Oxidation of Zircaloy-4 by H2O followed by molecular desorption

The interaction of H₂O with Zircaloy-4 (Zry-4) is investigated using Auger electron spectroscopy (AES) and temperature programmed desorption (TPD) methods. Following adsorption of H₂O at 150 K the Zr(MNV) and Zr(MNN) Auger features shift by ∼6.5 and 4.5 eV, respectively, indicating surface oxidation. Heating H₂O/Zry-4 results in molecular desorption of water at both low and high temperatures. The low-temperature desorption is attributed to ice multilayers, whereas, three overlapping high-temperature features are presumably due to recombinative desorption. This high-temperature desorption begins before the surface oxide is dissolved, continues upon its removal, and is atypical for water/metal systems. Unexpectedly, no significant desorption of hydrogen is observed near 400 K, as is typically observed following O₂ adsorption on Zr-based materials. However, we do observe that H₂O adsorption on Zry-4 surfaces roughened by argon ion sputtering results in H₂ desorption.     

The decomposition of formic acid on Ru(101̄0)

The decomposition of formic acid was studied on a clean Ru(101̄0) surface adsorption temperature between 100 and 460 K by means of flash thermal desorption. The decomposition products observed were H₂, CO₂, H₂O and CO. HCOOH itself was also desorbed, although at low exposures no formic acid was observed. The H₂ and CO₂ products were desorbed in identical first order peaks, with a peak temperature of 395 K. The H₂O product desorbed in a second order peak at 813 K, in contrast to H₂O desorption from low coverage H₂O adsorption which occurs in two peaks in the region of 220 and 265 K. The CO product desorbed in a first order peak at 488 K, identical to CO from CO adsorption. The dependence of the product peaks on adsorption temperature of the Ru surface was also studied. These results suggest a model involving the formation and decomposition of a surface intermediate species.     

Adsorption of H2O on Al(111)

The adsorption of H₂O on Al(111) has been studied by ESDIAD (electron stimulated desorption ion angular distributions), LEED (low energy electron diffraction), AES (Auger electron spectroscopy) and thermal desorption in the temperature range 80–700 K. At 80 K, H₂O is adsorbed predominantly in molecular form, and the ESDIAD patterns indicate that bonding occurs through the O atom, with the molecular axis tilted away from the surface normal. Some of the H₂O adsorbed at 80 K on clean Al(111) can be desorbed in molecular form, but a considerable fraction dissociates upon heating into OH_ads and hydrogen, which leaves the surface as H₂. Following adsorption of H₂O onto oxygen-precovered Al(111), additional OH_ads is formed upon heating (perhaps via a hydrogen abstraction reaction), and H₂ desorbs at temperatures considerably higher than that seen for H₂O on clean Al(111). The general behavior of H₂O adsorption on clean and oxygen-precovered Al(111) (θ_O ? monolayer) is rather similar at low temperature, but much higher reactivity for dissociative adsorption of H₂O to form OH _adsis noted on the oxygen-dosed surface around room temperature.     

Interaction of PH3 coadsorbed with H2, D2, O2 and H2O on Rh(100)

The coadsorption of PH₃ with H₂, D₂, O₂ and H₂O on Rh(100) has been studied using temperature programmed desorption (TPD), Auger electron spectroscopy (AES) and low energy electron diffraction (LEED). The adsorption and molecular desorption of PH₃ is not affected by preadsorbed H₂, D₂ and O₂. Preadsorbed PH₃ blocks H₂ desorption sites while postdosed PH₃ displaces H₂ (D₂₁) from the Rh(100). When D₂ and PH₃ are coadsorbed, no D appears in desorbed phosphine. Preadsorbed O₂ reduces the amount of H₂ desorption (from PH₃ decomposition) and increases the H₂ desorption temperature. There is also some reaction between O(a) and H(a) to form water. Preexposure to H₂O decreases the extent of PH₃ adsorption and of PH₃ decomposition.     

