多次改变聚焦强度法测量束流发射度

就“多次改变聚焦强度法测量束流发射度”,讨论了测量技术和测量装置的优化,包括薄透镜近似的合理采用,多点最小二乘拟合,截面测量靶轴向位置的优化选择,和测量软件系统的改进等,以提高发射度测量的准确性和可靠性.已将上述优化技术,应用于BEPC直线加速器上新建和改建的发射度测量装置,获得了满意的测量结果     

束流发射度对质子照相色差模糊的影响

分析了质子照相过程中发射度的增长过程。开展了照相系统设计,针对设计的照相系统,采用理论分析和蒙特卡罗计算的方法,具体分析了各个发射度增长因素的影响程度。分析结果表明：对于高能质子照相,加速器的引出发射度对系统的色差模糊的影响可以忽略,但对于中能质子照相,加速器的引出发射度不可忽略。可通过提高加速器引出系统的聚焦能力和减小散束器的厚度来减小发射度影响。     

束流发射度对质子照相色差模糊的影响

分析了质子照相过程中发射度的增长过程。开展了照相系统设计,针对设计的照相系统,采用理论分析和蒙特卡罗计算的方法,具体分析了各个发射度增长因素的影响程度。分析结果表明:对于高能质子照相,加速器的引出发射度对系统的色差模糊的影响可以忽略,但对于中能质子照相,加速器的引出发射度不可忽略。可通过提高加速器引出系统的聚焦能力和减小散束器的厚度来减小发射度影响。     

用修正三梯度法测量束流发射度

 介绍了修正三梯度法的原理和利用该方法测量发射度的实验装置。编写了基于束包络方程的数值拟合程序，并进行了模拟计算。用修正三梯度法对3.5MeV注入器出口处脉冲电子束的发射度做了时间分辨的测量。结果表明，当空间电荷力不可忽略时，该注入器输出的电子束脉冲期间中间部分束的发射度为1 040π·mm·mrad。     

BPM测量束流纵向发射度与Twiss参数

在C-ADS直线加速器样机中,为了描述束流相空间分布,需要精确测量束流在RFQ出口处的参数。束流横向信息已通过发射度重构测量获得,束流光学也得到了验证。采用了一种用BPM的SUM信号测量束流纵向参数的方法。在实验中,调节两台聚束器的聚束腔压并记录其下游BPM上的SUM信号。通过粒子群算法和TraceWin模拟相结合的方法,得到了考虑空间电荷效应的测量结果。测得的发射度与Toutatis中的模拟值相近。     

光阴极RF腔注入器束流发射度研究

分析了光阴极RF腔注入器中的RF场效应和空间电荷效应,给出了电子在加速腔中束流发射度的解析表达式,它说明在加速过程中束流发射度是振荡变化的。利用SUPERFISH和GPT程序模拟计算了光阴极1+1/2腔注入器输出束流发射度与加速场强、注入相位、束团大小和形状、束团电荷的关系。适当选择这些条件,可以获得横向发射度小于2πmm·mrad 的输出束流。     

二次电子发射对质子束流测量精度的影响

二次电子发射直接影响法拉第探测器测量质子束流的精度,减小或消除二次电子发射的影响是提高束流测量精度的关键。根据二次电子补偿原理设计了二次电子补偿型同轴法拉第探测器,实验发现探测器测量质子束流强度时不能完全实现二次电子补偿。为改进和完善探测器的设计,从理论上分析了补偿片未能完全消除二次电子对束流测量影响的原因,是由于补偿片前向发射二次电子数目大于收集极后向发射二次电子数目所致。为此设计了质子束穿过金属箔发射二次电子测量装置,测量得到能量为5~10 MeV质子穿过10 m厚铜箔时前向与后向发射二次电子产额,验证了理论分析的正确性。     

