银/硅纳米孔柱阵列活性基底的SERS效应研究

以硅纳米孔柱阵列(Si-NPA)为衬底,采用浸渍法制备出一种具有规则表面形貌特征的银/硅纳米孔柱阵列(Ag/Si-NPA),并以R6G为探测目标材料,对其表面增强拉曼(SERS)效应进行了研究。结果表明,对于R6G浓度低至10-15M,Ag/Si-NPA均能表现出清晰的特征SERS峰。随着浓度的降低,R6G的荧光淬灭,所测拉曼光谱的基线降低,但特征峰峰位基本保持不变。在低浓度10-15M时得到的SERS光谱,理论上证明为单分子光谱。此外,Ag/Si-NPA活性基底具有较好的稳定性,在长达28天的自然老化过程中,Ag/Si-NPA能够保持对R6G较高的探测水平,光谱具有较好的信噪比和分辨率。Ag/Si-NPA是一种理想的SERS活性基底。     

硅纳米孔柱阵列的结构和光学特性研究

采用水热腐蚀技术在单晶硅衬底上制备出一种新的硅微米／纳米结构复合体系——硅纳米孔柱阵列(Si-NPA)，并对其表面形貌、结构及光学特性进行研究.Si-NPA的结构复合性体现为 在微米和纳米两个尺度上形成了三个分明的结构层次，即微米尺度的硅柱阵列结构、硅柱上 的纳米多孔结构以及组成孔壁的硅纳米晶粒.积分光反射谱和荧光光谱测试表明，Si-NPA具 有良好的光吸收和光致发光特性.依据Si－NPA积分反射谱的实验数据，采用Kramers-Kronig 变换关系计算得到了Si-NPA的复折射率和复介电函数、吸收系数等光学常数，并由此讨论了 Si-NPA相对于单晶硅的光学特性发生显著变化的原因.最后，通过分析Si-NPA的光吸收系数 与入射光子能量之间的关系，揭示出Si-NPA具有直接带隙半导体的电子结构特征，而且理论 计算得到的Si-NPA的带隙能与其光致发光谱的峰位能很好符合. 关键词： 硅纳米孔柱阵列 光学特性 电子结构 水热腐蚀     

碳纳米管/硅纳米孔柱阵列的场发射性能

"通过热化学气相沉积的方法将碳纳米管生长到硅纳米孔柱阵列衬底上．采用场发射扫描电子显微镜、透射电子显微镜、高分辨透射电子显微镜、拉曼光谱和X射线能谱对所制备的样品形貌、组成进行了分析．结果发现：所制备产物为一种具有面积大、准周期性的碳纳米管/硅巢状阵列复合结构．能谱分析表明碳纳米管仅含有碳元素．对样品进行场发射性能测试表明该结构开启电压为1.3 MV/m,当外加电压为4.26 MV/m,发射电流为5 mA/cm2．由FN公式计算相应的场增强因子约为1.1￡104．碳纳米管/硅纳米孔柱阵列好的场发射性能被归     

硅纳米孔柱阵列及其四氧化三铁复合薄膜的湿敏电容特性研究

报道了硅纳米孔柱阵列（Si-NPA），Fe₃O₄复合的Si-NPA（Fe ₃O₄/Si-NPA）两种薄 膜材料的制备方法并对其形貌和结构进行了表征，研究了其电容湿度传感特性.结果表明，S i-NPA，Fe₃O₄/Si-NPA均为微米/纳米结构复合体系.当环境相对湿 度从11％上升到95％ 时，采用100 Hz的信号频率进行测试，以Si-NPA和Fe₃O₄/Si-NPA 为电介质材料制成的湿 敏元件的电容增加值分别为起始值的1500％和5500％；采用1000 Hz的信号频率测试时，则 分别为起始值的800％和12000％，显示出两种材料较高的湿度灵敏性和较强的绝对电容输出 信号强度.同时，在升湿和降湿过程中，Si-NPA，Fe₃O₄/Si-NPA都 具有较快的响应速度 ，其响应时间分别为15 s，5 s和20 s，15 s.文章结合材料的形貌和结构特性对其物理机理 进行了分析.上述结果表明，Si-NPA无论是直接作为湿度薄膜传感材料还是作为复合薄膜湿 度传感材料的衬底都具有很好的前景. 关键词： 硅纳米孔柱阵列 3O₄')" href="#">Fe₃O₄ 湿度电容传感特性     

