Laser-induced thermal desorption mass spectrometry of functionalized silicon surfaces

Functionalization of materials and laser patterning of chemisorbed layers play an increasing role in tailoring and structuring surface properties on the nanoscale. An attractive method of investigating organic functionalizations is laser-induced thermal desorption (LITD). The analysis of well-defined H- and D-terminated Si(1 1 1)-(1 × 1):H(D) surfaces was used to quantify the LITD technique. Moreover, oxidized silicon surfaces were functionalized with trimethylsilyl (TMS) and (3,3,3-trifluoropropyl)-dimethylsilyl (TFP) hydrophobic end groups. The samples were irradiated normal to the surface with focused XeCl laser pulses. The desorbed species were monitored at an oblique angle and their time-of-flight (TOF) distributions were measured with a quadrupole mass analyzer. The TOF temperatures of silicon were calibrated for different laser pulse energies by desorption of H₂ and D₂. In the LITD experiments, the desorption of trimethylsilanol groups was observed for TMS terminations, indicating that essentially the whole molecule desorbs from the surface. The TOF data could be fitted to Maxwellian distributions, providing the desorption yield of the emitted species, their mass, and temperature. On the other hand, several characteristic fragments were found for the TFP-terminated surface. The TOF distributions indicate that the fragments detected with the analyzer derived from different desorbed species.     

Thiophene decomposition on Pd(111) forms S and C4 species: a laser-induced thermal desorption/Fourier transform mass spectrometry study

The data presented here show that Pd(111) can directly activate thiophene decomposition resulting in the deposition of sulfur and the formation of C₄ species, most likely C₄H₄ or possibly C₄H₅, on the surface. Temperature programmed reaction (TPR) studies of a 0.2 L exposure of thiophene show some reversible, but primarily irreversible adsorption. No C- or S-containing reaction products desorb during TPR. However, laser induced thermal desorption (LITD) with Fourier transform mass spectrometry (FTMS) can be used to monitor the surface composition prior to conventional desorption. LITD/FTMS shows that thiophene is stable to approximately 280 K. Above 300 K, 1,3-butadiene is observed. The yield of 1,3-butadiene on the surface, as observed by LITD/FTMS, is estimated to be 30% of the initial thiophene signal.     

三甲基镓在Pd(111)表面吸附解离及表面预吸附H和O的影响

利用X-射线光电子能谱（XPS）和程序升温脱附谱（TPD）研究了三甲基镓在Pd（111）表面的吸附和解离行为,并考察了表面预吸附H和O的影响。结果表明,在吸附温度为140 K时,三甲基镓在Pd（111）上主要为解离吸附,此时表面物种为Ga（CH₃）_x （x=1,2,3）和CH_x物种。加热将导致Ga的甲基化合物中的Ga-C键发生分步断裂,在不同温度下产生CH₄和H₂从表面脱附。同时,XPS结果证实了在275~325 K的温度区间内存在Ga甲基化合物的分子脱附。退火至更高温度,表面只观察到积碳和金属Ga物种,这二者随着温度的继续升高逐渐向体相扩散。在Pd（111）表面预吸附O和H对上述吸附和解离行为存在显著的影响。当表面预吸附H时,脱附产物CH₄和H₂的脱附主要位于315 K,可归属为一甲基镓的解离脱附。当表面预吸附O时,只在258 K观察到CH₄和H₂的脱附峰,可能来自于Pd-O-Ga（CH₃）₂吸附结构的解离.     

Voltage-current characteristics of superatmospheric pressure CO2 laser discharges

The IR NH₃ laser radiation was applied for selective dissociation of CCl₄ molecules. The dissociation yield, its pressure dependence and isotopic selectivity were measured. Two-frequency dissociation of CCl₄ by the NH₃ laser and the CO₂ pump laser radiations was carried out. It was shown that the NH₃ laser is very effective for CCl₄ dissociation.     