二次电子发射对质子束流测量精度的影响

二次电子发射直接影响法拉第探测器测量质子束流的精度,减小或消除二次电子发射的影响是提高束流测量精度的关键。根据二次电子补偿原理设计了二次电子补偿型同轴法拉第探测器,实验发现探测器测量质子束流强度时不能完全实现二次电子补偿。为改进和完善探测器的设计,从理论上分析了补偿片未能完全消除二次电子对束流测量影响的原因,是由于补偿片前向发射二次电子数目大于收集极后向发射二次电子数目所致。为此设计了质子束穿过金属箔发射二次电子测量装置,测量得到能量为5~10MeV质子穿过10μm厚铜箔时前向与后向发射二次电子产额,验证了理论分析的正确性。     

光阴极RF腔注入器束流发射度研究

 分析了光阴极RF腔注入器中的RF场效应和空间电荷效应，给出了电子在加速腔中束流发射度的解析表达式，它说明在加速过程中束流发射度是振荡变化的。利用SUPERFISH和GPT程序模拟计算了光阴极1+1/2腔注入器输出束流发射度与加速场强、注入相位、束团大小和形状、束团电荷的关系。适当选择这些条件，可以获得横向发射度小于2πmm·mrad 的输出束流。     

利用针缝法测量强流栅控脉冲电子枪束流发射度

采用单缝单针法测量电子枪束流的发射度。用可移动的宽0.1mm单缝取样,与缝平行的直径为0.1mm匀速运动的探针接收穿过狭缝的束流。 缝、针距离为59mm,角分辨率为3.4mrad,系统最大接收度为0.64cm·rad。缝、针间设有平行度调节装置,提高了测量精度;狭缝板设有水冷结构,可承受较大的束流功率,采用良好的屏蔽及合理的二次电子抑制结构,清晰地测出了10~(-10)A量级的弱信号电流。所测相图的相对误差约为8％。利用该装置方便地测得了电子枪高压、栅控脉冲电压、阴极温度、脉冲流强等不同条件下的发射度变化。     

An emittance measurement device for a space-charge dominated electron beam

Beam emittance is one of the most important parameters for electron sources. To investigate the beam emittance of the 3.5-cell DC-SC photocathode injector developed at Peking University, a multi-slit emittance measurement device has been designed and manufactured. The designed slit width, mask thickness and beamlet drift length are 100 μ m, 3 mm and 430 mm respectively. It is suitable for the electron beam with energy of about 5 MeV and the average current less than 0.1 mA. The preliminary measurement result of the rms emittance of the electron beam produced by the DC-SC injector is about 5-7 mm·mrad.     

合肥光源单束团下束团长度和能散的测量

根据同步光与储存环中的束流信号具有相同的时间结构的原理,测量同步光脉冲的半高全宽值可以计算出束团的长度。根据合肥光源的特点和实际需要,选择快速光电接收器搭配高速高带宽示波器作为在线测量束团长度和纵向分布等的主要手段。对单束团模式下束团长度随流强和高频腔腔压的变化趋势进行了测量。测量结果表明：束团长度与腔压的0.3次方成反比,比理论值0.5小;而束团长度随流强的增长率为2.0 ps/mA。通过测量纵向量子寿命进行了能散随流强变化的间接测量,结果表明,束团的拉伸是能散变化和势阱效应共同作用的结果。     

Instantaneous electron beam emittance measurement system based on the optical transition radiation principle

One kind of instantaneous electron beam emittance measurement system based on the optical transition radiation principle and double imaging optical method has been set up. It is mainly adopted in the test for the intense electron-beam produced by a linear induction accelerator. The system features two characteristics. The first one concerns the system synchronization signal triggered by the following edge of the main output waveform from a Blumlein switch. The synchronous precision of about 1 ns between the electron beam and the image capture time can be reached in this way so that the electron beam emittance at the desired time point can be obtained. The other advantage of the system is the ability to obtain the beam spot and beam divergence in one measurement so that the calculated result is the true beam emittance at that time, which can explain the electron beam condition. It provides to be a powerful beam diagnostic method for a 2.5 kA, 18.5 MeV, 90 ns （FWHM） electron beam pulse produced by Dragon I. The ability of the instantaneous measurement is about 3 ns and it can measure the beam emittance at any time point during one beam pulse. A series of beam emittances have been obtained for Dragon I. The typical beam spot is 9.0 mm （FWHM） in diameter and the corresponding beam divergence is about 10.5 mrad.     

