物理气相传输法合成AlN单晶性能表征

采用物理气相传输(PVT)法通过同质外延生长获得14 mm×12 mm的AlN单晶样品。对样品进行切割、研磨、化学机械抛光处理后，采用拉曼光谱仪、高分辨X射线衍射仪、X射线光电子能谱仪、光致发光光谱仪对样品进行测试表征。拉曼测试结果表明，晶体中心区域的拉曼光谱E₂(high)声子模的半峰全宽为3.3 cm^-1,边缘区域E₂(high)声子模的半峰全宽为4.3 cm^-1,晶体呈现较高的结晶质量。XRD摇摆曲线表征结果显示，外延生长后的晶体中心和边缘区域的摇摆曲线半峰全宽增大至100″和205″,表明晶体内存在缺陷。XPS测试结果表明，晶体内存在C、O、Si杂质元素，杂质的原子数分数分别为0.74%、1.43%、2.14%,晶体内发现以氧杂质为主的Al—O、N—Al—O等特征峰。光致发光光谱测试结果显示，晶体内存在V_Al-O_N复合缺陷和V_Al点缺陷。     

AlN单晶生长行为研究

本文采用物理气相传输法对不同衬底温度和温差下制备的氮化铝(AlN)晶体形貌进行研究,研究结果表明AlN晶体生长受到AlN晶面表面能、Al基元平均动能和AlN晶体表面极性的共同影响.当温差为60℃时,AlN晶体(0001)面生长速率小于(10-10)面,AlN以带状形式生长.将该工艺应用于AlN同质生长中,研究结果表明:温差为60℃时AlN晶体(0001)面呈现畴生长模式,该晶体质量最差;温差为35℃时AlN晶体(0001)面呈现台阶流生长模式,该晶体质量最优;温差为20℃时AlN晶体(0001)面呈现台阶簇生长模式,该晶体容易开裂.通过工艺优化最终获得了直径为40 mm AlN单晶衬底,完全满足器件制备需求.     

气相生长氮化铝单晶的新方法

通过在钨坩埚盖开小孔的方法改变氮化铝结晶衬底上的温度场分布,在开孔处形成局部低温区;由于孔的几何尺寸的限制和氮化铝晶体生长的各向异性,开孔处的氮化铝晶体单晶化;随后,开孔处的单晶起籽晶的作用,逐渐长成较大尺寸、较高质量的氮化铝单晶.目前用该方法已经制备出直径大于2mm的氮化铝单晶体.     

物理气相传输法生长1英寸AlN单晶及其表征分析

本文采用物理气相传输法(PVT)及同质外延工艺,在自发生长的6 mm×7 mm AlN籽晶片上,通过4次迭代,成功生长出高质量1英寸AlN单晶锭.将生长出的单晶锭经过切片、研磨和抛光工艺加工成1英寸低表面粗糙度的单晶片,并采用拉曼光谱仪、扫描电子显微镜、高分辨率X射线衍射仪、分光光度计对籽晶片与外延晶片进行结晶质量、位错密度以及紫外透光率等性能表征.结果 表明:外延晶片的拉曼E2(high)半高宽为2.86 cm-1,(002)面XRD摇摆曲线半高宽为241 arcsec,说明晶片具有很高的结晶质量;经过同质外延4次迭代后的晶片较初始籽晶片相比质量有所下降,说明生长过程中由于非平衡生长存在缺陷的增殖;外延晶片具有极其优异的紫外透光率,深紫外265～280 nm波段下的吸收系数低至19～21.5 cm-1.     

直喷式直流电弧等离子化学气相沉积法金刚石单晶外延层制备研究

采用非循环直流喷射(直喷式)直流电弧等离子化学气相沉积法,在Ar/H2/CH4气氛下,成功制备了金刚石单晶外延层.试验采用的是3 mm×3 mm×1.2 mm的高温高压Ib型金刚石单晶衬底.研究了不同衬底温度和甲烷浓度对金刚石单晶外延层的形貌,速率和晶体质量的影响.采用光学显微镜,激光共聚焦表征了样品的形貌,利用千分尺测量其生长速率,利用Raman表征其晶体质量,采用OES诊断Ar/H2/CH4等离子气氛下C2、CH与Hβ的相对浓度.研究表明,温度和甲烷浓度对单晶刚石形貌和质量产生了明显的影响.在衬底为温度980℃,甲烷浓度在1.5;的条件下,生长速率达到了36 μm/h,并且晶体质量较好(半高宽仅为1.88 cm-1).同时发现生长参数对金刚石单晶外延层的生长模式有着显著地影响.     

LiNbO3晶体的坩埚下降法生长

通过选择合适的原料配比(Li2O 48.6mol;,Nb2O5 51.4mol;),控制固液界面处的温度梯度为20～40℃/cm,晶体生长速度为0.6～1.5mm/h,采用密闭条件下的坩埚下降法工艺成功地生长出了具有良好光学均匀性的完整LiNbO3单晶.用X射线粉末衍射表征获得的LiNbO3晶相,讨论了若干工艺条件对晶体组分与质量的影响.测定了未密闭条件下生长的LiNbO3晶体不同部位样品的紫外可见光谱,发现其吸收边沿生长方向发生红移,并讨论了产生此现象的原因.     