Laser induced thermal desorption of hydrogen from Zr(0 0 0 1): Relationship to water dissociation and hydrogen dissolution

On metals such as Zr, during hydrogen exposure, dissolution competes with desorption; this competition can be probed by thermal desorption at different heating rates. In the case of desorption from preadsorbed hydrogen, only ∼1% of the hydrogen can be desorbed even at heating rates of >10¹⁰ K s⁻¹. Recent measurements of the dynamics of hydrogen released by water dissociation on Zr(0 0 0 1) [G. Bussière, M. Musa, P.R. Norton, K. Griffiths, A.G. Brolo, J.W. Hepburn, J. Chem. Phys. 124 (2006) 124704] have shown that the desorbing hydrogen originates from the recombinative desorption of adsorbed H-atoms and that over 25% of the water collisions lead to hydrogen desorption. To gain further insight into the desorption and dissolution of hydrogen and in an attempt to resolve the paradox of the different desorption yields from H₂ vs. H₂O exposures, we report new measurements of the laser induced thermal desorption (LITD) of hydrogen from Zr(0 0 0 1) at initial temperatures down to 90 K. The low temperature was chosen because work function measurements suggested that hydrogen adsorbed into only the outermost (surface site) of the two available adsorption sites (surface and subsurface), from which we postulated much more efficient desorption at high heating rates compared to desorption from the sub-surface sites. However, hydrogen desorption by LITD from Zr(0 0 0 1) at 90 K still only accounts for 1% of the adsorbed species, the remainder dissolving into the bulk at LITD heating rates. The different yields alluded to above remain unexplained (Bussière, 2006).     

CH3OH在ZnO(0001)表面的光催化解离

本文利用266 nm波长的激光及程序升温脱附的方法研究了甲醇在ZnO(0001)表面的光催化反应. TPD结果显示部分的CH₃OH以分子的形式吸附在ZnO(0001)表面,而另外一部分在表面发生了解离. 实验过程中探测到H₂,CH₃^·,H₂O,CO,CH₂O,CO₂和CH₃OH这些热反应产物. 紫外激光照射实验结果表明光照可以促进CH₃OH/CH₃O^·解离形成CH₂O,在程序升温或光照的过程中它又可以转变为HCOO^-. CH₂OH_Zn与OH_ad反应在Zn位点上形成H₂O分子. 升温或光照都能促进CH₃O^·转变为CH₃^·. 该研究对CH₃OH在ZnO(0001)表面的光催化反应机理提供了一个新的见解.     

Adsorption of glycine on a NiAl(1 1 0) alloy surface

The adsorption and desorption of glycine (NH₂CH₂COOH), vacuum deposited on a NiAl(1 1 0) surface, were investigated by means of Auger electron spectroscopy (AES), low energy electron diffraction (LEED), temperature-programmed desorption, work function (Δφ) measurements, and ultraviolet photoelectron spectroscopy (UPS). At 120 K, glycine adsorbs molecularly forming mono- and multilayers predominantly in the zwitterionic state, as evidenced by the UPS results. In contrast, the adsorption at room temperature (310 K) is mainly dissociative in the early stages of exposure, while molecular adsorption occurs only near saturation coverage. There is evidence that this molecularly adsorbed species is in the anionic form (NH₂CH₂COO⁻). Analysis of AES data reveals that upon adsorption glycine attacks the aluminium sites on the surface. On heating part of the monolayer adsorbed at 120 K is converted to the anionic form and at higher temperatures dissociates further before desorption. The temperature-induced dissociation of glycine (<400 K) leads to a series of similar reaction products irrespective of the initial adsorption step at 120 K or at 310 K, leaving finally oxygen, carbon and nitrogen at the surface. AES and LEED measurements indicate that oxygen interacts strongly with the Al component of the surface forming an “oxide”-like Al-O layer.     

Benzene and thiophene formation from acetylene on sulfided Pd(111) studied by LITD/FTMS

We report the first laser-induced thermal desorption (LITD) studies of acetylene on Pd(111). LITD coupled with Fourier transform mass spectrometry (FTMS) probes the surface molecular composition. Our results show simultaneous formation of thiophene and benzene at 120 K after a 6 L dose of acetylene at 80 K on a Pd(111) surface with 0.06 ML of sulfur. Simultaneous formation implies that formation of the C₄H₄ intermediate is the slow step in the formation of both cyclic products. The relative amounts of thiophene and benzene observed with LITD/FTMS are comparable, while thermal desorption spectroscopy (TDS) yields integrated thiophene signals that are < 2% as intense as for benzene. This indicates that thiophene primarily decomposes upon heating. Low coverage (0.5 L) results confirm reports that the presence of sulfur enhances benzene production.     