掺铟氧化锌纳米阵列的制备、结构及性质研究

通过碳热辅助化学气相沉积法,用Au做催化剂在850℃下制备了铟掺杂的氧化锌（In/ZnO）纳米阵列.纳米棒的尺寸均匀,表面光滑,直径约为400 nm,长为2—3 μm.能量色散谱和X射线光电子能谱分析表明, 六棱柱状的纳米阵列中成功地进行了In 的掺杂,含量约为08%.室温光致发光谱显示掺杂后的紫外发射峰位有红移,峰的半高宽变大, 没有观察到绿光发射峰位.拉曼光谱显示出ZnO的峰位有不同程度的偏移,并且有新的峰位出现,这表明In的掺杂有效地取代了部分Zn的晶格. 关键词： In掺杂 ZnO 纳米阵列 光致发光     

掺AlZnO纳米线阵列的光致发光特性研究

采用化学气相沉积方法，以金做催化剂，在Si (100)衬底上制备了掺AlZnO纳米线阵列.扫描电子显微镜(SEM)表征发现ZnO纳米线的直径在30nm左右.X射线衍射(XRD)图谱上只存在ZnO的(002)衍射峰，说明ZnO纳米线沿c轴择优取向.掺AlZnO纳米线阵列的室温光致发光(PL)谱中出现了3个带边激子发射峰：373nm，375nm，389nm.运用激子理论推算出掺AlZnO纳米线的禁带宽度为3.343eV ，束缚激子结合能为0.156eV；纯ZnO纳米线阵列PL谱中3个带边激子发射 关键词： 光致发光 化学气相沉积(CVD) 激子 ZnO纳米线阵列     

纳米硅薄膜的光致发光特性

用等离子体增强化学汽相淀积法系统制备了发光纳米硅(nc-Si∶H)薄膜.讨论了晶粒尺寸和表面结构对光致发光(PL)谱的影响.用量子限制-发光中心模型解释了nc-Si∶H的PL.研究了PL谱的温度特性.温度从10K上升到250K，PL峰值红移了54meV，且PL强度衰减了两个数量级. 关键词：     

Co/AAO纳米有序阵列复合结构的光致发光和光吸收特性

以草酸电解液制备的高度有序的纳米级多孔阳极氧化铝(AAO)为模板,采用交流电化学沉积工艺合成了Co/AAO纳米有序阵列复合结构。分别研究了AAO模板和Co/AAO结构的光致发光和光吸收特性。结果表明,AAO模板在350～550nm范围内存在较强的光致发光带,其峰位在395nm处;Co/AAO纳米有序阵列复合结构的光致发射峰位亦在395nm处,且发光峰强度随Co沉积量的增加而迅速减弱。实验发现,Co/AAO纳米有序阵列复合结构的光吸收边从近紫外至近红外的波段范围内发生大幅度红移,最大红移量甚至超过380nm。文章定性分析并解释了Co/AAO纳米有序阵列复合结构吸收边大幅度红移及其光发射峰位不变、而峰强减弱的主要原因。     

硅纳米针及其光致发光特性(英文)

pacc:7855C Theusageofhydrofluoricacid(HF)orfluo ridewasbelievedtobeindispensableinthefabri cationofporoussilicon(PSi)sinceitsdiscovery. Herewereportanovelmethod,metal-assisted -chemical-reaction-etching(MACRE) method,topreparePSiwithoutHFacidorfluo rid…     

纳米硅结构薄膜光致发光的温度依赖特性

综合考虑纳米硅结构薄膜的特殊性质,如量子限制效应、光学带隙和光跃迁振子强度对纳米硅粒径的依赖特性以及光学带隙和光辐射的温度依赖特性等,给出了一个解析表达式来分析具有一定粒径分布的纳米硅结构薄膜的光致发光(PL)强度分布,其中选取了两种纳米硅的粒径分布,即高斯分布和对数正态分布。结果表明,随着平均粒径和粒径分布偏差的减小,纳米硅薄膜的PL谱峰蓝移。随着环境温度的升高,纳米硅结构薄膜的PL谱峰红移且相对发光强度减弱。纳米硅结构薄膜光辐射拟合的结果与实验数据的比较分析表明,该模型能够很好地解释纳米硅结构薄膜在不同温度下的PL特性。     