Instantaneous electron beam emittance measurement system based on the optical transition radiation principle

One kind of instantaneous electron beam emittance measurement system based on the optical transition radiation principle and double imaging optical method has been set up. It is mainly adopted in the test for the intense electron-beam produced by a linear induction accelerator. The system features two characteristics. The first one concerns the system synchronization signal triggered by the following edge of the main output waveform from a Blumlein switch. The synchronous precision of about 1 ns between the electron beam and the image capture time can be reached in this way so that the electron beam emittance at the desired time point can be obtained. The other advantage of the system is the ability to obtain the beam spot and beam divergence in one measurement so that the calculated result is the true beam emittance at that time, which can explain the electron beam condition. It provides to be a powerful beam diagnostic method for a 2.5 kA, 18.5 MeV, 90 ns (FWHM) electron beam pulse produced by Dragon I. The ability of the instantaneous measurement is about 3 ns and it can measure the beam emittance at any time point during one beam pulse. A series of beam emittances have been obtained for Dragon I. The typical beam spot is 9.0 mm (FWHM) in diameter and the corresponding beam divergence is about 10.5 mrad.     

强流柱对称相对论电子束的势能与发射度

推导了柱对称相对论电子束在漂移管内的空间电荷势及相互作用势能,分析了势能在束流传输过程中的变化规律,并与束流均方根发射度的变化方程比较。指出一部分势能随束流传输过程中包络振荡而呈现出可逆的变化;而另一部分势能则在束流传输系统及束流本身非线性力的作用下,随着电荷密度分布变化而转为电荷横向热运动能量,从而导致束流归一化发射度的增长,这种转化是一个不可逆的过程。     

强流柱对称相对论电子束的势能与发射度

推导了柱对称相对论电子束在漂移管内的空间电荷势及相互作用势能,分析了势能在束流传输过程中的变化规律,并与束流均方根发射度的变化方程比较。指出一部分势能随束流传输过程中包络振荡而呈现出可逆的变化;而另一部分势能则在束流传输系统及束流本身非线性力的作用下,随着电荷密度分布变化而转为电荷横向热运动能量,从而导致束流归一化发射度的增长,这种转化是一个不可逆的过程。     

Electro-optical sampling non-synchronous delay scanning measurement of electron beam bunch length at BFEL

The Electro-optical sampling delay scanning technique can be used for electron beam bunch length measurement.A novel non-synchronous delay scanning technique based on the electro-optical sampling measurements is presented.Based on Beijing Free Electron Laser(BFEL),the electron beam bunch length was measured with the electro-optical sampling technique for the first time in China.The result shows that the electron beam bunch length at BFEL is about 5.6±1.2 ps.     

Electro-optical sampling non-synchronous delay scanning measurement of electron beam bunch length at BFEL

The Electro-optical sampling delay scanning technique can be used for electron beam bunch length measurement. A novel non-synchronous delay scanning technique based on the electro-optical sampling measurements is presented. Based on Beijing Free Electron Laser （BFEL）, the electron beam bunch length was measured with the electro-optical sampling technique for the first time in China. The result shows that the electron beam bunch length at BFEL is about 5.6±1.2 ps.     

Generation and measurement of sub-picosecond electron bunch in photocathode rf gun

We consider a scheme to generate a sub-picosecond electron bunch in the photocathode rf gun by im-proving the acceleration gradient in the gun, suitably tuning the bunch charge, the laser spot size and the acceleration phase, and reducing the growth of transverse emittance by laser shaping. A nondestructive technique is also reported to measure the electron bunch length, by measuring the high-frequency spectrum of wakefield radiation which is caused by the passage of a relativistic electron bunch through a channel surrounded by a dielectric.