Oxygen as promoter or poison in the catalytic dissociation of H2, C2H4, C2H2, and NH3 on Palladium

The dissociation rates of H₂, C₂H₄, C₂H₄, and NH₃ have been studied on oxygen covered Pd surfaces by measuring the water desorption rates during exposure to each of the molecules. These results are correlated with the hydrogen response of a Pd-MOS structure. The measurements show a trend (at 473 K) where oxygen blocks H₂ dissociation, blocks C₂H₄ dissociation only above a certain oxygen coverage, has no influence on C₂H₂ dissociation, and promotes NH₃ dissociation.     

Dissociation of molecules in intense laser beam

Dissociation of molecules in the strong laser beam at the intensity of 10¹³–10¹⁴ W/cm² is investigated. Experimentally, the fragmentation of neutral molecules, CH₄, C₂H₄, C₄H₈; and the disintegration of molecular ions, CH ₄ ⁺ are studied by fluorescence spectroscopy and mass spectroscopy respectively. Some new phenomena, the strong dependence on the laser intensity, the universal dissociation, and the thorough fragmentation, are found in the fragmentation, and cannot be explained by the existing theories, as Coulomb Explosion theory or Re-scattering theory. We have suggested two new theories. The Super-excited State (SES) theory interprets the neutral fragmentation of molecules, which is stimulated to the SES by intense laser pulse. The Morse potential energy surface of the SES shows that either direct dissociation or pre-dissociation can take place in the SESs. Another theory, the theory of Field-assisted Dissociation (FAD) interprets the fragmentation of ionic molecules. According to this theory, the electric field of the laser pulse is involved directly to the dissociation process. QCT calculations for the trajectories moving on the dressed PES are performed. The result shows that the chemical bond which is parallel to the laser field vector undergo dissociation spontaneously. The dissociation takes place around 100 fs, which is in agreement with the ultrafast measurement in the pump-probe experiment.     

NO-methanol interaction on the surface of Pt(3 3 2)

The interaction between NO and CH₃OH on the surface of stepped Pt(3 3 2) was investigated using Fourier transform infra red reflection-absorption spectroscopy (FTIR-RAS) and thermal desorption spectroscopy (TDS). At 90 K, pre-dosed CH₃OH molecules preferentially adsorb on step sites, suppressing the adsorption of NO molecules on the same sites. However, due to a much stronger interaction with Pt, at 150 K and higher, the adsorption of NO molecules on step sites is restored, giving rise to peaks closely resembling those of NO molecules adsorbed on clean Pt(3 3 2) surface. Adsorbed CH₃OH is very reactive on this surface, and is readily oxidized to formate in the presence of O₂, even at 150 K. In contrast, reactions between CH₃OH and co-adsorbed NO are slight to non-existent. There are no new peaks in association with intermediates resulting from CH₃OH-NO interactions. It is concluded that the reduction of NO with CH₃OH on Pt(3 3 2) does not proceed through a mechanism of forming intermediates.     

Photochemistry of methyl bromide on the α-Cr2O3(0001) surface

The photochemical properties of the Cr-terminated α-Cr₂O₃(0001) surface were explored using methyl bromide (CH₃Br) as a probe molecule. CH₃Br adsorbed and desorbed molecularly from the Cr-terminated α-Cr₂O₃(0001) surface without detectable thermal decomposition. Temperature programmed desorption (TPD) revealed a CH₃Br desorption state at 240 K for coverages up to 0.5 ML, followed by more weakly bound molecules desorbing at 175 K for coverages up to 1 ML. Multilayer exposures led to desorption at ~ 130 K. The CH₃Br sticking coefficient was unity at 105 K for coverages up to monolayer saturation, but decreased as the multilayer formed. In contrast, pre-oxidation of the surface (using an oxygen plasma source) led to capping of surface Cr³⁺ sites and near complete removal of CH₃Br TPD states above 150 K. The photochemistry of chemisorbed CH₃Br was explored on the Cr-terminated surface using post-irradiation TPD and photon stimulated desorption (PSD). Irradiation of adsorbed CH₃Br with broad band light from a Hg arc lamp resulted in both photodesorption and photodecomposition of the parent molecule at a combined cross section of ~ 10^? 22 cm². Photodissociation of the CH₃–Br bond was evidenced by both CH₃ detected in PSD and Br atoms left on the surface. Use of a 385 nm cut-off filter effectively shut down the photodissociation pathway but not the parent molecule photodesorption process. From these observations it is inferred that d-to-d transitions in α-Cr₂O₃, occurring at photon energies < 3 eV, do not significantly promote photodecomposition of adsorbed CH₃Br. It is unclear to what extent band-to-band versus direct CH₃Br photolysis play in CH₃–Br bond dissociation initiated by more energetic photons.     

