Ambient-pressure vapor deposition of octanethiol self-assembled monolayers

Scanning tunneling microscopy was used to characterize self-assembled monolayers (SAMs) of octanethiol on Au(111), created using vapor deposition at elevated temperatures and ambient pressure. Monolayers contained large, close-packed ( radical3 x radical3)R30 degrees domains with sizes considerably larger than those typically formed from conventional solution-phase preparation and with crystallographically straight domain boundaries. New striped surface phases were also observed, including a 13 x radical3 phase with a density that was 69% of the close-packed density; these striped phases appeared topographically higher in STM images than close-packed monolayers.     

Structural rearrangement of c(70) monolayers induced by octanethiol adsorption

Mixed monolayers of C70 and octanethiol are prepared on Au(111) by a sequential adsorption method. A partial C70 monolayer is first formed and characterized, followed by the vapor deposition of octanethiol. This results in a well-ordered alkanethiol film where single C70 molecules and small molecular clusters are located at domain boundaries and in disordered regions. Substrate step defects have a large influence on the spatial distribution of C70; adjacent to a substrate defect, C70 binds preferentially on the upper terrace and is depleted on the lower terrace. We explain these observations as resulting from the kinetics of alkanethiol monolayer formation, and we present a simple model for the evolution of surface structure in the C70/octanethiol system.     

ALD resist formed by vapor-deposited self-assembled monolayers

A new process of applying molecular resists to block HfO2 and Pt atomic layer deposition has been investigated. Monolayer films are formed from octadecyltrichlorosilane (ODTS) or tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane (FOTS) and water vapor on native silicon oxide surfaces and from 1-octadecene on hydrogen-passivated silicon surfaces through a low-pressure chemical vapor deposition process. X-ray photoelectron spectroscopy data indicates that surfaces blocked by these monolayer resists can prevent atomic layer deposition of both HfO2 and Pt successfully. Time-dependent studies show that the ODTS monolayers continue to improve in blocking ability for as long as 48 h of formation time, and infrared spectroscopy measurements confirm an evolution of packing order over these time scales.     

Formation of gold-methanethiyl self-assembled monolayers

The energetics of formation of thiyl-gold self-assembled monolayers is investigated using density-functional theory simulations. It is found that the chemisorption of dimethyl disulfide on the reconstructed Au(111) (22 x radical3) surface is most favored at the fcc reconstruction stripe, with initial physisorption leading to disulfide dissociation, adatom/vacancy-pair formation, and then, at a coverage of 7.8% sulfur atoms per gold atom, surface reconstruction lifting. At higher coverages, monolayer formation proceeds similarly on the unreconstructed surface, leading to surface pitting. Formation of the analogous adatom/vacancy-pair bound dissociated adsorbate complex on exposure of the clean unreconstructed surface to methanethiol is shown to be endothermic, however.     

Electrochemistry of redox-active self-assembled monolayers

Redox-active self-assembled monolayers (SAMs) provide an excellent platform for investigating electron transfer kinetics. Using a well-defined bridge, a redox center can be positioned at a fixed distance from the electrode and electron transfer kinetics probed using a variety of electrochemical techniques. Cyclic voltammetry, AC voltammetry, electrochemical impedance spectroscopy, and chronoamperometry are most commonly used to determine the rate of electron transfer of redox-activated SAMs. A variety of redox species have been attached to SAMs, and include transition metal complexes (e.g., ferrocene, ruthenium pentaammine, osmium bisbipyridine, metal clusters) and organic molecules (e.g., galvinol, C₆₀). SAMs offer an ideal environment to study the outer-sphere interactions of redox species. The composition and integrity of the monolayer and the electrode material influence the electron transfer kinetics and can be investigated using electrochemical methods. Theoretical models have been developed for investigating SAM structure. This review discusses methods and monolayer compositions for electrochemical measurements of redox-active SAMs.     

Mapping of defects in self-assembled monolayers by polymer decoration

A new method mapping the defects in self-assembled monolayers (SAMs) is described. The method is based on electrochemical polymerisation of nonconductive tyramine in defect sites of a monolayer and subsequent visualisation of the polymer structures by atomic force microscopy (AFM). SAMs of hexadecanthiol (HDT) on gold prepared by deposition from solution and microcontact printing were used as a model for this study. The method allows easy mapping of defects on monolayers and provides information about their shape, size, size distribution, defect density and spatial distribution. Comparative electrochemical characterisation of defects in SAMs before and after polymerisation shows that polymer growth occurs on the sites of uncovered gold. The approach should be applicable for the characterisation of defects in other types of ultra-thin organic films on conducting surfaces.     

Controlling the properties of self-assembled monolayers by substrate curvature

Properties of self-assembled monolayers (SAMs) can be tailored by the curvature of the underlying surface. This is so because on a curved support the density of SAM headgroups is always smaller than that of the surface-attachment sites. This density difference increases with increasing curvature and is most pronounced for SAMs formed on nanoscopic particles. This Perspective describes systems in which nanoscale curvature causes pronounced changes in the pK(a) of acid-presenting SAMs or in the electrochemical potential of redox-active molecules (including supramolecular "switches") attached to nanoparticles. It is suggested that in nanoparticles having regions of different curvature these geometrical differences can translate into site-selective charging; such "patchy" particles could be used as building blocks of pH-sensitive assemblies.     