The adsorption of hydrogen and the reaction of hydrogen with oxygen on Pt (100)

The adsorption of hydrogen on Pt (100) was investigated by utilizing LEED, Auger electron spectroscopy and flash desorption mass spectrometry. No new LEED structures were found during the adsorption of hydrogen. One desorption peak was detected by flash desorption with a desorption maximum at 160 °C. Quantitative evaluation of the flash desorption spectra yields a saturation coverage of 4.6 × 10¹⁴ atoms/cm² at room temperature with an initial sticking probability of 0.17. Second order desorption kinetics was observed and a desorption energy of 15–16 kcal/mole has been deduced. The shapes of the flash desorption spectra are discussed in terms of lateral interactions in the adsorbate and of the existence of two substates at the surface. The reaction between hydrogen and oxygen on Pt (100) has been investigated by monitoring the reaction product H₂O in a mass spectrometer. The temperature dependence of the reaction proved to be complex and different reaction mechanisms might be dominant at different temperatures. Oxygen excess in the gas phase inhibits the reaction by blocking reactive surface sites. At least two adsorption states of H₂O have to be considered on Pt (100). Desorption from the prevailing low energy state occurs below room temperature. Flash desorption spectra of strongly bound H₂O coadsorbed with hydrogen and oxygen have been obtained with desorption maxima at 190 °C and 340 °C.     

三甲基镓在Pd(111)表面吸附解离及表面预吸附H和O的影响

利用X-射线光电子能谱（XPS）和程序升温脱附谱（TPD）研究了三甲基镓在Pd（111）表面的吸附和解离行为,并考察了表面预吸附H和O的影响。结果表明,在吸附温度为140 K时,三甲基镓在Pd（111）上主要为解离吸附,此时表面物种为Ga（CH₃）_x （x=1,2,3）和CH_x物种。加热将导致Ga的甲基化合物中的Ga-C键发生分步断裂,在不同温度下产生CH₄和H₂从表面脱附。同时,XPS结果证实了在275~325 K的温度区间内存在Ga甲基化合物的分子脱附。退火至更高温度,表面只观察到积碳和金属Ga物种,这二者随着温度的继续升高逐渐向体相扩散。在Pd（111）表面预吸附O和H对上述吸附和解离行为存在显著的影响。当表面预吸附H时,脱附产物CH₄和H₂的脱附主要位于315 K,可归属为一甲基镓的解离脱附。当表面预吸附O时,只在258 K观察到CH₄和H₂的脱附峰,可能来自于Pd-O-Ga（CH₃）₂吸附结构的解离.     

Dimethyl methylphosphonate decomposition on fully oxidized and partially reduced ceria thin films

The thermal decomposition of dimethyl methylphosphonate (DMMP) on crystalline ceria thin films grown on Ru(0 0 0 1) was studied by temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS) and infrared absorption reflection spectroscopy (IRAS). TPD experiments show that methanol and formaldehyde desorb as the two main products at 575 K, while water, formaldehyde and CO are produced above 800 K. IRAS studies demonstrate that DMMP adsorbs via the phosphoryl oxygen at 200 K, but the PO bond converts to a bridging OPO species at 300 K. DMMP decomposition initially occurs via POCH₃ bond scission to form methyl methylphosphonate (MMP) and methyl phosphonate (MP) between 300 and 500 K; XPS and IRAS data are consistent with a methoxy intermediate on the surface at these temperatures. The more stable PCH₃ bonds remain intact up to 700 K, and the only surface intermediate at higher temperatures is believed to be PO_x. Although the presence of PO_x decreases activity for DMMP decomposition, some activity on the ceria surface remains even after 7 cycles of adsorption and reaction. The ceria films become reduced by multiple DMMP adsorption-reaction cycles, with the Ce⁺⁴ content dropping to 30% after seven cycles. Investigations of DMMP reaction on reduced ceria surfaces show that CO and H₂ are produced in addition to methanol and formaldehyde. Furthermore, DMMP decomposition activity on the reduced ceria films is almost completely inhibited after only 3 adsorption-reaction cycles. Similarities between DMMP and methanol chemistry on the ceria films suggest that methoxy is a key surface intermediate in both reactions.     