纯镁单晶制备研究

利用自制的硅碳棒加热单晶生长炉,采用改进的坩埚下降法,在最高温度900℃,坩埚相对下降速度约为1.7cm/h条件下,生长出直径约为φ50mm的纯镁单晶.通过X射线衍射、金相观察和测量电导率等手段研究分析了所生长镁单晶的晶体质量.     

PVT法AlN单晶生长技术研究进展及其面临挑战

氮化铝(AlN)具有超宽禁带宽度(6.2 eV)、高热导率(340 W/(m·℃))、高击穿场强(11.7 MV/cm)、良好的紫外透过率、高化学和热稳定性等优异性能,是氮化镓基(GaN)高温、高频、高功率电子器件以及高Al组分深紫外光电器件的理想衬底材料.物理气相传输(PVT)法是制备大尺寸高质量AlN单晶最有前途的方法.本文介绍了AlN单晶的晶体结构、基本性质及PVT法生长AlN晶体的原理与生长习性.基于AlN单晶PVT生长策略,综述了自发形核工艺、同质外延工艺及异质外延工艺的研究历程,各生长策略的优缺点及其最新进展.最后对PVT法生长AlN单晶的发展趋势及其面临的挑战进行了简要展望.     

Ar对微波等离子体CVD单晶金刚石生长的影响

采用自主研发的5 kW不锈钢谐振腔式MPCVD设备,在Ar/H2/CH4气氛下,保持总气压与CH4气流量不变,研究了不同Ar/H2比例对单晶金刚石生长速度和晶体质量的影响.通过拉曼光谱与高分辨率XRD摇摆曲线,从生长速度与生长质量两点对所得样品进行分析.结果表明,适量Ar的存在能够显著提高单晶金刚石的生长速度,并且不损害金刚石的晶体质量.当Ar/H2=30;时,生长速度最高,为35 μm/h.随着Ar/H2比例的进一步增加,单晶金刚石的结晶质量会有所下降,Ar/H2比例过高则会严重破坏单晶金刚石的生长.     

碘化钾单晶的非真空密闭坩埚下降法生长

本文报道了KI单晶在非真空密闭条件下的坩埚下降法生长.以经充分干燥的高纯KI多晶为原料,将KI多晶料密封于套层铂坩埚中,添加少量活性碳粉末,可避免碘化物熔体的氧化与挥发,从而在非真空条件下实现KI单晶的坩埚下降法生长.在晶体生长过程中,炉体温度调节于750～770 ℃,固液界面温度梯度为30～40 ℃/cm,坩埚下降速率控制为1～2 mm/h,成功生长出尺寸为φ25 mm×50 mm的透明完整KI单晶.采用XRD、DTA-TG、透射光谱、荧光光谱对所获KI单晶进行了测试表征,结果表明该单晶具有良好的光学均匀性,在450～2500 nm波长范围的光学透过率达70;以上,其光学吸收边位于280 nm左右;在266 nm脉冲光激发下,该单晶具有397 nm峰值波长的荧光发射.     

AlN bulk single crystal growth on 6H-SiC substrates by sublimation method

Large and thick AlN bulk single crystals up to 43 mm in diameter and 10 mm in thickness have been successfully grown on 6H-SiC (0 0 0 1) substrates by the sublimation method using a TaC crucible. Raman spectrum indicates that the polytype of the grown AlN single crystals is a Wurtzite-2H type structure, and the crystals do not include any impurity phases. The quality at the top of the crystal improves as crystal thickness increases along the 〈0 0 0 1〉 direction during growth: a low etch pit density (7×10⁴ cm⁻²) and a small full width at half maximum for a 0002 X-ray rocking curve (58 arcsec) have been achieved at a thickness of ∼8 mm. The possible mechanism behind the improvement in the AlN crystal quality is also discussed.     

改进的升华法制备氮化铝单晶体

采用改进的升华法在氮气环境下制备氮化铝单晶体.通过优化实验条件制备出了六角形的高质量的氮化铝单晶体.实验发现,在坩埚的不同区域得到的氮化铝晶体的大小和形态有所不同.讨论了温度梯度对氮化铝晶体尺寸大小和形态的影响.     