Photodegradation of azobenzene-based self-assembled monolayers characterized by in-plane birefringence

Azobenzene-based self-assembled monolayers (azo-SAMs) are photoactive and become orientationally ordered when illuminated with linearly polarized light (LPL), making them attractive as dynamic alignment layers in liquid crystal cells. Azo-SAMs, however, are chemically unstable when exposed to both air and light. We have characterized the photodegradation of a methyl red-based SAM by measuring with a high-sensitivity polarimeter the optical anisotropy induced by illumination with linearly polarized actinic light after the sample is irradiated with circularly polarized light (CPL) in air. The number of unbleached, photoactive molecules in the SAM decays exponentially with CPL exposure time, lowering the reorientation rate during photowriting with LPL. Azo-SAMs in an argon atmosphere, in contrast, are chemically stable and remain photoactive even after exposure to CPL.     

Conglomerate crystallization on self-assembled monolayers

In this communication, we demonstrate that chiral self-assembled monolayers can be used for polymorphism control of chiral crystals. We studied the crystallization of DL-glutamic acid on chiral self-assembled monolayers and showed that crystallization of DL-glutamic acid on the chiral SAMs resulted in stabilization of the metastable conglomerate form.     

Functionalized fullerenes in self-assembled monolayers

Anisotropy of intermolecular and molecule-substrate interactions holds the key to controlling the arrangement of fullerenes into 2D self-assembled monolayers (SAMs). The chemical reactivity of fullerenes allows functionalization of the carbon cages with sulfur-containing groups, thiols and thioethers, which facilitates the reliable adsorption of these molecules on gold substrates. A series of structurally related molecules, eight of which are new fullerene compounds, allows systematic investigation of the structural and functional parameters defining the geometry of fullerene SAMs. Scanning tunnelling microscopy (STM) measurements reveal that the chemical nature of the anchoring group appears to be crucial for the long-range order in fullerenes: the assembly of thiol-functionalized fullerenes is governed by strong molecule-surface interactions, which prohibit formation of ordered molecular arrays, while thioether-functionalized fullerenes, which have a weaker interaction with the surface than the thiols, form a variety of ordered 2D molecular arrays owing to noncovalent intermolecular interactions. A linear row of fullerene molecules is a recurring structural feature of the ordered SAMs, but the relative alignment and the spacing between the fullerene rows is strongly dependent on the size and shape of the spacer group linking the fullerene cage and the anchoring group. Careful control of the chemical functionality on the carbon cages enables positioning of fullerenes into at least four different packing arrangements, none of which have been observed before. Our new strategy for the controlled arrangement of fullerenes on surfaces at the molecular level will advance the development of practical applications for these nanomaterials.     

Soft-UV photolithography using self-assembled monolayers

We report thiol-on-gold self-assembled monolayers (SAMs) that can be photodeprotected using soft UV irradiation (lambda = 365 nm) to yield CO(2)H functionalized surfaces complementing those reported previously, which yielded NH(2) functionalized surfaces. The photolysis of these SAMs were monitored using a combination of surface sensitive techniques. In the SAM environment the photodeprotection yields are lower than those obtained for equivalent reactions in dilute solution. The protected carboxylic acids SAMs are shown to have a low yield approximately 50% due to competing photoreduction reactions of the nitro group. The results from infrared studies show that, as the photolysis progresses, the long chain protected residues reorganize and shield the functional COOH groups, thereby reducing the hydrophilic character of the surface.     

Water penetration of damaged self-assembled monolayers

The interaction of water with self-assembled monolayers (SAMs) on amorphous silica is investigated using classical molecular dynamics simulation. Damage is induced through shear simulations with model atomic force microscopy (AFM) tips and separately with controlled extraction. We find that SAM coatings that have been slightly damaged (by normal loads close to 10 nN from a 10-nm-diameter AFM tip) are susceptible to water penetration and migration to the underlying hydrophilic substrate. The controlled damage studies indicate that the presence of water tends to heal damage below a threshold radius and exploits and magnifies damage above this threshold. For the systems studied here, Si(OH)3(CH2)10CH3 alkylsilane chains on amorphous silica, this threshold radius is between 0.5 and 1.0 nm.     

Electrochemical metallization of self-assembled porphyrin monolayers

Multifunctional sensor systems are becoming increasingly important in electroanalytical chemistry. Together with ongoing miniaturization there is a need for micro- and nanopatterning tools for thin electroactive layers (e.g. self-assembling monolayers). This paper documents a method for production of a micro-array of different metal-porphyrin monolayers with different sensor properties. A new method has been developed for the selective and local metallization of bare porphyrin monolayers by cathodic pulsing and sweeping. The metal-porphyrin monolayers obtained were characterized by cyclic voltammetry. It was shown that porphyrin monolayers can be metallized with manganese, iron, cobalt, and nickel by use of the new method. It is expected that all types of metal-porphyrin monolayers can be produced in the same manner.     