Exploring the mechanism of NO–C2H4 reactions on the surface of stepped Pt(3 3 2)

Fourier transform infra red reflection–absorption spectroscopy (FTIR-RAS), thermal desorption spectroscopy (TDS), and auger electron spectroscopy (AES), were employed to explore the mechanism of NO reduction in the presence of C₂H₄ on the surface of stepped Pt(3 3 2). Both NO–Pt and C₂H₄–Pt interactions are enhanced when NO and C₂H₄ are co-adsorbed on Pt(3 3 2). As a result, C₂H₄ is dissociated at surface temperatures as low as 150 K, and the N–O stretch band is weakened. The presence of post-exposed C₂H₄ leads NO desorption from steps to decrease significantly, but the same effect on NO desorption from terraces becomes appreciable only at higher post-exposures of C₂H₄, e.g., 0.6 L and 1.2 L, and proceeds to a much slighter extent. Auger spectra indicate that as a result of the reaction with O from NO dissociation, the amount of surface C species is greatly reduced when NO is post-exposed to a C₂H₄ adlayer. It is concluded that reduction of NO in the presence of C₂H₄ proceeds very effectively on the surface of the Pt(3 3 2), through a mechanism of NO dissociation and subsequent O removal. Following this mechanism, the significant dissociation of adsorbed NO molecules on steps at surface temperatures below 400 K, and subsequent rapid reaction between the resultant O and C-related species, accounts for the considerable amount of N₂ desorption at temperatures below 400 K.     

The adsorption of CO,H2, H2, CO2 and H2O on carburized and graphitized Ni(110)

A study of the adsorption/desorption behavior of CO, H₂O, CO₂ and H₂ on Ni(110)(4 × 5)-C and Ni(110)-graphite was made in order to assess the importance of desorption as a rate-limiting step for the decomposition of formic acid and to identify available reaction channels for the decomposition. The carbide surface adsorbed CO and H₂O in amounts comparable to the clean surface, whereas this surface, unlike clean Ni(110), did not appreciably adsorb H₂. The binding energy of CO on the carbide was coverage sensitive, decreasing from 21 to 12 $\text{kcal}\text{mol}$ as the CO coverage approached 1.1 × 10¹⁵ molecules cm^?2 at 200K. The initial sticking probability and maximum coverage of CO on the carbide surface were close to that observed for clean Ni(110). The amount of H₂, CO, CO₂ and H₂O adsorbed on the graphitized surface was insignificant relative to the clean surface. The kinetics of adsorption/desorption of the states observed are discussed.     

Methanol decomposition on platinum (111)

The interaction of methanol with clean and oxygen-covered Pt(111) surfaces has been examined with high resolution electron loss spectroscopy (EELS) and thermal desorption spectroscopy (TDS). On the clean Pt(111) surface, methanol dehydrogenated above 140 K to form adsorbed carbon monoxide and hydrogen. On a Pt(111)-p(2 × 2)O surface, methanol formed a methoxy species (CH₃O) and adsorbed water. The methoxy species was unstable above 170 K and decomposed to form adsorbed CO and hydrogen. Above room temperature, hydrogen and carbon monoxide desorbed near 360 and 470 K, respectively. The instability of methanol and methoxy groups on the Pt surface is in agreement with the dehydrogenation reaction observed on W, Ru, Pd and Ni surfaces at low pressures. This is in contrast with the higher stability of methoxy groups on silver and copper surfaces, where decomposition to formaldehyde and hydrogen occurs. The hypothesis is proposed that metals with low heats of adsorption of CO and H₂ (Ag, Cu) may selectively form formaldehyde via the methoxy intermediate, whereas other metals with high CO and H₂ chemisorption heats rapidly dehydrogenate methoxy species below room temperature.     