Effect of NH3 adsorption on the atomic structure of Si(111) √3 × √3 - Al and Si(111) √3 × √3 - Ag surfaces

The room temperature (RT) adsorption of ammonia (NH₃) on Si(111)√3 × √3-Al and Si(111)√3 × √3-Ag surfaces has been studied using LEED and AES. The transformation from Si(111)√3 × √3-Al surface structure to Si(111)1 × 1-(Al, H) upon NH₃ exposure has been found to be similar to the previously observed structural transformation induced by exposure in the atomic hydrogen. It has been demonstrated that the transformation is caused by hydrogen atoms which are generated by NH₃ dissociation on the Si(111)√3 × √3-Al surface. It has been estimated that about 0.1 ML of ammonia molecules is needed to complete the structural transformation. No interaction of NH₃ with the Si(111)√3 × √3-Ag surface has been found. The dissociation of NH₃ molecules is believed to be impossible on this surface     

Electron beam-adsorbate interactions on silicon surfaces

The interactions which occur between electron beams in the energy range 0.5–2.5 keV, with currents of 0.1–1.0 microA and various adsorbates (H₂, CO, CH₄ and C₂H₄) on silicon surfaces have been investigated. The accumulation of beam induced dissociation products on the surface has been monitored by Auger spectroscopy, and the extent of electron stimulated desorption of neutral molecules has been determined mass spectroscopically. Thermal desorption spectra for various gases have also been obtained in order to compare adsorption behaviour with and without the presence of an electron beam. It is concluded that serious experimental errors may occur when LEED and AES are used in adsorption studies, particularly where comparatively weak binding energies are involved.     

碰撞诱导离解(CID)(Ⅱ)——I2(B3∏o+u)在高振动态(v′=62)的碰撞猝灭机理实验研究

本文研究了B³∏_o+u激发态I₂分子在高振动态v′=62时的碰撞猝灭过程。实验中得到了该能级I₂分子和其自身以及与其他气体分子(He,Ar,Kr,H₂,CO,N₂,O₂,CH₄,NH₃,C₂H₆,CCl₄)的碰撞猝灭速率常数,并且发现,在I关键词：     

Reactions and anion desorption induced by low-energy electron exposure of condensed acetonitrile

Thermal desorption spectrometry (TDS) and electron stimulated desorption (ESD) are employed to investigate mechanisms responsible for the formation of C₂H₆ in electron irradiated multilayer films of acetonitrile (CH₃CN) at 30 K. Using a high sensitivity time-of-flight mass spectrometer, we observe the ESD of anionic fragments H⁻, CH₂ ⁻, CH₃ ⁻ and CN⁻. Desorption occurs following dissociative electron attachment (DEA) via several negative ion resonances in the 6 to 14 eV energy range and correlates well with a “resonant” structure seen in the TDS yield of C₂H₆ (i.e., at mass 30 amu). It is proposed that C₂H₆ is formed by the reactions of CH₃ radicals generated following DEA to CH₃CN which also yields CN⁻. Between 2 and 5 eV, a second resonant feature is seen in the C₂H₆ signal. While DEA is observed in the gas phase at these energies, no anion desorption occurs since anionic fragments likely have insufficient kinetic energy to desorb. Since the CH₂ ⁻ ion has not been observed in gas-phase measurements, we propose that it is formed, along with HCN (that is detected in TDS) when dissociation into CH₃ ⁻ and CN is hindered by adjacent molecules.     

