach. A similar international standard has been published for XPS (ISO 19318: 2003(E), Surface chemical analysis—XPS—reporting of methods used for charge control and charge correction. Copyright © 2010 John Wiley & Sons, Ltd. 相似文献
12.
M. P. Seah 《Surface and interface analysis : SIA》2007,39(4):367-369
This International Standard adds 5 abbreviations and 71 terms, many for glow discharge spectrometry, to the 340 defined terms for surface chemical analysis in ISO 18115:2001. The terms cover words or phrases used in describing the samples, instruments and theoretical concepts involved in surface chemical analysis. Copyright © 2006 John Wiley & Sons, Ltd. 相似文献
13.
M. P. Seah 《Surface and interface analysis : SIA》2007,39(4):370-372
This International Standard specifies a method for evaluating the repeatability and constancy of the intensity scale of X‐ray photoelectron spectrometers, for general analytical purposes, using non‐monochromated Al or Mg X‐rays or monochromated Al X‐rays. It is only applicable to instruments that incorporate an ion gun for sputter cleaning. It is not intended to be a calibration of the intensity/energy response function (Seah MP. J. Electron Spectrosc. 1995; 71: 191; http://www.npl.co.uk/nanoanalysis/a1calib.html [2006]). That calibration may be made by the instrument manufacturer or other organization. The present method provides data to evaluate and confirm the accuracy with which the intensity/energy response function remains constant with instrument usage. Guidance is given to some of the instrument settings that may affect this constancy. Copyright © 2006 John Wiley & Sons, Ltd. 相似文献
14.
《Surface and interface analysis : SIA》2018,50(8):835-838
ISO/TR 19693:2018—Surface chemical analysis—Characterization of functional glass substrates for biosensing applications gives an overview of methods, strategies, and guidance to identify possible sources of problems related to substrates, device production steps (cleaning, activation, and chemical modification), and shelf life (storage conditions and aging). It is particularly relevant for surface chemical analysts characterizing glass‐based biosensors, and developers or quality managers in the biosensing device production community. Based on quantitative and qualitative surface chemical analysis, strategies for identifying the cause of poor performance during device manufacturing can be developed and implemented. A review of measurement capabilities of surface analytical methods is given to assist readers from the biosensing community. 相似文献
15.
《Surface and interface analysis : SIA》2018,50(1):87-89
This International Standard specifies a procedure by which elemental detection limits in X‐ray photoelectron spectroscopy (XPS) can be estimated from data for a particular sample in common analytical situations and reported. This document is applicable to homogeneous materials and is not applicable if the depth distribution of elements is inhomogeneous within the information depth of the technique. 相似文献
16.
《Surface and interface analysis : SIA》2004,36(13):1642-1644
This International Standard provides a digital format to store and transfer between computers, in a compact way, important calibration and instrumental parameter data necessary to make effective use of spectral data files from static SIMS instruments. This format is designed to supplement the data transfer format specified in ISO 14976. Copyright © 2004 John Wiley & Sons, Ltd. 相似文献
17.
M. P. Seah 《Surface and interface analysis : SIA》2012,44(7):876-878
This International Standard specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X‐ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X‐ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that may be restricted to less than a 6° cone semiangle. For thermal oxides in the range 1‐ to 8‐nm thickness, using the best method described in this International Standard, uncertainties at a 95% confidence level around 2% may be typical and around 1% at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties. Copyright © 2012 Crown copyright. 相似文献
18.
M. P. Seah 《Surface and interface analysis : SIA》2008,40(11):1500-1502
This International Standard adds a further 87 terms to this Vocabulary series, many for secondary ion mass spectrometry, elastic peak electron spectroscopy and reflected electron energy loss spectroscopy, together with 76 acronyms for scanned probes, 33 definitions of scanned probe techniques, 6 terms for contact mechanics and 147 terms for concepts in scanned probe analysis. This brings the total number of terms and acronyms to over 750 in these documents. The terms cover words or phrases used in describing the samples, instruments and theoretical concepts involved in surface chemical analysis. Copyright © 2008 John Wiley & Sons, Ltd. 相似文献
19.
《Surface and interface analysis : SIA》2006,38(3):171-172
This International Standard specifies a method of determining relative sensitivity factors (RSFs) for secondary ion mass spectrometry (SIMS) from ion‐implanted reference materials. The method is applicable to specimens in which the matrix is of uniform chemical composition, and in which the peak concentration of the implanted species does not exceed one atomic percent. Published in 2006 by John Wiley & Sons, Ltd. 相似文献
20.
Martin P. Seah 《Surface and interface analysis : SIA》2014,46(5):361-364
Amendments have been made to International Standard ISO 18115‐2:2010, extending the number of terms and, in a few cases where usage has changed, incorporating revisions. Part 2 covers 277 terms used in scanning probe microscopy as well as 98 acronyms. The terms cover words or phrases used in describing the samples, instruments and theoretical concepts involved. © 2014 Crown copyright. Surface and Interface Analysis © 2014 John Wiley & Sons, Ltd. 相似文献