Décomposition thermique du monoxide de carbone sur une surface de molybdène: Formation de couches superficielles de carbone et de carbure

We have investigated the decomposition of carbon monoxide on polycrystalline and (001), (110) monocrystalline molybdenum surfaces. This study was performed by massspectrometry, for thermal desorption studies, Auger electron spectrometry (AES), low energy electron diffraction (LEED) and photoelectron spectroscopy (ESCA). By heating the clean Mo surface in CO or by heating the Mo surface covered with CO, the dissociation of chemisorbed CO leads to a build-up of carbon layer which inhibits the subsequent adsorption. Two distinct types of fine structure are associated with the KLL line of carbon Auger spectra. If the Mo surface is heated at a temperature between 300 and 1500 K, the Auger peak is characteristic of a “graphite layer”. If the Mo surface is heated at a temperature up to 2000 K, the Auger peak is characteristic of a “carbure” layer. This “carbure layer” give rise to a surstructure which agrees with a Mo₂C surface layer and was also investigated by ESCA. Chemical shifts of (1s) C and (3d) Mo photoemission bands were observed and attributed to the bounding between Mo and C atoms in the Mo₂C layer.     

C2H4在清洁和有Cs覆盖的Ru(0001)表面吸附的TDS研究

用热脱附谱(TDS)方法研究了乙烯(C₂H₄)在Ru(0001)表面上的吸附.在低温下(200K以下)乙烯可以在清洁及有Cs的Ru(0001)表面上以分子状态稳定吸附,在衬底温度升高至200K以上时,乙烯发生了脱氢分解反应,乙烯分解后的主要产物为乙炔(C₂H₂).在清洁的Ru(0001)表面,乙烯有两种吸附状态,脱附温度分别为275K和360K.而乙炔的脱附温度为350K.在Ru(0001)表面有Cs的存在时,乙烯分解 关键词： 乙烯 钌(0001)表面 铯钌(0001)表面乙烯 钌(0001)表面 铯钌(0001)表面     

Characterization of the adsorption and decomposition of methanol on Ni(110)

The chemisorption, condensation, desorption, and decomposition of methanol, both CH₃OH and CH₃OD, on a clean Ni(110) surface have been characterized using high resolution electron energy loss spectroscopy, temperature programmed reaction spectroscopy, and low energy electron diffraction. The vibrational spectrum of the saturated chemisorbed layer, 7.4 × 10¹⁴ molecules cm^?2, is almost identical to the infrared spectrum of liquid or solid methanol. Condensation of multilayers of methanol is facile at 80 K. The only quasi-stable intermediate isolated during the decomposition is a methoxy species, CH₃O, which decomposes thermally to CO and H. The evolution of both CO and H₂ occurs in desorption limited processes.     

The CO coadsorption and reactions of sulfur,hydrogen and oxygen on clean and sulfided Mo(100) and on MoS2(0001) crystal faces

The chemisorption and reactivity of O₂ and H₂ with the sulfided Mo(100) surface and the basal (0001) plane of MoS₂ have been studied by means of Thermal Desorption Spectroscopy (TDS), Auger Electron Spectroscopy (AES) and Low Energy Electron Diffraction (LEED). These studies have been carried out at both low (10^?8–10^?5Torr) and high (1 atm) pressures of O₂ and H₂. Sulfur desorbs from Mo(100) both as an atom and as a diatomic molecule. Sulfur adsorbed on Mo(100) blocks sites of hydrogen adsorption without noticeably changing the hydrogen desorption energies. TDS of ¹⁸O coadsorbed with sulfur on the Mo(100) surface produced the desorption of SO at 1150 K, and of S, S₂ and O, but not SO₂. A pressure of 1 × 10^?7 Torr of O₂ was sufficient to remove sulfur from Mo(100) at temperatures over 1100 K. The basal plane of MoS₂ was unreactive in the presence of 1 atm of O₂ at temperatures of 520 K. Sputtering of the MoS₂ produced a marked uptake of oxygen and the removal of sulfur under the same conditions.     