Catalytic reduction of NO in the presence of benzene on a Pt(3 3 2) surface

The catalytic reduction of NO in the presence of benzene on the surface of Pt(3 3 2) has been studied using Fourier transform infra red reflection-absorption spectroscopy (FTIR-RAS) and thermal desorption spectroscopy (TDS). IR spectra show that while the presence of benzene molecules at low coverage (e.g., following an exposure of just 0.25 L) promotes NO-Pt interaction, the adsorption of NO on Pt(3 3 2) at higher benzene coverages is suppressed. It is also shown that there are no strong interactions between the adsorbed NO molecules and the benzene itself or benzene-derived hydrocarbons, which can lead to the formation of intermediate species that are essential for N₂ production.TDS results show that the adsorbed benzene molecules undergo dehydrogenation accompanied by hydrogen desorption starting at 300 K and achieving a maximum at 394 K. Subsequent dehydrogenation of the benzene-derived hydrocarbons then begins with hydrogen desorption starting at 500 K. N₂ desorption from NO adlayers on clean Pt(3 3 2) surface becomes significant at temperatures higher than 400 K, giving rise to a peak at 465 K. This peak corresponds to N₂ desorption from NO dissociation on step sites. The presence of benzene promotes N₂ desorption, depending on the benzene coverage. When the benzene exposure is 0.25 L, the N₂ desorption peak at 459 K is dramatically increased. Increasing benzene coverage also results in the intensification of N₂ desorption at ∼410 K. At benzene exposures of 2.4 L, N₂ desorption develops as a broad peak with a maximum at ∼439 K.It is concluded that the catalytic reduction of NO by platinum in the presence of benzene proceeds by NO decomposition and subsequent oxygen removal at temperatures lower than 500 K, and NO dissociation is a rate-limiting step. The contribution of benzene to N₂ desorption is mainly attributed to providing a source of H, which quickly reacts with NO-derived atomic O, leaving the surface with more vacant sites for further NO dissociation.     

NH3 adsorption on Ni(110) and the production of the NH2 species by electron irradiation

The adsorption of NH₃ on Ni(110) has been examined using electron stimulated desorption ion angular distribution (ESDIAD), low energy electron diffraction (LEED) and thermal desorption spectrometry (TDS). At ～ 85 K the NH₃ molecule enters into a series of chemisorption and physisorption states whose structures have been partially characterized by means of ESDIAD and LEED. Upon heating, these NH₃ states desorb without dissociation; for adsorption below 300 K there is essentially no thermal decomposition. The ammonia adiayer was found to be extremely sensitive to electron irradiation effects. Evidence was found to support the irradiation induced conversion of NH₃(ads) to an amido intermediate, nh_2(ads). The NH₂ adsorbs with its C_2v axis normal to the surface and its NH bonds aligned along the [001] and [001?] directions. In the absence of further electron irradiation the nh_2(ads) species is stable to 375 K whereupon it dissociates to N_(ads)and H_2(g). The remaining N_(ads) desorbs near 750 K with significant attractive N…N interaction. No evidence is found for an imido intermediate, nh_(ads). nh_2(ads) also undergoes a disproportionation/recombination reaction upon heating to produce an additional NH₃ desorption state. A significant isotope effect for NH versus ND scission, sensitive to the adsorption state of the ammonia, is found to occur upon electron irradiation.     

Time-of-flight diagnostics of wavelength-dependent CO2 laser-induced desorption from condensed layers

Time-of-flight (TOF) diagnostics have been applied to study the interaction of CO₂ laser pulses with multilayers of D₂O, CH₃OH, CH₃F, CCl₄, and C₆H₅CHO condensed on different substrates (Ge, Ag, SiO₂). Maxwellian TOF distributions were fitted to the measured distributions. The TOF temperatures and the desorption yields show the same spectral features as do the respective ir absorption spectra. This indicates resonant heating by wavelength-dependent excitation of internal modes of the condensed molecules. Semilog plots of the desorption yield versus reciprocal TOF temperature exhibit Arrhenius behavior, as expected for a thermally activated process.     

强红外激光场中氟里昂123分子内的V-V能量转移

用无明显拖尾的TEACO₂激光强脉冲“超激发”氟里昂₁₂₃分子(CF₃CHCl₂和CF₃CDCl₂),使其形成很高激发态。在一定条件下,在离解过程中,这种分子主要表现为具有较高键能的C—C键被打断,其主要产物是C₂F₆和丙二烯及其取代物,而具有最低键能的C—Cl键的开裂却很少,离解产物的相对产量与激光能流密度的关系曲线指出,氟里昂< 关键词：