Effect of the seed crystallographic orientation on AlN bulk crystal growth by PVT method

The growth of AlN crystals by PVT method was investigated using TaC crucible in the temperature range of 2250‐2350 °C. AlN boules with 30 mm in diameter were successfully grown on the crucible lid by self‐seeded growth. The AlN boules consist of the spontaneously nucleated AlN single crystal grains with the {1010} natural crystalline face. The fast growth rate of more than 1 mm/h was achieved. AlN crystals grown on (11 0)‐, (10 0)‐, and (0001)‐face AlN seeds were investigated. Different experimental phenomena have been observed under particular condition. The crystal grown on (11 0)‐face seed has different natural crystalline face from the seed. For the crystal grown on (10 0) or (0001) seed, the crystal natural crystalline face is same as the crystallographic orientation of the seed. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

坩埚预处理技术在氮化铝晶体生长工艺中的应用

在氮化铝晶体生长工艺中,坩埚的使用寿命是主要技术难点之一.实验发现,在钨坩埚体和盖之间放置内径和外径与坩埚相同的石墨环,在氮气环境下进行一次高温处理,使钨坩埚体与盖接触的部位形成碳化钨保护层,可以有效地解决高温下钨坩埚体与盖相粘结的问题,大大提高了坩埚的使用寿命.使用经过预处理的钨坩埚,用物理气相法生长出φ0.8mm×1.5mm氮化铝单晶体和φ36mm×5mm氮化铝多晶片.     

Growth of ZnO single crystals by an induced nucleation from a high temperature solution of the ZnO‐PbF2 system

To grow ZnO single crystals from a high temperature solution of the ZnO‐PbF₂ system, a gas cooling system was assembled at the bottom of the crucible to induce nucleation in the initial growth stage. The growth experiments were carried out in a homemade vertical Bridgman furnace and Pt crucible of 28 mm in diameter was used. The furnace temperature was set to 1100°C and the flow rate of the oxygen gas was optimized as 3.0 l/min. ZnO crystal up to 5∼8mm in the thickness was obtained with the lowering rate of 0.3 mm/h. XRD patterns showed that the as‐grown crystal was pure ZnO Wurtzite phase. The impurity ions were analyzed by the glow discharge mass spectroscopy (GDMS) as 390.0 ppm and 40.0 ppm for Pb²⁺ and F^‐, respectively. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effect of Crucible Diameter and Sealing Pressure on Growth Features of As2Se3 Single Crystals

Crystals of arsenic triselenide were grown in tubes of diameter varying from 14 to 25 mm sealed under partial pressure of Ar in the range 60–660 Torr. The temperature range of the growth zone was independent of crucible diameter and ambient pressure under otherwise identical conditions. A particular range of ambient pressure was conducive for the growth of good quality crystals and whiskers, growth rate increasing with diameter of tube. Transition to growth stage from nucleation stage was not spontaneous in tubes of diameter ≦ 16 mm but required a temperature cycling. Results are explained qualitatively.     

Growth behaviour of bulk GaN single crystals grown with various flux ratios using solvent‐thermal method

Bulk GaN single crystals were grown using a solvent‐thermal method. They were grown for 200 h at 600 °C and 800 °C using 8 MPa of N₂ gas and 1–3 mm sized pyramid GaN single crystals. Pure Na, NaN₃ and Ca were used as the flux. The mole fraction of the [flux]/([flux] + [Ga]) was 0.30–0.67. The growth behavior differed according to the flux ratio. The quality of the bulk GaN single crystals was improved by increasing the flux ratio. The bulk GaN single crystals formed by spontaneous nucleation were deposited on the BN crucible wall and bottom during the first step of synthesis. The wurtzite structure of the GaN grown single crystal was confirmed by x‐ray diffration. The chemical composition was analyzed by electron probe microanalysis. The quality and optical properties of the GaN single crystal were examined by Raman spectroscopy and photoluminesence analysis. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical study of radial temperature distribution in the AlN sublimation growth system

A large radial temperature gradient in the AlN sublimation growth system would lead to non‐uniform growth rate along the radial direction and introduce thermal stress in the as grown crystal. In this paper, we have numerically studied the radial thermal uniformity in the crucible of a AlN sublimation growth system. The temperature difference on the source top surface is insignificant while the radial temperature gradient on the lid surface is too large to be neglected. The simulation results showed that the crucible material with a large thermal conductivity is beneficial to obtain a uniform temperature distribution on the lid surface. Moreover, it was found that the temperature gradient on the lid surface decreases with increased lid thickness and decreased top window size.     

熔盐法和水热法KTP晶体的晶胞参数及拉曼光谱特征

利用X射线衍射和显微激光拉曼光谱研究熔盐法自发结晶的KTP晶体、顶部籽晶熔盐法KTP晶体和水热法KTP晶体的晶胞参数和拉曼光谱特征,分析和比较不同方法生长的KTP晶体的晶体结构与化学键特征峰.研究表明:KTP晶体的晶胞参数与晶体生长方法有关,熔盐法自发结晶的KTP晶体生长过程中降温速率较快,晶胞体积相对较小;熔盐法和水热法KTP晶体中部分拉曼特征峰的位置因生长方法不同呈现一定的差异,水热法KTP晶体在782 cm-1、744 cm-1和515 cm-1处出现的特征峰可视为水热法KTP晶体的标志峰,借此可将其与熔盐法晶体相区分.