binding states of CO and H2 on clean and oxidized (111)Pt

The binding states and sticking coefficients of CO and H₂ on clean and oxide covered (111)Pt are examined using flash desorption mass spectrometry and Auger electron spectroscopy (AES). On the clean surface at 78 K there is one major binding state of CO with a desorption activation energy which decreases with coverage plus a second smaller state, while H₂ exhibits three binding states with peak temperatures of 140, 230 and 310 K and saturation density ratios of 0.5 : 1 : 1. Desorption kinetics of CO are consistent with a first order state with a normal pre-exponential factor of 10^{13 ± 1} sec^?1, while all three peaks of H₂ are broader than expected. Interpretations in terms of anomalous pre-exponential factors, coverage dependent desorption activation energies, and desorption orders are considered. On the oxidized surface saturation densities of both gases are nearly identical to those on the clean surface, but desorption temperatures are increased significantly and the initial sticking coefficient on the oxide decreases slightly for CO and increases slightly for H₂.     

Temperature programmed desorption investigations of hydrogen and ammonia reactions on GaN

We report data for chemisorption and reaction of deuterium and isotopically labeled ammonia on single-crystalline GaN films grown on sapphire substrates. Temperature programmed desorption (TPD) and Auger electron spectroscopy (AES) studies, following exposure of the clean GaN film at room temperature to the probe reactant species, were conducted under UHV conditions. Deuterium desorption took place over a wide temperature range, 525–;800 K, with molecular deuterium as the only product. At low exposures, two distinct deuterium desorption peaks at ∼ 660 and 770 K were observed. The deuterium desorption peak at 660 K shifted to lower temperatures with increasing D adatom coverages. TPD experiments after ammonia adsorption on GaN revealed small amounts of hydrogen desorbed at ∼ 600 K and over a range 660–;770 K, suggesting partial decomposition of ammonia. Molecular ammonia desorption was observed at ∼ 560 and 600 K, with the low temperature desorption state growing with increasing ammonia exposures. Further studies on deuterium-precovered GaN films indicated that ammonia production resulted from recombination of NH_x species and hydrogen adatoms on the surface.     

CO and H2O adsorption and reaction on Au(310)

We have studied desorption of ¹³CO and H₂O and desorption and reaction of coadsorbed, ¹³CO and H₂O on Au(310). From the clean surface, CO desorbs mainly in, two peaks centered near 140 and 200 K. A complete analysis of desorption spectra, yields average binding energies of 21 ± 2 and 37 ± 4 kJ/mol, respectively. Additional desorption states are observed near 95 K and 110 K. Post-adsorption of H₂O displaces part of CO pre-adsorbed at step sites, but does not lead to CO oxidation or significant shifts in binding energies. However, in combination with electron irradiation, ¹³CO₂ is formed during H₂O desorption. Results suggest that electron-induced decomposition products of H₂O are sheltered by hydration from direct reaction with CO.     

A thermal desorption study of thiophene adsorbed on the clean and sulfided Mo(100) crystal face

The adsorption of thiophene (C₄H₄S) on the clean and sulfided Mo(100) crystal surface has been studied. A fraction of the adsorbed thiophene desorbs molecularly while the remainder decomposes upon heating, evolving H₂ and leaving carbon and sulfur deposits on the surface. The reversibly adsorbed thiophene exhibits three distinct desorption peaks at 360, 230–290 and 163–174 K, corresponding to binding energies of 22, 13–16 and 7–9 kcal/mol respectively. Sulfur on the Mo(100) surface preferentially blocks the highest energy binding state and causes an increase in the amount of thiophene bound in the low binding energy, multilayer state. The thiophene decomposition reactions yield H₂ desorption peaks in the temperature range 300–700 K. We estimate that 50–66% of the thiophene adsorbed to the clean Mo(100) decomposes. The decomposition reaction is blocked by the presence of c(2 × 2) islands of sulfur and is blocked completely at θ_s = 0.5, at which point thiophene adsorption is entirely reversible.     