Preparation, structural and electrical properties of zinc oxide grown on silicon nanoporous pillar array

Polycrystalline thick film of zinc oxide (ZnO) is grown on a unique silicon substrate with a hierarchical structure, silicon nanoporous pillar array (Si-NPA), by using a vapour phase transport method. It is found that as-grown ZnO film is composed of closely packed ZnO crystallites with an average size of $\sim$10\,\mu$m. The film resistivity of ZnO/Si-NPA is measured to be $\sim$8.9\Omega\cdot$\,cm by the standard four probe method. The lengthwise $I$-$V$ curve of ZnO/Si-NPA heterostructure is measured. Theoretical analysis shows that the carrier transport across ZnO/Si-NPA heterojunction is dominated by two mechanisms, i.e. a thermionic process at high voltages and a quantum tunnelling process at low voltages.     

Microstructure and blue photoluminescence enhancement of silicon nanoporous pillar array embedded in ferroelectric barium strontium titanate

A silicon nanoporous pillar array (Si-NPA) with micrometer/nanometer hierarchical structure was fabricated by hydrothermal etching, followed by spin-coating barium strontium titanate (BST) on Si-NPA substrate. The photoluminescence (PL) spectra of the Si-NPA and BST/Si-NPA thin film were investigated. The emission band of freshly prepared Si-NPA located at 630 nm, and a blueshift at 425 nm as well as degradation in intensity after annealing at 600 °C for 1 h was observed, which might be explained by a quantum confinement effect model. BST ferroelectric material provided a static-electric field and induced the excited carriers in Si-NPA to migrate toward the opposite direction and recombine in an interfacial oxide layer. Therefore, BST enhanced blue emission of Si-NPA as well as passivated Si-NPA.     

Electronic band structure and optical properties of silicon nanoporous pillar array

Silicon nanoporous pillar array (Si-NPA) is fabricated by hydrothermally etching single crystal silicon (c-Si) wafers in hydrofluoric acid containing ferric nitrate. Microstructure studies disclosed that it is a typical micron/nanometer structural composite system with clear hierarchical structures. The optical parameters of Si-NPA were calculated by general light-absorption theory and Kramers–Kronig relations based on the experimental data of reflectance and the variations compared with the counterparts of c-Si were analyzed. The features of the electronic band structure deduced from the optical measurements strongly indicate that Si-NPA material is a direct-band-gap semiconductor and possesses separated conduction sub-bands which accords with conduction band splitting caused by silicon nanocrystallites several nanometers in size. All these electronic and optical results are due to the quantum confinement effect of the carriers in silicon nanocrystallites.     

Structure transition and photoluminescence of CdS/Si nanoheterostructure array on thermal annealing

CdS/Si heterojunctions have been prepared through growing CdS nanocrystallites (nc-CdS) on the silicon nanoporous pillar array (Si-NPA) by the chemical bath deposition method. Cadmium nanocrystallites (nc-Cd) have been observed and ascribed to the reducibility of Si-NPA. The reason for the appearance of CdO is indistinct and the related work will be done in the future. The blue, green and red emissions are ascribed to the silicon oxide layer, band gap of nc-CdS and the sulphur vacancies, respectively. Redshift and blueshift with the annealing temperature about green emissions are contributed to quantum size effect and the structure transition from nc-Cd to CdO. It is beneficial for investigating the structures and defects to the application of CdS/Si in the optoelectronic field.     