Molecular relaxation dynamics of self-assembled monolayers

Dielectric relaxation spectroscopy is used to quantify molecular motion in alkylsilane SAMs coated on porous glass over a broad temperature range, -30 to -150 degrees C. Systematic measurements using SAMs with variable coating densities allow us to determine the effect of monolayer disorder on molecular mobility in thin molecular films. A relaxation process with an activation energy of approximately 25 kJ/mol is found to dominate dynamics of SAM-chain segments near the substrate. By introducing polar CN groups at the ends of the chain, we show that the relaxation process in the monolayer canopy can be isolated and studied. This approach can be generalized to other substituent polar groups to probe localized relaxation dynamics in surface-grafted monolayer films.     

Structural changes in self-assembled monolayers initiated by ultraviolet light

Self-assembled monolayers of 2-anthracenethiol and 2-naphthalenethiol on gold (111) were irradiated with low-power UV light. Scanning tunneling microscope images recorded in situ show unusual structural changes. In the case of 2-anthracenethiol, structures measuring 4-7 nm wide and 30-40 nm in length are formed. Images taken 10 min after irradiation ceased to show further surface reorganization. With 2-naphthalenethiol SAMs, smaller structures form upon irradiation, which subsequently revert to resemble the original structure after time.     

New electroanalytical applications of self-assembled monolayers

New applications of self-assembled monolayers of thiol compounds on gold electrodes are reviewed. They include: (i) exploitation of electrical control of self-assembly of thiol compounds for electrically-addressable immobilization of receptor molecules onto sensor arrays; (ii) a spreader-bar technique for formation of stable nanostructures; and, (iii) use of self-assembled monolayers as selective filters for chemical sensors.     

Tribological properties of alkylsilane self-assembled monolayers

In this study, we perform molecular dynamics simulations of adhesive contact and friction between alkylsilane Si(OH)(3)(CX(2))(10)CX(3) and alkoxylsilane Si(OH)(2)(CX(2))(10)CX(3) (where X = H or F) self-assembled monolayers (SAMs) on an amorphous silica substrate. The alkylsilane SAMs are primarily hydrogen-bonded or physisorbed to the surface. The alkoxylsilane SAMs are covalently bonded or chemisorbed to the surface. Previously, we studied the chemisorbed systems. In this work, we study the physisorbed systems and compare the tribological properties with the chemisorbed systems. Furthermore, we examine how water at the interface of the SAMs and substrate affects the tribological properties of the physisorbed systems. When less than a third of a monolayer is present, very little difference in the microscopic friction coefficient mu or shear stresses is observed. For increasing amounts of water, the values of mu and the shear stresses decrease; this effect is somewhat more pronounced for fluorocarbon alkylsilane SAMs than for the hydrocarbon SAMs. The observed decrease in friction is a consequence of a slip plane that occurs in the water as the amount of water is increased. We studied the frictional behavior using relative shear velocities ranging from v = 2 cm/s to 2 m/s. Similar to previously reported results for alkoxylsilane SAMs, the values of the measured stress and mu for the alkylsilane SAM systems decrease monotonically with v.     

Formation of aromatic siloxane self-assembled monolayers

We describe reproducible protocols for the chemisorption of self-assembled monolayers (SAMs), useful as imaging layers for nanolithography applications, from p-chloromethylphenyltrichlorosilane (CMPS) and 1-(dimethylchlorosilyl)-2-(p,m-chloromethylphenyl)ethane on native oxide Si wafers. Film chemisorption was monitored and characterized using water contact angle, X-ray photoelectron spectroscopy, and ellipsometry measurements. Atomic force microscopy was used to monitor the onset of multilayer deposition for CMPS films, ultimately allowing film macroscopic properties to be correlated with their surface coverage and nanoscale morphologies. Although our results indicate the deposition of moderate coverage, disordered SAMs under our conditions, their quality is sufficient for the fabrication of sub-100-nm-resolution metal features. The significance of our observations on the design of future imaging layers capable of molecular scale resolution in nanolithography applications is briefly discussed.     

Structural characterization of aldehyde-terminated self-assembled monolayers

The structure of aldehyde-terminated alkanethiol self-assembled monolayers (SAMs) on Au(111) is investigated using scanning tunneling microscopy (STM), atomic force microscopy (AFM), and density functional theory (DFT) calculations. For the first time, the structures of aldehyde-terminated SAMs are revealed with molecular resolution. SAMs of 11-mercapto-1-undecanal exhibit the basic (radical3xradical3)R30 degrees periodicity and form various c(4x2) superstructures upon annealing. In conjunction with DFT studies, the models of the (radical3xradical3)R30 degrees and the c(4x2) superstructures are constructed. In comparison with alkanethiol SAMs, the introduction of aldehyde-termini results in smaller domain size, lower degree of long-range order, large coverage of disordered areas, and higher density of missing molecules and other point defects within domains of closely packed molecules. The origin of these structural differences is mainly attributed to the strong dipole-dipole interactions among the aldehyde termini.