Adsorption behavior of H2O on clean and oxygen precovered Ni(s)(111)

Photoelectron spectroscopy (UPS), thermal desorption spectroscopy (TDS), isotope exchange experiments, work function change (δφ) and LEED were used to study the adsorption and dissociation behavior of H₂O on a clean and oxygen precovered stepped Ni(s)[12(111) × (111)] surface. On the clean Ni(111) terraces fractional monolayers of H₂O are adsorbed weakly in a single adsorption state with a desorption peak temperature of 180 K, just above that of the ice multilayer desorption peak (T_m = 155 K). In the angular resolved UPS spectra three H₂O induced emission maxima at 6.2, 8.5 and 12.3 eV below E_F were found for θ ≈ 0.5. Angular and polarization dependent UPS measurements show that the C_2v symmetry of the H₂O gas-phase molecule is not conserved for H₂O(ad) on Ni(s)(111). Although the Δφ suggest a bonding of H₂O to Ni via the negative end of the H₂O dipole, the O atom, no hints for a preferred orientation of the H₂O molecular axes were found in the UPS, neither for the existence of water dimers nor for a long range ordered H₂O bilayer. These results give evidence that the molecular H₂O axis is more or less inclined with respect to the surface normal with an azimuthally random distribution. H₂O adsorption at step sites of the Ni(s)(111) surface leads in TDS to a desorption maximum at T_m = 225 K; the binding energy of H₂O to Ni is enhanced by about 30% compared to H₂O adsorbed on the terraces. Oxygen precoverage causes a significant increase of the H₂O desorption energy from the Ni(111) terraces by about 50%, suggesting a strong interaction between H₂O and O(ad). Work function measurements for H₂O+O demonstrate an increase of the effective H₂O dipole moment which suggests a reorientation of the H₂O dipole in the presence of O(ad), from inclined to a more perpendicular position. Although TDS and Δφ suggest a significant lateral interaction between H₂O+O(ad), no changes in the molecular binding energies in UPS and no “isotope exchange” between ¹⁸O(ad) and H₂¹⁶O(ad) could be observed. Also, dissociation of H₂O could neither be detected on the oxygen precovered Ni(s)(111) nor on the clean terraces.     

The low temperature water formation reaction on Pt(111): A static SIMS and TDS study

The formation of water by the reaction of preadsorbed oxygen with hydrogen on a Pt(111) surface has been characterized, using secondary ion mass spectroscopy, below the desorption temperature of H₂O (180 K). The concentration of chemisorbed water was monitored during the reaction by following the SIMS H₃O⁺ signal. Reaction profiles were measured over a temperature range of 120 to 153 K, and an H₂ pressure range of 10^-9 to 10^-6 Torr. Under all conditions the reaction profiles were characterized by an induction time, a region of rapid reaction, and finally a steady decline in the rate. In the rapid region, an overall activation energy of 2.9 ± 0.3 kcalmol^-1 and a half-order H₂ pressure dependence were observed. At low initial oxygen concentrations the induction time increased and the maximum rate decreased. The reaction was slow in the absence of gas phase hydrogen, even when the surface coverage of hydrogen was relatively high. Water and hydrogen thermal desorption spectra, measured after stopping the reaction by removal of gas phase hydrogen, were complex functions of the H₂ exposure, exhibiting several peaks between 170 and 400 K. However, after an exposure large enough to drive the reaction to completion, only one H₂O peak at 173 K and one H₂ peak at 350 K were observed. The results indicate that only a fraction of the total H(a) on the surface was readily available for reaction during H₂ exposure at T ? 153 K. the remainder either recombined to form H₂ or reacted with O(a) during the thermal desorption ramp. There is good evidence for a surface rearrangement during the induction period. A model is proposed which involves the formation of water clusters that accelerate the rate.