Rectification and electroluminescence of nanostructured GaN/Si heterojunction based on silicon nanoporous pillar array

A GaN/Si nanoheterojunction is prepared through growing Ga N nanocrystallites(nc-GaN) on a silicon nanoporous pillar array(Si-NPA) by a chemical vapor deposition(CVD) technique at a relatively low temperature. The average size of nc-Ga N is determined to be ~10 nm. The spectral measurements disclose that the photoluminescence(PL) from GaN/SiNPA is composed of an ultraviolet(UV) band and a broad band spanned from UV to red region, with the feature that the latter band is similar to that of electroluminescence(EL). The electron transition from the energy levels of conduction band and, or, shallow donors to that of deep acceptors of Ga N is indicated to be responsible for both the broad-band PL and the EL luminescence. A study of the I–V characteristic shows that at a low forward bias, the current across the heterojunction is contact-limited while at a high forward bias it is bulk-limited, which follows the thermionic emission model and space-charge-limited current(SCLC) model, respectively. The bandgap offset analysis indicates that the carrier transport is dominated by electron injection from n-GaN into the p-Si-NPA, and the EL starts to appear only when holes begin to be injected from Si-NPA into GaN with biases higher than a threshold voltage.     

反应磁控溅射ZnO/MgO多量子阱的光致荧光光谱分析

采用反应射频磁控溅射方法，在Si(001)基片上制备了具有高c轴择优取向的ZnO/MgO多量子阱.利用X射线反射、X射线衍射、电子探针，光致荧光光谱等表征技术，研究了ZnO/MgO多量子阱的结构、成份和光致荧光特性.研究结果表明，多量子阱的调制周期在1.85—22.3 nm之间，所制备的多量子阱具有量子限域效应，导致了室温光致荧光峰的蓝移，并观测到了量子隧穿效应引起的荧光效率下降.建立了基于多声子辅助激子复合跃迁理论的室温光致荧光光谱优化拟合方法，通过室温光致荧光光谱拟合发现，ZnO/MgO比ZnO/ZnMgO多量子阱具有更大的峰位蓝移，探讨了导致光致荧光光谱展宽的可能因素. 关键词： ZnO/MgO 多量子阱 磁控溅射 光致荧光 量子限域效应     

Effect of excitation and detection angles on photoluminescence spectrum from ZnO nanorod array

The angular dependent photoluminescence from ZnO nanorod array was investigated. Variations in the excitation and detection angles provided to reveal a blue shift and then splitting of a near-band edge emission into two bands. It is suggested that the observed phenomenon is caused by an inhomogeneous distribution of the emission along the nanorod length. The spatially resolved cathodoluminescence measurements confirmed that indeed the emission along the length of the nanorod is inhomogeneous and the top and bottom parts of the nanorod exhibit different emission spectra.     

Low-bias visible photodetection realized by graphite nanostructures grown on silicon nanoporous pillar array

A graphite nanostructure (nano-graphite) with the morphology of nanoparticles and nanowires which are composed of graphite nanocrystallites (nc-graphite) was grown on silicon nanoporous pillar array (Si-NPA) by a simple chemical vapor deposition method. The structural characterizations disclosed a complex interface configuration made of nc-graphite, nc-Ni (pre-deposited on Si-NPA as catalyst for nc-graphite growth), nc-NiO₂, and nc-Si. The designed nano-graphite/Si-NPA exhibits strong light absorption and sensitive photoresponsivity under low-bias potential in the visible region of 400–800 nm. For example, it shows a switching ratio of 75, a photoresponsivity of ~?0.16 AW^?1 and a rise/fall time of 12.24/5.66 s with an ultralow bias of 0.1 mV under the visible illumination of 5 mWcm^?2. The high switching ratio and responsivity were ascribed to the complexity of the interface nanostructures and the formation of a thick and compact graphite nanofilm. The results illustrate that nano-graphite/Si-NPA might be a promising candidate material for fabricating high-performance low-power Si-based visible photodetectors.     

退火对多晶ZnO薄膜结构与发光特性的影响

用射频反应溅射法在Si（111）衬底上制备了C轴取向的多晶ZnO薄膜，通过不同温度的退火处理，研究了退火对多晶ZnO薄膜结构和发光特性的影响.由x射线衍射得知，随退火温度的升高，晶粒逐渐变大，薄膜中压应力由大变小至出现张应力.光致发光测量发现，样品在430nm附近有一光致发光峰, 峰的强度随退火温度升高而减弱，联合样品电阻率随退火温度升高而逐渐变大的测量及能级图，推测出ZnO薄膜中的蓝光发射主要来源于锌填隙原子缺陷能级与价带顶能级间的跃迁. 关键词： ZnO薄膜 退火 光致发光 射频反应溅射